Abstract: Machine for applying sealing material to a metal element comprises at least one electromagnetic mandrel provided with a main body to house at least one electromagnet and a support to hold the metal element in position on a work surface following the excitation of the electromagnet; the main body is connected to drive means configured to make the support rotate on the work surface; the delivery device of the sealing material is positioned at least in proximity to the periphery of the metal element and is able to deliver sealing material when the metal element is held in position and made to rotate on the work surface by means of the support of the electromagnetic mandrel.

Abstract: A binding strip storing and dispensing device for organizing and dispensing binding strips for quilting includes a box and a lid. The box has a top that is open and configured for insertion of a plurality of binding strips, which are used in binding quilts, into the box. The lid is hingedly coupled to the box and is selectively couplable to the box so that the lid is positioned to selectively close the top to contain the binding strips. A set of slots is positioned in the lid. Each slot is configured to allow extension of a respective binding strip from the lid, wherein the respective binding strip is positioned for grasping in a hand of a user, positioning the user for pulling a desired length of the respective binding strip through the slot.

Abstract: A method includes: providing a three-dimensional printer including a build surface and a carrier that is movable away from and toward the build surface; advancing the carrier toward the build surface and contacting a lower surface of the carrier with the build surface or a fixture or frame member adjacent the build surface to align the carrier in an aligned position with the lower surface of the carrier parallel to the build surface; and locking the carrier in a locked state to maintain the carrier in the aligned position.

Abstract: To reduce damage to a column caused during column switching when performing successive analyses while switching columns, provided is liquid chromatograph control system 70 for analyzing a sample according to a schedule table where analysis conditions and execution order of a plurality of analyses are described. Control system 70 includes: schedule reader 66 for reading out two consecutively executed analysis conditions; column comparator 67 for comparing columns used in the two analysis conditions; insertion method file creator for creating an insertion method file so that the flow rate of a mobile phase sent to the column used in later one of the two analyses is increased in stages toward a flow rate determined for the later analysis, where the columns are different between the two analysis conditions; and a schedule table creator 63 for inserting the insertion method file into immediately before the later analysis in the schedule table.

Abstract: A process for additive manufacturing of a resorbable implant to be implanted into a patient includes providing a biocompatible resin including a liquid light-polymerizable material that is resorbable after polymerization and an initiator. The process further includes actuating an additive manufacturing apparatus to expose an amount of the biocompatible resin to light to at least partially cure the exposed amount of biocompatible resin to form a layer of the resorbable implant and actuating the additive manufacturing apparatus to expose at least some additional amount of biocompatible resin to light to at least partially cure the exposed additional amount of biocompatible resin to form an additional layer of the resorbable implant and to at least partially overcure previously cured layers to cause at least some interlayer binding between the previously cured layers and the additional layer.

Abstract: A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.

Abstract: Processing apparatus and method for processing a workpiece surface, in particular for the internal coating of cylinder bores. Processing apparatus has a shield unit which is provided to separate from one another—at least during operation—a part region of the workpiece surface provided for the processing and an adjacently arranged part region of the workpiece surface. The shield unit has at least one blocking nozzle which is provided to generate a fluid flow for separating the at least two part regions.

Abstract: The present invention relates to a novel process for the production of coated filaments for subsequent application as print in extrusion-based 3D printers, e.g. FDM printers (fused deposition modelling printers). The filaments are coated in a separate process outside of the printer, and can also be used in a conventional extrusion printer. The present invention further relates to the coating device for application of the coating to the filament and to a roll containing the coated filaments.

Abstract: A coating apparatus including a coating part which coats a liquid material containing a metal on a substrate, a coating-film forming part which subjects the liquid material coated on the substrate to a predetermined treatment to form a coating film, and a removing part which removes a peripheral portion of the coating material formed along the outer periphery of the substrate.

Abstract: A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit block for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.

Abstract: A method of forming a boron nitride or boron carbon nitride dielectric produces a conformal layer without loading effect. The dielectric layer is formed by chemical vapor deposition (CVD) of a boron-containing film on a substrate, at least a portion of the deposition being conducted without plasma, and then exposing the deposited boron-containing film to a plasma. The CVD component dominates the deposition process, producing a conformal film without loading effect. The dielectric is ashable, and can be removed with a hydrogen plasma without impacting surrounding materials. The dielectric has a much lower wet etch rate compared to other front end spacer or hard mask materials such as silicon oxide or silicon nitride, and has a relatively low dielectric constant, much lower then silicon nitride.

