Abstract: A process for coating a carrier material with an active material for production of an electrode foil of a battery cell with a Laval nozzle, wherein the Laval nozzle has at least one converging first portion, one second portion having a smallest flow cross section, and one diverging third portion arranged one after the other along a flow direction.

Abstract: A reflector antenna heating system includes a dielectric radome that covers a first side of a reflector and a feed subsystem of an antenna. The system also includes a plurality of heater blower devices on a second side of the reflector, each of the plurality of heater blower devices having an inlet port and an outlet port. The system further includes a plurality of outlet duct assemblies, wherein each of the plurality of outlet duct assemblies is coupled to the outlet port of a respective heater blower device to direct heated air around a perimeter of the reflector and along an inside surface of the dielectric radome. One or more gaps proximal to a center of the reflector are included to recirculate cooled air toward a plurality of inlet ducts for the plurality of heater blower devices to feed the inlet port of each heater blower device.

Abstract: The present invention relates to an inlet screen adapted to be arranged at the water inlet (8) of a hydropower plant and comprises a plurality of elongated bars (20), said bars (20) being separated by a distance holding means, each elongated bar (20) having in its elongation a proximal portion and a distal portion, and an upstream region and a downstream region, said upstream and downstream regions being at an angle in relation to said proximal and distal portions, at least one of said bars (20) defining a space (36; 36a) extending along at least a portion of the elongation of said bar (20), said bar (20) being provided with an electric heating means (31).

Abstract: A substrate treating liquid recovery unit with improved cleaning efficiency and a substrate treating apparatus including the same are provided. The substrate treating apparatus includes a substrate support unit; and a substrate treating liquid recovery unit surrounding the substrate support unit, for recovering a substrate treating liquid, and including a first recovery container, wherein the first recovery container comprises a first base for discharging the substrate treating liquid to an outside through a first recovery line, and including a third portion disposed on one side of the substrate support unit and a fourth portion disposed on the other side of the substrate support unit; a first sidewall extending upwardly from one end of the first base; a first upper plate extending obliquely and upwardly from an end of the first sidewall; and a first inner wall extending upwardly from the other end of the first base.

Abstract: The present disclosure relates to an apparatus for fluidised-bed chemical vapour deposition from a gaseous phase allowing the temperature of the fluidised bed to be stabilised during the deposition and also to an associated method for its implementation, the apparatus being characterised in that it comprises a porous thermal insulator present in an inlet zone and configured to be passed through by the gaseous phase, said porous thermal insulator having an effective thermal conductivity at 20° C. less than or equal to 3.5 W·m-1·K-1.

Abstract: A method for operating a substrate processing system includes delivering precursor gas to a chamber using a showerhead that includes a head portion and a stem portion. The head portion includes an upper surface, a sidewall, a lower planar surface, and a cylindrical cavity and extends radially outwardly from one end of the stem portion towards sidewalls of the chamber. The showerhead is connected, using a collar, to an upper surface of the chamber. The collar is arranged around the stem portion. Process gas is flowed into the cylindrical cavity via the stem portion and through a plurality of holes in the lower planar surface to distribute the process gas into the chamber. A purge gas is supplied through slots of the collar into a cavity defined between the head portion and an upper surface of the chamber.

Abstract: A vehicle air conditioner is disclosed. The present invention provides the vehicle air conditioner, which: can directly control the amount of air passing through an evaporator and a heater core since a blower is disposed between the evaporator and the heater core; has front and rear seat discharge units respectively having heater cores, thereby having a simple form, minimizing energy consumption, and independently enabling four or more zones, including front and rear seats, the left and right of the front seats, and the left and right of the rear seats, to be air-conditioned; and can discharge an offensive smell to the outside during initial driving of a vehicle since the air outside a vehicle, flowing in from an air inlet, and indoor air flowing in from an inside air suction port, disposed at the center of the vehicle, are discharged to the outside of the vehicle by means of a second blower, and not by a front seat blower, for discharging the air to the rear seats.

Abstract: A method of irrigation comprises supplying water to an inclined irrigation pipe provided with a plurality of drippers such that a pressure at a highest level of the inclined irrigation pipe is at most 200 cm H2O.

