Etching To Produce Porous Or Perforated Article Patents (Class 216/56)
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Patent number: 11547972Abstract: A porous membrane comprising stacked layers of nanosheets, each nanosheet comprising one to three atomic layers of a 2D material comprising or consisting of one or more transition metal dichalcogenides is provided. The nanosheets have pores and the membrane comprises a network of water permeation pathways including through-pathways formed by the pores, horizontal pathways formed by gaps between the layers, and vertical pathways formed by gaps between adjacent nanosheets and stacking defects between the layers. Also provided is a method for making the membrane.Type: GrantFiled: July 24, 2018Date of Patent: January 10, 2023Assignee: Northeastern UniversityInventors: Meni Wanunu, Bedanga Sapkota
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Patent number: 11121430Abstract: Embodiments disclosed herein generally relate to a microporous separator with a pore geometry that creates a low or no tortuosity architecture. In one embodiment, a battery cell may comprise of an anode layer, a cathode layer, and a separator layer positioned between the cathode layer and the anode layer. The separator layer may be comprised of one or more block copolymers. The block copolymers that make up the separator layer may be materials that self-align into a vertical nanostructure. The vertical nanostructures may allow ions within the battery cell to flow in a vertical path between the cathode and anode. This vertical path my create a low or no tortuosity environment within the battery cell.Type: GrantFiled: March 5, 2019Date of Patent: September 14, 2021Assignees: Chongqing Jinkang New Energy Automobile Co., Ltd., SF Motors Inc.Inventors: Brennan Campbell, Scott Monismith, Yifan Tang, Ying Liu
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Patent number: 11085456Abstract: A gas turbine engine and a composite apparatus is disclosed. The gas turbine engine includes a composite apparatus body formed from a composite material, the composite material including a three dimensional preform, the three dimensional preform including a plurality of warp fibers disposed in a warp direction in a first plane, a plurality of fill fibers disposed in a fill direction, wherein the fill direction is perpendicular to the warp direction in the first plane, a plurality of z-yarn fibers disposed in a z-yarn direction, wherein the z-yarn direction intersects the warp direction through the first plane, and a plurality of bias fibers disposed in a bias direction, wherein the bias direction is not aligned with the warp direction and the fill direction.Type: GrantFiled: August 22, 2016Date of Patent: August 10, 2021Assignee: RAYTHEON TECHNOLOGIES CORPORATIONInventors: Larry Foster, Rajiv A. Naik, John D. Riehl
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Patent number: 10971735Abstract: An electrochemical cell according to one embodiment includes a solid electrolyte layer having insulating property, a first electrode, and a second electrode. The solid electrolyte layer has a first face and a second face, and allows ions to move therethrough. The first electrode is one of an anode and a cathode and provided on the first face. The first electrode includes an inside channel that allows gas to flow, a third face into which a first open end of the channel opens, a fourth face into which a second open end of the channel opens, and an inner wall face that defines the channel. The second electrode is the other of the anode and the cathode and provided on the second face.Type: GrantFiled: October 30, 2018Date of Patent: April 6, 2021Assignee: KABUSHIKI KAISHA TOSHIBAInventors: Yasuaki Hadame, Masayuki Tanaka, Naoya Akaishi, Takahiro Terada, Shinji Nakata
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Patent number: 10947356Abstract: A nanocomposite including an array of extended length fibers with nanofibers oriented in transverse relation to the extended length fibers. The nanofibers are mechanically interlocked with the extended length fibers using a connecting agent concentrated at contact locations between the extended length fibers and the nanofibers without saturating the composite. The resultant composite of fibers and connecting agent is characterized by significant internal porosity with an internal void volume not occupied by the connecting agent.Type: GrantFiled: August 31, 2015Date of Patent: March 16, 2021Assignee: THE UNIVERSITY OF SOUTH ALABAMAInventor: Kuang-Ting Hsiao
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Patent number: 10950438Abstract: A method for selectively modifying a base material surface, includes applying a composition on a surface of a base material to form a coating film. The coating film is heated. The base material includes a surface layer which includes a first region including a metal. The composition includes a first polymer and a solvent. The first polymer includes at an end of a main chain or a side chain thereof, a group including a first functional group capable of forming a bond with the metal. It is preferred that the base material further includes a second region comprising substantially only a non-metal, and the method further includes, after the heating, removing with a rinse agent a portion formed on the second region, of the coating film. The metal is preferably a constituent of a metal substance, an alloy, an oxide, an electrically conductive nitride or a silicide.Type: GrantFiled: February 28, 2019Date of Patent: March 16, 2021Assignee: JSR CORPORATIONInventors: Hiroyuki Komatsu, Tomohiro Oda, Hitoshi Osaki, Masafumi Hori, Takehiko Naruoka
