Abstract: Provided is a mask manufacturing method which includes preparing a mask sheet and a frame, stretching the mask sheet, and fixing the stretched mask sheet to the frame, and forming cell openings in the mask sheet fixed to the frame.

Abstract: A deposition mask according to an embodiment of the present disclosure includes a first surface, a second surface that is located opposite the first surface, and two or more through-holes. Each of the through-holes includes a first recess that is located at the first surface and a second recess that is located at the second surface. The deposition mask has a first mask region having a first surface remaining ratio that represents a remaining area ratio of the second surface and a second mask region having a second surface remaining ratio that represents a remaining area ratio of the second surface and that is higher than the first surface remaining ratio.

Abstract: A hybrid mask stick and a mask frame assembly employing the same are provided. The mask frame assembly includes: a mask frame; and a mask stick assembly including a first mask stick that extends in a first direction, a second mask stick that extends in a second direction intersecting the first direction, and a plurality of third mask sticks that is coupled to ends of the first mask stick and the second mask stick and defines a plurality of deposition areas, wherein a thickness of the first mask stick is different from a thickness of the second mask stick, and a partial etching portion is arranged in a portion where the first mask stick and the second mask stick are coupled to each other.

Abstract: A display device includes a substrate including a display area having first color subpixels and a transparent area inside the display area, an array layer in the display area on the substrate, a first electrode in the first color subpixels on the array layer, a first emission assisting layer on the first electrode, an emitting material layer in the first color subpixels on the first emission assisting layer, a second emission assisting layer on the emitting material layer, a deposition preventing layer in the transparent area on the second emission assisting layer, a second electrode on the second emission assisting layer, the second electrode selectively disposed in a region where the deposition preventing layer is not disposed, an encapsulating layer on the deposition preventing layer and the second electrode, a polarizing layer in the display area on the encapsulating layer, an auxiliary equipment in the transparent area under the substrate.

Abstract: A thin film deposition apparatus used to produce large substrates on a mass scale and improve manufacturing yield. The thin film deposition apparatus includes a deposition source; a first nozzle disposed at a side of the deposition source and including a plurality of first slits arranged in a first direction; a second nozzle disposed opposite to the first nozzle and including a plurality of second slits arranged in the first direction; and a barrier wall assembly including a plurality of barrier walls arranged in the first direction so as to partition a space between the first nozzle and the second nozzle.

Abstract: A masking member used to coat a pipe inner circumferential surface of a vent stringer, wherein the masking member comprises: a sponge for blocking a pipe internal space of the vent stringer, the sponge having an outer circumferential surface capable of contacting the pipe inner circumferential surface; and a support member for supporting the sponge.

Abstract: A mask assembly includes a mask and a blocking stick. The mask includes a pattern region formed therein with openings and extends in a first direction. The blocking stick is disposed under the mask and overlaps a first side portion of the mask. The mask further includes dummy opening regions and opening regions. The dummy opening regions are arranged in the first direction in the first side portion of the mask, and are formed therein with openings. The opening regions are arranged in the first direction in a second side portion which is opposite to the first side portion of the mask and correspond to the dummy opening regions, respectively. The number of the openings per a unit area in each of the dummy opening region and the opening region is smaller than the number of the openings per a unit area in the pattern region.

Abstract: A mask frame includes a first horizontal portion, a second horizontal portion disposed under the first horizontal portion, at least one vertical portion connecting the first horizontal portion and the second horizontal portion and a tensile bar coupled to the first horizontal portion, and the tensile bar is configured to apply a contraction force to the first horizontal portion in a longitudinal direction of the tensile bar.

Abstract: There is provided a vapor deposition mask including: a resin mask including a plurality of resin mask openings corresponding to a pattern to be produced by vapor deposition; and a metal mask including a metal mask opening, the resin mask and the metal mask being stacked such that the resin mask openings overlap with the metal mask opening, wherein a shape of the metal mask opening as the metal mask is seen in plan view includes a polygon as a basic shape and an elongation part, added to the polygon, the elongation part elongating a length of a whole periphery of the polygon.

Abstract: An apparatus for manufacturing a display device includes a mask assembly, the mask assembly including a silicon substrate having a first surface, a second surface opposite the first surface, and a first opening portion penetrating the first surface and the second surface, and a support substrate on the second surface, the support substrate having a second opening portion connected to the first opening portion. The first opening portion at the first surface is less in width than the first opening portion at the second surface.

