Abstract: Techniques for mitigating loss of vaporized working fluid in a two-phase immersion cooling system may be implemented using one or more supplemental condensers that facilitate condensation of vaporized working fluid when the immersion tank is open, and one or more vapor collection points that are in fluid communication with at least one supplemental condenser. One or more fluid displacement devices may be configured to create suction pressure at the one or more vapor collection points. One or more vents may be positioned in the door. The one or more vents may be configured to permit movement of air from outside the immersion tank into an interior portion of the immersion tank without permitting loss of vaporized working fluid. A directional blowing device may be configured to blow a gaseous substance against a computing device in a downward direction as the computing device is being pulled upward out of the immersion tank.

Abstract: A magnetic induction heating system is described. The heating system includes a receptacle and a substrate positioned within the receptacle. The substrate includes ferrous material and forms a cavity that can be filled with fluid, such as water or other liquid. An induction coil at least partially encompasses the substrate. A controller provides alternating current to the induction coil. The alternating current in the induction coil induces an electromagnetic field that creates heat in the substrate. The heat in the substrate heats the fluid. The heating system can further include valves on either end of the substrate that enable fluid to move between the cavity and a chamber that is formed by the receptacle.

Abstract: A dish washer includes: a washing tank including a sump at a bottom surface thereof; a water storage unit disposed inside or outside the washing tank to store washing water to be supplied to the washing tank; a heat pump system including a compressor that compresses and circulates refrigerant, a first heat exchanger disposed in the sump, an expansion apparatus, and a second heat exchanger disposed in the water storage unit to heat washing water for washing the dishes; and a reverse valve that changes a flow of refrigerant flowing through each of the first heat exchanger and the second heat exchanger to allow each of the first heat exchanger and the second heat exchanger to be switched from each other between a heating mode for heating the washing water and a heat recovery mode for recovering heat from washing water discharged to the outside from the washing tank.

Abstract: Cleaning systems and methods for semiconductor fabrication use rotatable and translatable chuck assemblies that incorporate a compact drive system to cause chuck rotation. The system uses an offset drive gear that drives a ring gear. This reduces components whose friction or lubricants might generate undue contamination. The low friction chuck functionality of the present invention is useful in any fabrication tool in which a workpiece is supported on a rotating support during a treatment. The chuck is particularly useful in cryogenic cleaning treatments.

Abstract: A dishwasher includes a case, injection arms, a sump including an injection flow path coupling portion, a washing pump for supplying washing water stored in the sump to the injection arms, and a switching valve including a flow path distributor for distributing washing water to injection arms. The flow path distributor defines distribution holes. When the flow path distributor is in a reference position, the distribution holes are positioned so that all of the injection arm supply holes are opened, and, when the flow path distributor is rotated by a first angle from a reference position, the distribution holes are positioned so that any one of the injection arm supply holes is opened. The injection flow path coupling portion includes a plurality of support ribs protruded toward the flow path distributor and including a support rib corresponding to at least one of the distribution holes.

Abstract: A system and method for washing items with water includes a water inlet and a container for receiving the items to be washed. The system comprises a water purification apparatus for purifying water introduced through said water inlet to produce purified water. The water purification apparatus comprises at least one filter for filtering off particulate solids, a reverse osmosis device, and at least one deionizing filter. The system further comprises a reservoir for storing purified water produced by the water purification apparatus, said reservoir being connected to said water purification apparatus and said container, so that the items are washable inside the container with the purified water.

Abstract: A substrate processing method includes a liquid film forming step of forming a liquid film of the processing liquid on the upper surface of the substrate; a liquid filling heating step of supplying a heating medium to a space between a heater unit and the substrate to thereby fill the space with the heating medium, and heating the heating medium by the heater unit, an opening defining step of defining an opening in the central region of the liquid film in a state where the substrate is heated in the liquid filling heating step such that the temperature of the substrate is the boiling point of the processing liquid or higher, and an opening enlarging step of enlarging the opening while rotating the base to thereby rotate the substrate. The liquid filling heating step is executed in parallel with the opening enlarging step at least during part of a period of the opening enlarging step.

