Abstract: A control device controls an operation of a processing apparatus for performing a processing in a processing container that accommodates a substrate. The control device includes: a temperature acquisition unit configured to acquire a temperature inside the processing container; a storage unit configured to store relationship information indicating a relationship between the temperature inside the processing container and an etching rate, and film thickness information including a cumulative film thickness of a deposited film inside the processing container; a rate calculator configured to calculate an etching rate of the deposited film based on the temperature acquired by the temperature acquisition unit and the relationship information stored in the storage unit; and a time calculator configured to calculate an etching time for removing the deposited film based on the etching rate calculated by the rate calculator and the film thickness information stored in the storage unit.

Abstract: A solution is provided includes a strong base, a corrosion inhibitor, wherein the strong base is an alkali metal hydroxide, wherein the corrosion inhibitor is at least one of an organic acid having a-COOH functional group or an alkali metal salt of one of an organic acid having a-COOH functional group.

Abstract: A cleaning system, including a robot cleaner and a station are provided. The cleaning system includes a robot cleaner including a dust collector, the dust collector provided with a dust outlet, and an outlet door configured to open and close the dust outlet. The robot cleaner further includes a station including a lever device configured to open the outlet door and communicate with the dust collector when the lever device is pressed by the robot cleaner, and a collector configured to communicate with the lever device, and generate a suction force to suction dust collected in the dust collector.

Abstract: A vacuum cleaner includes a primary dust container that includes a container body, the container body delineating a dust collecting chamber that accumulates dust sucked into the vacuum cleaner and including a waste outlet that discharges the dust accumulated in the dust collecting chamber, the primary dust container also including a waste-outlet lid that opens and closes the waste outlet. A station includes a secondary dust container that accumulates the dust discharged from the primary dust container, and a driving source that generates opening driving force and closing driving force for the waste outlet. The electric vacuum cleaner generates a driving force for opening and closing an air passage connecting a primary dust container and a secondary dust container, without impairing convenience of a vacuum cleaner.

Abstract: A substrate liquid processing method comprises: providing a substrate liquid processing apparatus that includes a processing liquid flow path including a concentration sensor and a heater configured to heat the processing liquid; measuring a period of time for which the processing liquid is retained in the part of the processing liquid flow path including the concentration sensor; when determined that the period of time measured by the timer is longer than a predetermined period of time, 1) heating the processing liquid to a temperature higher than a crystallization temperature at which a reaction between the processing liquid and the cleaning fluid resulting in crystallization occurs, 2) supplying at least a part of the heated processing liquid into the part of the processing liquid flow path including the concentration sensor; and supplying the cleaning fluid into the part of the processing liquid flow path including the concentration sensor.

Abstract: A pre-drying processing liquid containing a sublimable substance that changes to gas without passing through to a liquid and a solvent in which the sublimable substance dissolves is supplied to a front surface of a substrate on which a pattern has been formed. Thereafter, the solvent is evaporated from the pre-drying processing liquid on the front surface of the substrate to thereby form a solidified body containing the sublimable substance on the front surface of the substrate. Thereafter, the solidified body is sublimated and thereby removed from the front surface of the substrate. A value acquired by multiplying a ratio of the thickness of the solidified body to the height of the pattern by 100 is greater than 76 and less than 219.

Abstract: A surface cleaning apparatus adapted for movement across a surface to be cleaned. The surface cleaning apparatus can dock within a storage tray and charge a power supply. Electrical contacts on the surface cleaning apparatus and the storage tray can be shielded when the surface cleaning apparatus is not docked within the storage tray. Furthermore, the storage tray can include a reservoir for a self-cleaning mode.

Abstract: According to one embodiment, provided is a cleaning liquid supplying system including: a circulation line in which cleaning liquid flows, first end of the circulation line being connected to a supply port of a cleaning liquid supplying apparatus, second end of the circulation line being connected to a collection port of the cleaning liquid supplying apparatus; a branch pipe branched from the circulation line and connected to a substrate cleaning unit; a valve provided on the branch pipe and configured to control supply of cleaning liquid from the circulation line to the substrate cleaning unit; and a flow rate adjuster configured to adjust a flow rate of the cleaning liquid flowing in the circulation line.

Abstract: A composition for use in recycled food and beverage containers is disclosed. A mixture of a strong sequestrant, a weak sequestrant, a polymer, an antiscalant and a surfactant is disclosed. Methods directed to using the composition are also disclosed. A composition that cleans and also reduces the defects present on the external surface of containers during a wash cycle is disclosed. The composition may or may not have metallic salts.

