Focal Position Of Light Source Patents (Class 356/123)
  • Patent number: 11892706
    Abstract: An observation device captures images at focal positions inside a sample container with an optical system that includes an objective lens; an objective lens actuator; an irradiation unit; a reflection light intensity detector; a focus controller that positions the focal point of the objective lens on a reflection surface imparting a peak in the reflected light intensity; and a counting unit. The focus control unit drives the objective lens actuator and positions the focal point on a reflection surface when a peak is detected in the reflected light intensity; and the counting unit counts the reflection surface when the focus control unit has positioned the focal point on the reflection surface. The computation unit determines whether or not the focal point is positioned at the focal position, and causes the optical system to capture images if the focal point is positioned at the focal position.
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: February 6, 2024
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Akira Masuya, Tadao Yabuhara, Hiroko Fujita
  • Patent number: 11850793
    Abstract: Aspects described herein relate to additive manufacturing systems and related methods. In some embodiments, an additive manufacturing system includes a laser array position detector to determine a position and/or orientation of laser energy pixels in a laser array. The laser array position detector may include an aperture and an optical sensor positioned within the aperture to detect laser energy from a laser energy pixel when the laser array is scanned across the aperture.
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: December 26, 2023
    Assignee: VulcanForms Inc.
    Inventor: Matthew Sweetland
  • Patent number: 11774740
    Abstract: An apparatus is provided for monitoring a focal state of a microscope having an object plane and a main imaging area. The apparatus has an auxiliary light source providing an auxiliary light beam and coupling the auxiliary light beam into the microscope in such a way that the coupled auxiliary light beam runs within a plane which is spanned outside of the main imaging area by a straight line running in the object plane and a normal to the object plane, and that the coupled auxiliary light beam is inclined at an angle to a normal to the object plane. A part of the coupled auxiliary light beam reflected by a reference boundary surface in the microscope impinges on a registration device in an area of incidence. The registration device registers position changes of the area of incidence on the registration device.
    Type: Grant
    Filed: May 22, 2020
    Date of Patent: October 3, 2023
    Assignee: ABBERIOR INSTRUMENTS GMBH
    Inventors: Joachim Fischer, Matthias Henrich, Winfried Willemer
  • Patent number: 11747363
    Abstract: Described are various configurations for performing efficient optical and electrical testing of an opto-electrical device using a compact opto-electrical probe. The compact opto-electrical probe can include electrical contacts arranged for a given electrical contact layout of the opto-electrical device, and optical interface with a window in a probe core that transmits light from the opto-electrical device. An adjustable optical coupler of the probe can be mechanically positioned to receive light from the device's emitter to perform simultaneous optical and electrical analysis of the device.
    Type: Grant
    Filed: December 16, 2021
    Date of Patent: September 5, 2023
    Assignee: OpenLight Photonics, Inc.
    Inventors: Molly Piels, Anand Ramaswamy, Brandon Gomez
  • Patent number: 11592385
    Abstract: According to one embodiment, a monitoring device includes a detector unit including an image transfer element comprising an incident surface which allows light to enter from a light-transmissive base material on which a microbody is placed and an emission surface which emits the light entering from the incident surface, which transfers two-dimensional image data of the microbody to a semiconductor optical sensor, and the semiconductor optical sensor which receives light from the emission surface.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: February 28, 2023
    Assignee: CYTORONIX INC.
    Inventors: Kaita Imai, Shouhei Kousai, Michihiko Nishigaki
  • Patent number: 11561163
    Abstract: According to one embodiment, a monitoring device includes a detector unit including an image transfer element comprising an incident surface which allows light to enter from a light-transmissive base material on which a microbody is placed and an emission surface which emits the light entering from the incident surface, which transfers two-dimensional image data of the microbody to a semiconductor optical sensor, and the semiconductor optical sensor which receives light from the emission surface.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: January 24, 2023
    Assignee: CYTORONIX INC.
    Inventors: Kaita Imai, Shouhei Kousai, Michihiko Nishigaki
  • Patent number: 11512946
    Abstract: The disclosure provides an improvement to digital fringe projection techniques in which the optimal focal length settings are automatically determined for reconstructing a 3D profile. In a pre-calibration phase, geometric parameters of the system are calibrated using a few discrete focal length settings. These discretely calibrated geometric parameters are fitted onto a continuous function model. In a 3D autofocusing phase, a set of optimal focal length settings for a scene are determined using a 2D autofocusing technique. Calibrated geometric parameters for each optimal focal length setting are automatically calculated using the continuous geometric parameter model. Finally, a 3D profile of objects in the scene is reconstructed using the calibrated geometric parameters for each optimal focal length setting.