Abstract: A dishwashing appliance includes a tub defining a wash chamber. The tub includes an inlet and an outlet. The dishwashing appliance also includes a drying system in fluid communication with the wash chamber. The drying system includes a heat pipe heat exchanger having a condenser section and an evaporator section. The evaporator section is downstream of the outlet. The condenser section is downstream of the evaporator section and upstream of the inlet. A thermoelectric assembly is in thermal communication with the heat pipe heat exchanger.

Abstract: A disinfecting system for sanitizing a structure having a fire suppression sprinkler system includes a main conduit positioned in the structure and that is in fluid communication with a water source and operable to carry a water stream downstream from the water source. The disinfecting system includes a disinfectant conduit having in fluid communication with a disinfectant reservoir and operable to carry a disinfectant stream downstream from the disinfectant reservoir, the disinfectant conduit being in fluid communication with the main conduit. A control valve is in fluid communication with the disinfectant main conduits, the control valve allowing one of the disinfectant or water streams to flow downstream in the main conduit. A master nozzle defining outlet holes is in fluid communication with the main conduit, is positioned downstream of the control valve, and is operably configured to spray a liquid into an interior area of the structure.

Abstract: The present disclosure provides a wafer cleaning apparatus and a cleaning method. The wafer cleaning apparatus includes a tank and a wafer holder. The tank includes a bottom wall, a lateral wall, and a partition wall. The lateral wall is connected to the bottom wall. The partition wall is movably mounted on the lateral wall and divides a cleaning space defined by the bottom wall and the lateral wall into a first compartment and a second compartment. A passage communicating with the first compartment and the second compartment is formed when the partition wall is moved away from the bottom wall and immersed in a cleaning fluid received in the cleaning space. The wafer holder is adapted to be immersed in the cleaning fluid and to move between the first compartment and the second compartment. The present disclosure further provides a method of cleaning the wafer.

Abstract: A wafer drying method to detect airborne molecular contaminants in a drying gas as a feedback parameter for a single wafer or multi-wafer drying process is provided. For example, the method includes dispensing in a wafer drying station a drying gas over one or more wafers; collecting the drying gas from an exhaust of the wafer drying station; determining the concentration of contaminants in the drying gas; re-dispensing the drying gas over the one or more wafers if the concentration of contaminants is higher than a baseline value; and transferring the one or more wafers out of the wafer drying station if the concentration is equal to or less than the baseline value.

Abstract: Disclosed herein is a water jet processing apparatus including a chuck table that holds a workpiece by a holding surface, a high-pressure water injection unit having a high-pressure water nozzle that injects high-pressure water along planned dividing lines of the workpiece to remove burrs, a processing feed unit that carries out processing feed of the chuck table in an X-direction, and an indexing feed unit that carries out indexing feed of the high-pressure water nozzle in a Y-direction. The water jet processing apparatus also includes a movement unit that moves the high-pressure water nozzle in a Z-direction, an alignment unit that images the workpiece, a cassette placement region in which a cassette that houses plural workpieces is placed, and a conveying unit that conveys the workpiece between the cassette and the chuck table.

Abstract: An annular nozzle assembly includes an inlet tube, an annular tube, at least three first spray nozzles, and a plurality of separating vanes. The annular tube connects to the inlet tube. The first spray nozzles are fixed to the annular tube and are directed to spray inwardly and in a first vertical direction and are equally spaced from each other. The separating vanes are disposed within the annular tube and extend along a length thereof and define a flow channel for each first spray nozzle.

Abstract: A continuous method for improving the firmness of vegetable products uses a continuous vegetable product treatment device comprising a vegetable product treatment chamber having a vegetable product inlet, a vegetable product outlet, a vegetable product transport mechanism for urging the vegetable product toward the vegetable product outlet, and at least one liquid introduction orifice for introducing a liquid. Vegetable product is continuously treated in the chamber at a temperature of from about 125° F. to about 160° F., and the liquid in the treatment chamber is maintained at a pH of from about 5 to about 7. Individual vegetable products reside in the treatment chamber for a time of from about 20 minutes to about 60 minutes. The heat-treated vegetable products are blanched in a subsequent blanching step at a temperature ranging from about 190° F. to 210° F. for a time of from about two to about 10 minutes.