Abstract: A method of reducing resist residue on a semiconductor substrate includes introducing ozone gas into a chemical solution effective to dissolve resist residue adhered to the semiconductor substrate. The chemical solution is circulated through a processing tank where the semiconductor substrate is immersed in the chemical solution and through a first circulation path having a first pump and a first filter. After dissolution of the resist in the processing tank, the chemical solution is circulated through a second circulation path having a second pump and a second filter and returned to the processing tank. The first filter is cleaned by circulating the chemical solution through a third circulation path that includes the first pump and the first filter while introducing ozone gas into the chemical solution. The third circulation path is a closed loop path that excludes the processing tank, the second pump and the second filter.

Abstract: A substrate processing method includes a substrate holding step of holding a substrate in which a pattern is defined on one major surface, a charge supply step of supplying a charge of one polarity to the substrate, a first voltage application step of applying, in parallel with the charge supply step, a voltage of the other polarity to a first electrode arranged on the other major surface of the substrate through a dielectric member, a second voltage application step of applying, after the first voltage application step, a voltage of the one polarity to the first electrode while keeping a state where a ground connection of the substrate is released and a drying step of removing, in parallel with the second voltage application step, a liquid from the one major surface of the substrate so as to dry the substrate.

Abstract: A surfactant stabilized vinyl acetate ter-polymer based emulsion is provided comprising surfactant combination based freeze thaw stabilized vinyl acetate ter-polymer emulsion wherein said surfactant combination comprises non-ionic surfactant in combination with at least two polymerizable anionic reactive surfactants. A process of manufacturing the said emulsion is also provided, which process in comprising of selective sequence based steps and upon employing selective amounts of ingredients provides for said freeze thaw stable emulsion that is freeze thaw stable upto at least 5 cycles of freezing and thawing and yet maintains a particle size of 130-150 nm.

Abstract: A cleaning and drying method of a semiconductor substrate capable of suppressing collapse or breakdown of a pattern which occur at the time of drying a cleaning solution after cleaning the substrate and decomposition of a resin at a bottom of the pattern, and capable of removing the cleaning solution with good efficiency without using a specific device.

Abstract: According to the present invention, a substrate processing apparatus has a chamber (1), a stage (4) for holding a substrate (W) to be processed in the chamber (1), and a nozzle part (13) from which a gas cluster is blasted onto the substrate (W) to be processed, and has a function for processing the substrate (W) to be processed by the gas cluster. Cleaning of the inside of the chamber (1) is performed by: placing a prescribed reflecting member (dW, 60) in the chamber (1), blasting a gas cluster (C) onto the reflecting member (dW, 60), and applying the gas-cluster flow reflected by the reflecting member (dW, 60) onto a wall section of the chamber (1) to remove particles (P) adhered to the wall section of the chamber (1).

Abstract: Disclosed herein is an environmentally safe etching composition and method for a concrete or mortar surface. The composition includes, in some embodiments, an aqueous solution of urea, acetic acid, an anticorrosive agent, and a surfactant with no more than about 30% (w/v) urea and at least about 10% (v/v) acetic acid. The method includes, in some embodiments, obtaining the etching composition; applying the etching composition to the concrete or mortar surface at a prescribed ratio of the etching composition to the concrete or mortar surface; allowing the etching composition to stand on the concrete or mortar surface for a prescribed amount of time; and washing the concrete or mortar surface with water to produce an etched surface of the concrete or mortar.

Abstract: The apparatus for measuring disentrainment rate of air includes a Confined Plunging Liquid Jet Reactor (CPLJR) having a downcomer column surrounding a liquid jet. The end of the downcomer column is partially immersed in a receiving liquid pool contained in a reservoir. A conical ring is placed in the downcomer column below the liquid jet, the ring bearing against the wall of the downcomer column and forming a seal to define a headspace in the column. A gas supply and first bubble meter are connected to the column above the conical ring to supply gas and measure total entrainment. A second bubble meter connected to the headspace between the ring and the receiving pool measures disentrainment, and a third bubble meter connected to headspace above the receiving pool outside the column measures net entrainment.

