Patents by Inventor Andras G. Major

Andras G. Major has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160266502
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Application
    Filed: December 15, 2015
    Publication date: September 15, 2016
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 9310701
    Abstract: A device for guiding electromagnetic radiation into a projection exposure apparatus for semiconductor lithography includes an optical fiber and an actuator for the mechanical manipulation of a section of the fiber as a result of which a temporally averaged homogenization of an intensity profile of electromagnetic radiation emerging at an exit end of the fiber can be achieved. A projection exposure apparatus for semiconductor lithography is equipped with the abovementioned device.
    Type: Grant
    Filed: February 8, 2012
    Date of Patent: April 12, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Andras G. Major
  • Patent number: 9239229
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Grant
    Filed: April 24, 2015
    Date of Patent: January 19, 2016
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Publication number: 20150300807
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Application
    Filed: April 24, 2015
    Publication date: October 22, 2015
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 9052606
    Abstract: A microlithographic projection exposure apparatus includes a projection light source. The apparatus also includes a heating light source for generating heating light which is at least partly absorbed by an optical element. An illumination optical unit directs the heating light onto the optical element such that the heating light has a predefined intensity distribution on an optical surface of the optical element. The illumination optical unit includes a deflection element which is a diffractive optical element or a refractive freeform element. The deflection element simultaneously directs the heating light impinging thereon in different directions.
    Type: Grant
    Filed: September 26, 2012
    Date of Patent: June 9, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Andras G. Major, Manfred Maul, Gundula Weiss, Jochen Hetzler
  • Patent number: 9019475
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: April 28, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 9013680
    Abstract: An illumination system of a microlithographic projection exposure apparatus includes a beam deflection array including a number beam deflection elements, for example mirrors. Each beam deflection element is adapted to deflect an impinging light beam by a deflection angle that is variable in response to control signals. The light beams reflected from the beam deflection elements produce spots in a system pupil surface. The number of spots illuminated in the system pupil surface during an exposure process, during which a mask is imaged on a light sensitive surface, is greater than the number of beam deflection elements. This may be accomplished with the help of a beam multiplier unit that multiplies the light beams reflected from the beam deflection elements. In another embodiment the beam deflecting elements are controlled such that the irradiance distribution produced in the system pupil surface changes between two consecutive light pulses of an exposure process.
    Type: Grant
    Filed: July 14, 2010
    Date of Patent: April 21, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Damian Fiolka, Ralf Mueller, Andras G. Major
  • Patent number: 9013684
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Grant
    Filed: July 24, 2012
    Date of Patent: April 21, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 9001309
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: April 7, 2015
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 8854604
    Abstract: A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.
    Type: Grant
    Filed: August 23, 2011
    Date of Patent: October 7, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Deguenther, Michael Patra, Andras G. Major
  • Publication number: 20140233006
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 21, 2014
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Manfred Maul, Johannes Eisenmenger, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Damian Fiolka, Andras G. Major, Johannes Wangler, Michael Layh
  • Publication number: 20140226141
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 14, 2014
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Patent number: 8773639
    Abstract: An illumination system of a microlithographic projection exposure apparatus comprises a pupil surface and an arrangement of individually drivable beam deviating elements. Each beam deviating element is configured to direct light impinging thereon onto different positions on the pupil surface in response to a control signal applied to the beam deviating element. According to the disclosure an attenuation unit is provided which is configured to reduce the intensity of light, which is directed by any arbitrary beam deviating element (onto the pupil surface, by more than 50%. This makes it possible to reduce the intensity of light in the pupil surface that has been reflected by defective beam deviating elements.
    Type: Grant
    Filed: December 7, 2009
    Date of Patent: July 8, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Deguenther, Andras G. Major, Anne Christine Andresen
  • Publication number: 20130230073
    Abstract: The invention concerns a method of and an arrangement for determining the heating condition of a mirror in an optical system, in particular in a microlithographic projection exposure apparatus. In an embodiment the mirror is an EUV mirror and a method according to the invention comprises the following steps: deflecting at least one input measuring beam on to the mirror; ascertaining at least one optical parameter of at least one output measuring beam produced from the input measuring beam after interaction with the mirror; and determining the heating condition of the mirror on the basis of the parameter.
