Abstract: The present invention relates to a preconcentrator for vapors and particles collected from air. The vapor preconcentrator is made from plural layer of coils. The coil is made of resistance alloy. The pitch size of the coil is made to precisely trap/filter out certain size of the particles during preconcentration. Multiple coils could be made with different pitch sizes to achieve multiple step filtrations. When the sample flow enters the preconcentrator chamber, it passes through the coils. The particles of different sizes are trapped on different layer of coils. The vapor sample can be trapped on any coils when interacted with the coil surface. They could be trapped without any affinitive coating as the preconcentrator is at relatively low temperature. Different coils or different sections of the coil can be coated with different material to trap chemicals of different classes.

Abstract: A standing-wave linear accelerator structure has an electron gun; a first cavity axially adjacent to the electron gun, into which electrons are injected directly from the electrode gun; a pancake cavity disposed adjacent to the electron gun on a side of the first cavity opposite the electron gun; and a plurality of accelerating cavities including both on-axis cavities and side-coupled cavities, disposed serially after the at least one pancake cavity, to accelerate electrons injected from the electron gun through a central aperture formed in each of the on-axis cavities. The first cavity and the pancake cavity together form a buncher cavity. The accelerator structure omits the prebuncher and buncher cavities while retaining their functions.

Abstract: The invention relates to charged particle beam generator comprising a charged particle source for generating a charged particle beam, a collimator system comprising a collimator structure with a plurality of collimator electrodes for collimating the charged particle beam, a beam source vacuum chamber comprising the charged particle source, and a generator vacuum chamber comprising the collimator structure and the beam source vacuum chamber within a vacuum, wherein the collimator system is positioned outside the beam source vacuum chamber. Each of the beam source vacuum chamber and the generator vacuum chamber may be provided with a vacuum pump.

Abstract: Illustrative embodiments of the present invention are directed to devices and methods for ion generation. One such device includes a substrate. The substrate is disposed within a housing that is configured to contain a gas. The substrate includes an interior surface that at least partially defines an interior volume. The substrate also includes a number of channels with walls. Nano-tips are disposed on the walls of the channels.

Abstract: The present invention provides a radiation generating tube which suppresses electrical charging of an inner wall of an insulating tube attributable to electron emission from a junction between the insulating tube and a cathode and which has improved voltage withstand capability. The radiation generating tube comprising: a hollow insulating tube; a cathode and an anode respectively bonded to both ends of the insulating tube; and an electron emission source provided on the cathode, the radiation generating tube having a vacuum interior space. The electron emission source includes an electron emitting portion in the interior space, and the insulating tube includes a protrusion that protrudes into the interior space.

Abstract: Devices and methods are provided to allow rapid deflection of a charged particle beam. The disclosed devices can, for example, be used as part of a hadron therapy system to allow scanning of a target area within a patient's body. The disclosed charged particle beam deflectors include a dielectric wall accelerator (DWA) with a hollow center and a dielectric wall that is substantially parallel to a z-axis that runs through the hollow center. The dielectric wall includes one or more deformed high gradient insulators (HGIs) that are configured to produce an electric field with an component in a direction perpendicular to the z-axis. A control component is also provided to establish the electric field component in the direction perpendicular to the z-axis and to control deflection of a charged particle beam in the direction perpendicular to the z-axis as the charged particle beam travels through the hollow center of the DWA.

Abstract: Device for producing an electron beam includes a housing, which delimits a space that is evacuatable and has an electron beam outlet opening; an inlet structured and arranged for feeding process gas into the space; and a planar cathode and an anode, which are arranged in the space, and between which, a glow discharge plasma is producible by an applied electrical voltage. Ions are accelerateable from the glow discharge plasma onto a surface of the cathode and electrons emitted by the cathode are accelerateable into the glow discharge plasma. The cathode includes a first part made of a first material at least on an emission side, which forms a centrally arranged first surface region of the cathode, and a second part made of a second material, which forms a second surface region of the cathode that encloses the first surface region.

Abstract: The present invention provides a corona discharge device, comprising a first electrode including: a first substantially cylindrical inner chamber portion and a second substantially conical inner chamber portion in communication with the first inner chamber portion, wherein the second inner chamber portion has a cross sectional area that gradually enlarges in a direction away from the first inner chamber portion. The present invention also provides an ion mobility spectrometer comprising: an ionization region; and the corona discharge device disposed in the ionization region. With the above construction and structure, the ion mobility spectrometer of the present invention has the advantages that extraction of ions is facilitated and a life time of the corona electrode is lengthened. In addition, the focusing and storing electrode is used to effectively shield interference of a corona discharge pulse, and to push and focus sample ions.

