Means For Deflecting Or Focusing Patents (Class 313/361.1)
  • Patent number: 11905937
    Abstract: A magnetic pole structure for a Hall thruster is provided. The magnetic pole structure includes: multiple wide-envelope outer magnetic pole components, a magnetic bridge, a pagoda-shaped inner magnetic pole component, a top plate, and a bottom plate, where the multiple wide-envelope outer magnetic pole components are arranged on an outer edge of the Hall thruster, symmetrical about the pagoda-shaped inner magnetic pole component, and enclose a semi-open structure; the magnetic bridge is located between each of the wide-envelope outer magnetic pole components and the pagoda-shaped inner magnetic pole component; the bottom plate is attached to a bottom part of each of the wide-envelope outer magnetic pole components and a bottom part of the pagoda-shaped inner magnetic pole component; and the top plate is attached to an upper part of each of the wide-envelope outer magnetic pole components.
    Type: Grant
    Filed: November 15, 2021
    Date of Patent: February 20, 2024
    Assignee: SHANGHAI INSTITUTE OF SPACE PROPULSION
    Inventors: Zhen Zhao, Jiabing Cheng, Xiaolu Kang, Yanan Wang, Leichao Tian, Zhiyuan Zhang, Qingqing Jia, Caixia Qiao, Guanrong Hang
  • Patent number: 11682538
    Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.
    Type: Grant
    Filed: November 22, 2021
    Date of Patent: June 20, 2023
    Assignee: ASML Netherlands B.V.
    Inventors: Jian Zhang, Zhiwen Kang, Yixiang Wang
  • Patent number: 10723489
    Abstract: A low-power Hall thruster gains significantly improved efficiency by a combination of features, including a single piece, h-shaped magnetic screen which enables a more efficient internal volume utilization as well as optimal magnetic shielding; an internally mounted cathode with varying diameter further decreases the footprint of the thruster; an anode with multiple baffles connected by axially oriented holes generates a highly azimuthally uniform propellant flow.
    Type: Grant
    Filed: November 29, 2018
    Date of Patent: July 28, 2020
    Assignee: CALIFORNIA INSTITUTE OF TECHNOLOGY
    Inventors: Ryan W Conversano, Dan M Goebel, Ira Katz, Richard R Hofer
  • Patent number: 10714307
    Abstract: An imaging system utilizing atomic atoms is provided. The system may include a neutral atom source configured to generate a beam of neutral atoms. The system may also include an ionizer configured to collect neutral atoms scattered from the surface of a sample. The ionizer may also be configured to ionize the collected neutral atoms. The system may also include a selector configured to receive ions from the ionizer and selectively filter received ions. The system may also include one or more optical elements configured to direct selected ions to a detector. The detector may be configured to generate one or more images of the surface of the sample based on the received ions.
    Type: Grant
    Filed: September 25, 2018
    Date of Patent: July 14, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Ilya Bezel, Eugene Shifrin, Gildardo Delgado, Rudy F. Garcia
  • Patent number: 9887060
    Abstract: The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The ion source chamber is constructed of a ceramic material having very low electrical conductivity. An electrically conductive liner may be inserted into the ion source chamber and may cover three sides of the ion source chamber. The liner may be electrically connected to the faceplate, which contains the extraction aperture. The electrical connections for the cathode and repeller pass through apertures in the ceramic material. In this way, the apertures may be made smaller than otherwise possible as there is no risk of arcing. In certain embodiments, the electrical connections are molded into the ion source chamber or are press fit in the apertures. Further, the ceramic material used for the ion source chamber is more durable and introduces less contaminants to the extracted ion beam.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: February 6, 2018
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Craig R. Chaney, Neil J. Bassom
  • Patent number: 9856862
    Abstract: A propulsion system for spacecraft is based on an electric engine that expels propellant to achieve thrust. The propellant is first ionized to generate a plasma. Plasma particles are selectively accelerated via a pulsed laser that accelerates predominantly the electrons in the plasma. The electrons are expelled first, forming a space charge that acts as a virtual cathode to accelerate the positive ions. Interactions between the laser beam and plasma electrons are predominantly through the ponderomotive force.