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Patent number: 10774246Abstract: A dry adhesive and a method of forming a dry adhesive. The method includes forming an opening through an etch layer and to a barrier layer, expanding the opening in the etch layer at the barrier layer, filling the opening with a material, removing the barrier layer from the material in the opening, and removing the etch layer from the material in the opening.Type: GrantFiled: September 3, 2013Date of Patent: September 15, 2020Assignee: Carnegie Mellon UniversityInventors: Metin Sitti, Seok Kim
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Patent number: 10756270Abstract: Provided is a method of manufacturing an organic deposition mask used in manufacturing of an organic light emitting diode (OLED). More specially, provided is a method of manufacturing an organic deposition mask by which fine deposition openings may be formed on a thin board by electrochemical machining (ECM) using a multi array electrode having projecting electrode parts arrayed thereon. According to an embodiment of the present invention, the method of manufacturing an organic deposition mask including deposition openings formed of first openings facing a deposition source and second openings facing a deposited object, the method may include: forming the first openings on one side of a thin board; and forming the second openings on an opposite side of the thin board by electrochemical machining (ECM) using a second multi array electrode having second projecting electrode parts arrayed thereon so as to communicate with the first openings.Type: GrantFiled: December 11, 2018Date of Patent: August 25, 2020Assignee: ANYCASTING CO., LTD.Inventors: Sung Bin Kim, Chan Kyu Park, Kun Woong Ko
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Patent number: 10665783Abstract: A nanoparticle includes a cuboid base including a semiconductor material, and a plurality of surfaces formed on the base and including a plurality of functionalities, respectively.Type: GrantFiled: June 27, 2019Date of Patent: May 26, 2020Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Qing Cao, Kangguo Cheng, Zhengwen Li, Fei Liu
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Patent number: 10414142Abstract: A method of forming a composite preform containing multiple laminates is disclosed. The method may include providing a first sublaminate comprising stacked fibers woven into a fabric; providing a second sublaminate comprising stacked fibers woven into a fabric; joining the first sublaminate and the second sublaminate forming a component comprising a region of discontinuity sandwiched between the first sublaminate and the second sublaminate; rigidizing the component; and softening the region between the first sublaminate and the second sublaminate. In illustrative embodiments, the method may include manipulating the region of discontinuity between the first sublaminate and the second sublaminate to reduce the incoherence between the sublaminates by moving fibers from the sublaminates through at least part of the region between the first sublaminate and the second sublaminate.Type: GrantFiled: December 28, 2015Date of Patent: September 17, 2019Assignee: Rolls-Royce CorporationInventors: Adam L. Chamberlain, Andrew J. Lazur
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Patent number: 10344324Abstract: A technique is provided for controlling biomolecules in a nanodevice. A membrane has two reservoirs at opposing ends of the membrane. A nanochannel is formed in the membrane connecting the two reservoirs. A gate electrode is formed on the membrane such that the gate electrode extends laterally in a region of the nanochannel. A biomolecule is trapped in the nanochannel by applying a first voltage to the gate electrode. In response to trapping the biomolecule, the biomolecule is stretched in the nanochannel by applying a second voltage to the gate electrode. The biomolecule is stretched based on changing from the first voltage to the second voltage applied to the gate electrode.Type: GrantFiled: March 26, 2014Date of Patent: July 9, 2019Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Binquan Luan, Sung-wook Nam
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Patent number: 10316672Abstract: A method for fabricating an airfoil includes forming a diffuser section in an exterior surface of the airfoil. The diffuser section is defined by at least an outer surface and an inner surface that converge at a stop surface. The method also includes positioning a drilling element of a drilling device on the stop surface. The method further includes orienting the drilling element at a first angle relative to the exterior surface. The method also includes forming, using the drilling element, a cooling channel extending through the airfoil from the stop surface to an interior surface, thereby forming the cooling channel at substantially the first angle.Type: GrantFiled: September 26, 2013Date of Patent: June 11, 2019Assignee: General Electric CompanyInventors: Aaron Ezekiel Smith, John Wesley Harris, Jr.