Abstract: A method for manufacturing a display backplane, a display backplate, and a display device are disclosed. The method includes: forming a planarization layer on one side of a substrate inside a pixel region, a partition region, and a perforation region; forming at least one girdle of annular passivation layer disposed around the perforation region on a surface, away from the substrate, of the planarization layer inside a portion of the partition layer; removing a portion of the planarization layer, inside the partition region, uncovered by the annular passivation layer and the planarization layer, inside the partition region, partially covered by the annular passivation layer, to obtain at least one girdle of annular isolation columns disposed between the substrate and the annular passivation layer and around the perforation region; and forming organic light-emitting elements on one side of the planarization layer away from the substrate to obtain the display backplane.

Abstract: A protective mask for a part, the part including a plurality of openings in a surface thereof, is provided. The protective mask includes a mounting member at least partially within each of at least two of the plurality of openings. Each mounting member includes a water soluble material. A masking member couples the at least two mounting members. The masking member includes a non-water soluble material. Each mounting member includes a first plurality of integral layers of the water soluble material, and the masking member includes a second plurality of integral layers of the non-water soluble material. The protective mask can be made by a two material additive manufacturing system. A related method is also provided.

Abstract: The present disclosure provides a mask plate and a fabricating method thereof. The mask plate includes a patterning layer having a plurality of openings; a bonding region at a periphery of the patterning region and including a bonding part configured to be bonded to an external frame; and a transition region between the patterning region and the bonding region and including a transition part, the transition part adjoining the patterning layer and the bonding part, respectively; a thickness of the patterning layer is less than a thickness of the bonding part; and a thickness of a portion of the transition part adjoining the patterning layer is less than a thickness of a portion of the transition part adjoining the bonding part. The mask plate of the present disclosure can alleviate problem that the patterning layer is thin and easy to deform and has improved flatness of the patterning layer.

Abstract: Provided are a mask frame assembly in which deformation of a frame may be reduced, and a method of manufacturing an organic light-emitting display apparatus using the mask frame assembly. The mask frame assembly includes a frame of a rectangular shape, the frame including an opening and a lower surface including first grooves extending in a first direction, a plurality of first auxiliary sticks extending in the first direction across the opening, wherein a first end and a second end of each of the first auxiliary sticks are bonded to an upper surface of the frame, a mask on the plurality of first auxiliary sticks, and a plurality of second auxiliary sticks arranged in the first grooves, wherein one end and an opposite end of each of the plurality of second auxiliary sticks are bonded to a bottom surface in each of the first grooves.

Abstract: A wall surface of an opening of a deposition mask includes a first wall surface that extends from a first end toward a second surface, a second wall surface that extends from a second end toward a first surface, and a connection at which the first wall surface is connected to the second wall surface. When the opening is viewed from the first surface side along a normal direction of the first surface, the first end of the opening includes a first portion that extends in a first direction and has a first dimension and a second portion that extends in a second direction intersecting the first direction and a second dimension shorter than the first dimension. The first wall surface includes a first wall surface section that extends from the first portion toward the connection and a second wall surface section that extends from the second portion toward the connection. A height of the first wall surface section is lower than a height of the second wall surface section.

Abstract: A metal plate to be used in the manufacture of a deposition mask comprises: a base metal plate; and a surface layer disposed on the base metal plate, wherein the surface layer includes elements different from those of the base metal plate, or has a composition ratio different from that of the base metal plate, and an etching rate of the base metal plate is greater than the etching rate of the surface layer. An embodiment includes a manufacturing method for a deposition mask having an etching factor greater than or equal to 2.5. The deposition mask of the embodiment includes a deposition pattern region and a non-deposition region, the deposition pattern region includes a plurality of through-holes, the deposition pattern region is divided into an effective region, a peripheral region, and a non-effective region, and through-holes can be formed in the effective region and the peripheral region.

Abstract: A metal plate includes a surface including a longitudinal direction of the metal plate and a width direction orthogonal to the longitudinal direction. A surface reflectance by regular reflection of a light is 8% or more and 25% or less. The surface reflectance is measured when the light is incident on the surface at an angle of 45°±0.2°. The light is in at least one plane orthogonal to the surface.

Abstract: Provided is a mask having a plurality of cell areas, each of which has a plurality of through-portions defined therein. The mask includes a mask film including a polymer and a conductive layer disposed on at least one surface of the mask film and including conductive metal or a conductive metal oxide. Accordingly, precision of a deposition process is enhanced while reducing process time and costs in a manufacturing process of the mask, and thus the yield in manufacturing a display panel using the mask is improved. Therefore, the display panel manufactured using the mask may have improved reliability.