Abstract: Embodiments of the invention generally relate to methods for removing a boron-carbon layer from a surface of a processing chamber using water vapor plasma treatment. In one embodiment, a method for cleaning a surface of a processing chamber includes positioning the pedestal at a first distance from the showerhead, and exposing a deposited boron-carbon layer to a first plasma process where the first plasma process comprises generating a plasma that comprises water vapor and a first carrier gas by biasing a showerhead that is disposed over a pedestal, and positioning the pedestal at a second distance from the showerhead and exposing the deposited boron-carbon layer to a second plasma process where the second plasma process comprises generating a plasma that comprises water vapor and a second carrier gas by biasing the showerhead and biasing a side electrode relative to the showerhead.

Abstract: Provided is a method for measuring the temperature at each location of a pipe in a hot water supply system comprising a water heater, a pipe, and outlets, the method comprising checking for a temperature of a first point (TP1), which is upstream of the outlet, a temperature of a second point (TP2), which is downstream of the outlet and an outdoor temperature (TA), and confirming a length (L) of the pipe from the first point to the second point, then measuring a temperature of the pipe located at a distance of x away from the first point.

Abstract: A solids heat exchanger (10) is in the form of a shell and tube arrangement having a shell section (11) through which heated oil (12) passes and a tube section (13). A screw conveyor (14) extends along its length and has a drive motor (15). Drill cuttings or other hydrocarbon contaminated materials are fed in through an inlet (16) and then conveyed along the tube (13) where heat transfer takes place. On exiting the tube (13) oil and water vapour rises and escapes through a first outlet (17) while the now cleaned drill cuttings or other materials fall through a second outlet (18) forming a discharge zone. The apparatus aims to reduce the oil content of the solids to less than 0.5%. The solids can then simply be disposed of. The base oil can be reclaimed and reused.

Abstract: The present disclosure generally relates to methods for removing contaminants and native oxides from substrate surfaces. The method includes exposing a surface of the substrate to first hydrogen radical species, wherein the substrate is silicon germanium having a concentration of germanium above about 30%, then exposing the surface of the substrate to a plasma formed from a fluorine-containing precursor and a hydrogen-containing precursor, and then exposing the surface of the substrate to second hydrogen radical species.

Abstract: A substrate processing method includes a liquid film forming step of supplying a low surface tension liquid onto the upper surface of the substrate while rotating the substrate at a first rotational speed, in order to form a liquid film of the low surface tension liquid on the upper surface of the substrate, a rotation decelerating step of decelerating rotation of the substrate to a second rotational speed while continuing the liquid film forming step, after a processing liquid on the substrate has been replaced with the low surface tension liquid, an opening forming step of forming an opening in the center region of the liquid film on the substrate that rotates at the second rotational speed after completion of the liquid film forming step, and a liquid film removing step of removing the liquid film from the upper surface of the substrate by widening the opening.

Abstract: Provided is an apparatus for removing residual water in a hot water mat using a circulating pump, in which residual water that remains in a boiler and a mat of the hot water mat and a mat can be conveniently and rapidly removed, the configuration of the apparatus for removing residual water in the hot water mat can be simplified and the leakage at a connector of the boiler and the mat is prevented from occurring so that the risk of suffering a low-temperature burn can be eliminated during the removal of residual water.

Abstract: An apparatus for cleaning an instrument with a cleaning fluid includes a vessel defining a chamber and a port for at least partially filling the chamber with the fluid. The apparatus further includes an ultrasonic transducer for delivering ultrasonic energy to the fluid, and a vacuum pump for depressurizing the chamber. The apparatus further includes a rotatable device removably disposable in the chamber and having a rack defining a cavity for supporting the instrument. The rotatable device also has a fluid delivery member extending toward the cavity and having a fluid channel between an inlet and an outlet. The apparatus further includes a fluid transmission system in fluid communication with the chamber and the fluid channel of the fluid delivery member for circulating the fluid from the chamber through the fluid channel of the fluid delivery member. A method of cleaning an instrument is also provided.

Abstract: A process and apparatus for removing hydrocarbons from hydrocarbon containing drilling waste. The process includes introducing hydrocarbon contaminated drill cuttings into one or more centripetal cuttings separators to create two distinct phases, thereafter discarding the bulk solids containing less hydrocarbons and treating the concentrated liquids phase in a solvent wash apparatus, resulting in improved efficiency of the facility throughput, while not substantially impacting the capital cost or operating cost of a solvent wash process facility. Apparatus for performing the process is also described.