Abstract: The present invention provides a system (100) for aligning a dispensing apparatus (110) utilized within a semiconductor deposition chamber (102). A stationary reference apparatus (106) is disposed along the bottom of the deposition chamber. A self-alignment support system (122), comprising one or more support components (124), is intercoupled between the dispensing apparatus and a deposition system exterior component (112). The self-alignment support system is adapted to facilitate and secure repositioning of the dispensing apparatus responsive to pressure applied to the dispensing surface (114) thereof. A non-yielding offset component (126) is placed upon a first surface (108) of the stationary reference apparatus. The dispensing surface of the dispensing apparatus is engaged with the offset component, and pressure is applied to the dispensing apparatus via the offset component until a desired alignment is achieved.

Abstract: A tire coating apparatus for applying fluid to vehicle tires in a vehicle washing system, includes a pair of mechanical applicators, which each have at least one coating applicator disposed thereon for contacting the vehicle tires to apply the fluid. One mechanical applicator is intended to engage the tires on a right side of a vehicle while the other mechanical applicator is intended to engage the tires on a left side of the vehicle. The mechanical applicators also include a guide portion for guiding the vehicle wheel when a patron had elected not to have a coating fluid applied to the vehicle wheels. The mechanical applicators are rotatable between an initial position where the coating applicators are in a non-coating position to a second position where the coating applicators are intended to contact a vehicle tire.

Abstract: New baffles and methods of using these baffles are provided. The baffles comprise a body having an edge wall configured to direct the flow of a composition against a substrate (e.g., silicon wafer) edge. The edge wall comprises a vertical surface, a curved sidewall coupled to the vertical surface, and a lip coupled to the curved sidewall. A preferred baffle is annular in shape and formed from a synthetic resinous composition. Even more preferably, the baffle is not formed of a metal. The inventive methods comprise positioning the baffle adjacent a substrate during a spin coating process so that the edge wall causes the composition to cover the edges of the substrate and preferably a portion of the back side of the substrate.

Abstract: A mask frame assembly for thin film deposition including a frame having an opening portion and a support portion, and a mask having a deposition area in a position corresponding to the opening portion, wherein the mask includes a first layer including the deposition area and a peripheral portion disposed outside the deposition area and a second layer including a first surface and a second surface opposite to the first surface, at least a part of the first surface of the second layer faces the first layer and contacts the peripheral portion, and the second surface is welded to the support portion of the frame.

Abstract: Disclosed is an coating/developing apparatus and method thereof in which the processing time is shortened and the foot prints is reduced by shortening the travel distance of a wafer transfer arm. The coating/developing apparatus of the present disclosure includes, inter alia, liquid processing part (COT) that processes the substrate using a liquid, a cooling processing part (CA) provided to correspond to the liquid processing part (COT) and perform the cooling process for the substrate, a liquid processing unit (COTU) provided to correspond to the cooling processing part (CA) and equipped with a heating processing part (HP) that performs a heating processing for the substrate. The cooling processing part (CA) transfers the substrate to/from the liquid processing part (COT) and the heating processing part (HP).

Abstract: The present invention provides an electrode for a polymer electrolyte membrane fuel cell. In one embodiment, a planar nanoporous or microporous metal foam or metal aerogel structure is provided, from which an electrode with a catalyst layer integrally formed by fixing a catalyst in the metal foam or metal aerogel is formed.

Abstract: A masking apparatus includes a mask base body and a mask plate. The mask base body includes at least one spacer plate, and a cavity in which an electronic component can be housed. The mask plate is disposed on an upper surface and/or a lower surface of the mask base body. The mask plate includes a film-forming opening with a shape corresponding to the shape of an external structural body to be formed on an outer surface of the component. The mask plate thus allows a film-forming operation to be selectively performed on the outer surface of the component through the film-forming opening. The cavity includes, in an inner surface thereof, a film-forming groove communicating with the film-forming opening so that the external structural body can be formed at once on an upper surface and/or a lower surface of, and also on a peripheral surface of the component.

Abstract: A substrate processing apparatus includes a processing chamber that processes a substrate, and a substrate placing base enclosed in the processing chamber, and a substrate transporting member that allows the substrate to wait temporarily on the substrate placing base, and exhaust holes provided so as to surround the substrate placing base, and a retracting space that allows the substrate transporting member to move in between lines each connecting the exhaust hole and an upper end of the substrate placing base and the substrate placing base.