Abstract: Disclosed herein is a full-size mask assembly and a manufacturing method thereof. The full-size mask assembly according to an embodiment of the present invention includes a frame having a frame opening formed therein and a support surrounding the frame opening, a structural auxiliary mask supported by the support and having a plurality of shafts in a grid shape to form a plurality of structural auxiliary mask openings, and a plurality of cell unit masks supported by the structural auxiliary mask and each of which has a deposition pattern portion through which a deposition material passes.

Abstract: A mask and a method of manufacturing the same are disclosed. The method of manufacturing a mask includes forming a conductive layer on a pattern region and an auxiliary region around the pattern region of a substrate, placing the substrate including the conductive layer in a plating bath, forming a plating layer on the conductive layer, and separating the substrate and the conductive layer from the plating layer.

Abstract: A furniture spacer (1) that maintains an even gap between a piece of furniture and a wall thereby protecting the furniture and wall from damage while providing an attractive design aesthetic.

Abstract: Disclosed are a mask strip, a mask plate frame, a mask plate, and a welding method thereof. The mask strip includes a first welding region, a second welding region, and a pattern region between the first welding region and the second welding region. In addition, a bendable region is disposed both between the first welding region and the pattern region and between the second welding region and the pattern region.

Abstract: A mask device, a mask plate and frame are provided. The mask device includes a frame and a first mask plate. The frame includes an inner edge, an outer edge, and a plurality of mounting grooves. A first mask plate includes a substrate, at least one first mask opening on the substrate, and a plurality of clamping portions protruding and extending outward from at least part of a periphery of the substrate. The plurality of clamping portions are mounted in the plurality of mounting grooves, respectively, so that the substrate is mounted on the inner edge of the frame. A direction along which the clamping portion extends from the substrate to a direction away from the substrate is a first direction, a direction perpendicular to the first direction is a second direction.

Abstract: The present disclosure provides a mask device and a manufacturing method thereof, and an evaporation system. The mask device includes a frame, strip alignment plates and a strip support plate, hollow portions are provided in the strip alignment plates, and the strip alignment plates are fixed on the frame; the strip support plate and the strip alignment plates cross each other, a plurality of welding spots are provided on the surface of the strip support plate proximal to the frame, and are welded and fixed to the frame, and the plurality of welding spots are provided in the region of the strip support plate corresponding to the hollow portions.

Abstract: The present invention provides a mask, a display panel, a method for manufacturing a display panel, and a display device. The display panel has a hollow region and a display region surrounding the hollow region. The display panel includes a plurality of organic light-emitting devices arranged only in the display region. Each of the plurality of organic light-emitting devices includes an anode layer, a cathode layer, a light-emitting layer and a functional layer. The functional layer includes a plurality of uneven portions.

Abstract: Embodiments are disclosed for an apparatus that enables the user to paint a surface and keep the paint focused in the desired area intended to receive the paint and minimize overspray. The disclosed apparatus is a paint shield. The paint shield includes an elongated planar body, a right fin, a left fin, and one or more reinforcing ridges that extend along the planar body. The paint shield can include an attached or attachable handle and the handle can rotate. The user may adjust the angle of the right fin and the left fin to provide additional protection from the side to protect a surface area from receiving any paint and then orient the back surface of the planar body against a surface to be painted. Once the paint shield is positioned, while holding the paint shield using the handle, the user paints the area not covered by the paint shield. The paint shield protects the surface that is covered by the paint shield so that no or minimal paint is deposited on that surface.

Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.

Abstract: A vapor deposition mask used to manufacture a display device includes a notch portion. The vapor deposition mask is provided with an FMM sheet and a first cover sheet. The first cover sheet includes a trunk portion and a notch forming portion that protrudes from the trunk portion and prevents film formation on the notch portion, and the thickness of at least a part of the notch forming portion is smaller than the thickness of the trunk portion.

Abstract: A method of manufacturing a mask frame assembly includes: welding fixing ends of a long-side support bar on a frame; and fixing a mask having a pattern area to be divided by the long-side support bar, on the frame, wherein the welding of the fixing ends of the long-side support bar on the frame includes forming welds asymmetrically with respect to a longitudinal central axis of the fixing ends.