    Type: Grant
    Filed: January 27, 2021
    Date of Patent: November 29, 2022
    Assignee: Purdue Research Foundation
    Inventors: Song Zhang, Xiaowei Hu, Guijin Wang
  • Patent number: 11355375
    Abstract: A metrology system and metrology methods are disclosed. The metrology system comprises a set of device features on a first layer of a sample, a first set of target features on a second layer of the sample and overlapping the set of device features, and a second set of target features on the second layer of the sample and overlapping the set of device features. Relative positions of a first set of Moiré fringes and a second set of Moiré fringes indicate overlay error between the first layer of the sample and the second layer of the sample.
    Type: Grant
    Filed: July 16, 2020
    Date of Patent: June 7, 2022
    Assignee: KLA Corporation
    Inventors: Roie Volkovich, Liran Yerushalmi, Raviv Yohanan, Mark Ghinovker
  • Patent number: 11256244
    Abstract: Systems and methods for monitoring an operational system. An initial set of sensor data is accumulated from a system over a substantially shorter time than is required to collect data to characterize a regression model for an operating parameter of the system. An initial regression model is created based on the initial set of sensor data. A subsequent set of sensor data is received from the at least one sensor after creating the initial regression model. An expected dependent value for the subsequent independent value is determined using the initial regression model. An operator is prompted to update the initial regression model based on a difference between a subsequent dependent value and the expected dependent value. The initial regression model is updated to incorporate the subsequent set of sensor data. A notification is provided based on a difference between presently received sensor data and the updated regression model.
    Type: Grant
    Filed: February 5, 2018
    Date of Patent: February 22, 2022
    Assignee: Inventus Holdings, LLC
    Inventors: Boris A. Zarate, Sentibaleng M. Ncube, Hooman Yousefizadeh, Yi Li, Donville Smith
  • Patent number: 11092900
    Abstract: A substrate has first and second target structures formed thereon by a lithographic process. Each target structure has two-dimensional periodic structure formed in a single material layer on a substrate using first and second lithographic steps, wherein, in the first target structure, features defined in the second lithographic step are displaced relative to features defined in the first lithographic step by a first bias amount that is close to one half of a spatial period of the features formed in the first lithographic step, and, in the second target structure, features defined in the second lithographic step are displaced relative to features defined in the first lithographic step by a second bias amount close to one half of said spatial period and different to the first bias amount.
    Type: Grant
    Filed: November 6, 2019
    Date of Patent: August 17, 2021
    Assignee: ASML Netherlands B.V.
    Inventors: Maurits Van Der Schaar, Youping Zhang, Hendrik Jan Hidde Smilde, Anagnostis Tsiatmas, Adriaan Johan Van Leest, Alok Verma, Thomas Theeuwes, Hugo Augustinus Joseph Cramer, Paul Christiaan Hinnen
  • Patent number: 10976250
    Abstract: Provided is a position detection method and a position detection device for detecting a position of a sensor chip and obtaining relative positional information between a well member and a prism as for a well chip type sensor chip in which the well member is provided on a prism. By applying measurement light to the sensor chip while changing a distance between the sensor chip and a measurement light irradiation unit and detecting reflected light traveling in a predetermined direction out of the reflected light generated when the measurement light is reflected by the sensor chip, at least any one of the position of the sensor chip and the relative position between a dielectric member and a sample solution holding member is detected on the basis of a change in intensity of the detected reflected light.
    Type: Grant
    Filed: January 16, 2018
    Date of Patent: April 13, 2021
    Assignee: KONICA MINOLTA, INC.
    Inventors: Yukito Nakamura, Takatoshi Kaya, Kosuke Nagae
  • Patent number: 10969562
    Abstract: An observation device, comprising an image sensor that forms images of a specimen and outputs an image signal, an AF detection circuit that calculates evaluation values based on the image signal, and a focus control circuit that controls focus position based on the evaluation values, wherein the AF detection circuit calculates a plurality of evaluation values based on signals relating to a plurality of frequency bands of the image signal, and the focus control circuit controls focus position based on maximum value or minimum value of the plurality of evaluation values.