Abstract: To prevent over-pickling of a steel strip during pickling pause, and shorten the time required to switch between pickling operation and pickling pause, a pickling device includes: a pickling tank for storing acid solution and for pickling a steel strip by allowing the steel strip to travel therethrough while the steel strip is immersed in the acid solution; a heat exchanger for heating the acid solution in the pickling tank; a circulation tank for storing the acid solution, provided separately from the pickling tank; an acid-solution circulation unit configured to circulate the acid solution between the pickling tank and the acid-solution storage tank; and a control device configured to control the acid-solution circulation device to maintain a liquid level of the acid solution in the pickling tank at a level below a traveling height of the steel strip.

Abstract: A reduced-pressure drying apparatus, for drying solution on a substrate in a chamber in a depressurized state, includes a solvent collecting unit that is a net-shaped plate configured to temporarily collect a solvent in the solution vaporized from the substrate. The solvent collecting unit is provided to face the substrate in the chamber, and the net-shaped plate has an opening ratio of 60% to 80% and a thermal capacity of 850 J/K or less per 1 m2.

Abstract: A dishwasher provided that may include a washing chamber, a rack adapted to accommodate items to be washed by washing liquid within the washing chamber, an arm, and an arm moving arrangement arranged to move the arm within the washing chamber. The arm may include at least one washing liquid removing element arranged to touch at least one of the rack and washing liquid at the rack upon movement of the arm to remove the washing liquid from the rack. The embodiments herein also relate to method for removing washing liquid from a rack of a dishwasher.

Abstract: A moldable earpiece heating case for heating a first and second moldable earpiece to achieve a moldable condition which can be configured to fit within the auricle of the ear.

Abstract: A dishwasher is disclosed. The dishwasher includes a cabinet, a tub defining a washing space therein, a sump disposed under and coupled to the tub, a pump for transferring washing water stored in the sump, and a base defining a lower part of the cabinet, wherein the sump includes a sump mount, the sump mount being temporarily mounted on the base, and the base includes a first position guide, the sump mount being mounted on the first position guide so as to guide the sump to a coupling position with respect to the base.

Abstract: Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.

Abstract: A two-phase liquid immersion cooling system is described in which heat generating computer components cause a dielectric fluid in its liquid phase to vaporize. The dielectric vapor is then condensed back into a liquid phase and used to cool the computer components. Using a pressure controlled vessel and pressure controller, the disclosed system may be operated at less than ambient pressure. By controlling the pressure at which the system operates, the user may influence the temperature at which the dielectric fluid vaporizes and thereby achieve increased performance from a given computer component. Utilizing robotic arms and slot-in computing components, a self-healing computing system may be created.

Abstract: Fire protection systems and methods of fire protection systems for protection of a stored commodity. The systems and methods included a plurality of fluid distribution devices disposed above the stored commodity and configured for selective identification and controlled actuation in response to a fire. The systems have a hydraulic demand defined by at least one of: i) a hydraulic design area having a minimum operational area of less than 768 square feet; or ii) less than twelve hydraulic design devices.

Abstract: A laundry treatment apparatus includes a cabinet and a drawer retractably provided in the cabinet. An accommodation unit is disposed in the drawer and defines a space configured to receive washing water. A water supply channel is connected to a water supply source and is configured to supply washing water to the accommodation unit. The laundry treatment apparatus includes a body along which a water supply channel is provided, the body being rotatably provided at the cabinet. A body guider is provided at the cabinet and is configured to guide a rotational movement of the body.

Abstract: A laundry treatment apparatus includes a cabinet and a drawer retractably provided in the cabinet. A tub is provided in the drawer and defines a space configured to receive washing water. A drum is rotatably provided in the tub, and a through hole is formed through an upper surface of the tub. The laundry treatment apparatus also includes a recovery unit that is configured to recover moisture discharged from the tub out of the through hole, and to return the moisture back into the tub through the through hole.

Abstract: A substrate treatment method is used for removing a resist from a front surface of a substrate. A substrate treatment apparatus includes a substrate holding unit which holds the substrate, and a sulfuric acid ozone/water mixture supplying unit which supplies a sulfuric acid ozone/water mixture to the front surface of the substrate held by the substrate holding unit, the sulfuric acid ozone/water mixture being a mixture which is prepared by a method including mixing water with sulfuric acid ozone prepared by dissolving ozone gas in sulfuric acid.