    Type: Grant
    Filed: March 13, 2014
    Date of Patent: January 2, 2018
    Inventor: Wesley Gordon Faler
  • Patent number: 9847740
    Abstract: A high-voltage electrostatic generator has an assembly of concentric electrically conductive half-shells separated by an equatorial gap, essentially with cylindrical symmetry about an axis. Adjacent to the equatorial gap, edge regions of at least a selected subset of the half-shells are shaped.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: December 19, 2017
    Assignee: Siemens Aktiengesellschaft
    Inventors: Peter Simon Aptaker, Paul Beasley, Oliver Heid
  • Patent number: 9741522
    Abstract: The IHC ion source comprises an ion source chamber having a cathode and a repeller on opposite ends. The ion source chamber is constructed of a ceramic material having very low electrical conductivity. An electrically conductive liner may be inserted into the ion source chamber and may cover three sides of the ion source chamber. The liner may be electrically connected to the faceplate, which contains the extraction aperture. The electrical connections for the cathode and repeller pass through apertures in the ceramic material. In this way, the apertures may be made smaller than otherwise possible as there is no risk of arcing. In certain embodiments, the electrical connections are molded into the ion source chamber or are press fit in the apertures. Further, the ceramic material used for the ion source chamber is more durable and introduces less contaminants to the extracted ion beam.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: August 22, 2017
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Craig R. Chaney, Neil J. Bassom
  • Patent number: 9494142
    Abstract: A steerable-thrust Hall effect thruster in which a final stage of a magnetic circuit includes an inner pole and a facing outer pole, the inner pole being offset axially downstream relative to the outer pole, so that a magnetic field is inclined relative to a transverse plane of the thruster.
    Type: Grant
    Filed: November 19, 2012
    Date of Patent: November 15, 2016
    Assignee: SNECMA
    Inventors: Frederic Raphael Jean Marchandise, Anthony Claude Bernard Lorand, Vanessa Marjorie Vial
  • Patent number: 9461218
    Abstract: In at least one embodiment, a surface light source includes one or a more optoelectronic semiconductor chips having a radiation main side for generating a primary radiation. A scattering body is disposed downstream of the radiation main side along a main emission direction of the semiconductor chips. The scatting body is designed for scattering the primary radiation. A main emission direction of the scattering body is oriented obliquely with respect to the main emission direction of the semiconductor chip.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: October 4, 2016
    Assignee: OSRAM Opto Semiconductors GmbH
    Inventors: Stefan Illek, Matthias Sabathil, Alexander Linkov, Thomas Bleicher, Norwin von Malm, Wolfgang Mönch
  • Patent number: 9335450
    Abstract: An optical element includes a lens and a light diffusion layer formed on the lens. The lens includes a light incident face and a light emerging face. The light emerging face includes a concave face opposite to the light incident face and a convex face surrounding the concave face. The convex face is covered by the light diffusion layer. The concave face is exposed outside the light diffusion layer. A method for manufacturing the optical element is also disclosed.
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: May 10, 2016
    Assignee: HON HAI PRECISION INDUSTRY CO., LTD.
    Inventors: Chau-Jin Hu, Jia-Ming Wang, Chun-Yu Lin
  • Patent number: 9184037
    Abstract: A mass spectrometer including a sample attaching member of attaching a sample, an ionizing chamber including an introductory port of the sample attaching member and an ionization source of generating a sample ion, a vacuumed chamber having a mass analyzer of analyzing the sample ion, and an opening/closing mechanism provided between the ionizing chamber and the vacuumed chamber, in which the opening/closing mechanism is controlled from a closed state to an open state after introducing the sample attaching member into the ionizing chamber to thereby enable to perform ionization with inconsiderable fragmentation at a high sensitivity with a high throughput.
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: November 10, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Shun Kumano, Masuyuki Sugiyama, Yuichiro Hashimoto, Hideki Hasegawa, Masuyoshi Yamada, Hidetoshi Morokuma, Shuhei Hashiba
  • Publication number: 20150126797
    Abstract: A method for packetizing a beam-charged particle, in which the particles pass through an electric field in a device is provided. The device includes an annular shaped central electrode which, in the direction of the beam, is arranged between a first outer electrode and a second outer electrode. A time-dependent electric voltage signal is applied to the central electrode, the temporal course thereof being selected such that particles inside the device undergo a position-dependent speed modification. The course of the speed modification is approximately sawtooth-shaped in the direction of the beam. An associated device is also provided.