    Type: Grant
    Filed: October 8, 2018
    Date of Patent: April 6, 2021
    Assignee: Olympus Corporation
    Inventor: Satoshi Takinoiri
  • Patent number: 10830989
    Abstract: An observation device, comprising an AF detection circuit that calculates an evaluation value showing a larger value as degree of focus increases, based on an image signal, and a controller that detects focus position where focus is achieved based on the evaluation value, wherein the controller, when peaks of the evaluation value have been detected for different focus positions, detects a minimum of the evaluation value between focus positions of the plurality of peaks, and in the event that a first difference between a first peak, among the plurality of peaks, and a focus position of the minimum, and a second difference between the minimum and a focus position of a second peak, among the plurality of peaks, are within respective specified ranges, detects a focus position where focus is achieved based on the focus position of the minimum.
    Type: Grant
    Filed: December 3, 2018
    Date of Patent: November 10, 2020
    Assignee: Olympus Corporation
    Inventor: Satoshi Takinoiri
  • Patent number: 10394137
    Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.
    Type: Grant
    Filed: May 1, 2018
    Date of Patent: August 27, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Youri Johannes Laurentius Maria Van Dommelen, Peter David Engblom, Lambertus Gerardus Maria Kessels, Arie Jeffrey Den Boef, Kaustuve Bhattacharyya, Paul Christiaan Hinnen, Marco Johannes Annemarie Pieters
  • Patent number: 10250827
    Abstract: An imaging apparatus has a focus adjustment mechanism based on auto focus adjustment of an imaging plane phase difference scheme. An imaging element has a plurality of micro-lenses and a plurality of photoelectric conversion units corresponding to the micro-lenses and acquires a pupil-divided image signal. An auto focus (AF) signal processing unit and a camera control unit perform shading correction on a image for each pupil division acquired from the imaging element. The recording medium control unit controls an operation of recording a correction value to be used in shading correction in a recording medium when the image signal before correction for each pupil division is recorded in the recording medium.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: April 2, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventor: Reiji Hasegawa
  • Patent number: 9903785
    Abstract: A method of estimating an in-focus level of a target in an image scanning apparatus is provided, wherein the image scanning apparatus comprises a first line scan detector configured to obtain one or more image scan lines of the target and a second line scan detector configured to obtain one or more focus scan lines of the target. The method comprises obtaining at least one image scan line of the target using the first line scan detector, each at least one image scan line being obtained at a respective focus level; obtaining at least one focus scan line of the target using the second line scan detector, each at least one focus scan line being obtained at a respective focus level; calculating at least one focus parameter using at least the at least one focus scan line; and estimating a nominal in-focus level of the target using the calculated focus parameter(s).
    Type: Grant
    Filed: December 27, 2016
    Date of Patent: February 27, 2018
    Assignee: FFEI Limited
    Inventor: Martin Philip Gouch
  • Patent number: 9635243
    Abstract: A ranging apparatus includes: an output ratio data calculation unit for calculating an output ratio data of first and second image data; a correction function calculation unit for calculating a correction function approximating the output ratio data by an N-order function (N being an integer equal to or greater than 1) having a pixel position as a variable; a correction unit for correcting at least one of the first and second image data on the basis of the correction function; and a ranging unit for calculating the defocus amount by using the picture image data corrected by the correction unit.
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: April 25, 2017
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kazuya Nobayashi
  • Patent number: 9519226
    Abstract: System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, a parallel imaging writer system comprises a plurality of spatial light modulator (SLM) imaging units, and a controller configured to control the plurality of SLM imaging units. Each of the plurality of SLM imaging units includes one or more illumination sources, one or more alignment sources, one or more projection lenses, and a plurality of micro mirrors configured to project light from the one or more illumination sources to the corresponding one or more projection lens. The controller synchronizes movements of the plurality of SLM imaging units with movement of a substrate in writing a mask data to the substrate in a lithography manufacturing process.