Abstract: The ratio of the difference between a surface distance L at each of the different positions in a width direction DW of a metal sheet and a minimum surface distance Lm to the minimum surface distance Lm is an elongation difference ratio. The elongation difference ratio in a center section in the width direction DW of the metal sheet is less than or equal to 3×10?5. The elongation difference ratios in two edge sections in the width direction DW of the metal sheet are less than or equal to 15×10?5. The elongation difference ratio in at least one of the two edge sections in the width direction DW of the metal sheet is less than the elongation difference ratio in the center section in the width direction of the metal sheet.

Abstract: A protective device (10, 10?) provides a protective cover for a part (12, 12?, 12?) of a medical device and includes a flexible part (14, 14?) and with a rigid part (16, 16?). The rigid part (16, 16?) has at least one locking element (28, 28?). The locking element (28, 28?) is lockingly connectable to a counterpiece of the corresponding part (12, 12?, 12?) of the medical device.

Abstract: A deposition mask apparatus including a frame, a supporter including a plurality of supporting members fixed to the frame, and a deposition mask fixed to the frame is provided. The plurality of supporting members include at least a first supporting member that is closest to an intermediate position between a third portion and a fourth portion of the frame and a second supporting member that is located closer to the third portion of the frame than the first supporting member. The first supporting member in a state of warping downward from the frame with a first warping amount supports the deposition mask from below. The second supporting member in a state of warping downward from the frame with a second warping amount that is smaller than the first warping amount supports the deposition mask from below.

Abstract: The present disclosure discloses a fixing apparatus for fixing a substrate to be processed below a bearing base during an evaporation process, the substrate to be processed includes a base substrate, a ferromagnetic material is formed on a front surface or a back surface of the base substrate, and a magnetic field generator is disposed on a back surface of the bearing base at a location corresponding to the ferromagnetic material; the magnetic field generator is configured to generate a magnetic field so that the ferromagnetic material and the magnetic field generator are approaching to each other under an effect of the magnetic field generated by the magnetic field generator to fix a front surface of the bearing base with the back surface of the base substrate. An evaporation method is further disclosed.

Abstract: A covering device (10) for covering at least one region (21) of a component (20) during a high-temperature coating process, the covering device (10) being placed essentially form-fittingly on the component (20) during the high-temperature coating process to prevent the at least one region covered by the covering device from being coated. The elements of the covering device (10) placed essentially form-fittingly on the component (20) are fabricated of a high temperature-resistant plastic which is dimensionally stable during the high-temperature coating process.

Abstract: A mask includes a shielding portion and a plurality of hollow regions. The shielding portion includes: a plurality of shielding strips, a plurality of raised portions and a plurality of grooves. Side surfaces of some of the plurality of shielding strips are sequentially connected to form one of the plurality of hollow regions. Each raised portion is disposed on a side surface of a corresponding one of the plurality of shielding strips close to a corresponding hollow region, and each raised portion is connected with the side surface of the shielding strip. Each groove is at least partially formed in a first surface of a corresponding one of the plurality of raised portions, and the first surface is parallel to a plate surface of the mask.

Abstract: A mask plate and manufacturing method thereof, a mask assembly and a vapor deposition apparatus are provided. The mask plate includes a mask pattern region, and a peripheral region of the mask pattern region, the peripheral region including a recess structure, and a recess direction of the recess structure being parallel to a thickness direction of the mask plate. When the glass substrate is superposed on the mask plate, the force suffered by the glass substrate at the weld pad is reduced, and the probability of scratching the glass substrate is lowered.

Abstract: A deposition mask includes: a first surface and a second surface, in which a plurality of through-holes are formed; a pair of long side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a longitudinal direction of the deposition mask; and a pair of short side surfaces connected to the first and second surfaces, and defining a profile of the deposition mask in a width direction of the deposition mask. The long side surface includes a first portion that is recessed inside and includes a first end portion positioned along the first surface, and a second end portion positioned along the second surface and positioned inside the first end portion. The through-hole includes a first recess formed on the first surface, and a second recess formed on the second surface and connected to the first recess through a hole connection portion.

Abstract: A deposition mask includes a mask body and a through-hole provided in the mask body and through which a deposition material passes when the deposition material is deposited on a deposition target substrate. The mask body satisfies y?950 and y?23x?1280 when an indentation elastic modulus is x (GPa) and a 0.2% yield strength is y (MPa).