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Patent number: 10301733Abstract: A template based process is used for the production of the nanowire structural element, wherein the nanowires are electrochemically depositioned in the nanopores. The irradiation is carried out at different angles, such that a nanowire network is formed. The hollow chamber-like structure in the nanowire network is established through the dissolving of the template foil and removal of the dissolved template material. The interconnecting of the nanowires provides stability to the nanowire structural element and an electrical connection between the nanowires is created thereby.Type: GrantFiled: September 25, 2015Date of Patent: May 28, 2019Assignee: GSI Helmholtzzentrum für Schwerionenforschung GmbHInventors: Thomas Cornelius, Wolfgang Ensinger, Reinhard Neumann, Markus Rauber
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Patent number: 10293436Abstract: Forming holes in a material includes focusing a pulsed laser beam into a laser beam focal line oriented along the beam propagation direction and directed into the material, the laser beam focal line generating an induced absorption within the material, the induced absorption producing a defect line along the laser beam focal line within the material, and translating the material and the laser beam relative to each other, thereby forming a plurality of defect lines in the material, and etching the material in an acid solution to produce holes greater than 1 micron in diameter by enlarging the defect lines in the material. A glass article includes a stack of glass substrates with formed holes of 1-100 micron diameter extending through the stack.Type: GrantFiled: November 7, 2014Date of Patent: May 21, 2019Assignee: Corning IncorporatedInventors: Sasha Marjanovic, Garrett Andrew Piech, Shyamala Shanmugam, Sergio Tsuda, Robert Stephen Wagner
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Patent number: 10281453Abstract: The invention relates to an apparatus (100) and a method for the processing of single molecules, particularly for the sensing or sequencing of single-stranded DNA. A bottom layer (110) and an electrically conductive top layer (120) with a first and a second slit (111,121), respectively, are disposed on top of each other such that an aperture (A) is formed by the slits. The slits (111,121) are preferably perpendicular to each other. An electrical circuit (140) may be connected to the top layer (120), allowing to sense single molecules that pass through the aperture (A).Type: GrantFiled: September 25, 2012Date of Patent: May 7, 2019Assignee: Koninklijke Philips N.V.Inventors: Pieter Jan Van Der Zaag, Reinder Coehoorn, Falco Cornelius Marinus Jacobus Maria Van Delft
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Patent number: 10266407Abstract: An electrically conductive thin film including a compound represented by Chemical Formula 1 and having a layered crystal structure MeCha??Chemical Formula 1 wherein, Me is Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, or Lu; Ch is sulfur, selenium, or tellurium; and a is an integer ranging from 1 to 3.Type: GrantFiled: May 4, 2015Date of Patent: April 23, 2019Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Se Yun Kim, Sang Il Kim, Sung Woo Hwang, Yoon Chul Son, Yong-Hee Cho, Jae-Young Choi
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Patent number: 10236162Abstract: A method of etching a porous film is provided. The method includes supplying a first gas into a processing chamber of a plasma processing apparatus in which an object to be processed including a porous film is accommodated, and generating a plasma of a second gas for etching the porous film in the processing chamber. The first gas is a processing gas having a saturated vapor pressure of less than or equal to 133.3 Pa at a temperature of a stage on which the object is mounted in the processing chamber, or includes the processing gas. In the step of supplying the first gas, no plasma is generated, and a partial pressure of the processing gas which is supplied into the processing chamber is set to be greater than or equal to 20% of the saturated vapor pressure.Type: GrantFiled: November 29, 2017Date of Patent: March 19, 2019Assignee: TOKYO ELECTRON LIMITEDInventors: Shigeru Tahara, Eiichi Nishimura, Mikhail Baklanov, Liping Zhang, Jean-Francois de Marneffe
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Patent number: 10100419Abstract: The invention relates to a method for fabricating nanowires and a method for fabricating an electrode of an electrochemical device. The nanowire fabrication method according to the invention comprises: a) a step of depositing, on one of the faces of the matrix comprising hole openings, at least one porous layer, having a porosity equal to or higher than 26% by volume, of nanoparticles of a conductive material having their smallest dimension at least equal to the diameter of the holes in the matrix, the nanoparticles being in electrical contact with one another, b) growing the nanowires in the holes of the matrix, and c) removing the matrix. The invention has an application in the field of electrochemical devices in particular.Type: GrantFiled: November 25, 2009Date of Patent: October 16, 2018Assignees: Commissariat a L'Energie Atomique et aux Energies Alternatives, King Saud UniversityInventors: Nicolas Guillet, Galdric Sibiude