Abstract: In the present invention, at a coater cup 18 of a resist coating device 10, a through-hole 46 is formed in a top wall 38 of an upper cup 24 that is formed of a resin material. A silicon substrate 16 is held at a rotating chuck 14 that passes-through the through-hole 46. A reverse surface of the silicon substrate 16 thereby faces a top surface of the top wall 38 of the upper cup 24. Here, a deformation correcting hardware 48 is mounted to the top wall 38 of the upper cup 24 along a hole edge portion of the through-hole 46 (i.e., along a pushed-out portion 38A). Because the deformation correcting hardware 48 is formed to have higher rigidity than the top wall 38 of the upper cup 24, deformation of the top wall 38 can be corrected or suppressed by the deformation correcting hardware 48.

Abstract: The stain preventing cover is formed from a composite sheet 24 having a three layer structure as a raw material which is produced by laminating a first sheet material 21 having a low dielectric constant and having insulation performance, a second sheet material 22 having a dielectric constant higher than that of the first sheet material 21 or having semiconductivity and a third sheet material 23 having a dielectric constant lower than that of the second sheet material 22 and having insulation performance, in which an end of the second sheet material 22 is positioned together with an end of the first and third sheet materials 21 and 23 adjacent to a electrostatic high voltage part 10 of a coating machine and another end thereof is positioned distant from an earth part 11 of the coating machine to be electrically insulated.

Abstract: To ensure a uniform flow over the surface of a product W, an apparatus is provided for the wet chemical treatment of the product W that is disposed in the apparatus 100. This apparatus comprises at least one flow member 150 that includes respectively at least one paddle-like flow element 155, wherein at least one flow member 155 is disposed situated opposite the surface of the product W and is moveable substantially parallel to the surface of the product W.

Abstract: Techniques for reducing particle contamination on a substrate are disclosed. In one particular exemplary embodiment, the technique may be realized with a platen having different regions, where the pressure levels in the regions may be substantially equal. For example, the platen may comprise a platen body comprising first and second recesses, the first recess defining a fluid region for holding fluid for maintaining a temperature of the substrate at a desired temperature, the second recess defining a first cavity for holding a ground circuit; a first via defined in the platen body, the first via having first and second openings, the first opening proximate to the fluid region and the second opening proximate to the first cavity, wherein pressure level of the fluid region may be maintained at a level that is substantially equal to pressure level of the first cavity.

Abstract: A method for manufacturing components is provided. The method includes coupling a drive assembly to a positioning assembly, coupling a plurality of components to be manufactured to a plurality of fixtures, securing the plurality of fixtures to the drive assembly wherein each fixture is configured to receive a component to be manufactured, and repositioning the plurality of components simultaneously using the positioning assembly to facilitate manufacturing of the plurality of components, wherein the components are configured to be oscillated in a first plane of rotation via the drive assembly and rotated through a second plane of rotation via the plurality of fixtures.

Abstract: A lateral double diffused metal oxide semiconductor a lateral double diffused metal oxide semiconductor (LDMOS) transistor which may include a first conductive type semiconductor substrate and a shallow trench isolation film defining an active region in the substrate. A second conductive type body region may be disposed over a portion of the top of the semiconductor substrate. A first conductive type source region may be disposed in the top of the body region. A first conductive type extended drain region may be disposed over a portion of the top of the semiconductor substrate and spaced from the body region. A gate dielectric film covers surfaces of the second conductive type body region and first conductive type source region and a portion of the top of the first conductive type semiconductor substrate. A gate conductive film may extend from the first conductive type source region, over the gate dielectric film, over the shallow trench isolation film, and inside the shallow trench isolation film.

Abstract: A coating system includes an intermediate coat applying process, an overcoat applying process, and a clear coat applying process, which are disposed successively along a coating flow direction. The intermediate coat applying process includes first through fourth intermediate coat applying stations through, which are disposed in parallel to each other across a coating line. The overcoat applying process includes first through sixth overcoat applying stations through, which are disposed in parallel to each other across the coating line. At least each of the first through third overcoat applying stations through has a plurality of coating robots for applying coats having different colors.

Abstract: At a time of a substrate loading step or/and at a time of a substrate unloading step, particles are effectively eliminated from a reaction chamber. Provided are a step of loading at least one wafer 200 into a reaction chamber 201, a step of introducing reaction gas into the reaction chamber 201, and exhausting an inside of the reaction chamber 201, thereby processing the wafer 200, and a step of unloading the processed wafer 200 from the reaction chamber 201. In the step of loading the wafer 200 or/and in the step of unloading the wafer 200, the inside of the reaction chamber 201 is exhausted at a larger exhaust flow rate than an exhaust flow rate in the step of processing the wafer 200.