Abstract: A flying body, which prevents others from measuring precise position of the flying body and allows friends to measure precise position of the flying body, is provided. The flying body (10) is provided with a reflector (100), a controller (300) and an anti-reflection section (200). The reflector (100) is provided with a reflective surface, arranged in an aperture, which reflects a radiated laser. The controller (300) generates a control signal on a basis of a state of the flying body. The anti-reflection section (200) prevents a reflection of the laser by the reflective surface on a basis of the control signal.

Abstract: The communication plate has a first layer that defines a wall surface of the communication flow channel, a second layer stacked on a side of the first layer opposite to the wall surface, and a third layer stacked on a side of the second layer opposite to the first layer, and the thermal expansion coefficient of the second layer is smaller than the thermal expansion coefficient of the first layer and is smaller than the thermal expansion coefficient of the third layer.

Abstract: A semiconductor manufacturing apparatus includes a chamber that includes a station in which a substrate is provided, a substrate holder that is in the station and receives the substrate, and lower showerheads below the substrate holder, the lower showerheads including an isotropic showerhead having first nozzle holes that isotropically provide a first reaction gas on a bottom surface of the substrate, and a striped showerhead having striped nozzle regions and striped blank regions between the striped nozzle regions, the striped nozzle regions having second nozzle holes that non-isotropically provide a second reaction gas on the bottom surface of the substrate.

Abstract: Various embodiments for an adjustable flow nozzle system having a manifold with a plurality of adjustable flow nozzles in which the flow rate of each adjustable flow nozzle may be individually adjusted are described herein.

Abstract: A shower system includes a shower assembly and a mounting system. The shower assembly is configured to receive water from a water source and pass water through a plurality of outlets. The mounting system is for coupling the shower assembly to a building structure, and is configured to adjust the shower assembly. The mounting system includes a post and a fitting. The post is configured to fixedly couple to the building structure. The fitting is coupled to the shower assembly and adjustably received to the post, such that a vertical position of the shower assembly may be adjusted relative to the post and the building structure.

Abstract: Methods and arrangements are provided for release of an ROV operable subsea clamp connector, the clamp connector comprising at least two clamp segments hinged to move pivotally, and a drive screw connecting the clamp segments by threaded engagement with trunnions arranged rotatable in the pivoting ends of the clamp segments, the threads of the drive screw and trunnions turned such that the trunnions travel along the drive screw in mutually opposite directions when the drive screw is turned. An axial bore in the drive screw is adapted for accommodation of a waterjet cutting tool having a sideways pointing nozzle in a forward end, the waterjet cutting tool rotatable inside the bore while feeding high-pressure water through the nozzle, towards the wall of the drive screw until the wall of the drive screw is cut through.

Abstract: A method of prepping a cylindrical inner surface of a bore using a high-frequency forced pulsed waterjet apparatus entails generating a pressurized waterjet using a high-pressure water pump, generating a high-frequency signal using a high-frequency signal generator, applying the high-frequency signal to a transducer having a microtip to cause the microtip to vibrate to thereby generate the high-frequency forced pulsed waterjet, and rotating the rotatable ultrasonic nozzle inside the bore to prep the inner cylindrical surface of the bore using the high-frequency forced pulsed waterjets exiting from the angled exit orifices of the rotatable ultrasonic nozzle.

Abstract: A wiper unit includes a retaining ring, which is arranged in a rotationally symmetric fashion about a longitudinal axis and which includes a contact portion for being received at a housing part, a primary wiper and a secondary wiper, which is axially spaced away from the primary wiper towards the secondary side. A primary lip is formed at the primary wiper and a secondary lip is formed at the secondary wiper. The primary lip and the secondary lip, in a mounted state, contact a sliding surface of a guided slide partner part in a sealing fashion, wherein the primary lip protrudes towards the primary side in a collar-like fashion and wherein the primary lip, at the side thereof facing away from the guided slide partner part, is at least sectionally conically tapered towards the primary side, wherein the primary lip comprises a contact surface arranged for abutting the sliding surface.

Abstract: A method of prepping a cylindrical inner surface of a bore using a high-frequency forced pulsed waterjet apparatus entails generating a pressurized waterjet using a high-pressure water pump, generating a high-frequency signal using a high-frequency signal generator, applying the high-frequency signal to a transducer having a microtip to cause the microtip to vibrate to thereby generate the high-frequency forced pulsed waterjet, and rotating the rotatable ultrasonic nozzle inside the bore to prep the inner cylindrical surface of the bore using the high-frequency forced pulsed waterjets exiting from the angled exit orifices of the rotatable ultrasonic nozzle.

