Polyamide Or Polyimide (e.g., Nylon, Etc.) Patents (Class 205/926)
  • Patent number: 5484517
    Abstract: The invention comprises a method of forming a multi-element, thin hot film sensor on a polyimide film. The sensor is formed by first cleaning one surface of the polyimide. Then, under a continuous vacuum, the surface is simultaneously cleaned by ion bombardment while nickel is deposited by evaporation. The ion beam cleaning is discontinued and copper is then deposited to an initial thickness by evaporation without a break in the vacuum. The vacuum is then removed and a final thickness of copper is deposited by plating. Sensor patterns are then defined in the nickel and copper layers using conventional photolithography and etching techniques.
    Type: Grant
    Filed: March 8, 1994
    Date of Patent: January 16, 1996
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventor: Purnell Hopson, Jr.
  • Patent number: 5478462
    Abstract: Polyimide-metal laminates are formed by etching the surfaces of a polyimide web with a glycol-containing etchant followed by electroless nickel or cobalt deposition and then by copper per deposition. The glycol containing etchant can be utilized to form through holes through the web.
    Type: Grant
    Filed: June 16, 1994
    Date of Patent: December 26, 1995
    Assignee: Polyonics Corporation, Inc.
    Inventor: Daniel P. Walsh
  • Patent number: 5176811
    Abstract: Disclosed is a method of fabricating a microelectronic package, especially a microelectronic package having gold plated copper circuitization on a polyimide substrate. The method includes the steps of forming a pattern of copper circuitization on the selected portions of the polyimide substrate, and thereafter depositing a gold thin film of selected portions of the copper circuitization layer. The gold thin film is electrodeposited from an electrodeposition solution of KAu(CN).sub.2, K.sub.2 HPO.sub.4, and KH.sub.2 PO.sub.4, modified by the addition of an effective amount of NH.sub.4.sup.+.
    Type: Grant
    Filed: February 1, 1991
    Date of Patent: January 5, 1993
    Assignee: International Business Machines Corporation
    Inventors: Leann G. Keim, Ralph S. Paonessa, Daniel C. Van Hart
  • Patent number: 5112462
    Abstract: A flexible metal-film laminate can comprise a layered film structure having a metal layer securely bonded to a film layer. The laminate contains a unique metal-oxide attachment structure between the film and metal layer comprising randomly distributed regions of metal-oxide. The peel strength of such a laminate is significantly improved over prior laminates and is resistant to peel strength reduction due to environmental stress. The preferred metal-film laminates made with polyester or polyimide can be used in the manufacture of high-quality, low cost, flexible printed circuit boards.
    Type: Grant
    Filed: September 13, 1990
    Date of Patent: May 12, 1992
    Assignee: Sheldahl Inc.
    Inventor: Richard L. Swisher
  • Patent number: 5092967
    Abstract: Printed electrical circuits are formed by coating an electrically insulating substrate with a layer of nickel metal followed by electroplating a second metal layer in a pattern of the desired circuit. Exposed nickel is removed from the substrate by reacting it with carbon monoxide to form nickel carbonyl vapor while the second metal remains unreacted. The nickel carbonyl vapor is heated to form nickel metal and carbon monoxide.
    Type: Grant
    Filed: June 17, 1991
    Date of Patent: March 3, 1992
    Assignee: Romar Technologies Incorporated
    Inventor: Robert G. Guess