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Patent number: 9923222Abstract: Disclosed is a fuel cell with enhanced mass transfer characteristics in which a highly hydrophobic porous medium, which is prepared by forming a micro-nano dual structure in which nanometer-scale protrusions with a high aspect ratio are formed on the surface of a porous medium with a micrometer-scale roughness by plasma etching and then by depositing a hydrophobic thin film thereon, is used as a gas diffusion layer, thereby increasing hydrophobicity due to the micro-nano dual structure and the hydrophobic thin film. When this highly hydrophobic porous medium is used as a gas diffusion layer for a fuel cell, it is possible to reduce water flooding by efficiently discharging water produced by an electrochemical reaction of the fuel cell and to improve the performance of the fuel cell by facilitating the supply of reactant gases such as hydrogen and air (oxygen) to a membrane-electrode assembly (MEA).Type: GrantFiled: December 23, 2014Date of Patent: March 20, 2018Assignees: Hyundai Motor Company, Korea Institute of Science and TechnologyInventors: Bo Ki Hong, Sae Hoon Kim, Kook Il Han, Kwang Ryeol Lee, Myoung Woon Moon
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Patent number: 9873622Abstract: A hybrid porous structured material may include a matrix including a plurality of first pores interconnected in three dimensions, and a porous material including second pores and filling wholly or partially each of the plurality of the first pores.Type: GrantFiled: October 23, 2013Date of Patent: January 23, 2018Assignee: Samsung Electronics Co., Ltd.Inventors: Hyo Kang, Sung Soo Han, Pil Jin Yoo, Du-yeol Ryu, Young Hun Kim, Seon Ju Yeo
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Patent number: 9839418Abstract: A passive retrieving interosseous suture passing instrument (10) having a guide handle (13) with a proximal end for grasping and a distal end for engagement with a bone (11) to which suture (22) is to be attached. The bone (11) is provided with a first tunnel (15), and a suture retrieving arm (12) carried at the distal end of the guide handle (13) is provided with a distal tip dimensioned to be received in the first tunnel (15).Type: GrantFiled: August 28, 2014Date of Patent: December 12, 2017Assignee: TENSOR SURGICAL, INC.Inventors: Brett Sanders, Keith J. Harper
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Patent number: 9689087Abstract: A method of making a photonic crystal includes step 1 providing a seed, followed by etching a surface of the seed to form thereon submicron voids; step 2 providing a graphite disk, followed by coating a side of the graphite disk with a graphite adhesive whereby the void-formed surface of the seed is attached to the graphite disk to form a seed holder; step 3 placing the seed holder above a growth chamber, followed by placing a raw material below the growth chamber; step 4 forming a thermal field in the growth chamber with a heating device to sublime the raw material; and step 5 controlling temperature, thermal field, atmosphere and pressure in the growth chamber to allow the gaseous raw material to be conveyed and deposited on the seed, thereby forming a photonic crystal.Type: GrantFiled: December 8, 2015Date of Patent: June 27, 2017Assignee: NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Ta-Ching Li, Dai-Liang Ma, Bang-Ying Yu, Bo-Cheng Lin
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Patent number: 9676913Abstract: This patent is provided a method for producing a porous polymer film using vanadium oxide nanowires, and a porous polymer film obtained from the method. The method allows control of a uniform pore size and density through a simple process including the steps of: adding an ion exchanger to deionized water to perform acidification and adding a vanadate compound thereto to grow vanadium oxide nanowires by a sol-gel process; mixing the resultant solution of grown nanowires with a polymer solution to provide a mixed solution of nanowires; pouring the mixed solution of nanowires to a mold, followed by drying and curing, to form a film; and etching the resultant film with an etching solution to remove the vanadium oxide nanowires.Type: GrantFiled: June 5, 2014Date of Patent: June 13, 2017Assignee: KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATIONInventors: Taek-Seung Kim, Hee-Deung Park, Gyu-Tae Kim, Man-Joong Han, Yun-Jeong Kim
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Patent number: 9670069Abstract: The disclosure provides relates to compositions and methods for water treatment. It also addresses a method for synthesizing TiO2 (and other metal oxides) with or without dopants. This method enables control over size, phase, morphology and porosity and specific surface area of these materials. The disclosure also provides metal oxide composites that can be used in photocatalysts, photovoltaics, and solar hydrogen applications.Type: GrantFiled: October 8, 2010Date of Patent: June 6, 2017Assignee: The Regents of the University of CaliforniaInventors: David Kisailus, Nichola Kinsinger
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Patent number: 9595422Abstract: The disclosed technology generally relates to semiconductor fabrication, and more particularly to plasma etching of dielectric materials having pores. In one aspect, a method for etching a porous material in an environment includes contacting the porous material with an organic gas at a pressure and a temperature. The organic gas is such that at the pressure and the temperature, the organic gas remains in a gas state when outside of the porous material, while the organic gas condenses into an organic liquid upon contacting the porous material. Upon contacting the porous material, the organic gas thereby fills the pores of the porous material with the organic liquid. Subsequent to contacting the porous material, the method additionally includes plasma etch-treating of the porous material having filled pores, thereby evaporating a fraction of the organic liquid filling the pores of the porous material.Type: GrantFiled: March 16, 2016Date of Patent: March 14, 2017Assignees: IMEC VZW, Katholieke Universiteit LeuvenInventors: Mikhaïl Baklanov, Liping Zhang, Jean-Francois de Marneffe