    Type: Grant
    Filed: March 10, 2014
    Date of Patent: December 13, 2016
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Jang Fung Chen, Thomas Laidig
  • Patent number: 9294668
    Abstract: A ranging apparatus includes: an output ratio data calculation unit for calculating an output ratio data of first and second image data; a correction function calculation unit for calculating a correction function approximating the output ratio data by an N-order function (N being an integer equal to or greater than 1) having a pixel position as a variable; a correction unit for correcting at least one of the first and second image data on the basis of the correction function; and a ranging unit for calculating the defocus amount by using the picture image data corrected by the correction unit.
    Type: Grant
    Filed: September 30, 2014
    Date of Patent: March 22, 2016
    Assignee: Canon Kabushiki Kaisha
    Inventor: Kazuya Nobayashi
  • Patent number: 9074877
    Abstract: A positional deviation detection unit (20) includes a detection portion (21) that detects a relative positional relationship between a laser element (24), a condensing lens (27), and a light emitting portion (3), and a determination portion (22) that compares a detection result from the detection portion (21) with a reference relative positional relationship which is used as a reference for the relative positional relationship, so as to determine whether or not there is a deviation of the relative positional relationship between the laser element (24), the condensing lens (27), and the light emitting portion (3) when the detection portion (21) performs the detection, from the reference relative positional relationship.
    Type: Grant
    Filed: July 23, 2012
    Date of Patent: July 7, 2015
    Assignee: Sharp Kabushiki Kaisha
    Inventors: Rina Sato, Katsuhiko Kishimoto
  • Patent number: 8982331
    Abstract: A condenser lens suitable for a laser rangefinder includes a lens body wherein the lens body is formed with or has attached thereto a deviation correction area that is located on the light emitting side thereof for correcting focus deviation upon reception of light scattered by a close range object. A center of the body is located inside the deviation correction area of the lens. The deviation correction area may include one or more deviation correction zones.
    Type: Grant
    Filed: April 19, 2013
    Date of Patent: March 17, 2015
    Assignee: Chevron (HK) Limited
    Inventors: Ming Chen, Wu Chen
  • Publication number: 20150009491
    Abstract: Systems and methods for facilitating focusing of an image scanner, such as a confocal microscope, are disclosed. Measurement of optical characteristics in certain areas of a test sample are compared to stored or baseline optical characteristic profiles to determine an appropriate correction to properly focus the scanner. In one aspect, the method includes obtaining a dynamic profile at a current detection region of a test sample and associating the dynamic profile to a profile selected from a set of stored baseline profiles. Each of the stored baseline profiles is associated with a correction.
    Type: Application
    Filed: September 19, 2014
    Publication date: January 8, 2015
    Inventor: Wenyi Feng
  • Publication number: 20150002838
    Abstract: Light quantity information of an imaging optical system is acquired according to a focus detection position in an imaging screen. Conversion is performed from the light quantity information and a first aperture value of the imaging optical system, so that the first aperture value is converted into a second aperture value according to the focus detection position. A conversion coefficient is set according to the second aperture value and an exit pupil distance. A correction value to correct output signals from an imaging unit is obtained according to the second aperture value and an exit pupil distance.
    Type: Application
    Filed: June 27, 2014
    Publication date: January 1, 2015
    Inventors: Koichi Fukuda, Yuki Yoshimura
  • Publication number: 20140368635
    Abstract: A focus height sensor in an optical system for inspection of semiconductor devices includes a sensor beam source that emits a beam of electromagnetic radiation. A reflector receives the beam of electromagnetic radiation from the sensor beam source and directs the beam toward a surface of a semiconductor device positioned within a field of view of the optical system. The reflector is positioned to receive at least a portion of the beam back from the surface of the semiconductor device to direct the returned beam to a sensor. The sensor receives the returned beam and outputs a signal correlating to a position of the surface within the field of view along an optical axis of the optical system.
    Type: Application
    Filed: December 20, 2012
    Publication date: December 18, 2014
    Inventors: Dennis L. Ohren, Christopher J. Voges, Andrew E. Rotering
  • Publication number: 20140362368
    Abstract: There is provided a focus detection apparatus including: microlenses; light reception units that receive light which is incident through the microlenses; waveguides that cause light, which is incident to the microlenses at a predetermined angle, to be received by the light reception units and that are provided between the microlenses and the light reception units; and a detection unit that detects focusing output values from the light reception units.