Abstract: Provided herein are various improvements to rocket engine components and rocket engine operational techniques. In one example, a rocket engine propellant injection apparatus is provided that includes a manifold formed into a single body by an additive manufacturing process and comprising a fuel cavity and an oxidizer cavity. The manifold also includes one or more propellant feed stubs, the one or more propellant feed stubs protruding from the manifold and formed into the single body of the manifold by the additive manufacturing process, with at least a first stub configured to carry fuel to the fuel cavity and at least a second stub configured to carry oxidizer to the oxidizer cavity. The manifold also includes a plurality of injection features formed by apertures in a face of the manifold, ones of the plurality of injection features configured to inject the fuel and the oxidizer for combustion.

Abstract: A method of prepping a cylindrical inner surface of a bore using a high-frequency forced pulsed waterjet apparatus entails generating a pressurized waterjet using a high-pressure water pump, generating a high-frequency signal using a high-frequency signal generator, applying the high-frequency signal to a transducer having a microtip to cause the microtip to vibrate to thereby generate the high-frequency forced pulsed waterjet, and rotating the rotatable ultrasonic nozzle inside the bore to prep the inner cylindrical surface of the bore using the high-frequency forced pulsed waterjets exiting from the angled exit orifices of the rotatable ultrasonic nozzle.

Abstract: A method of providing a liquid over a substrate is provided. The method includes providing the liquid over the substrate via a first opening of a flow path formed in a spray nozzle. The method further includes sucking back the liquid away from the first opening of the flow path. The method also includes holding the chemical solution in the flow path to keep a front surface of the chemical solution located in a tapered flow path section of the flow path.

Abstract: Semiconductor processing chamber showerheads with contoured faceplates, as well as techniques for producing such faceplates, are provided. Data describing deposition rate as a function of gap distance between a reference showerhead faceplate and a reference substrate may be obtained, as well as data describing deposition rate as a function of location on the substrate when the reference showerhead and the reference substrate are in a fixed arrangement with respect to each other. The two data sets may be used to determine offsets from a reference plane associated with the faceplate that determine a contour profile to be used with the faceplate.

Abstract: Each of the valve device and the shower device includes: a valve/shower device main body; a link lever pivotally held in the valve/shower device main body; a weight provided on the link lever; and a ball valve provided between the weight and a pivot axis of the link lever. When the valve/shower device main body is manually caused to move by shaking, swinging, turning, tilting, tapping, or like operation, a kinetic energy imposed on the weight causes the link lever to make a rotational movement relative to the valve/shower device main body, and then the rotational movement of the link lever displaces the ball valve to open or close a valve hole. The valve device and the shower device can significantly facilitate the valve-opening/closing operations, and do not require a special external member for hand- or finger-operation such as a button, a handle or a switch.

Abstract: The present invention provides an irrigation system with cheap humidity sensors and cheap automatic faucets preferably by using at the end nodes of the system low water pressure, so that much less force is needed to open and close the local waterway, and then either using simple electrical valves that do not require engines, or using for example mechanical sensors based on a bi-material of two or more materials which expand differently when they become wet, thus converting the difference of the expansion into convenient movement. Another possible variation, instead of mechanical sensors and valves, is to use for example a preferably synthetic material that tends to behave like a normal root preferably at the edge of each side channel, so that the “root” counter-balances the water supply and reaches equilibrium with it when the soil becomes wet enough, based preferably on asymmetric capillary materials.

Abstract: A supersonic compressor including a rotor to deliver a gas at supersonic conditions to a diffuser. The diffuser includes a plurality of aerodynamic ducts that have converging and diverging portions, for deceleration of gas to subsonic conditions and then for expansion of subsonic gas, to change kinetic energy of the gas to static pressure. The aerodynamic ducts include vortex generating structures for controlling boundary layer, and structures for changing the effective contraction ratio to enable starting even when the aerodynamic ducts are designed for high pressure ratios, and structures for boundary layer control. In an embodiment, aerodynamic ducts are provided having an aspect ratio of in excess of two to one, when viewed in cross-section orthogonal to flow direction at an entrance to the aerodynamic duct.

Abstract: A showerhead including a fluid connector configured to be threadedly coupled to a shower arm, and an outer shell receiving the fluid connector. A rotational stop or drive member is operably coupled between the fluid connector and the outer shell and is configured to limit relative rotation between the fluid connector and the outer shell.