Abstract: An ion transfer arrangement for transporting ions between higher and lower pressure regions of the mass spectrometer comprises an ion transfer conduit 60. The conduit 60 has an inlet opening towards a relatively high pressure chamber 40 and an outlet 70 opening towards a relatively low pressure chamber. The conduit 60 also has at least one side wall surrounding an ion transfer channel 115. The side wall includes a plurality of apertures 140 formed in the longitudinal direction of the side wall so as to permit a flow of gas from within the ion transfer channel 115 to a lower pressure region outside of the side wall of the conduit 60.

Abstract: In an ion implanter, an ion current measurement device is disposed behind a mask co-planarly with respect to a surface of a target substrate as if said target substrate was positioned on a platen. The ion current measurement device is translated across the ion beam. The current of the ion beam directed through a plurality of apertures of the mask is measured using the ion current measurement device. In this manner, the position of the mask with respect to the ion beam as well as the condition of the mask may be determined based on the ion current profile measured by the ion current measurement device.

Abstract: A method of transporting gas and entrained ions between higher and lower pressure regions of a mass spectrometer comprises providing an ion transfer conduit 60 between the higher and lower pressure regions. The ion transfer conduit 60 includes an electrode assembly 300 which defines an ion transfer channel. The electrode assembly 300 has a first set of ring electrodes 305 of a first width D1, and a second set of ring electrodes of a second width D2 (?D1) and interleaved with the first ring electrodes 305. A DC voltage of magnitude V1 and a first polarity is supplied to the first ring electrodes 205 and a DC voltage of magnitude V2 which may be less than or equal to the magnitude of V1 but with an opposed polarity is applied to the second ring electrodes 310. The pressure of the ion transfer conduit 60 is controlled so as to maintain viscous flow of gas and ions within the ion transfer channel.

Abstract: An ion transfer arrangement for transporting ions between higher and lower pressure regions of the mass spectrometer comprises an ion transfer conduit 60. The conduit 60 has an inlet opening towards a relatively high pressure chamber 40 and an outlet 70 opening towards a relatively low pressure chamber. The conduit 60 also has at least one side wall surrounding an ion transfer channel 115. The side wall includes a plurality of apertures 140 formed in the longitudinal direction of the side wall so as to permit a flow of gas from within the ion transfer channel 115 to a lower pressure region outside of the side wall of the conduit 60.

Abstract: A charged particle beam decelerating device includes a high-frequency cavity 34 provided on an orbit of a charged particle beam 1, and a phase synchronizing device 40 for synchronizing the charged particle beam 1 in the high-frequency cavity with a phase of a high-frequency electric field 4. By moving the high-frequency cavity 34 or changing an orbit length of the charged particle beam 1, the charged particle beam in the high-frequency cavity is synchronized with a phase of the high-frequency electric field 4.

Abstract: Techniques for reducing an electrical stress in a acceleration/deceleration system are disclosed. In one particular exemplary embodiment, the techniques may be realized as an acceleration/deceleration system. The acceleration/deceleration system may comprise an acceleration column including a plurality of electrodes having apertures through which a charged particle beam may pass. The acceleration/deceleration system may also comprise a plurality of voltage grading components respectively electrically coupled to the plurality of electrodes. The acceleration/deceleration system may further comprise a plurality of insulated conductors disposed proximate the plurality of voltage grading components to modify an electrical field about the plurality of voltage grading components.

Abstract: An ion transfer arrangement for transporting ions between higher and lower pressure regions of a mass spectrometer includes an electrode assembly (120) with a first plurality of ring electrodes (205) arranged in alternating relation with a second plurality of ring electrodes (210). The first plurality of ring electrodes (205) are narrower than the second plurality of ring electrodes (210) in a longitudinal direction, but the first plurality of ring electrodes have a relatively high magnitude voltage of a first polarity applied to them whereas the second plurality of ring electrodes (210) have a relatively lower magnitude voltage applied to them, of opposing polarity to that applied to the first set of ring electrodes (205). In this manner, ions passing through the ion transfer arrangement experience spatially alternating asymmetric electric fields that tend to focus ions away from the inner surface of the channel wall and towards the channel plane or axis of symmetry.

Abstract: A particle controller is disclosed. In some embodiments, a particle controller includes an input port configured to receive a particle stream and a set of cells configured to form a tube through which at least a portion of the particles comprising the particle stream are directed. In some such cases, each cell in the set of cells comprises at least a portion of a semiconductor die.