    Type: Application
    Filed: May 31, 2012
    Publication date: May 7, 2015
    Inventors: Peter Simon Aptaker, Paul Beasley, Oliver Heid
  • Patent number: 8994258
    Abstract: In accordance with one embodiment of the present invention, an end-Hall ion source has an electron emitting cathode, an anode, a reflector, an internal pole piece, an external pole piece, a magnetically permeable path, and a magnetic-field generating means located in the permeable path between the two pole pieces. The anode and reflector are enclosed without contact by a thermally conductive cup that has internal passages through which a cooling fluid can flow. The closed end of the cup is located between the reflector and the internal pole piece and the opposite end of the cup is in direct contact with the external pole piece, and wherein the cup is made of a material having a low microhardness, such as copper or aluminum.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: March 31, 2015
    Assignee: Kaufman & Robinson, Inc.
    Inventors: Harold R. Kaufman, James R. Kahn, Richard E. Nethery
  • Publication number: 20150047079
    Abstract: There is provided an iridium tip including a pyramid structure having one {100} crystal plane as one of a plurality of pyramid surfaces in a sharpened apex portion of a single crystal with <210> orientation. The iridium tip is applied to a gas field ion source or an electron source. The gas field ion source and/or the electron source is applied to a focused ion beam apparatus, an electron microscope, an electron beam applied analysis apparatus, an ion-electron multi-beam apparatus, a scanning probe microscope or a mask repair apparatus.
    Type: Application
    Filed: August 8, 2014
    Publication date: February 12, 2015
    Applicant: Hitachi High-Tech Science Corporation
    Inventors: Tomokazu Kozakai, Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Anto Yasaka, Hiroshi Oba
  • Patent number: 8766523
    Abstract: An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: July 1, 2014
    Assignee: Hitachi Zosen Corporation
    Inventors: Steven R. Walther, Gerald M. Friedman, Michael L. Bufano
  • Patent number: 8736049
    Abstract: Micro-plasma is generated at the tip of a micro-spring by applying a positive voltage to the spring's anchor portion and a negative voltage to an electrode maintained a fixed gap distance from the spring's tip portion. By generating a sufficiently large voltage potential (i.e., as determined by Peek's Law), current crowding at the tip portion of the micro-spring creates an electrical field that sufficiently ionizes neutral molecules in a portion of the air-filled region surrounding the tip portion to generate a micro-plasma event. Ionic wind air currents are generated by producing multiple micro-plasma events using micro-springs disposed in a pattern to produce a pressure differential that causes air movement over the micro-springs. Ionic wind cooling is produced by generating such ionic wind air currents, for example, in the gap region between an IC die and a base substrate disposed in a flip-chip arrangement.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: May 27, 2014
    Assignee: Palo Alto Research Center Incorporated
    Inventors: Bowen Cheng, Dirk DeBruyker, Eugene M. Chow
  • Patent number: 8729491
    Abstract: The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element.
    Type: Grant
    Filed: March 7, 2013
    Date of Patent: May 20, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hideto Dohi, Akira Ikegami, Hideyuki Kazumi
  • Patent number: 8664619
    Abstract: A hybrid electrostatic lens is used to shape and focus an ion beam. The hybrid electrostatic lens comprises an Einzel lens defined by an elongated tube having a first and second ends and a first electrode disposed at the first end and a second electrode disposed at the second end. The elongated tube is configured to receive a voltage bias to create an electric field within the Einzel lens as the ion beam travels through the hybrid electrostatic lens. The hybrid electrostatic lens further includes a quadrupole lens having a first stage and a second stage, where each of the stages is defined by a plurality of electrodes turned 90° with respect to each other to define a pathway in the Z direction through the elongated tube. The Einzel lens focuses the ion beam and the quadrupole lens shapes the ion beam.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: March 4, 2014
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventor: Shengwu Chang
  • Patent number: 8664594
    Abstract: The present disclosure provides an electron beam column with substantially improved resolution and/or throughput for inspecting manufactured substrates. The electron beam column comprises an electron gun, a scanner, an objective lens, and a detector. In accordance with one embodiment, the electron gun includes a gun lens having a flip-up pole piece configuration. In accordance with another embodiment, the scanner comprises a dual scanner having a pre-scanner and a main scanner, and the detector may be configured between the electron gun and the pre-scanner. In accordance with another embodiment, the electron beam column includes a continuously-variable aperture configured to select a beam current. Other embodiments relate to methods of using an electron beam column for automated inspection of manufactured substrates. In one embodiment, for example, an aperture size is adjusted to achieve a minimum spot size given a selected beam current and a column-condition domain being used.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: March 4, 2014
    Assignee: KLA-Tencor Corporation
    Inventors: Xinrong Jiang, Liqun Han, Mohammed Tahmassebpur, Salam Harb, John D. Greene
  • Patent number: 8581484
    Abstract: A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.