Abstract: A container for a substance to be sprayed includes a reservoir for the substance and operable spraying means connected to the reservoir for spraying the substance. The spraying means are provided with at least two spaced apart outflow openings that are in fluid communication with the reservoir for spraying the substance in at least two spray beams to surroundings.

Abstract: A showerhead is disclosed in this invention. The showerhead includes a bottom portion, at least one plate, and a top portion. The bottom portion includes a plurality of gas tubes which are integratedly formed on the bottom portion. The gas tubes include at least one first gas tube. The at least one plate includes a first plate. The first plate includes a plurality of first openings, wherein the gas tubes pass through the first openings. The top portion is coupled to the bottom portion for forming at least one inner space.

Abstract: The present invention is generally directed to a system for controlling placement of nanoparticles, and methods of using same. In one illustrative embodiment, the device includes a substrate and a plurality of funnels in the substrate, wherein each of the funnels comprises an inlet opening and an elongated, rectangular shaped outlet opening. In one illustrative embodiment, the method includes creating a dusty plasma comprising a plurality of carbon nanotubes, positioning a mask between the dusty plasma and a desired target for the carbon nanotubes, the mask having a plurality of openings extending therethrough, and extinguishing the dusty plasma to thereby allow at least some of the carbon nanotubes in the dusty plasma to pass through at least some of the plurality of openings in the mask and land on the target.

Abstract: A combustor nozzle includes a downstream surface having an axial centerline. A plurality of passages through the downstream surface provide fluid communication through the downstream surface, and a downstream section of each passage has at least one of a frusto-conical or frusto-spherical shape. A method for modifying a combustor nozzle includes machining a downstream side of a body to remove a recast surface in a plurality of passages that provide fluid communication through the body. The method may further include machining a downstream section in each passage to form at least one of a frusto-conical or frusto-spherical surface in each passage proximate to the downstream side of the body.

Abstract: A water-ejection-angle adjustable shower head, and it is characterized in that, it includes a main body, and a swing rod, a water dispenser disk, an upper plate, and a lower plate built in said main body from top to bottom. An upper end of said lower plate passes through said upper plate and is hinged onto said water dispenser disk. A center of said swing rod is hinged onto a center of said water dispenser disk. The water-ejection-angle adjustable shower head can be operate to make the water outage holes on a lower surface of said lower plate to swing to various different directions, to form the dispersion water ejections or converging and merging water ejections. As such, the form and intensity of water ejections can be varied, to meet the demands of various customers.

Abstract: The substance of the invention is a method of fluid feeding by means of at least one nozzle (4, 4A, 4B, 4C, 4D, 4E) onto a carrier (2) in a machine of the tobacco industry wherein the fluid is fed to the nozzle (4, 4A, 4B, 4C, 4D, 4E) from a fluid container (10) by means of a feeding device (11), whereas the nozzle (4, 4A, 4B, 4C, 4D, 4E) comprises a body (12, 12A) and at least one movable member (13, 13A, 13C, 13E, 13F, 13G, 30), and the fluid is fed onto the carrier (2) through at least two outlet orifices (15, 15A, 15B, 15C, 15D) of the nozzle (4, 4A, 4B, 4C, 4D, 4E). The reciprocal position of the outlet orifices (15, 15A, 15B, 15C, 15D) of the nozzle (4, 4A, 4B, 4C, 4D, 4E) is varied by means of an adjusting mechanism (19, 19A, 19B, 19C, 19D).

Abstract: An injector for forming films respectively on a stack of wafers is provided. The injector includes a plurality of hole structures. Every adjacent two of the wafers have therebetween a wafer spacing, and each of the wafers has a working surface. The hole structures respectively correspond to the respective wafer spacings. The working surface and a respective hole structure have therebetween a parallel distance. The parallel distance is larger than a half of the wafer spacing. A wafer processing apparatus and a method for forming films respectively on a stack of wafers are also provided.

Abstract: A showerhead assembly includes a front plate having a front surface, a back surface and a plurality of first through holes connecting the front surface and the back surface, a back plate having a front surface, a back surface and a plurality of second through holes connecting the front surface and the back surface, and an adhesive layer joining the back surface of the front plate and the front surface of the back plate. The plurality of first through holes are aligned with the plurality of second through holes, and the front plate and the back plate are formed from dissimilar materials.