Abstract: The invention relates to a method for epilamization of at least one portion of a substrate surface comprising the steps of: a) preparing an epilame agent b) optionally, preparing the substrate surface c) placing the substrate and the epilame agent in a chamber at ambient pressure d) introducing CO2 into the hermetically sealed chamber at a pressure comprised between 25 bar and 74 bar and at a temperature comprised between 10° C. and 80° C. for a duration comprised between 1 minute and 30 minutes, e) reducing the pressure in the chamber, and f) removing the epilamized substrate from the chamber.

Abstract: The present disclosure discloses a copper etchant solution additives and a method for producing copper etchant solution. The method includes: producing copper etchant solution additives, wherein the copper etchant solution additives is an inorganic solution with cupric ions (Cu2+), and deionized water is a solvent for the copper etchant solution additives and is electric neutrality; before wet-etching, the copper etchant solution additives is added in the copper etchant solution, and the copper etchant solution is with a cupric ions (Cu2+) concentration of 700-1000 ppm. Through the above method, the present disclosure can improve etchant property of copper etchant solution to increase etching rate and uniformity.

Abstract: A washing operation and a drying operation are performed while a basket which is located inside a washing tub and accommodates dishes reciprocates in a vertical direction of a washing tub due to a driving device. The basket reciprocates in order to pass through an injection nozzle which injects washing water and an air nozzle which injects air to perform the washing operation while passing through the injection nozzle and to perform the drying operation while passing through the air nozzle. Through this, a small amount of dishes may be washed and dried in a short time and the dishes may be washed using a small amount of water and energy.

Abstract: Vibratory finishing apparatus comprising: a receptacle to receive media; a first fixture to: support an object within the receptacle; and move the object relative to the receptacle in at least a first direction; and a first guide to move relative to the receptacle to direct movement of the media within the receptacle to a predetermined part of the object.

Abstract: A surface cleaning apparatus may include a surface cleaning head including a cleaning pad mount that is configured to receive a cleaning pad and a water distribution system including a first heating unit in fluid communication with a water reservoir and having a water outlet in communication with the cleaning pad mount. The water distribution system may be configured to deliver water to the water outlet as liquid water.

Abstract: A dishwasher with a tub at least partially defining a treating chamber, a liquid spraying system, a liquid recirculation system defining a recirculation flow path, and a liquid filtering system. The liquid filtering system includes a rotatable filter disposed in the recirculation flow path to filter the liquid and a diverter overlying and spaced from at least a portion of the upstream surface to form a gap there between.

Abstract: There is provided a coating method which can apply a coating solution uniformly onto a substrate surface while reducing the amount of the coating solution supplied. The coating method for applying a coating solution onto a wafer includes the steps of: supplying a solvent for the coating solution onto the wafer to form an annular liquid film of the solvent in a peripheral area of the wafer; supplying the coating solution to the center of the wafer while rotating the wafer at a first rotational speed (time t1-t2); and allowing the coating solution to spread on the wafer by rotating the wafer at a second rotational speed which is higher than the first rotational speed (time t4-t5). The supply of the solvent is continued until just before the coating solution comes into contact with the liquid film of the solvent (time t0-t3).

Abstract: An immersion cooling device includes a refrigerant tank configured to accommodate a refrigerant liquid in which an electronic device is immersed; a seal tank configured to accommodate a sealing material and communicate with the refrigerant tank through an upper space of the seal tank, a cable connected to the electronic device being disposed in the upper portion space; and a partition member that, in a state in which a portion of the cable disposed in the upper portion space is immersed in the sealing material in a liquid state, partitions the upper portion space into a first space that is in communication with the refrigerant tank, and a second space that is in communication with an outside of the seal tank.

Abstract: The present disclosure relates to the technical field of glass substrate cleaning. Specifically, the present disclosure provides a glass substrate detergent tank which can solve the technical problem of wasting detergent solution. The detergent tank includes a tank body enclosed by a top face, a bottom face and side faces. There are a water inlet, a water outlet and a vent hole in tank body. There is a partition plate disposed between two facing inside faces of the tank body, which separate the tank body into two cavities communicating at the bottom. The detergent tank according to the embodiment of the present disclosure will not let froth discharge outside the tank body with gas, and thus can reduce the amount of wasted detergent solution, thereby extending the usage time of the detergent solution.