Abstract: The invention is a method for producing a tool which can be used to create optically active surface structures in the sub-?m range, having a support surface onto which relief surface structures are applied over the support surface by means of material deposition. The invention is distinguished by the support surface being directly contacted with a mask in which openings with diameters in the sub-?m range are provided or can be provided, by the support surface including the mask being subjected to a coating process in which the coating material deposits through the openings of the mask onto the support surface, and the mask is removed from the support surface when a partial amount of an average end structure height of the surface structures is reached and the coating procedure is then continued without the mask using the same coating material or different coating materials.

Abstract: A material for forming a conductive structure for a micromechanical current-driven device is described, which is an alloy containing about 0.025% manganese and the remainder nickel. Data shows that the alloy possesses advantageous mechanical and electrical properties. In particular, the sheet resistance of the alloy is actually lower and more stable than the sheet resistance of the pure metal. Accordingly, when used for conductive leads in a photonic device, the leads using the NiMn alloy may provide current to heat the photonic device while generating less heat within the leads themselves, and a more stable output.

Abstract: A component capable of being exposed to a plasma in a process chamber has a structure having an electroplated coating comprising yttrium-containing species. The electroplated coating is resistant to corrosion in the plasma, and can have a compositional gradient of yttrium-containing species through a thickness of the coating. In one embodiment, the coating is formed by electroplating a layer comprising yttrium onto the surface, and then electroplating a second layer onto the first layer, and annealing the first and second layers. The second layer can comprise aluminum or zirconium. In another embodiment, the coating is formed by electroplating a layer comprising a mixture of aluminum and yttrium onto the surface and annealing the layer.

Abstract: The systems, methods and products of the invention include systems and methods for manufacturing servo tracks on a magnetic tape. In one aspect, the invention includes systems for manufacturing magnetic tapes having servo tracks thereon wherein the servo tracks are optically detectable and are capable of being processed by a servo control system for maintaining alignment of a magnetic recording head with the data tracks on the recording side of the magnetic tape. In one practice, the manufacturing systems described herein engrave the servo tracks onto the non-recording side of a magnetic tape by directing a laser beam at the non- recording side of the magnetic tape. In another practice, the manufacturing systems described herein engrave the servo tracks onto the magnetic side of a magnetic tape by directing a laser beam at the magnetic side of the magnetic tape. Such engraved patterns can act as optical servo tracks for maintaining alignment of the recording head with the data tracks on the magnetic tape.

Abstract: The invention provides a film forming apparatus that is capable of forming films sequentially with two types of film forming mechanisms in the same chamber. The film forming apparatus according to the present invention includes a Pt target disposed at one side within a film forming chamber, a sputtering output mechanism to supplying to the Pt target, a Pt vapor deposition source disposed at an other side within the film forming chamber, vapor deposition output mechanism to supply to the Pt vapor deposition source, a substrate holder disposed between the Pt target and the Pt vapor deposition source within the film forming chamber to mount a substrate, a rotating mechanism to move the substrate holder so that the substrate directs to the Pt target or to the Pt vapor deposition source, a heating mechanism to heat the substrate when the substrate is subjected to a sputtering film forming, and a cooling mechanism to cool the substrate when the substrate is subjected to vapor deposition film forming.

Abstract: A method and apparatus for regulating fluid flows, such as flows of electrochemical processing fluids for processing microelectronic workpieces. The apparatus includes a valve body having an entrance port, an exit port, and a flow passage between the entrance and exit ports through which a first fluid flows. The valve body further includes a pressure chamber coupleable to a second fluid source and at least partially isolated from the flow passage. A regulator, movably disposed in the flow passage to change a flow area of the flow passage, has a first surface with a first projected area and a second surface with a second, larger, projected area, both of which are operatively coupled to the first fluid. A third surface of the regulator is operatively coupled to the second fluid. The regulator can adjust its position to maintain a constant or nearly constant first fluid flow rate as the fluid pressure at the entrance port changes.