    Type: Application
    Filed: April 16, 2013
    Publication date: September 5, 2013
    Inventors: Peter Vogt, Martin Hermann, Oliver Dier, Andras G. Major
  • Patent number: 8339577
    Abstract: An illumination system of a microlithographic projection exposure apparatus has a pupil surface and an essentially flat arrangement of desirably individually drivable beam deviating elements for variable illumination of the pupil surface. Each beam deviating element allows deviation of a projection light beam incident on it to be achieved as a function of a control signal applied to the beam deviating element. A measurement illumination instrument directs a measurement light beam, independent of the projection light beams, onto a beam deviating element. A detector instrument records the measurement light beam after deviation by the beam deviating element. An evaluation unit determines the deviation of the projection light beam from measurement signals provided by the detector instrument.
    Type: Grant
    Filed: July 21, 2009
    Date of Patent: December 25, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Publication number: 20120293784
    Abstract: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to compute, for each element, an estimated state vector based on the measurement signal. The estimated state vector represents: a deviation of a light beam caused by the element; and a time derivative of the deviation. The illumination system further includes a regulator configured to receive, for each element: a) the estimated state vector; and b) target values for: i) the deviation of the light beam caused by the deviating element; and ii) the time derivative of the deviation.
    Type: Application
    Filed: July 24, 2012
    Publication date: November 22, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Stefan Xalter, Yim-Bun Patrick Kwan, Andras G. Major, Manfred Maul, Johannes Eisenmenger, Damian Fiolka, Jan Horn, Markus Deguenther, Florian Bach, Michael Patra, Johannes Wangler, Michael Layh
  • Publication number: 20120212720
    Abstract: A device for guiding electromagnetic radiation into a projection exposure apparatus for semiconductor lithography includes an optical fibre and an actuator for the mechanical manipulation of a section of the fibre as a result of which a temporally averaged homogenization of an intensity profile of electromagnetic radiation emerging at an exit end of the fibre can be achieved. A projection exposure apparatus for semiconductor lithography is equipped with the abovementioned device.
    Type: Application
    Filed: February 8, 2012
    Publication date: August 23, 2012
    Applicant: Carl Zeiss SMT GmbH
    Inventor: Andras G. Major
  • Publication number: 20120127440
    Abstract: An optical assembly for projection lithography has an optical component to guide imaging or illumination light. The optical component has a reflective substrate that contains a fluorescent component. An excitation light source is used to produce fluorescence excitation light. An excitation optical system is used to guide the fluorescence excitation light to the fluorescent component of the substrate. The optical assembly also has a fluorescent light detector and a fluorescence optical system for guiding fluorescent light to the fluorescent light detector. The fluorescent light is produced via fluorescence of the fluorescent component upon irradiation with fluorescence excitation light. The optical assembly can detect a temperature or temperature distribution of the substrate of the optical component with a high degree of precision.
    Type: Application
    Filed: November 18, 2011
    Publication date: May 24, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventor: Andras G. Major
  • Patent number: 8164046
    Abstract: An illumination system for illuminating a mask in a microlithographic projection exposure apparatus includes an array of mirrors or other beam deflecting elements. Each beam deflecting element produces on the surface a projection light spot at a position that is variable by changing a deflection angle produced by the beam deflecting element. A spot shape measuring unit measures the shapes of spots which are produced on the spot measuring unit by the beam deflecting elements. The spot shape measuring unit is arranged outside of every possible path projection light is allowed to take between the array and the mask. A control unit controls the beam deflecting elements such that, at a given instant during an exposure operation of the apparatus, at least one beam deflecting element directs projection light exclusively on the spot shape measuring unit, and at least some beam deflecting elements direct projection light exclusively on the surface.
    Type: Grant
    Filed: July 16, 2009
    Date of Patent: April 24, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Andras G. Major
  • Publication number: 20120002185
    Abstract: A microlithographic projection exposure apparatus includes an optical surface, which may be formed by a plurality of micro-mirrors, and a measurement device which is configured to measure a parameter related to the optical surface at a plurality of locations. The measurement device includes an illumination unit with a plurality of illumination members, each having a light exit facet. An optical imaging system establishes an imaging relationship between an object plane in which at least two light exit facets are arranged, and an image plane which at least substantially coincides with the optical surface. A detector unit measures the property of measuring light after it has interacted with the optical surface, and an evaluation unit determines the surface related parameter for each of the locations on the basis of the properties determined by the detector unit.
    Type: Application
    Filed: August 23, 2011
    Publication date: January 5, 2012
    Applicant: CARL ZEISS SMT GMBH
    Inventors: Markus Deguenther, Michael Patra, Andras G. Major