    Type: Grant
    Filed: May 14, 2010
    Date of Patent: November 12, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyasu Kaga, Kanehiro Nagao, Motohide Ukiana
  • Publication number: 20130181599
    Abstract: A DC voltage-operated particle accelerator for accelerating a charged particle from a source to a target includes a first electrode arrangement and a separate second electrode arrangement. The first electrode arrangement and the second electrode arrangement are disposed in such a way that the particle successively runs through the first electrode arrangement and the second electrode arrangement. Each of the electrode arrangements is designed as a high-voltage cascade.
    Type: Application
    Filed: May 20, 2011
    Publication date: July 18, 2013
    Inventor: Oliver Heid
  • Patent number: 8471452
    Abstract: An apparatus (200) for accelerating an ion beam comprising: a) a first electrode (202) having a proximal side and a distal side and having at least one aperture (201) therethrough, the wall of the aperture being shaped such that the radius of the aperture on the distal side of the first electrode is greater than that on the proximal side of the electrode; b) a second electrode (204) located such that it is adjacent to but spaced from the distal side of the first electrode and having at least one aperture therethrough; and c) a third electrode (206) located such that it is adjacent to and spaced from the second electrode and having at least one aperture therethrough, said at least one apertures in each electrode being aligned with corresponding apertures in the other electrodes; wherein the electrodes are arranged such that there is a potential difference between the first and second electrodes and a potential difference between the second and third electrodes.
    Type: Grant
    Filed: June 29, 2007
    Date of Patent: June 25, 2013
    Assignee: Nordiko Technical Services Limited
    Inventors: Mervyn Howard Davis, Andrew James Timothy Holmes
  • Patent number: 8471453
    Abstract: The disclosure relates to a Hall-effect ion ejection device that comprises a longitudinal axis substantially parallel to the ion ejection direction, and comprises at least: a main ionization and acceleration annular channel, the annular channel being open at its end; an anode extending inside the channel; a cathode extending outside the channel at the outlet thereof; a magnetic circuit for generating a magnetic field in a portion of the annular channel, said circuit including at least an annular inner wall, an annular outer wall and a bottom connecting the inner and outer annular walls and defining the downstream portion of the magnetic circuit; characterized in that the magnetic circuit is arranged so as to create at the outlet of the annular channel a magnetic field independent from the azimuth.
    Type: Grant
    Filed: August 4, 2008
    Date of Patent: June 25, 2013
    Assignees: Centre National de la Recherche Scientifique (CNRS), Universite de Versailles St Quentin en Yvelines, Centre National d'Etudes Spatiales
    Inventors: Marcel Guyot, Patrice Renaudin, Vladimir Cagan, Claude Boniface
  • Publication number: 20130088150
    Abstract: An ion beam source that emits an ion beam in a direction of a substrate is provided. A cathode with a discharge opening defined therein is included. An anode is also included and spaced apart from the cathode. Ions are set to be emitted in an area proximate to the discharge opening in a direction similar to the direction from the anode to the discharge opening. First and second ceramic walls at least partially define a discharge channel between the anode and the cathode. At least one magnet generates a magnetic field in an area proximate to the discharge opening.
    Type: Application
    Filed: October 10, 2011
    Publication date: April 11, 2013
    Applicant: Guardian Industries Corp.
    Inventor: Maximo FRATI
  • Patent number: 8405044
    Abstract: Embodiments of the invention provide systems and methods for achromatically bending beam of charged particles by about 90° during radiation treatment. A system may include first, second, third, and fourth bending magnets serially arranged along the particle beam path. The first and fourth bending magnets are configured to generate a positive field gradient that defocuses the particle beam in the bend plane. The second and third bending magnets are configured to generate a negative field gradient that focuses the particle beam in the bend plane. The first, second, third, and fourth bending magnets collectively bend the particle beam by about 90°, e.g., by about 22.5° each.
    Type: Grant
    Filed: July 15, 2011
    Date of Patent: March 26, 2013
    Assignee: Accuray Incorporated
    Inventors: Barry A. MacKinnon, Roger H. Miller
  • Patent number: 8399852
    Abstract: The systems and methods described herein relate to the use of electrostatic elements or combinations of electrostatic and magnetic elements to confine charged particles in stable recirculating, trapped orbits. More particularly, the invention relates to systems and methods for acceleration and focusing of multiple charged particle beams having multiple energies and arbitrary polarities along a common axis.