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Patent number: 9577401Abstract: Fiber optic amplification in a spectrum of infrared electromagnetic radiation is achieved by creating a chalcogenide photonic crystal fiber (PCF) structure having a radially varying pitch. A chalcogenide PCF system can be tuned during fabrication of the chalcogenide PCF structure, by controlling, the size of the core, the size of the cladding, and the hole size to pitch ratio of the chalcogenide PCF structure and tuned during exercising of the chalcogenide PCF system with pump laser and signal waves, by changing the wavelength of either the pump laser wave or the signal wave, maximization of nonlinear conversion of the chalcogenide PCF, efficient parametric conversion with low peak power pulses of continuous wave laser sources, and minimization of power penalties and minimization of the need for amplification and regeneration of pulse transmissions over the length of the fiber, based on a dispersion factor.Type: GrantFiled: July 31, 2015Date of Patent: February 21, 2017Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Leslie Brandon Shaw, Jasbinder S. Sanghera, Ishwar D. Aggarwal, Daniel J. Gibson, Frederic H. Kung
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Patent number: 9518335Abstract: A porous metallic material for making a structure is fabricated by subjecting the material structure to Surface Mechanical Attrition Treatment (SMAT) once, using the SMAT-treated structure as an electrode, and selectively etching away at least one metal component in the SMAT-treated structure once, thus forming an etched-away structure. Additional SMAT treatment and/or etching treatment to the etched away structure may be performed. The resulting structure has improved physical characteristics.Type: GrantFiled: January 2, 2014Date of Patent: December 13, 2016Assignee: CITY UNIVERSITY OF HONG KONGInventors: Jie Zhang, Yang Yang Li, Jian Lu
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Patent number: 9505192Abstract: A method for making a nanoporous membrane is disclosed. The method provides a composite film comprising an atomically thin material layer and a polymer layer, and then bombarding the composite film with energetic particles to form a plurality of pores through at least the atomically thin material layer. The nanoporous membrane also has a atomically thin material layer with a plurality of apertures therethrough and a polymer film layer adjacent one side of the graphene layer. The polymer film layer has a plurality of enlarged pores therethrough, which are aligned with the plurality of apertures. All of the enlarged pores may be concentrically aligned with all the apertures. In one embodiment the atomically thin material layer is graphene.Type: GrantFiled: March 7, 2014Date of Patent: November 29, 2016Assignee: LOCKHEED MARTIN CORPORATIONInventors: Randall M. Stoltenberg, Peter V. Bedworth, Scott E. Heise, Steven W. Sinton
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Patent number: 9457426Abstract: A mask substrate that includes a first area and a second area surrounding the first area is provided. Then, a laser beam is irradiated on the mask substrate to at least partly remove a material of the second area. After that, a physical force is applied to the mask substrate to separate the first area from the mask substrate thereby forming an opening through the mask substrate.Type: GrantFiled: September 9, 2013Date of Patent: October 4, 2016Assignee: Samsung Display Co., Ltd.Inventors: Doh-Hyoung Lee, Jun Ho Jo
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Patent number: 9404861Abstract: The present disclosure pertains to metal or dielectric nanostructures of the subwavelength scale within the grating lines of optical diffraction gratings. The nanostructures have surface plasmon resonances or non-plasmon optical resonances. A linear photodetector array is used to capture the resonance spectra from one of the diffraction orders. The combined nanostructure super-grating and photodetector array eliminates the use of external optical spectrometers for measuring surface plasmon or optical resonance frequency shift caused by the presence of chemical and biological agents. The nanostructure super-gratings can be used for building integrated surface enhanced Raman scattering (SERS) spectrometers. The nanostructures within the diffraction grating lines enhance Raman scattering signal light while the diffraction grating pattern of the nanostructures diffracts Raman scattering light to different directions of propagation according to their wavelengths.Type: GrantFiled: February 9, 2015Date of Patent: August 2, 2016Assignee: BOARD OF TRUSTEES OF THE UNIVERSITY OF ALABAMA, FOInventor: Junpeng Guo
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Patent number: 9281322Abstract: A thin film transistor array panel is disclosed. The thin film transistor array panel may include a gate line disposed on a substrate and including a gate electrode, a semiconductor layer including an oxide semiconductor disposed on the substrate, a data wiring layer disposed on the substrate and including a data line crossing the gate line, a source electrode connected to the data line and a drain electrode facing the source electrode, a polymer layer covering the source electrode and the drain electrode, and a passivation layer disposed on the polymer layer. The data wiring layer may include copper or a copper alloy and the polymer layer may include fluorocarbon.Type: GrantFiled: March 16, 2015Date of Patent: March 8, 2016Assignee: SAMSUNG DISPLAY CO., LTD.Inventors: Seung-Ho Jung, Young Joo Choi, Joon Geol Kim, Kang Moon Jo, Sho Yeon Kim, Byung Hwan Chu, Woo Geun Lee, Woo-Seok Jeon