Abstract: In an ozone generating system which performs intermittent operation, that is, an operation in an ozone generating operation period in which ozone is generated by discharging gas including oxygen at a discharge electrode part and an operation in an ozone generating operation standby period in which ozone is not generated by stopping discharge are alternately repeated, a gas circulating device which circulates gas in the ozone generating apparatus and removes at least nitric acid from the gas which is circulated is connected to the ozone generating apparatus.

Abstract: The present disclosure generally relates to methods for removing contaminants and native oxides from substrate surfaces. The method includes exposing a surface of the substrate to first hydrogen radical species, wherein the substrate is silicon germanium having a concentration of germanium above about 30%, then exposing the surface of the substrate to a plasma formed from a fluorine-containing precursor and a hydrogen-containing precursor, and then exposing the surface of the substrate to second hydrogen radical species.

Abstract: Corrosion Resistant Ozone Generators, including ozone generating chips, for various purposes including spas, pools and jetted tubs as well as methods for making and using such Corrosion Resistant Ozone Generators.

Abstract: A melter includes a heater unit for melting adhesive, a reservoir for receiving melted adhesive from the heater unit, and a pump in fluid communication with the reservoir and located within a heated housing. The heated housing heats the pump during startup and regular operation of the adhesive melter, thereby reducing delays in operation caused by slow warming of adhesive within the pump. The heated housing may be a manifold in fluid communication with the reservoir and with fluid outlets in some embodiments, but the heated housing may also be a separate heat block. In either type of embodiment, the pump is configured to be inserted cartridge-style into the heated housing and held in position using a single locking fastener. Additional elements such as insulating external housings and mounting hooks may also be used to further encourage conductive heat transfer into the structure surrounding the pump.

Abstract: A method for cleaning a single crystal pulling apparatus according to the present invention includes preparing a dummy crucible that simulates a crucible and includes a dummy liquid surface simulating a liquid surface of material melt in the crucible and a first dummy ingot simulating a single crystal ingot in process of being pulled up from the liquid surface of the material melt, and supplying gas in a state in which the dummy crucible is installed in a decompressed chamber of the single crystal pulling apparatus to generate a flow of the gas affected by the dummy crucible and detach foreign substances adhering to a wall surface of the chamber or parts in the chamber.

Abstract: In order to recycle glass fiber/fiber fabric production waste material, such as a material used in the manufacturing of rotor blades for wind turbines, and preferably where the material is bendable or flexible and reinforced in a plurality of layers in one or more directions in planes that are parallel with the surface of the material and stitch bonded together, the material is mechanically processed involving a size reduction of the material into shorter fiber length, in order to convert the material into one or more substantial pure glass fiber products. In this way it is possible inter alia to further process the material and create materials such as acoustic insulation wool, and chopped glass fiber strands.

Abstract: A communications terminal receives a data communications signal via a random access channel. A processor searches for data bursts in a first time-slot that include one of a first set of signature sequences assigned to the first time-slot. When a data burst A in the first time-slot includes one of the first set of signature sequences, the data burst A in the first time-slot is an initial burst of a message from a first communications terminal. The processor determines whether a second time-slot includes a data burst B that includes the one signature sequence. When the second time-slot includes the data burst B, the message is a multi-burst message and that the data burst B is a second burst of the multi-burst message. When the second time-slot does not include the data burst B the message is a single-burst message that has been completed via the first time-slot.

Abstract: The invention relates to a dryer for a lacquering facility: a) having a dryer housing, in which heated air is circulated, b) having an exhaust air line for a exhausting exhaust air from the dryer housing; c) having a combustion unit, which is connected to the exhaust air line, and which is used for thermal post-treatment of the exhaust air from the dryer housing and for providing hot air to a heat exchanger; d) wherein said heat exchanger is set up to supply said dryer housing with heated fresh air; and wherein e) at least one heating unit for heating the air circulated in said dryer housing is associated with said dryer housing. It is provided according to the invention that a combustion air supply of the heating unit is connected so it communicates with the dryer housing.

Abstract: A robot floor cleaning system features a mobile floor cleaning robot and an evacuation station. The robot includes: a chassis with at least one drive wheel operable to propel the robot across a floor surface; a cleaning bin disposed within the robot and arranged to receive debris ingested by the robot during cleaning; and a robot vacuum configured to pull debris into the cleaning bin from an opening on an underside of the robot. The evacuation station is configured to evacuate debris from the cleaning bin of the robot, and includes: a housing defining a platform arranged to receive the cleaning robot in a position in which the opening on the underside of the robot aligns with a suction opening defined in the platform; and an evacuation vacuum in fluid communication with the suction opening and operable to draw air into the evacuation station housing through the suction opening.