    Type: Grant
    Filed: November 23, 2011
    Date of Patent: March 19, 2013
    Inventors: Alexander Klein, Matthew Wittman, Scott Rackey
  • Patent number: 8382337
    Abstract: A lighting device, a light spreading plate for the lighting device and a method for manufacturing the same are provided. The lighting device comprises a light source plate and the light spreading plate. The light source plate comprises a plurality of light sources. The light spreading plate comprises a light travelling layer formed with a plurality of light spreading units. Each of the light spreading units is formed with a main body being defined with a top surface, a bottom surface and a peripheral. The main body has a thickness being tapered towards the peripheral. The main body comprises a top surface having a cone-shaped recess and a bottom surface having a bowl-shaped recess. The cone-shaped recess and the bowl-shaped recess of each of the spreading units are opposite to each other, and one of the cone-shaped recess and bowl-shaped recess is fitted for one of the light sources.
    Type: Grant
    Filed: September 10, 2010
    Date of Patent: February 26, 2013
    Assignee: Luxingtek, Ltd.
    Inventors: Wen-Chiun Ing, Wei-Hsin Hou, Zhi-Wei Koh, Chi-Jen Kao
  • Patent number: 8339024
    Abstract: An exit window can include an exit window foil, and a support grid contacting and supporting the exit window foil. The support grid can have first and second grids, each having respective first and second grid portions that are positioned in an alignment and thermally isolated from each other. The first and second grid portions can each have a series of apertures that are aligned for allowing the passage of a beam therethrough to reach and pass through the exit window foil. The second grid portion can contact the exit window foil. The first grid portion can mask the second grid portion and the exit window foil from heat caused by the beam striking the first grid portion.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: December 25, 2012
    Assignee: Hitachi Zosen Corporation
    Inventors: Steven R. Walther, Gerald M. Friedman, Michael L. Bufano
  • Publication number: 20120187843
    Abstract: A closed drift ion source is provided comprising a single magnetic source, a first pole and a second pole. The ends of the first and second poles are separated by a gap. The magnetic source is disposed proximate to one of the first pole and second pole. A first magnetic path is provided between one magnetic pole of the single magnetic source and the end of the first pole. A second magnetic path is provided between the other magnetic pole of the single magnetic source and the end of the second pole. The first and second magnetic paths are selectively constructed to produce a symmetrical magnetic field in the gap.
    Type: Application
    Filed: August 3, 2010
    Publication date: July 26, 2012
    Inventor: John E. Madocks
  • Publication number: 20120139407
    Abstract: A device for lighting a room is described. The device has an envelope with a transparent face, the face having an interior surface coated with a cathodoluminescent screen and a thin, reflective, conductive, anode layer. There is a broad-beam electron gun mounted directly to feedthroughs in a base of the envelope with a heated, button-on-hairpin, cathode for emitting electrons in a broad beam towards the anode, and a power supply mounted on the feedthroughs at the base of the envelope that drives the cathode to a multi-kilovolt negative voltage. A two-prong snubber serves as an anode contact to permit the power supply to drive the anode to a voltage near ground. A method of manufacture of the anode uses a single step deposition and lacquering process followed by a metallization using a conical-spiral tungsten filament coated with aluminum by a thermal spray coating process.
    Type: Application
    Filed: March 30, 2010
    Publication date: June 7, 2012
    Applicant: VU1 CORPORATION
    Inventors: Richard Herring, Charles E. Hunt, Bernard K. Vanch, Tomas Hasilik, Viktor Jelinek
  • Patent number: 8193511
    Abstract: A method of calibrating the beam position in a charged-particle beam system starts with finding a focus deviation on the material surface for each point within a deflection field. A focus correction voltage VF necessary to cancel out the focus deviation is determined. A beam position deviation fi per unit focus correction voltage is found. The deflection voltage is corrected so as to cancel out the product fi·VF. The deflection voltage is corrected so as to cancel out the sum of the product fi·VF and the measured deflection field distortion while correcting the focus based on the voltage VF.
    Type: Grant
    Filed: January 9, 2009
    Date of Patent: June 5, 2012
    Assignee: JEOL Ltd.