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Patent number: 9274430Abstract: Embodiments of the disclosure are directed to a device for molecule sensing. In some embodiments, the device includes a first electrode separated from a second electrode by a dielectric layer. The first electrode comprises a large area electrode and the second electrode comprises a small area electrode. At least one opening (e.g., trench) cut or otherwise created into the dielectric layer exposes a tunnel junction therebetween whereby target molecules in solution can bind across the tunnel junction.Type: GrantFiled: October 10, 2013Date of Patent: March 1, 2016Assignee: ARIZONA BOARD OF REGENTS on behalf of ARIZONA STATE UNIVERSITYInventors: Brett Gyarfas, Stuart Lindsay, Pei Pang
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Patent number: 9221217Abstract: The invention relates to a method for producing a three-dimensional structure. The method according to the invention comprises the following steps: applying to or introducing into a carrier element (1; 7; 16) particles (2), a plurality of at least partially interlinked cavities being formed between the particles (2) and the particles (2) coming into contact in points of contact, and interconnecting the particles (2) in the points of contact by coating the system consisting of particles and the carrier element, the coat (4) produced during coating penetrating the cavities at least to some extent. The method according to the invention allows the production of three-dimensional structures with little effort.Type: GrantFiled: February 3, 2012Date of Patent: December 29, 2015Assignee: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.Inventors: Thomas Lisec, Mato Knez
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Patent number: 9217935Abstract: Provided are a method for fabricating a porous carbon structure using optical interference lithography, and a porous carbon structure fabricated by same, wherein the method for fabricating a porous carbon structure using optical light interference lithography includes: forming a photoresist layer on a substrate; irradiating a three-dimensional optical interference pattern onto the photoresist formed using three-dimensional optical interference lithography to form a three-dimensional porous photoresist pattern; coating the formed three-dimensional porous photoresist pattern with an inorganic material; heating the photoresist pattern on which the inorganic material is coated to carbonize the pattern; and removing the coated inorganic material.Type: GrantFiled: April 15, 2010Date of Patent: December 22, 2015Assignee: Industry-University Cooperation Foundation Sogang UniversityInventors: Jun Hyuk Moon, Woo Min Jin, Juhwan Shin
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Patent number: 9214559Abstract: Graphene transferring members, graphene transferrer, methods of transferring graphene, and methods of fabricating a graphene device, may include a metal thin-film layer pattern and a graphene layer sequentially stacked on an adhesive member. The metal thin-film layer and the graphene layer may have the same shape. After transferring the graphene layer onto a transfer-target substrate during the fabrication of a graphene device, the metal thin-film layer is patterned to form electrodes on respective ends of the graphene layer by removing a portion of the metal thin-film layer.Type: GrantFiled: October 24, 2012Date of Patent: December 15, 2015Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Joo-ho Lee, Chang-seung Lee, Yong-sung Kim, Hyun-jae Song
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Patent number: 9206307Abstract: A method of producing a structure containing a phase-separated structure, including: forming a layer including a neutralization film on a substrate; forming a layer containing a block copolymer on the layer including the neutralization film, the PA block and PB block being mutually bonded in the block copolymer, and the PB block including a structural unit other than a structural unit constituting the PA block; and subjecting the layer containing the block copolymer to an annealing treatment, such that, in the case where a surface free energy of the PA block, a surface free energy of the PB block and a surface free energy of the neutralization film are represented by a coordinate point A of the PA block, a coordinate point B of the PB block and a coordinate point N of the neutralization film, respectively in the plane of coordinates, the coordinate point N of the neutralization film is within the predetermined range.Type: GrantFiled: July 30, 2014Date of Patent: December 8, 2015Assignee: TOKYO OHKA KOGYO CO., LTD.Inventors: Tasuku Matsumiya, Takehiro Seshimo, Ken Miyagi, Takaya Maehashi, Takahiro Dazai, Yoshiyuki Utsumi
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Patent number: 9196783Abstract: A method for producing a microelectronic device including a plurality of light emitting diodes each including a wire of nanometric or micrometric size, the method including: growing the nanowires from a growth substrate; forming at least one dielectric layer on a transfer substrate distinct from the growth substrate; and penetration by the nanowires in the dielectric layer.Type: GrantFiled: January 23, 2013Date of Patent: November 24, 2015Assignee: COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVESInventors: Alexandre Lagrange, Stephan Landis