Abstract: A dishwasher comprises a basket (10) for accommodating articles to be cleaned, said basket comprising a basket floor and a plurality of holding spikes (30) projecting upwardly from the basket floor, and a rotatable spray arm (12) located below the basket, the spray arm comprising a plurality of spray nozzles (20) oriented to direct water jets towards the basket. In accordance with the present invention the basket (10) comprises at least one fixed holding spike (30) or a fixture (90) for a removable holding spike (92) the placement of which coincides with the path of movement of one of the spray nozzles (20), said fixed holding spike or fixture for a removable holding spike comprising means (36) to optically differentiate the holding spike from the remaining holding spikes.

Abstract: The present invention relates to a gas extinguishing system for a predefined protected area, particularly small-parts storage systems, wherein the gas extinguishing system comprises an inert gas source and a diffuser system fluidly connected to the inert gas source by a tubing system. The diffuser system comprises a diffuser tube having a plurality of drill holes provided in the surface of the diffuser tube and a pressure reducer allocated to the diffuser tube. In order to be able to achieve non-interactiveness with respect to the diffuser system from the standpoint of the design of the gas extinguishing system, the inventive provides for designing the diffuser system such that a primary baffle pressure measured in absolute bar is at least twice as high as the internal pressure of the diffuser tube during the flooding period dimensioned for the protected area and that the internal pressure of the diffuser tube during the dimensioned flooding period is at a maximum of 2 bar absolute.

Abstract: A washing machine includes a sealed tub for accepting articles to be washed. A liquid circulation circuit sprays a pressurized liquid (e.g. water, detergent, solvent) around the articles to clean them. The liquid circulation circuit is in thermal contact with a hot side of a thermoelectric device. A heat sink is in thermal contact with both a cold side of the thermoelectric device and a heat sink charging circuit. A liquid is successively directed one or more times through the liquid circulation circuit with the thermoelectric device powered on, and then directed one or more times through the heat sink charging circuit with the thermoelectric device powered off. Finally, the liquid is discharged from the tub after having its temperature lowered by heat exchange to the heat sink.

Abstract: Provided are washout devices for cleaning the interior of a frac tank. In embodiments, the devices may comprise (i) a wand comprising a first pipe and a second pipe; wherein the second pipe is positioned in parallel below the first pipe; wherein one or more trusses connect the first pipe and the second pipe; (ii) a support member in communication with a proximal end of the wand such that the wand is suspended above and at a desired angle relative to the ground; (iii) one or more washout nozzles disposed along the length of the first pipe. Embodiments may also include a system and a process for cleaning the interior of a frac tank.

Abstract: The forced air drying dishwasher provides an intake and air channel that ensure a smooth and more than adequate air entry, coupled with a narrowed venturi area to accelerate an air flow into a blower. With the air flow heated by a heating element, a distribution manifold coupled to a pair of nozzle manifolds with a plurality of spaced apart, evenly distributing nozzles are all joined via a plurality of laminar bends to ensure the air flow that is further aided. A gradual bend of an exhaust provides proper exit of the air flow. With such a plurality of air flow enhancements, a drying of dishes is comparatively more hastened and complete.

Abstract: A method and processing system are provided for independent temperature and hydration control for an etching solution used for treating a wafer in process chamber. The method includes circulating the etching solution in a circulation loop, maintaining the etching solution at a hydration setpoint by adding or removing water from the etching solution, maintaining the etching solution at a temperature setpoint that is below the boiling point of the etching solution in the circulation loop, and dispensing the etching solution into the process chamber for treating the wafer. In one embodiment, the dispensing includes dispensing the etching solution into a processing region proximate the wafer in the process chamber, introducing steam into an exterior region that is removed from the wafer in the process chamber, and treating the wafer with the etching solution and the steam.

Abstract: Wafers on a first wafer carrier in a tank are lifted from the first wafer carrier and a bath in the tank so as to accomplish Marangoni drying of the wafers. The lifted dry wafers are positioned on a second wafer carrier in a chamber and shifted to an offset position. A barrier, which can be a wall of the chamber with or without a sweeping flow of gas, impedes the passage of deposits to the wafers arising during drying of the first wafer carrier. Static electricity can be discharged from wafer supports in the offset position.