    Inventor: Kazuya Goto
  • Publication number: 20120126684
    Abstract: A liquid metal ion gun 3 includes a liquid metal ion source 31 and a beam limiting aperture 33. The liquid metal ion source 31 includes a reservoir 36 and an emitter 35. The reservoir 36 is made of tungsten (W) and holds liquid metal gallium (Ga). The emitter 35 is made of W. The beam limiting aperture 33 is formed with a liquid metal member 44 made of Ga placed on a base 46 made of W, has an opening 41 that enables an ion beam 2 extracted from the liquid metal ion source 31 to pass therethrough, and limits the diameter of the ion beam 2. The beam limiting aperture 33 has a groove structure 45 that causes the liquid metal 44 to gather into a region located around the opening 41. The lifetime of the beam limiting aperture can be increased, and an emission can be maintained stable for a long time period and reproducibly restored to a stable state.
    Type: Application
    Filed: May 14, 2010
    Publication date: May 24, 2012
    Inventors: Hiroyasu Kaga, Kanehiro Nagao, Motohide Ukiana
  • Patent number: 8164066
    Abstract: The invention provides a magnetic lens for generating a magnetic imaging field to focus charged particles emitted from a sample, the lens comprising a central pole piece and an outer pole piece disposed about the central pole piece, wherein the lens comprises a magnetic moveable element for movement relative to at least one of the pole pieces, whereby a focal length of the lens is variable by said movement of the magnetic moveable element, thereby enabling a zoom facility for changing the magnification of an image. The movement of the moveable element preferably changes the magnetic circuit between the pole pieces. Also provided is a method of focusing charged particles emitted from a sample and a charged particle energy analyzer, such as an imaging photoelectron spectroscopy system.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: April 24, 2012
    Assignee: VG Systems Limited
    Inventors: Bryan Barnard, Christopher Glenister
  • Patent number: 8159118
    Abstract: An electron gun includes the following: a primary thermionic electron source, a secondary thermionic electron source and a focusing electrode disposed within a first housing that includes one or more reference members adjustably attached to a housing support connected to a first platform; an anode and one or more focusing coils disposed within a second housing comprising one or more insulating members adjustably connected to the first platform; and one or more deflection coils disposed within a third housing connected to the second housing and located opposite said first housing.
    Type: Grant
    Filed: November 2, 2005
    Date of Patent: April 17, 2012
    Assignee: United Technologies Corporation
    Inventors: Viktor A. Tymashov, Oleg L. Zhdanov, Sergiy I. Ryabenko, Andriy A. Tsepkalov, Steven M. Burns
  • Patent number: 8154001
    Abstract: An ion radiation therapy machine provides a steerable beam for treating a tumor within the patient where the exposure spot of the beam is controlled in width and/or length to effect a flexible trade-off between treatment speed, accuracy, and uniformity.
    Type: Grant
    Filed: June 10, 2010
    Date of Patent: April 10, 2012
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Ryan Thomas Flynn, Thomas R. Mackie
  • Patent number: 8138678
    Abstract: A charged particle beam decelerating device includes a high-frequency cavity 34 provided on an orbit of a charged particle beam 1, and a phase synchronizing device 40 for synchronizing the charged particle beam 1 in the high-frequency cavity with a phase of a high-frequency electric field 4. By moving the high-frequency cavity 34 or changing an orbit length of the charged particle beam 1, the charged particle beam in the high-frequency cavity is synchronized with a phase of the high-frequency electric field 4.
    Type: Grant
    Filed: March 18, 2008
    Date of Patent: March 20, 2012
    Assignees: IHI Corporation, The University of Tokyo
    Inventors: Daisuke Ishida, Hiroyuki Nose, Namio Kaneko, Yasuo Sakai, Masashi Yamamoto, Mitsuru Uesaka, Katsuhiro Dobashi, Fumito Sakamoto
  • Patent number: 8134287
    Abstract: An ion source includes a pair of pole elements, at least one shunt element, and at least one magnetic field producing element that produces a magnetic field. A gap is defined between the pole elements of the pair of pole elements. The at least one magnetic field producing element and the at least one shunt element cooperate to define at least a part of a magnetic field conducting circuit that conducts the magnetic field between the pole elements of the pair of pole elements. The pair of pole elements and the at least one shunt element are formed from a material that consists essentially of ferrous metal having an overall carbon content of less than 0.08 percent.
    Type: Grant
    Filed: August 5, 2010
    Date of Patent: March 13, 2012
    Assignee: Mirrage, Ltd.
    Inventor: Ray Price
  • Patent number: 7888653
    Abstract: Techniques for independently controlling deflection, deceleration, and focus of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for independently controlling deflection, deceleration, and focus of an ion beam. The apparatus may comprise an electrode configuration comprising a set of upper electrodes disposed above an ion beam and a set of lower electrodes disposed below the ion beam. The set of upper electrodes and the set of lower electrodes may be positioned symmetrically about a central ray trajectory of the ion beam. A difference in potentials between the set of upper electrodes and the set of lower electrodes may also be varied along the central ray trajectory to reflect an energy of the ion beam at each point along the central ray trajectory for independently controlling deflection, deceleration, and focus of an ion beam.