    Type: Application
    Filed: May 29, 2014
    Publication date: December 11, 2014
    Applicant: Sony Corporation
    Inventor: Koji Kikuchi
  • Patent number: 8891077
    Abstract: A wavefront measuring method using a Shack-Hartmann sensor includes the steps of provisionally determining one of a plurality of light receiving elements as a center-of-gravity position in a spot having a light intensity distribution of light condensed on the light receiving element, calculating a distance between the provisionally determined center-of-gravity position and an adjacent center-of-gravity position, setting an area smaller than and inside of a spot that partially overlaps another spot, and setting a spot that does not overlap another spot to the area, calculating a center-of-gravity position for each area, and calculating the wavefront based upon a shift amount between an ideal center-of-gravity position when parallel light enters the micro lens array and the center-of-gravity position of each area.
    Type: Grant
    Filed: August 9, 2013
    Date of Patent: November 18, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventor: Yuuichi Takaie
  • Publication number: 20140168640
    Abstract: A method of estimating an in-focus level of a target in an image scanning apparatus is provided, wherein the image scanning apparatus comprises a first line scan detector configured to obtain one or more image scan lines of the target and a second line scan detector configured to obtain one or more focus scan lines of the target. The method comprises obtaining at least one image scan line of the target using the first line scan detector, each at least one image scan line being obtained at a respective focus level; obtaining at least one focus scan line of the target using the second line scan detector, each at least one focus scan line being obtained at a respective focus level; calculating at least one focus parameter using at least one focus scan line; and estimating a nominal in-focus level of the target using the calculated focus parameter(s).
    Type: Application
    Filed: July 27, 2012
    Publication date: June 19, 2014
    Applicant: FFEI Limited
    Inventor: Martin Philip Gouch
  • Publication number: 20140104600
    Abstract: In order to determine the focus position of a laser beam (60, 60a) in an ophthalmological laser projection system (1), at least one measurement marking (3) applied to a reference area (20) is passed over by means of the laser beam (60, 60a) along a scanning path. A measurement signal created by passing over the measurement marking (3) is captured. Time values from at least one signal edge created in the measurement signal when passing over edges of the measurement marking (3) are determined and the focus position is established on the basis of the time values. By scanning defined measurement markings (3) and establishing time values of signal edges created when edges of the measurement marking (3) are passed over, it is possible to determine the focus position of the laser beam (60, 60a) without focusing movements being required for this during the measurement.
    Type: Application
    Filed: December 20, 2012
    Publication date: April 17, 2014
    Applicant: ZIEMER OPHTHALMIC SYSTEMS AG
    Inventor: Ziemer Ophthalmic Systems AG
  • Patent number: 8687178
    Abstract: A process is proposed for testing a laser device that has been set up to emit pulsed focused laser radiation, the focal position of which is adjustable both in and across the direction of propagation of the laser radiation. The laser device includes a contact element that is transparent to the laser radiation, with an abutment surface for abutment of an object to be machined. Within the scope of the process, a test object that is transparent to the laser radiation at least in a machining region is applied onto the abutment surface of the contact element. Then laser radiation is beamed into the test object bearing against the abutment surface and in the process the focal position is moved in accordance with a predetermined test pattern, in order to generate enduring machining structures in the test object.
    Type: Grant
    Filed: September 30, 2010
    Date of Patent: April 1, 2014
    Assignee: Wavelight GmbH
    Inventors: Thomas Deisinger, Christof Donitzky, Claudia Gorschboth, Richard Heimisch, Olaf Kittelmann, Gerhard Robl, Martin Starigk, Klaus Vogler, Mathias Wölfel
  • Publication number: 20140071438
    Abstract: A method of estimating an in-focus level of a target in an image scanning apparatus, wherein the image scanning apparatus comprises a first line scan detector configured to obtain one or more image scan lines of the target and a second line scan detector configured to obtain one or more focus scan lines of the target, the second line scan detector comprising at least one focus shifting element such that each focus scan line is obtained at respective first and second focus levels, wherein the first focus level is different from the second focus level, the method comprising: obtaining at least one focus scan line of the target using the second line scan detector; obtaining at least one image scan line of the target using the first line scan detector, the image scan line being obtained at a respective third focus level; calculating at least one focus parameter using the at least one focus scan line; and estimating a nominal in-focus level of the target using the at least one focus parameter.