Abstract: A Liquid Metal Ion Thruster (LMIT) has a substrate having a plurality of pedestals, one end of the pedestal attached to the substrate, and the opposing end of the pedestal having a tip, the pedestals having grooves and the substrate also having grooves coupled to each other and to a source of liquid metal. An extractor electrode positioned parallel to the substrate and above the pedestal tips provides an electrostatic extraction field sufficient to accelerate ions from the tips of the pedestals through the extractor electrode. A series of focusing electrodes with matching apertures provides a flow of substantially parallel ion trajectories, and an optional negative ion source provides a charge neutralization to prevent space charge spreading of the exiting accelerated ions. The assembly is suitable for providing thrust for a satellite while maintaining high operating efficiencies.

Abstract: A gas-fed hollow cathode keeper can reduce ion bombardment erosion by expelling gas through the keeper faceplate. The expelled gas effectively creates a high-pressure “shield” around the keeper such that bombarding ions suffer energy-reducing collisions before impacting the keeper. If the bombarding ion energy is reduced enough, the erosion is eliminated since sputtering is a threshold phenomenon.

Abstract: An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.

Abstract: A device for transporting and focusing ions in a low vacuum or atmospheric-pressure region of a mass spectrometer is constructed from a plurality of longitudinally spaced apart electrodes to which oscillatory (e.g., radio-frequency) voltages are applied. In order to create a tapered field that focuses ions to a narrow beam near the device exit, the inter-electrode spacing or the oscillatory voltage amplitude is increased in the direction of ion travel.

Abstract: An ion implanting apparatus is provided. The ion implanting apparatus includes a beam scanner, a beam collimator and a unipotential lens which is disposed between said beam scanner and said beam collimator, and which includes first, second, third, and fourth electrodes arranged in an ion beam traveling direction while forming first, second, and third gaps, said first and fourth electrodes being electrically grounded, wherein positions of centers of curvature of said first and third gaps of said unipotential lens coincide with a position of a scan center of said beam scanner, and wherein a position of a center of curvature of said second gap of said unipotential lens is shifted from the position of the scan center of said beam scanner toward a downstream or upstream side in the ion beam traveling direction.

Abstract: A linac system having at least two linac structures configured to operate with a resonant coupler. The linac structures and the resonant coupler resonate at the same frequency, are in close proximity, and designed for a relative phase of 0° or 180°. The coupling between the resonant coupler and the linac structures is achieved by slots between the linac structures and the resonant coupler, which allow the magnetic fields of the linac structures to interact with the magnetic field of the resonant coupler. The relative size of the slots determines the relative amplitude of the fields in the linac structures. There are three modes of oscillation, a 0 mode, wherein the linac structures and the resonant coupler are excited in phase, a ?/2 mode, wherein the linac structures are excited out of phase and the resonant coupler is nominally unexcited, and the ? mode, wherein the linac structures and the resonator coupler are excited out of phase.

Abstract: Auxiliary electrodes for creating drag fields may be provided as arrays of finger electrodes on thin substrates such as printed circuit board material for insertion between main RF electrodes of a multipole. A progressive range of voltages can be applied along lengths of the auxiliary electrodes by implementing a voltage divider that utilizes static resisters interconnecting individual finger electrodes of the arrays. Dynamic voltage variations may be applied to individual finger electrodes or to groups of the finger electrodes.

Abstract: Conventional power supplies that actify the grids of electric rockets use an output capacitor to smooth the output DC voltage signal. Large capacitors tend to store a great amount of energy. Arcing acts to transfer this energy to create a well or pit on an accelerator grid of the electric rockets that may eventually cause repeating arcing or perforation on the accelerator grid. Various embodiments of the present invention eliminate or reduce the need to use an output capacitor. Additionally, various embodiments of the present invention use multiple phases of an input signal into the power supply to cause the output DC voltage signal to be substantially smooth.

Abstract: An apparatus and/or method for controlling an ion beam may be provided, and/or a method for preparing an extraction electrode for the same may be provided. In the apparatus, a plurality of extraction electrodes may be disposed in a path of an ion beam. At least one extraction electrode may include a plurality of sub-grids.