    Type: Grant
    Filed: January 2, 2009
    Date of Patent: February 15, 2011
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Peter L. Kellerman, Svetlana Radovanov, Frank Sinclair, Victor M. Benveniste
  • Patent number: 7827779
    Abstract: A Liquid Metal Ion Thruster (LMIT) has a substrate having a plurality of pedestals, one end of the pedestal attached to the substrate, and the opposing end of the pedestal having a tip, the pedestals having grooves and the substrate also having grooves coupled to each other and to a source of liquid metal. An extractor electrode positioned parallel to the substrate and above the pedestal tips provides an electrostatic extraction field sufficient to accelerate ions from the tips of the pedestals through the extractor electrode. A series of focusing electrodes with matching apertures provides a flow of substantially parallel ion trajectories, and an optional negative ion source provides a charge neutralization to prevent space charge spreading of the exiting accelerated ions. The assembly is suitable for providing thrust for a satellite while maintaining high operating efficiencies.
    Type: Grant
    Filed: September 10, 2007
    Date of Patent: November 9, 2010
    Assignee: Alameda Applied Sciences Corp.
    Inventors: Mahadevan Krishnan, Kristi Wilson, Kelan Champagne, Jason D. Wright, Andrew N. Gerhan
  • Publication number: 20100276592
    Abstract: A slider bearing for use with an apparatus comprising a vacuum chamber (11).
    Type: Application
    Filed: April 26, 2007
    Publication date: November 4, 2010
    Applicant: FEI COMPANY
    Inventors: Johannes Antonius Hendricus Wilhelmus Gerardus Persoon, Andreas Theodorus Engelen, Siegfried Lichtenegger, Petrus Henricus Joannes Van Dooren
  • Patent number: 7821187
    Abstract: An electron gun of the type having an electron emitter for emitting electrons, including an electrostatic lens and a magnetic lens formed by pole pieces with a winding coil disposed between the magnetic pole pieces. The magnetic lens forms a rotationally symmetrical magnetic field in a gap formed by the pole pieces. The magnetic field forms the magnetic lens and focuses the electrons emitted from the emitter. A vacuum tube separates the electron gun from the magnetic lens. The electron gun is sealed in a vacuum by the vacuum tube and the magnetic lens is shielded in air.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: October 26, 2010
    Assignee: KLA-Tencor Corporation
    Inventors: Xinrong Jiang, Marian Mankos, Liqun Han
  • Patent number: 7807986
    Abstract: An ion implanter and method for adjusting the shape of an ion beam are disclosed. After an ion beam is outputted from an analyzer magnet unit, at least one set of bar magnets is used to adjust the shape of the ion beam when the ion beam passes through a space enclosed by the bar magnets. The set of bar magnets can apply a multi-stage magnetic field on the ion beam. Hence, different portions of the ion beam will have different deformations or alterations, because the multi-stage magnetic field will apply a non-uniform force to change the trajectory of ions. Moreover, each bar magnet of the set is powered by one and only one power source, such that the set of bar magnets essentially only can adjust the magnitude of the multi-stage magnetic field. Particular structures and techniques for achieving the multi-stage magnetic field are not limited.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: October 5, 2010
    Assignee: Advanced Ion Beam Technology, Inc.
    Inventors: Ko-Chuan Jen, York Yang, Zhimin Wan
  • Publication number: 20100244657
    Abstract: The disclosure relates to a Hall-effect ion ejection device that comprises a longitudinal axis substantially parallel to the ion ejection direction, and comprises at least: a main ionization and acceleration annular channel, the annular channel being open at its end; an anode extending inside the channel; a cathode extending outside the channel at the outlet thereof; a magnetic circuit for generating a magnetic field in a portion of the annular channel, said circuit including at least an annular inner wall, an annular outer wall and a bottom connecting the inner and outer annular walls and defining the downstream portion of the magnetic circuit; characterised in that the magnetic circuit is arranged so as to create at the outlet of the annular channel a magnetic field independent from the azimuth.