    Type: Application
    Filed: September 6, 2013
    Publication date: March 13, 2014
    Applicant: FFEI Limited
    Inventors: Martin Philip GOUCH, William Roland HAWES
  • Publication number: 20140063491
    Abstract: Boresight and other pointing errors are detected based on a monitor beam formed by diverting a portion of a probe beam. The monitor beam is directed to a position sensitive photodetector, and the optical power received at the position sensitive photodetector is used to estimate or correct such pointing errors.
    Type: Application
    Filed: August 26, 2013
    Publication date: March 6, 2014
    Applicant: Nikon Corporation
    Inventors: Daniel G. Smith, W. Thomas Novak
  • Patent number: 8648906
    Abstract: A method is disclosed for operating a machine vision inspection system to determine a fluorescent imaging height for acquiring a fluorescent image for repeatably determining the location of a feature within the fluorescent material. The height of an exposed workpiece portion exposed outside of the fluorescent material is determined (e.g., using a height sensor or autofocus operations). The determined height is repeatable. The exposed portion has a characteristic height relative to the fluorescent material and/or features located therein. The fluorescent imaging height, which may be inside the fluorescent material, is determined relative to the determined height of the exposed portion. The fluorescent imaging height is determined such that it enhances the detection of the desired feature located within the fluorescent material in the resulting fluorescent image.
    Type: Grant
    Filed: October 13, 2010
    Date of Patent: February 11, 2014
    Assignee: Mitutoyo Corporation
    Inventor: Mark Lawrence Delaney
  • Publication number: 20140027421
    Abstract: In a method for determining the focal point or the beam profile of a laser beam, which can be deflected in the x and y directions by a scanner optic or an x-y-movement unit and can be displaced in the z direction by a focusing optic or a z-movement unit, at a plurality of measurement points in the two-dimensional working field or three-dimensional working space of the laser beam. An aperture diaphragm, followed by a detector, is arranged at each measurement point. At each measurement point, for x-y-focal point or beam profile measurements, the laser beam is moved by the scanner optic or the x-y-movement unit in an x-y-grid over the measurement aperture in the aperture diaphragm, and, at each grid point, the laser power is measured by the detector, the scanner axis of the scanner optic or the x-y-movement unit being stationary. For z-focal point measurements, the laser beam is displaced by the focusing optic or the z-movement unit in the z direction within the measurement aperture in the aperture diaphragm.
    Type: Application
    Filed: September 30, 2013
    Publication date: January 30, 2014
    Applicant: TRUMPF Laser GmbH + KG
    Inventor: Thomas Notheis
  • Patent number: 8629382
    Abstract: An reference light emitted from an LED for auto focus enters a glass cover, on which a sample is adhered to, via a half mirror to an objective lens. The reference light that entered the glass cover is reflected by the boundary surface to be reflected light, and this reflected light enters a dichroic mirror via an objective lens. A part transmits the reflected light and allows the light to enter the camera via the dichroic mirror to the lens. A user rotates a motor-operated mirror while viewing the image of the reference light captured by a camera, so as to shift the reference light image position on the boundary surface.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: January 14, 2014
    Assignee: Nikon Corporation
    Inventor: Ichiro Sase
  • Patent number: 8496879
    Abstract: A cartridge and cartridge system for use in an apparatus for analyzing a sample are provided. The system has a plurality of cartridges for different applications for a multimode instrument. The cartridges are removably engaged with a cartridge support in a “plug-in” format such that one cartridge may be removed from the apparatus and another cartridge may be easily installed. The cartridge support includes a plurality of cartridge positions that receive cartridges concurrently. One of the cartridges is a wavelength-tunable cartridge in which different light sources, excitation filters, and/or emission filters may be selected. Tuning is further accomplished by tilting the excitation or emission filters at desired angles relative to a beam of exciting light or emitted light.