Abstract: A focused ion source based on a Hall thruster with closed loop electron drift and a narrow acceleration zone is disclosed. The ion source of the invention has an ion focusing system consisting of two parts. The first part is a ballistic focusing system in which the aperture through which the beam exits the discharge channel is tilted. The second is a magnetic focusing system which focuses the ion beam exiting the discharge channel by canceling a divergent magnetic field present at the aperture through which the beam exits the discharge channel. The ion source of the invention also has an in-line hollow cathode capable of forming a self-sustaining discharge. The invention further reduces substrate contamination, while increasing the processing rate. Further the configuration disclosed allows the ion source to operate at lower operational gas pressures.

Abstract: An improved air-breathing electrostatic ion thruster specially configured for use in low-Earth atmosphere comprises a housing having an electrically conductive inner surface defining an ionization chamber. Ambient atmospheric gas passes through a forward screen electrode at the chamber inlet to be ionized by an inner electrode disposed in the chamber. The ions are directed rearward through the aligned apertures of a rearward screen electrode and an accelerator electrode at the chamber outlet to generate thrust. A source of electrical power, which can be solar cells, a battery and/or a generator, provides current of a first polarity to the inner surface, forward screen electrode and rearward screen electrode and current of a second polarity to the inner electrode and accelerator electrode. A controller controls the amount and/or polarity of the current. Magnets disposed about the chamber improve ionization. A neutralizing mechanism near the chamber outlet keeps the ion thruster electrically neutral.

Abstract: An ion beam apparatus includes a plasma chamber with a grid assembly installed at one end of the plasma chamber and a plasma sheath controller disposed between the plasma chamber and the grid assembly. The grid assembly includes first ion extraction apertures. The plasma sheath controller includes second ion extraction apertures smaller than the first ion extraction apertures. When the plasma sheath controller is used in this configuration, the surface of the plasma takes on a more planar configuration adjacent the controller so that ions, extracted from the plasma in a perpendicular direction to the plasma surface, pass cleanly through the apertures of the grid assembly rather than collide with the sidewalls of the grid assembly apertures. A semiconductor manufacturing apparatus and method for forming an ion beam are also provided.

Abstract: An ion beam blocking component suitable for blocking an ion beam generated by an ion source of an ion implanter is provided. The blocking component includes a front plate, a back plate, and a plurality of side plates. The front plate has at least one opening. The back plate is behind the front plate, and has a plurality of grooves formed on one surface thereof facing the front plate. The side plates are connected between the front plate and the back plate, and a receiving space is formed between these plates.

Abstract: The present invention relates to an apparatus for pre-acceleration of ions and optimized matching of beam parameters used in a heavy ion application comprising a radio frequency quadruple accelerator (RFQ) having two mini-vane pairs supported by a plurality of alternating stems accelerating the ions from about 8 keV/u to about 400 keV/u and an intertank matching section for matching the parameters of the ion beam coming from the radio frequency quadruple accelerator (RFQ) to the parameters required by a subsequent drift tube linear accelerator (DTL).

Abstract: An ion printer is proposed for simultaneous generation on the spatially fixed substrate of the whole image composed of micron and submicron size elements, containing a fixed substrate with layer of material capable of changing its properties under the ion influence; an ion source with a tool for beam forming, which ensures the divergence angle less than 20°, and with the first tool of acceleration of ions providing them the energy less than the one needed for variation of the properties of the material on the substrate surface. The said ion printer contains also a mask with parallel flat surfaces and with a ratio of its thickness to the distance from the mask to the substrate equals to 1:(0.6–3), correspondingly. The said mask has a plurality of apertures for passing the said accelerated ions, each of the apertures having the ratio of its depth to its cross-section size in the range from 9 to 50.

Abstract: A multi-grid ion beam source has an extraction grid, an acceleration grid, a focus grid, and a shield grid to produce a highly collimated ion beam. A five grid ion beam source is also disclosed having two shield grids. The extraction grid has a high positive potential and covers a plasma chamber containing plasma. The acceleration grid has a non-positive potential. The focus grid is positioned between the acceleration grid and the shield grid. The combination of the extraction grid and the acceleration grid extracts ions from the plasma. The focus grid acts to change momentum of the ions exiting the acceleration grid, focusing the ions into a more collimated ion beam than previous approaches. In one embodiment, the focus grid has a large positive potential. In another embodiment, the focus grid has a large negative potential.

Abstract: An electron beam gun comprises a beam waveguide and an accelerating anode fixed thereto. The accelerating anode is connected with the aid of high-voltage insulators and through a cathode plate to a cathode assembly. The cathode assembly comprises a linear hot cathode fixed with the aid of two cathode carriers and a focussing electrode which is coaxially arranged with respect to the linear hot cathode and encompasses it with the aid of a two-sided surface. The beam waveguide is separated from the accelerating anode with the aid of rack panels which rigidly fix the accelerating anode to the beam waveguide in such a way that a space is formed therebetween. In order to hermetically separate cathode and anode parts of the projector, the accelerating anode is provided with a plate rigidly connected thereto.