Abstract: A system includes a plurality of nozzles, a pump configured to pump a fluid through the nozzles, and a manifold configured to arrange the plurality of nozzles to substantially match a shape of a workpiece. Each nozzle of the plurality of nozzles is configured to impinge upon a section of the workpiece with the fluid.

Abstract: An electronic device manufacturing system may include a chamber port assembly that provides an interface between a transfer chamber and a process chamber. In some embodiments, the chamber port assembly may be configured to direct a flow of purge gas into a substrate transfer area of the chamber port assembly. In other embodiments, a process chamber and/or the transfer chamber may be configured to direct a flow of purge gas into the substrate transfer area. The flow of purge gas into a substrate transfer area may prevent and/or reduce migration of particulate matter from chamber hardware onto a substrate being transferred between the transfer chamber and a process chamber. Methods of assembling a chamber port assembly are also provided, as are other aspects.

Abstract: A method is illustrated and described for reducing unwanted substances by injecting a reactant into a flue gas of a steam generator. In order that the reactant can also be used in larger steam generators and/or combustion chambers, a method is proposed, in which the reactant is injected into the combustion chamber of the steam generator via a reactant opening of a multi-component nozzle, in which an enveloping medium is injected into the combustion chamber through at least one enveloping medium opening arranged outside the reactant opening, and in which the enveloping medium at least partly envelops the reactant in the combustion chamber and in this way at least partly shields the reactant from the flue gas.

Abstract: An applicator head for a vacuum coating system includes two applicator manifolds. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. One of the applicator manifolds includes one manifold plate that is wider than the other at the leading edge. First and second face plates are disposed over the leading edges of the applicator manifolds.

Abstract: An applicator head for a vacuum coating system includes a manifold shell having opposing shell plates, each including a conduit attachment coupled to a shell aperture. An applicator manifold is affixed to each shell plate. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. First and second face plates are disposed over the leading edges of the applicator manifolds.

Abstract: An applicator head for a vacuum coating system includes two applicator manifolds. Each applicator manifold includes two coupled manifold plates, with one including a manifold aperture, and each is affixed to the respective shell plate so that each manifold aperture aligns with the respective shell aperture. An applicator channel is formed between the manifold plates of each applicator manifold, and the applicator channel is fluidically coupled to the manifold aperture of each respective applicator manifold. Each applicator channel forms an applicator port at a leading edge of each respective applicator manifold, and each leading edge is configured to be complementary in shape to an edge of a workpiece to be coated. One of the leading edges is configured to have different application gaps with respect to different portions of the edge of a workpiece. First and second face plates are disposed over the leading edges of the applicator manifolds.

Abstract: The present disclosure generally comprises a heated showerhead assembly that may be used to supply processing gases into a processing chamber. The processing chamber may be an etching chamber. When processing gas is evacuated from the processing chamber, the uniform processing of the substrate may be difficult. As the processing gas is pulled away from the substrate and towards the vacuum pump, the plasma, in the case of etching, may not be uniform across the substrate. Uneven plasma may lead to uneven etching. To prevent uneven etching, the showerhead assembly may be separated into two zones each having independently controllable gas introduction and temperature control. The first zone corresponds to the perimeter of the substrate while the second zone corresponds to the center of the substrate. By independently controlling the temperature and the gas flow through the showerhead zones, etching uniformity of the substrate may be increased.

Abstract: A showerhead assembly attached to a plumbing feature has a main body with a hollow body portion to receive incoming fluid. An outlet is formed on the bottom of the main body to release outgoing fluid, and a fluid distributing element is configured to distribute the outgoing fluid from the hollow body portion. A main sprinkler unit is mounted below the main body to connect to the outlet to receive the incoming fluid, and a plurality of fluid release points formed on the bottom for emitting fluid. Several fluid distributing plates have connectors extended from each of them to connect to the fluid distributing element for receiving fluid from the hollow body portion, and several fluid release points are formed on the bottom of the fluid distributing plate for emitting fluid. The watering area can be adjusted by extending the fluid distributing plates as required, which enables a wide variation in spray patterns flowing from the showerhead assembly.