Abstract: The present application provides a beverage dispensing system using a sweetener. The beverage dispensing system may include a sweetener source with the sweetener therein, one or more rotating or stationary components positioned about a flow of the sweetener, and a component wash system positioned about the one or more rotating or stationary components to wash off the sweetener thereon.

Abstract: An interior cleaning device for a machine tool includes a pipe arranged inside a cover covering at least a periphery of a machining section of the machine tool, and a pump for supplying liquid into the pipe, the interior cleaning device being for ejecting liquid from the pipe and cleaning accumulated substances accumulated inside the cover, wherein the pipe includes a first pipe provided with a first ejection section for ejecting liquid or air into the cover, and a second pipe installed inside the first pipe and that is provided with a second ejection section at a part facing other than downward in a vertical direction.

Abstract: The cleaning apparatus includes a reservoir tank for reserving a cleaning fluid, a pressure-feed unit for feeding the cleaning fluid while pressurizing the cleaning fluid above the atmospheric pressure, a heating unit for heating the cleaning fluid pressure-fed from the pressure-feed unit above an atmospheric pressure boiling point of the cleaning fluid, a gas supply unit for supplying a gas and an injection unit connected to the heating unit and the gas supply unit for injecting the cleaning fluid pressurized by the pressure-feeding unit and heated by the heating unit as a pressurized superheated cleaning fluid and the gas supplied from the gas supply unit to the member at the same time.

Abstract: A conveyor conveys electrodes edgewise along a path, and may include a conveyor belt for supporting a bottom peripheral edge of each electrode. The conveyor belt may include support cleats and safety stops. A plurality of wash nozzles are positioned adjacent to the path on opposing sides thereof. Wash spray from the nozzles is directed to impinge sides of the electrode. An enclosure for enclosing a washing section associated with the wash nozzles includes an entrance and an exit. An exhaust system may maintain the space within the enclosure at negative pressure. A drying system may be located at the exit of the enclosure and may include a pair of plenums. The plenums may include vertically extending longitudinal slots for drawing air along side surfaces of the electrode, and the plenums may be connected to the exhaust system for venting the air.

Abstract: A fermentation system include a volatile organic compound (VOC) recovery sub-system and an instrumented control devise for detecting anomalous condition with a fermentor vessel and providing alarms or alerts and controlled responses to overcome the cause of the detected anomaly.

Abstract: A transfer mechanism for transferring food product from a compartment of a food processing system includes a conduit having a first end portion configured to be in communication with the compartment and a second end portion, a fluid discharge positioned substantially within the conduit between the first end portion and the second end portion, and a pressurized fluid source in communication with the fluid discharge. The pressurized fluid source is operable to propel a fluid through the fluid discharge to move the food product from the first end portion of the conduit toward the second end portion.

Abstract: The specification discloses a portable dialysis machine having a detachable controller unit and base unit with an improved reservoir heating system. The controller unit includes a door having an interior face, a housing with a panel, where the housing and panel define a recessed region configured to receive the interior face of the door, and a manifold receiver fixedly attached to the panel. The base unit has a reservoir with an internal pan and external pan, separated by a space that holds a heating element. The heating element is electrically coupled to electrical contacts attached to the external surface of the external pan.

Abstract: A method for removing organic materials includes providing a target object having the organic materials adsorbed thereon, and an adsorbent, into a space including a non-liquid medium therein; and separating the organic materials from the target object by applying ultrasound waves to the target object having the organic materials adsorbed thereon and the adsorbent in the space, and disposing the organic materials to the adsorbent.

Abstract: A steam cleaning apparatus including a main body having a main switch, a steam cleaning head coupled to the main body, and a position sensitive switch having a first state when the steam apparatus is in a substantially vertical storage position and a second state when the steam cleaning apparatus is in a tilted, cleaning position, the position sensitive switch being connected in electrical series with the main switch such that when the position-sensitive switch is in the first state the position-sensitive switch interrupts the flow of electrical current from the main switch and when the position-sensitive switch is in the second state, electrical power is supplied by the main switch.