Abstract: An apparatus for dispensing fluid includes a base member having a feed channel and a slot nozzle having first and second spaced apart members. A slot-shaped outlet channel is in fluid communication with the feed channel and is defined between the first and second spaced apart members. A slot-shaped outlet opening is in fluid communication with the slot-shaped outlet channel and has a width defined between the first and second spaced apart members. A valve is coupled with the base member and selectively interrupts and releases the flow of fluid through the slot-shaped outlet opening. An adjustment device infinitely adjusts the position of the first member relative to the position of the second member to change the width of the slot-shaped outlet opening. A method for dispensing fluid onto a substrate includes directing the fluid through the slot-shaped outlet channel while continuously increasing the pressure of the fluid.

Abstract: An arrangement and method orients the magnetization direction of magnetic layers on a plate shaped substrate on a mounting. The mounting defines a positioning plane for the substrate and a magnet arrangement is on one side of the positioning plane. The magnet arrangement has at least three electromagnets whose dipole axes are at least approximately parallel to the positioning plane and, viewed perpendicularly to the positioning plane, define a closed surface.

Abstract: A system and method for applying adhesive to at least a first end of a rod-shaped member, such as a cotton swab stick includes a carrier, an adhesive applicator, and a rotator device. The carrier conveys the rod-shaped member or stick in a machine direction and also allows rotation of the rod-shaped member about its longitudinal axis. The adhesive applicator includes an application surface positioned to engage the first end of the rod-shaped member. The application surface includes at least one discharge passage for applying adhesive to the first end of the rod-shaped member. The rotator device rotates the rod relative to the application surface and about its longitudinal axis as the rod-shaped member is conveyed along the application surface.

Abstract: Systems and methods for creating a combinatorial coating library including a coating system operatively coupled to at least one of a plurality of materials suitable for forming at least one coating layer on a surface of one or more substrates. The systems and methods also including a curing system operative to apply at least one of a plurality of curing environments to each of a plurality of regions associated with the at least one coating layer, the curing system comprising a plurality of waveguides each having a first end corresponding to at least one of the plurality of regions and a second end associated with at least one curing source. The combinatorial coating library comprising a predetermined combination of at least one of the plurality of materials and at least one of the plurality of curing environments associated with each of the plurality of regions.

Abstract: In one embodiment of the invention, a sleeve that forms a hollowed cylinder to enclose a spindle. The sleeve has a thickness and a first length. A strut is mounted to the spindle to keep the sleeve from traveling up a shaft. The strut is slotted into a first slot on a top end of the hollowed cylinder.

Abstract: A UV curing system includes a light source, which produces UV light and non-useful light (heat energy), a shade member having a lamp-side surface that reflects light and provides thermal insulation to the target substance, and a housing having an internal reflecting surface. The shade member is situated between the light source and the target substance so that all, or most, light from the light source does not directly strike the target substance. The housing is situated on the opposite side of the light source from the barrier and partially encloses the light source.

Abstract: A method and apparatus for anodizing aluminum exhaust housings including the utilization of conducting rods placed through the narrow passages. The rods allow current to flow and anodizing coating to build up inside the narrow passages. The rods are insulated from the housing and are connected to a special end plate. The end plate has an insulating spacer between the housing and connecting plate and ensures that the rods are installed and spaced properly and that the current properly flows. The assembly is then degreased and rinsed. The clean assembly is then placed into an appropriate anodizing solution and connected to a current source until the coating sufficiently builds up. The assembly is then removed from the anodizing tanks and rinsed in a series of tanks of increasing temperature.

Abstract: A coating system includes a source of electrically non-insulative coating material, a dispenser for dispensing the coating material toward an article to be coated thereby, and an electrostatic high potential supply for supplying charge to the coating material. The high potential supply is coupled across the dispenser and the article The coating system further includes a reservoir, a valve having a housing providing first, second, third and fourth ports, and a component movable within the housing and having a first passageway selectively to connect the first port to the second port to permit the flow of coating material between the first port and the second port The first port is coupled to the coating material source. The second port is coupled to the reservoir. The third port is coupled to the dispenser The component is movable within the housing selectively to connect the second port to the third port to permit the flow of coating material between the reservoir and the dispenser.

Abstract: A method for producing a laminated metal ribbon comprises the steps of (a) vapor-depositing a third metal layer on at least one welding surface of a first metal ribbon 4 and a second metal ribbon 5 in a vacuum chamber 1, the third metal being the same as or different from a metal or an alloy of the first and second metal ribbons 4, 5; (b) pressure-welding the first metal ribbon 4 to the second metal ribbon 5; and (c) subjecting the resultant laminate 9 to a heat treatment for thermal diffusion.