Abstract: The invention relates to the field of gaseous-discharge high-vacuum apparatuses. The engineering effect attainable thereby consists in improving the efficiency of extracting the electron beam as well as the gas and power efficiency. The disclosed plasma electron source comprises inner and outer pole pieces made as bodies of revolution having central holes, with a magentomotive force source arranged between them, and comprises also, placed in a sealed housing, an arc diaphragmed hollow cathode with a gas feed device as well as, installed between and in line with the coaxial outlets of the cathode and housing, intermediate and main anodes made as bodies of revolution having central holes. The intermediate anode, the inner pole piece, an annular header, the main anode and the outer pole piece are installed successively between the outlets of the cathode and housing.

Abstract: An emitter of a Ga liquid metal ion source is constituted to include W12 of a base material and Ga9 of an ion source element covering a surface as construction materials. By making back-sputtered particles become elements (W and Ga) of the Ga liquid metal ion source, if back-sputtered particles attach to the Ga liquid metal ion source, contamination which may change physical characteristics of Ga9 does not occur. A W aperture is used as a beam limiting (GUN) aperture to place Ga of approx. 25 mg (of melting point of 30° C.) on a surface of a portion included in a beam emission region (Ga store). When emitting ions to the beam limiting (GUN) aperture, Ga in the emission region melts and diffuses on a surface of the beam emission region of the W aperture.

Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

Abstract: A charged species source and a charged species drain are provided. A moveable component is positioned proximate to the charged species source and the charged species drain. A first protrusion and a second protrusion are provided in contact with the moveable component, wherein at least one of the moveable component, the first protrusion and the second protrusion have a size of a micrometer scale or smaller. The moveable component is moved relative to the charged species source and the charged species drain to transfer electrical charge between the source and the drain.

Abstract: A voltage tracking system for an ion thruster includes a discharge chamber, a screen grid, an accelerator grid, and an accelerator grid voltage controller. The discharge chamber contains plasma at a given potential. The screen grid is adjacent to the discharge chamber and is voltage biased relative to the plasma to form a plasma sheath that repels electrons and attracts ions from the discharge chamber plasma. The accelerator grid is adjacent to the screen grid and has a voltage for accelerating the ions to create thrust and prevent any electrons from backstreaming into the ion thruster from the beam plasma. The accelerator grid voltage controller supplies voltage to the accelerator grid. The accelerator grid voltage controller adjusts the magnitude of the accelerator grid voltage to minimize the amount of voltage required to prevent electron backstreaming into the ion thruster.

Abstract: In accordance with one specific embodiment of the present invention, the ion optics for use with an ion source have a plurality of electrically conductive grids that are mutually spaced apart and have mutually aligned respective pluralities of apertures through which ions may be accelerated and wherein each grid has an integral peripheral portion. A plurality of moment means are applied to a circumferentially distributed plurality of locations on the peripheral portion of each grid, which is initially flat, thereby establishing an annular segment of a cone as the approximate shape for that peripheral portion and a segment of a sphere as the approximate dished shape for the grid as a whole. The plurality of grids have conformal shapes in that the direction of deformation and the approximate spherical radii are the same.

Abstract: A closed loop exit hole is formed in a magnetically permeable end wall (2) of an enclosure (1) of a closed electron drift ion source. Parts of this end wall separated by the exit hole serve as pole pieces (7 and 8) of the magnetic system and define the first pole gap. The magnetic system includes pole pieces (9 and 10), which define the second pole gap made in the form of a closed loop exit hole and arranged along the direction of ion emission. Magnetomotive force sources (5 and 6) are located in space between two groups of magnetic terminals. The ratio of width of each pole gap and distance between pole pieces of the first (7 and 8) and second (9 and 10) magnetic gaps along the direction of ion emission is not less than 0.05. The invention allows the intensity of the generated ion beam and the energy of ions to be increased, and this is provided by the homogeneous distribution of ion current density across the ion beam section.