Abstract: A vapor deposition mask is provided with: a resin film, which has at least one of first to third opening patterns in which first to third openings, for forming first to third subpixels that configure one pixel of a display panel, are disposed with a fixed periodicity; and a metal support layer, which is bonded to the resin film and has an opening pattern for fourth openings that are formed so as to be able to encompass all of the first to third openings of the resin film. In regions of the resin film exposed by the fourth openings of the metal support layer, one or two of the first to third openings of the resin film are formed.

Abstract: A metal mask includes a mask body part and two connecting parts disposed at opposite sides of the mask body part. Each of the connecting parts includes a body portion and a single-stage step portion. A side of the body portion is connected to the mask body part, and an opposite side of the body portion is connected to the single-stage step portion. A thickness of the single-stage step portion is smaller than a thickness of the body portion.

Abstract: A mask for thin film deposition includes a first mask which defines an opening, and a second mask on a surface of the first mask, and which defines a plurality of deposition holes and has a multilayer structure, in which the opening and the plurality of deposition holes communicate with each other and provide a passage for a deposition material, a size of each of the plurality of deposition holes is smaller than a size of the opening, and each of the plurality of deposition holes has a shape corresponding to a deposition pattern to be patterned on a substrate.

Abstract: An embodiment of the present disclosure provides a vapor deposition device and a vapor deposition method thereof. The vapor deposition device comprises an adjustable magnet array. The adjustable magnet array comprises m magnet blocks, wherein a magnetization direction of at least one of the magnet blocks is adjustable. The vapor deposition device is used to prepare a film.

Abstract: A method of applying a multi-color finish to a plumbing fixture includes depositing a first coating on the plumbing fixture; selectively applying a masking material in a graduated fashion over at least a portion of the first coating to define a gradient from a first portion of the plumbing fixture that is substantially completely covered by the masking material to a second portion of the plumbing fixture that has substantially no masking material; depositing a second coating over the masking material; and removing the masking material from the plumbing fixture such that the plumbing fixture has a surface finish including a transition region representing a gradual transition between the first coating and the second coating.

Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.

Abstract: A mask plate, a manufacturing method of the mask plate, and a method of evaporation by using the mask plate are provided. The mask plate includes an opening plate, the opening plate includes an opening and a blocking portion outside the opening, a concavity is in the blocking portion, and a depth of the concavity is smaller than a thickness of the blocking portion.

Abstract: A deposition mask includes a first area defining a clamping portion at ends of the deposition mask and to which a force is applied to extend the deposition mask in a length direction thereof, a recess area adjacent to the first area and defining a recess at the ends; and a pattern portion including a plurality of pattern holes through which a deposition material passes. Along the length direction, a plurality of first pattern portions are arranged in the first area and a plurality of second pattern portions arranged in the recess area. The force applied extends the first area and does not extend the recess area. The force not applied defines non-extended positions of the pattern portions, and for the non-extended positions of the first and second pattern portions, a first distance between adjacent first pattern portions is less than a second distance between adjacent second pattern portions.

Abstract: A vapor deposition mask is provided with: a resin film, which has at least one of first to third opening patterns in which first to third openings, for forming first to third subpixels that configure one pixel of a display panel, are disposed with a fixed periodicity; and a metal support layer, which is bonded to the resin film and has an opening pattern for fourth openings that are formed so as to be able to encompass all of the first to third openings of the resin film. In regions of the resin film exposed by the fourth openings of the metal support layer, one or two of the first to third openings of the resin film are formed.

Abstract: A division mask includes a main body portion including an opening pattern; and a clamping portion disposed at opposite ends of the main body portion. The clamping portion including at least three branch portions. The branch portions have a smaller width in a direction away from a central line of the division mask.

Abstract: A field effect transistor having at least a gate, source, and drain electrodes and a semiconductor channel for controlling transport of charge carriers between the source and drain electrodes, the gate being insulated from the channel by an dielectric, at least a portion of the dielectric disposed between the gate electrode and the semiconductor channel being doped or imbued with the an element which if doped or imbued into a semiconductor material would cause the semiconductor to be p-type. The p-type element used to dope or imbue the gate dielectric is preferably Mg.

Abstract: A mask frame assembly manufactured via an extension-welding process on a stage, the mask frame assembly includes: a mask frame disposed on a stage, the mask frame including a first frame and a second frame having a first length, and a third frame and a fourth frame having a second length, the second length less than the first length. The mask frame assembly also includes a mask having respective ends welded and combined onto the first frame and the second frame. The first frame and the second frame include a slot disposed toward the stage, and at least portions of the first frame and the second frame corresponding to the slot are not in contact with the stage. The third frame and the fourth frame and the stage are in contact with the stage.