    Type: Application
    Filed: August 4, 2008
    Publication date: September 30, 2010
    Applicants: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS, UNIVERSITE DE VERSAILLES ST QUENTIN EN YVELINES, CENTRE NATIONAL D'ETUDES SPATIALES
    Inventors: Marcel Guyot, Patrice Renaudin, Vladimir Cagan, Claude Boniface
  • Publication number: 20100207551
    Abstract: A two-beam accelerator device including a drive beam source and an accelerated beam source for providing a drive beam and accelerated beam, a detuned resonant cavity disposed in the path of the drive beam and the accelerated beam, and a two-beam focusing device and method of use thereof. The detuned resonant cavity may be rectangular, square, axisymmetrical, and/or cylindrical. The focusing device may include a modified quadrupole magnet having four magnets, a central opening, a channel in the central opening, an opening in one of the four magnets, the opening having a non-magnetic channel lined with a magnetic material.
    Type: Application
    Filed: January 22, 2010
    Publication date: August 19, 2010
    Applicant: OMEGA P-INC.
    Inventors: S. Y. KAZAKOV, S. V. Kuzikov, Jay L. Hirshfield, Vyachesav Yakovlev, Yong Jiang
  • Patent number: 7763873
    Abstract: An ion radiation therapy machine provides a steerable beam for treating a tumor within the patient where the exposure spot of the beam is controlled in width and/or length to effect a flexible trade-off between treatment speed, accuracy, and uniformity.
    Type: Grant
    Filed: February 27, 2008
    Date of Patent: July 27, 2010
    Assignee: Wisconsin Alumni Research Foundation
    Inventors: Ryan Thomas Flynn, Thomas R. Mackie
  • Patent number: 7759658
    Abstract: An ion implanting apparatus is provided. The ion implanting apparatus includes a beam scanner, a beam collimator and a unipotential lens which is disposed between said beam scanner and said beam collimator, and which includes first, second, third, and fourth electrodes arranged in an ion beam traveling direction while forming first, second, and third gaps, said first and fourth electrodes being electrically grounded, wherein positions of centers of curvature of said first and third gaps of said unipotential lens coincide with a position of a scan center of said beam scanner, and wherein a position of a center of curvature of said second gap of said unipotential lens is shifted from the position of the scan center of said beam scanner toward a downstream or upstream side in the ion beam traveling direction.
    Type: Grant
    Filed: April 6, 2009
    Date of Patent: July 20, 2010
    Assignee: Nissin Ion Equipment Co., Ltd.
    Inventor: Yoshiki Nakashima
  • Patent number: 7705321
    Abstract: A charged particle beam writing apparatus includes a stage on which a target object is placed and which moves in a predetermined direction, a first column configured to irradiate a first charged particle beam on a writing region of the target object, a second column which is located at the back of the first column in the predetermined direction and configured to irradiate a second charged particle beam on the writing region of the target object, and a sensor configured to measure a height level of the target object at any one of a position in front of a position where the first column irradiates the first charged particle beam in the predetermined direction and a position almost immediately under the position where the first charged particle beam is irradiated.
    Type: Grant
    Filed: May 29, 2008
    Date of Patent: April 27, 2010
    Assignee: NuFlare Technology, Inc.
    Inventor: Takayuki Abe
  • Patent number: 7622721
    Abstract: A focused ion source based on a Hall thruster with closed loop electron drift and a narrow acceleration zone is disclosed. The ion source of the invention has an ion focusing system consisting of two parts. The first part is a ballistic focusing system in which the aperture through which the beam exits the discharge channel is tilted. The second is a magnetic focusing system which focuses the ion beam exiting the discharge channel by canceling a divergent magnetic field present at the aperture through which the beam exits the discharge channel. The ion source of the invention also has an in-line hollow cathode capable of forming a self-sustaining discharge. The invention further reduces substrate contamination, while increasing the processing rate. Further the configuration disclosed allows the ion source to operate at lower operational gas pressures.
    Type: Grant
    Filed: February 9, 2007
    Date of Patent: November 24, 2009
    Inventors: Michael Gutkin, Alexander Bizyukov, Vladimir Sleptsov, Ivan Bizyukov, Konstantin Sereda
  • Publication number: 20090273284
    Abstract: A closed drift Hall Current accelerator with a split solenoid Hall field, a radial injection collimated gas source, an anode, intermediate Hall effect ionization magnetic field structures and intermediate acceleration electrodes, for injection of ions into the solenoid field. The Hall Effect field in this case is in the gap of the return field of the split solenoid magnetic field.
    Type: Application
    Filed: May 1, 2008
    Publication date: November 5, 2009
    Inventor: Mark Edward Morehouse