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Patent number: 9117652Abstract: A method for forming porous metal structures and the resulting structure may include forming a metal structure above a substrate. A masking layer may be formed above the metal structure, and then etched using a reactive ion etching process with a mask etchant and a metal etchant. Etching the masking layer may result in the formation of a plurality of pores in the metal structure. In some embodiments, the metal structure may include a first end region, a second end region, and an intermediate region. Before etching the masking layer, a protective layer may be formed above the first end region and the second end region, so that the plurality of pores is contained within the intermediate region. In some embodiments, the intermediate metal region may be a nanostructure such as a nanowire.Type: GrantFiled: June 18, 2013Date of Patent: August 25, 2015Assignee: International Business Machines CorporationInventors: Yann Astier, Jingwei Bai, Robert L. Bruce, Aaron D. Franklin, Joshua T. Smith
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Patent number: 9076916Abstract: Disclosed is a method for manufacturing semiconductor devices. Said method includes: a supply step in which a process liquid (19) that oxidizes and dissolves a target substrate (20) to be treated is supplied to the surface of said substrate (20) to be treated; a positioning step in which a mesh-like transferring member (10b) provided with a catalyst material is positioned near or in contact with the surface of the substrate (20) to be treated; and a concave or convex forming step in which a concave or convex is formed on the surface of the substrate (20) to be treated via the aforementioned supply and positioning steps. As opposed to existing manufacturing methods, which manufacture semiconductor devices provided with semiconductor substrates with highly arbitrary (i.e.Type: GrantFiled: February 14, 2011Date of Patent: July 7, 2015Inventor: Hikaru Kobayashi
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Patent number: 9059184Abstract: A method and system for decapsulating a portion of an encapsulated integrated circuit delivers etchant mixture in variable but precise, high-velocity micro-metered pulses to a single outlet port of a pump from any one of or a combination of separate inlet ports connected to separate etchant source containers holding specific etchant solutions, controls temperature of the etchant mixture by passing the etchant mixture from the outlet port through a serpentine passage in a temperature-controlled metal block, and delivers the etchant mixture from the serpentine passage of the temperature-controlled block via a delivery conduit to an encapsulation surface of the encapsulated integrated circuit.Type: GrantFiled: December 19, 2011Date of Patent: June 16, 2015Assignee: RKD Engineering CorporationInventor: Kirk Alan Martin
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Patent number: 9050621Abstract: Methods for fabricating a nanopillared substrate surface include applying a polymer solution containing an amphiphilic block copolymer and a hydrophilic homopolymer to a substrate surface. The amphiphilic block copolymer and the hydrophilic homopolymer in the polymer solution self-assemble on the substrate surface to form a self-assembled polymer layer having hydrophobic domains adjacent to the substrate surface and hydrophilic domains extending into the self-assembled polymer layer. At least a portion of the hydrophilic domains may be removed to form a plurality of pores in the exposed surface of the self-assembled polymer layer. A protective layer may be deposited on the exposed surface as a mask for etching through the plurality of pores to form through-holes. A nanopillar-forming material may be deposited onto the substrate surface via the through-holes. Then, the remaining portion of the self-assembled polymer layer may be removed to expose a nanopillared substrate surface.Type: GrantFiled: January 24, 2013Date of Patent: June 9, 2015Assignee: CORNING INCORPORATEDInventors: Mark Alejandro Quesada, Jianguo Wang, Ying Zhang
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Publication number: 20150147525Abstract: Methods for enabling or enhancing growth of carbon nanotubes on unconventional substrates. The method includes selecting an inactive substrate, which has surface properties that are not favorable to carbon nanotube growth. A surface of the inactive substrate is treated so as to increase a porosity of the same. CNTs are then grown on the surface having the increased porosity.Type: ApplicationFiled: November 25, 2014Publication date: May 28, 2015Applicant: Government of the United States as Represented by the Secretary of the Air ForceInventors: Benji Maruyama, Gordon A. Sargent, Ahmad E. Islam
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Publication number: 20150136733Abstract: Multiple walled nested coaxial nanostructures, methods for making multiple walled nested coaxial nanostructures, and devices incorporating the coaxial nanostructures are disclosed. The coaxial nanostructures include an inner nanostructure, a first outer nanotube disposed around the inner nanostructure, and a first annular channel between the inner nanostructure and the first outer nanotube. The coaxial nanostructures have extremely high aspect ratios, ranging from about 5 to about 1,200, or about 300 to about 1200.Type: ApplicationFiled: November 13, 2014Publication date: May 21, 2015Inventors: Helmut BAUMGART, Gon NAMKOONG, Diefeng GU, Tarek ABDEL-FATTAH