Abstract: A silicon wafer heat treatment method includes: placing a silicon wafer on a SiC jig and into a heat treatment furnace; performing heat treatment on the silicon wafer in the heat treatment furnace in a first non-oxidizing atmosphere; reducing the temperature; and carrying the silicon wafer out of the heat treatment furnace. In the heat reduction step, after the temperature is reduced to the temperature at which the silicon wafer can be carried out of the heat treatment furnace, the first non-oxidizing atmosphere is switched to an atmosphere containing oxygen, an oxide film having a thickness of 1 to 10 nm is formed on the surface of the SiC jig in the atmosphere containing oxygen, and the atmosphere containing oxygen is then switched to a second non-oxidizing atmosphere. A silicon wafer heat treatment method can prevent carbon contamination from a jig and an environment during a heat treatment process.

Abstract: The present disclosure provides a method of repairing a mask. The method includes inspecting a mask to identify a defect on the mask; performing a cleaning process to the mask using a non-thermal chemical solution to the mask; and repairing the mask to remove the defect from the mask. The non-thermal chemical solution is cooled by a cooling module to a working temperature below room temperature.

Abstract: An apparatus for removing a coating from a lengthwise section of an optical fiber includes a heater at least partially defining an elongate heating region configured for receiving the lengthwise section of the optical fiber, wherein the heater is configured for heating the heating region to a temperature above a thermal decomposition temperature of the at least one coating; a sensor configured for providing a signal indicative of explosive removal of the at least one coating from the lengthwise section of the optical fiber; and at least one device operatively associated with the sensor and the heater for receiving and processing the at least one signal from the sensor, and deactivating the heater. The at least one device may be configured for determining how much time passes between occurrence of the heater being deactivated and the at least one coating being removed from the lengthwise section of the optical fiber.

Abstract: A washing plant (10) comprises a battery (12) of washing and heat-disinfection machines (14, 16, 18) disposed along an alignment axis (X), able to operate in parallel with respect to each other in order to effect the washing and heat-disinfection, at least a translator slider (20) mobile in an automatic manner parallel to the alignment axis (X) in a front position to said battery (12), which receives the objects to be washed and both transports them in correspondence to the entrance of one of the machines (14, 16, 18) selected on each occasion depending on the washing program set or depending on availability, and moves them inside the desired machine (14, 16, 18) in a direction of feed (F) substantially perpendicular to said alignment axis (X), transport means (24) being provided to direct the objects to be washed toward the translator slider (20) operating in a direction of transport (Y) substantially parallel to said alignment axis (X).

Abstract: Provided is a cleaning composition and its applications. The cleaning composition comprises a mixture of a halogen-containing compound and an organic solvent. In some embodiments, the halogen-containing compound is TetraButylAmmonium Fluoride (TBAF) and the organic solvent is either propylene glycol monomethylether acetate (PGMEA) or a mixture of PGMEA and propylene glycol monomethylether (PGME). The cleaning composition is effective in removing silicon-containing material off of a surface of an apparatus. In some embodiments, the apparatus comprises a pipeline for delivering the silicon-containing material in semiconductor spin-coating processes. In some embodiments, the apparatus comprises a drain for collecting waste fluid in semiconductor spin-coating processes. In some embodiments, the apparatus comprises a patterned substrate.

Abstract: Processes for shutting down a hydroprocessing reactor and for removing catalyst from the reactor may comprise shutting off hydrocarbon feed to the reactor, stripping hydrocarbons from the catalyst, cooling the reactor to a first threshold reactor temperature, purging the reactor with N2 gas, introducing water into the reactor, and dumping the catalyst from the reactor, wherein the first threshold reactor temperature may be substantially greater than 200° F. In an embodiment, the water may be introduced into the reactor via a quench gas distribution system when the reactor is at a second threshold reactor temperature not greater than 200° F. to cool the reactor to a third threshold reactor temperature not greater than 120° F.

Abstract: The present invention relates to an acidic aqueous solution suitable for the pickling of stainless steel grades that comprises accelerators based on water soluble inorganic compounds comprising at least one nitrogen atom in an oxidation state in the range of ?2 to ??. The present invention further encompasses a process for the pickling of stainless steel that makes use of a pickling solution comprising the above-mentioned accelerators.