Abstract: A coating system includes a source of electrically non-insulative coating material, a dispenser for dispensing the coating material toward an article to be coated thereby, and an electrostatic high potential supply for supplying charge to the coating material. The high potential supply is coupled across the dispenser and the article. The coating system further includes a reservoir, a valve having a housing providing first, second, third and fourth ports, and a component movable within the housing and having a first passageway selectively to connect the first port to the second port to permit the flow of coating material between the first port and the second port.

Abstract: Between a wafer and a holder holding a wafer, a seal member is disposed so that a contact surface is formed in an approximate plane, and an inner periphery surface is formed in an approximate plane and approximately vertical to a contact surface. The seal member, in a sealed state, has a brim portion of a radius of curvature of 0.5 mm or less at a boundary portion between an inner periphery surface of a seal member and a contact surface. Due to a brim portion, a gap between a contact surface of a seal member and a surface being plated of a wafer W can be made smaller, resulting in reducing bubbles entering in a gap.

Abstract: In the chemical vapor deposition apparatus, a substrate stage for mounting a substrate is provided inside a reaction chamber of the apparatus. A source gas inlet for introducing a source gas and exhaust outlets and for exhausting the source gas are provided. Exhaust outlet valves provided for exhaust outlets are open and shut successively with time. The direction of the flow of source gas relative to the fixed substrate varies with time. The present chemical vapor deposition apparatus allows the improved evenness of film thickness, the composition ratio, and the like within the substrate surface as well as the reduction of particles of foreign substance generated inside the reaction chamber.

Abstract: A method for producing visco-elastic fluidic material flows by drawing a visco-elastic fluidic material with corresponding separate second fluid flows associated therewith to form a visco-elastic fiber vacillating in a repeating, generally omega-shaped pattern having a bowed portion with first and second side portions that first converge toward each other and then diverge outwardly in generally opposing directions. In one operation, the visco-elastic fiber vacillating in the repeating, generally omega-shaped pattern is an adhesive material deposited onto woven and non-woven fabric substrates and stretched elongated elastic strands in the manufacture of a variety of bodily fluid absorbing hygienic articles.

Abstract: A substrate processing apparatus comprising a substrate mounting table, a cup having an upper opening and surrounding the substrate mounting table, a lid for opening/closing the upper opening of the cup, a support arm for supporting the lid, a first lifting mechanism having a first piston for supporting the support arm directly or indirectly and a first cylinder for guiding the first piston in an up-and-down motion, a second lifting mechanism having a second piston for supporting the support arm directly or indirectly and a second cylinder for guiding the second piston in up-and -down motion, a driving circuit for supplying the pressurized fluid to the first and second cylinders, independently and exhausting the pressurized fluid from the first and second cylinders, independently, and a control mechanism for controlling operations of the driving circuit.

Abstract: The invention concerns a device for distributing liquid by gravity, particularly in a photographic coating process.The device comprises: a) a rigid cylindrical outer pipe; an inner casing produced from a flexible material and the external diameter of which is less than or equal to the internal diameter of the pipe, said casing being arranged so as to define, with the pipe, substantially concentric first and second zones isolated from each other, the second zone being connected to a source of fluid so as to be able, under the effect of the pressure of the fluid, to cause the relative volumes of the first and second zones to vary in order to control the flow of liquid in the first zone; and c) a source of pressurized fluid connected to the second zone.

Abstract: A coating system comprises a source of electrically non-insulative coating material, a dispenser for dispensing the coating material toward an article to be coated thereby, an electrostatic high potential supply for supplying charge to the coating material, means for coupling the high potential supply across the dispenser and the article, a first reservoir, and a first valve. The first valve has a first housing providing first, second, third, fourth and fifth ports, and a first component movable within the first housing and having a first passageway selectively to connect the first port to the second port to permit the flow of coating material from the first port to the second port. The first port is coupled to the coating material source, the second port to the first reservoir, and the third port to the dispenser. The second port is coupled to the third port to permit the flow of coating material from the first reservoir to the dispenser. A source is provided for an electrically non-conductive fluid.

Abstract: A powder coating apparatus and method are provided for feeding fine powdered coating material such as thermoplastic type material to a succession of discrete articles passing by the apparatus. The invention also provides a powder feed system that deposits an excess of powdered coating material than that required to form the coating and provides for recirculation of the powder not ultimately used to form the coating back to the powder feeding apparatus.