Abstract: A method and an apparatus for measuring an inclination angle of an ion beam when ions are implanted into a semiconductor wafer include an ion current measuring section having a Faraday cup assembly which is rotatably installed, an angle varying section for adjusting an alignment angle of the Faraday cup assembly, and an inclination angle measuring section for measuring the inclination angle of the ion beam based on a variation of the ion current caused by a variation of the alignment angle of the Faraday cup assembly. By measuring the inclination angle of the ion beam, the incident angle of the ion beam, which is incident into the wafer during the ion implantation process, can be precisely adjusted to a predetermined critical angle. Accordingly, the channeling effect and shadow effect can be effectively prevented. The amount of the ions included in the ion beam can be precisely measured, so the amount of ions implanted into the wafer can be precisely adjusted.

Abstract: A method of constructing an ion mirror having an axial axis which includes arranging electrode plate elements in parallel alignment along the axial axis and attaching a rigid structure to all of the electrode plate elements with adhesive, thereby fixing the electrode plate elements in their respective axial positions and parallel alignment. In an embodiment of the method, the electrode plate elements are arranged in parallel alignment by turning the electrode plate elements from a single workpiece. In an alternative embodiment, the electron plate elements are arranged in parallel alignment by stacking the electrode plate elements using precisely dimensioned spacers, and the spacers are then removed after attachment of the rigid structure.

Abstract: Apparatuses, devices, systems and methods employing a material or combination of materials capable of emitting both far infared radiation and negative ions are provided. The material at least include a first part of, for example, a bio-ceramic, and a second part that includes an additional oxide material. The material can be used in a variety of different applications including, for example, internal engine combustion, natural gas combustion, water purification or the like.

Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

Abstract: Methods and apparatus are provided for ion implantation of a workpiece. The apparatus includes an ion beam generator for generating an ion beam, a deflection device for deflecting the ion beam to produce a deflected ion beam, and a drive device for rotating the deflection device about an axis of rotation to thereby cause the deflected ion beam to rotate about the axis of rotation and to produce a rotating ion beam. The apparatus may include a controller for controlling the deflection and/or the rotation of the ion beam to produce a desired distribution of the ion beam over the surface of the workpiece. The apparatus may further include an angle compensation device for causing the rotating ion beam to have a substantially constant angle of incidence on the workpiece.

Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

Abstract: An oxygen ion containing plasma is generated using a hot filament ion source. The oxygen ions in the plasma come from an oxide source (e.g., a metal oxide) which has a lower free energy of formation than that of the filament metal oxide (e.g., WO3) at the operating temperatures of the ion source. Consequently, oxidation of the filament and other metal components of the arc chamber is limited, or even prevented. Thus, the invention can advantageously lead to longer filament lives as compared to certain conventional processes that generate oxygen plasmas using hot filament sources.

Abstract: An integrated RF amplifier and resonator is provided for use with an ion accelerator. The amplifier includes an output substantially directly coupled with a resonator coil. The amplifier output may be coupled capacitively or inductively. In addition, an apparatus is provided for accelerating ions in an ion implanter. The apparatus comprises an amplifier with an RF output, a tank circuit with a coil substantially directly coupled to the RF output of the amplifier, and an electrode connected to the coil for accelerating ions. Also provided is a method for coupling an RF amplifier with a resonator in an ion accelerator. The method comprises connecting the RF output of the amplifier to a coupler, and locating the coupler proximate the coil, thereby substantially directly coupling the RF output of the amplifier with the resonator coil.

Abstract: A charged particle apparatus, with multiple electrically conducting semispheric grid electrodes, the grid electrodes mounted in a dielectric mounting ring, with hidden areas or regions to maintain electrical isolation between the grid electrodes as sputter deposits form on the grid electrodes and mounting ring. The grid electrodes are mounted to the mounting ring with slots and fastening pins that allow sliding thermal expansion and contraction between the grid electrodes and mounting ring while substantially maintaining alignment of grid openings and spacing between the grid electrodes. Asymmetric fastening pins facilitate the sliding thermal expansion while restraining the grid electrodes. Electrical contactors supply and maintain electrical potentials of the grid electrodes with spring loaded sliding contacts, without substantially affecting the thermal characteristics of the grid electrodes.

Abstract: Disclosed is an electron beam irradiating apparatus including an electron beam source; an accelerating unit for accelerating electrons emitted from the electron beam source; a deflecting unit for deflecting a highly energized electron beam generated by the accelerating unit in a scanning direction; a vacuum vessel accommodating the electron beam source, the accelerating unit, and the deflecting unit in a vacuum environment; a window foil for ejecting the electron beam from the vacuum environment into a gas environment; a crosspiece for adhering to and supporting the window foil; and a cooling block for shielding the crosspiece from the electron beam in areas that the electron beam intersects the crosspiece.