Abstract: An aqueous fluid composition useful for the recovery of hydrocarbons from a subterranean formation, including a mixture of water, a water soluble polymer, an inorganic salt and at least one zwitterionic surfactant and methods of using same.

Abstract: Cured or uncured silicones are effectively removed from substrates with minimized substrate corrosion by the use of a silicone dissolver containing a tetralkylammonium fluoride and an inorganic base, dissolved in a solvent.

Abstract: A method for reducing an internal pressure of a vacuum chamber while preventing impurity contamination within the vacuum chamber as much as possible is provided. The method includes: rough pumping reducing an internal pressure of a vacuum chamber by using a roughing pump, the roughing pump being a mechanical pump that is capable of reducing the internal pressure of the vacuum chamber to be less than 15 Pa; main pumping reducing the internal pressure of the vacuum chamber by using a main pump after the rough pumping, the main pump being a non-mechanical pump. Transition from the rough pumping to the main pumping is performed when the internal pressure of the vacuum chamber is no less than 15 Pa.

Abstract: Provided is a method for cleaning the inside of a pressure tight container for a blasting treatment, wherein the inside of a pressure tight container can be cleaned for a short period of time after a blasting treatment.

Abstract: A substrate processing apparatus that includes a process tank having a pair of opposed sidewalls for storing a chemical liquid, and processing a plurality of substrates by the chemical liquid; a substrate holding mechanism including a holding part for holding the plurality of substrates, and a back part connected to the holding part and interposed between the substrates held by the holding part and one sidewall of the pair of opposed sidewalls when the substrate holding mechanism is loaded into the process tank. A heating device is disposed on the process tank for heating the stored chemical liquid. The heating device includes at least a first heater disposed on the one sidewall, and a second heater disposed on the other sidewall of the pair of opposed sidewalls. Energy outputs of the first heater and the second heater are independently controlled.

Abstract: A substrate processing method that is a method for removing a resist, the surface layer of which has been cured, from a substrate having a pattern disposed inside the resist and includes an SPM supplying step of supplying an SPM, formed by mixing sulfuric acid and a hydrogen peroxide solution, to the substrate and a liquid temperature increasing step of changing, in parallel to the SPM supplying step, a mixing ratio of the sulfuric acid and the hydrogen peroxide solution used to form the SPM to increase the liquid temperature of the SPM supplied to the substrate in the SPM supplying step.

Abstract: The present invention concerns a method for measuring the thickness of any deposit of material on the inner wall of a structure conducting a fluid stream of hydrocarbons, the method comprising the steps of: applying a first heat pulse or continuous heating to at least one first section of the structure removing deposits on the inner wall of the first section of the structure; applying a second heat pulse to both the first section of the structure and at least one second section of the structure, the first and second sections being spaced apart, which heat pulse does not loosen any deposit of material in the second section; measuring the temperature of the wall of the structure or the fluid during the second heat pulse at both the first and second sections; and determining the thickness of any deposit of material on the inner wall of the structure at the second section based on the measured temperatures. The present invention also relates to a corresponding device and arrangement.

Abstract: The invention relates to an arrangement for de-icing railway trucks and ore concentrate in railway trucks. The arrangement comprises a tunnel (2) having a number of discharge openings (3) for heated air which is used for de-icing and at least one exhaust opening (4) for used air. An air heater (5) is in communication with the discharge openings (3) through a supply air duct (6). The arrangement further comprises a water supply device arranged to supply water to the air heater (5) and/or the supply air duct (6). The capacity of the air heater (5) is high enough to heat the air to a temperature sufficient for vaporizing at least a portion of the water. The invention also relates to a corresponding method for de-icing.

Abstract: A method of preparing a sealing surface of a container for application of a seal. A lip of the container may be heated, rinsed, and dried to establish the sealing surface. Then the seal may be applied to the sealing surface.

Abstract: A method for recycling glass mat waste, wound rovings, and other products includes providing a source of glass mat, or a plurality of rovings, for example on a roll, and routing the glass mat or rovings into a submerged combustion melter. An unwind system and a pair of powered nip rolls, powered conveyors, or other arrangement may work in combination to provide a substantially consistent rate of material into the melter. The melter may operate under less than atmospheric pressure to avoid fumes escaping the melter. A slot in the melter allows ingress of the glass mat or rovings into the melter, and a glass mat former such as a folder may be used to ensure that the mat fits through the slot. Alternatively, the glass mat may be cut by a slitter prior to entering the slot.