Abstract: An aerated shower head structure has a body, a stationary disc, a water distributor and a pressing disc sequentially assembled. The stationary disc has an air inlet hole and a water inlet hole both formed through the stationary disc and communicating with a water inlet of the body. The water distributor and the pressing disc are combined and rotatably mounted under the stationary disc. The water distributor has an air compartment and a water compartment separately formed in a bottom of the water distributor, and has an air channel selectively communicating with the air compartment and multiple water orifices selectively communicating with the water compartment. The pressing disc has an air outlet hole communicating with the air compartment, a water outlet hole communicating with the water compartment, and an elongated water passage communicating with the air outlet hole and the water outlet hole and constitute a water outflow path.

Abstract: A sanitary shower has a shower body, a water inlet on the shower body connectable to a wall supply line, at least one jet outlet opening and a water conduit providing fluid communication to the water inlet. The sanitary shower includes a connector body with a water inlet connectable to a wall supply line and a basket-type shower body which extends from the connector body up to an outlet-sided basket terminal axially spaced from the connector body. The basket-type shower body defines a hollow basket interior space adjacent to the connector body, and the outlet-sided basket terminal delimits an axial basket opening and/or a light transparent terminal disk element. On the basket-type shower body and/or on the connector body at least one jet outlet opening is provided. A water conduit provides a fluid communication of the at least one jet outlet opening to the water inlet.

Abstract: A rail cooling method for forcibly cooling a rail by jetting a coolant includes jetting the coolant to a foot back part of the rail from a porous plate nozzle in which a nozzle hole at an end in a width direction is smaller than a nozzle hole at a central part in the width direction and causes a cooling capacity for the end in the width direction of the underside of the base of the rail to be lower than a cooling capacity for the central part in the width direction of the underside of the base of the rail.

Abstract: A mounting system for a spray manifold having a plurality of spray modules arranged in a lateral array with support assemblies between adjacent modules. The mounting arrangement includes one or more mounting assemblies which each have a hub that is securable about one of the manifold support assemblies and a clamp comprising a pair of clamping arms that is securable about the hub by means of an appropriate fastener. The hub and clamping arms define complementary circular surfaces which permit the selected pivotal positioning of the hub and the spray manifold to which it is secured relative to the clamp and a machine mounting structure.

Abstract: Dispensing head (1) intended to be fitted on a container that contains at least one product to be dispensed, this dispensing head comprising: a body (3) that is open at its two opposite axial ends, an engaging part (10) that is open at its two opposite axial ends, at least partially defining a dispensing orifice.

Abstract: A dual-temperature, multi-plenum showerhead for use in semiconductor processing equipment is described. The showerhead may supply multiple separate gases to a wafer reaction area while keeping the gases largely segregated within the showerhead. Additionally, the showerhead may be configured to allow a faceplate of the showerhead to be maintained at a significantly higher temperature than the rest of the showerhead.

Abstract: A deposition apparatus for processing semiconductor substrates having an isothermal processing zone comprises a chemical isolation chamber in which semiconductor substrates are processed. A process gas source is in fluid communication with a showerhead module which delivers process gases from the process gas source to the isothermal processing zone wherein the showerhead module includes a faceplate wherein a lower surface of the faceplate forms an upper wall of a cavity defining the isothermal processing zone, a backing plate, and an isolation ring which surrounds the faceplate and the backing plate. At least one compression seal is compressed between the faceplate and the backing plate which forms a central gas plenum between the faceplate and the backing plate. A substrate pedestal module is configured to heat and support a semiconductor substrate wherein an upper surface of the pedestal module forms a lower wall of the cavity defining the isothermal processing zone within the chemical isolation chamber.

Abstract: Embodiments described herein generally relate to an aluminum alloy showerhead with a reduced zinc content for use in semiconductor processing chambers. The showerhead may be utilized in processing chambers adapted for making low temperature polysilicon (LTPS) liquid crystal displays (LCD) or LTPS organic light emitting diode (OLED) displays which may be controlled by thin film transistors (TFT). More specifically, embodiments described herein relate to a reduced zinc showerhead.

Abstract: A gas diffuser unit for a process chamber includes at least one controllable diffuser, a power source, and a controller. The at least one controllable diffuser is configured to generate controllable forces acting in various directions on a gaseous material in a flow of the gaseous material introduced into the process chamber, to spread the gaseous material inside the process chamber. The power source is coupled to the at least one controllable diffuser, and configured to supply power to the at least one controllable diffuser to generate the controllable forces. The controller is coupled to the power source and configured to control the power supplied by the power source to the at least one controllable diffuser.