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Publication number: 20150126827Abstract: A covering cap, in particular for placing on a skin analyzer, contains an end wall bounded by a circumferential edge, and a circumferential wall adjoining the circumferential edge of the end wall. At least one part of the covering cap has a thickness that is less than a thickness of the circumferential wall in a portion of the circumferential wall that lies in the region or end of the circumferential wall remote from the end wall. The end wall is of a gas-permeable configuration.Type: ApplicationFiled: May 24, 2013Publication date: May 7, 2015Inventor: HAGL Peter
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Patent number: 9011702Abstract: One of objects is to reduce the effect caused by the volume expansion of an active material. An embodiment is a method for manufacturing an electrode for a power storage device which includes an active material over one of surfaces of a current collector. The active material is formed by forming a conductive body functioning as the current collector; forming a mixed layer including an amorphous region and a microcrystalline region over one of surfaces of the conductive body; and etching the mixed layer selectively, so that a part of or the whole of the amorphous region is removed and the microcrystalline region is exposed. Thus, the effect caused by the volume expansion of the active material is reduced.Type: GrantFiled: September 23, 2010Date of Patent: April 21, 2015Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Shunpei Yamazaki, Kazutaka Kuriki, Junpei Momo, Rie Matsubara
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Patent number: 9011705Abstract: The present invention relates to a method of forming polymer substrate with variable refractive index sensitivity, the method comprising the steps of: (a) contacting a metal-coated patterned mold with a polymer substrate at a temperature sufficient to deform said polymer substrate to thereby deposit a patterned mask of a metal film on the polymer substrate; and (b) etching away portions of said polymer substrate not covered by said patterned mask under conditions to form a region of variable refractive index sensitivity on said polymer substrate.Type: GrantFiled: July 26, 2012Date of Patent: April 21, 2015Assignee: Agency for Science, Technology and ResearchInventors: Kwok Wei Shah, Xiaodi Su, Soo Jin Chua, Hong Yee Low
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Patent number: 9011706Abstract: A foraminous microstructure or film that has photonic or plasmonic properties is made by forming a structure or film composed of at least two constituent materials so that the compositional ratio of the constituent materials varies in a depth direction of the structure, and then removing one of the materials from the structure.Type: GrantFiled: December 16, 2008Date of Patent: April 21, 2015Assignee: City University of Hong KongInventors: Yang Yang Li, Zhengtao Xu, Chun Kwan Tsang
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Publication number: 20150099168Abstract: According to one embodiment, a separator for a lead-acid battery includes a membrane film of an ultra-high molecular weight polymer material (UHMWPE). Precipitated silica and glass fibers are disposed throughout the membrane film and held or maintained in position by the UHMWPE. The separator may have a thickness of between 1 and 50 mils and include between 10% and 30% by weight of the UHMWPE, between 40% and 80% by weight of the precipitated silica, between 5% and 25% by weight of processing oils, and between 1% and 30% by weight of the glass fibers.Type: ApplicationFiled: October 8, 2013Publication date: April 9, 2015Applicant: JOHNS MANVILLEInventors: Zhihua Guo, Guodong Zheng, Souvik Nandi, Jawed Asrar
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Publication number: 20150083561Abstract: According to one general aspect of the invention, a keyboard of a computing device includes a keycap and a light source. The keycap is configured to actuate a switch of the computing device. The keycap includes a metal material and has an upper surface and a lower surface. The upper surface of the keycap is configured to be viewed by a user while operating the computing device and defines one or more openings in the keycap. The one or more openings in the upper surface is patterned in the shape of a single alphanumeric character. The lower surface of the keycap defines one or more openings in the keycap. The keycap defines one or more passageways extending from the one or more openings defined by the upper surface of the keycap through the keycap to the one or more openings defined by the lower surface of the keycap.Type: ApplicationFiled: March 31, 2011Publication date: March 26, 2015Applicant: GOOGLE INC.Inventors: Amy Han, Lawrence Lam
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Patent number: 8986558Abstract: A plasma etching method capable of oblique etching with a high aspect ratio and high uniformity is provided. In the plasma etching method, a base body is etched with a high aspect ratio by the following process: An electric-field control device having an ion-introducing orifice penetrating therethrough in a direction inclined from the normal to the surface of a base body is placed on or above the surface of this base body. Plasma is generated on the surface of the base body on or above which the electric-field control is placed. A potential difference is formed between the plasma and the base body so as to attract ions in the plasma toward the base body.Type: GrantFiled: August 27, 2009Date of Patent: March 24, 2015Assignee: Japan Science and Technology AgencyInventors: Susumu Noda, Shigeki Takahashi