Group Iii Element Containing Binary Compound; E.g., Ga, As Patents (Class 252/62.3GA)
  • Publication number: 20130334454
    Abstract: The present invention relates to the use of printable inks for the formation of Al2O3 coatings or mixed Al2O3 hybrid layers, and to a corresponding process for the formation thereof.
    Type: Application
    Filed: February 9, 2012
    Publication date: December 19, 2013
    Applicant: MERCK PATENT GMBH
    Inventors: Ingo Koehler, Oliver Doll, Werner Stockum, Sebastian Barth
  • Patent number: 7862738
    Abstract: The present invention relates to an inorganic composition mainly containing a compound semiconductor, wherein the inorganic composition contains iridium element. The invention also relates to a method of producing an inorganic composite for producing an luminescent material, wherein the method comprises subjecting an inorganic composition mainly containing a compound semiconductor to an explosion by gunpowder and/or explosive in a sealed vessel. An inorganic composite for producing a luminescent material can be prepared by subjecting an inorganic composition to a doping treatment such as explosive treatment or heat-treatment. The inorganic composite can further be heat-treated to produce a luminescent material. The resulting luminescent material can be formed into a layer as a light emitter layer of an inorganic EL device.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: January 4, 2011
    Assignee: Kuraray Co., Ltd.
    Inventors: Tadashi Ueda, Seikoh Yamauchi, Jiro Kanamori, Yoshisada Hayashi
  • Publication number: 20060169944
    Abstract: A semiconductive GaAs wafer has a diameter of 4 inches or more, and an in-wafer plane dislocation density of 30,000/cm2 or more and 100,000/cm2 or less. A semiconductive GaAs wafer is made by growing a GaAs single crystal under a temperature gradient of 20° C./cm or more and 150° C./cm or less formed in the crystal so that the semiconductive GaAs wafer has an in-wafer plane dislocation density of 30,000/cm2 or more and 100,000/cm2 or less.
    Type: Application
    Filed: January 30, 2006
    Publication date: August 3, 2006
    Applicant: Hitachi Cable, Ltd.
    Inventors: Shinji Yabuki, Michinori Wachi, Kouji Daihou
  • Patent number: 6277297
    Abstract: An optical dome or window formed of a composition which is transmissive to infrared frequencies in the range of from about 1 micron to about 14 microns and which is relatively opaque to substantially all frequencies above about 14 microns consisting essentially of a compound taken from the class consisting of group III-V compounds doped with an element taken from the class consisting of shallow donors and having less than about 1×107 atoms/cc impurities and having less than about 1×1015 parts carbon. The shallow donors are Se, Te and S, preferably Se, with the Se concentration from 5×1015 atoms/cc to 2×1016 atoms/cc. The group III-V compound is preferably GaAs or GaP.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: August 21, 2001
    Assignee: Raytheon Company
    Inventor: Paul Klocek