    Type: Grant
    Filed: June 22, 2011
    Date of Patent: July 30, 2013
    Assignee: Molecular Devices, LLC
    Inventor: Josef J. Atzler
  • Patent number: 8441626
    Abstract: An OAOA measurement system uses optical elements to converge incoming light from multiple sources onto an FPA as respective crosshair patterns made from lines which are oblique with respect to the FPA's axes, such that each pattern's location indicates the angular position of its corresponding source. The optical elements are arranged such that each crosshair's center point is at least twice as bright as the lines which form the crosshair's arms. The position of each crosshair is interpolated by defining regions around each arm of one of the crosshairs, determining the points of peak intensity in each row or column within each region, and curve-fitting the points to define each arm. Multiple crosshair patterns are accommodated by assigning a small magnitude value to each pixel of a defined arm, and then repeating the interpolation process for another crosshair.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: May 14, 2013
    Assignee: Teledyne Scientific & Imaging, LLC
    Inventor: Bing Wen
  • Patent number: 8379194
    Abstract: The invention relates to a process and an apparatus for automatic laser focusing. The core concept of the process is the automatable and especially preferably the automated photographing of the focal spot generated during a focus series by camera and a determination of the particular focal spot diameter as well as an evaluation of this data by an interpolated or approximating function that allows a conclusion about the focal spot with the smallest focal spot diameter and thus with the associated optimal focal distance. A series of disadvantages present in the state of the art can be avoided by using the process in accordance with the invention, in particular the great expenditure of time in the determining of the optimal focal distance and the uncertainty in the selection of the optimal focal spot associated with an operator are eliminated in the framework of the photographing of a focus series.
    Type: Grant
    Filed: February 18, 2009
    Date of Patent: February 19, 2013
    Assignee: MTU Aero Engines GmbH
    Inventor: Mark Geisel
  • Patent number: 8289504
    Abstract: A Shack Hartmann (“SH”) wavefront sensor comprising an optical device, such as a wave front dissector including a lenslet array, for transmitting, dissecting and focusing an incoming optical wave, an optical system, including, for example, an optical sensor, for receiving the transmitted incoming optical wave, and a removable kinematic mount for repeatable precision mounting of the optical device to the optical system.
    Type: Grant
    Filed: July 20, 2010
    Date of Patent: October 16, 2012
    Assignee: Thorlabs, Inc.
    Inventors: Alex E. Cable, Egbert Krause, John Taranto
  • Publication number: 20120154794
    Abstract: An OAOA measurement system uses optical elements to converge incoming light from multiple sources onto an FPA as respective crosshair patterns made from lines which are oblique with respect to the FPA's axes, such that each pattern's location indicates the angular position of its corresponding source. The optical elements are arranged such that each crosshair's center point is at least twice as bright as the lines which form the crosshair's arms. The position of each crosshair is interpolated by defining regions around each arm of one of the crosshairs, determining the points of peak intensity in each row or column within each region, and curve-fitting the points to define each arm. Multiple crosshair patterns are accommodated by assigning a small magnitude value to each pixel of a defined arm, and then repeating the interpolation process for another crosshair.
    Type: Application
    Filed: December 17, 2010
    Publication date: June 21, 2012
    Inventor: BING WEN
  • Patent number: 8174686
    Abstract: A focal position determining method determines a focal position of an objective lens focused on an observed target region in a specimen. The focal position determining method includes measuring any one of the focal position of the objective lens at a near point and the focal position of the objective lens at a far point or both so as to determine the focal position of the objective lens focused on the observed target region based on the measured focal position.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: May 8, 2012
    Assignee: Olympus Corporation
    Inventors: Akihiro Namba, Hirobumi Suzuki, Hiroshi Ishiwata
  • Publication number: 20120050723
    Abstract: A system and method provide a dual beam chromatic point sensor (CPS) system operable to simultaneously measure two surface regions. In one embodiment, a single beam CPS optical pen may have a dual beam assembly attached. First and second measurement beams of the system may be positioned on respective first and second surface regions, and both reflect light through a confocal aperture of the dual beam CPS. At least one set of measurements is determined, comprising a first and second measurement arising from the first and second measurement beams, respectively. At least the first surface region may be moved to acquire sets of measurements at various positions. Each measurement may be determined with extremely fine resolution (e.g., at least as fine as 10 nm). The system and method satisfy applications that require such resolution and accuracy without the use of an interferometer or other costly and complex elements.
    Type: Application
    Filed: November 15, 2010
    Publication date: March 1, 2012
    Applicant: MITUTOYO CORPORATION
    Inventors: Casey Edward Emtman, Yong Xie
  • Publication number: 20120050722
    Abstract: A dual beam assembly is provided for attachment to a chromatic confocal point sensor optical pen. The optical pen provides a single source beam having a measurement range R in the absence of the dual beam assembly. The dual beam assembly includes a first reflective element that is positioned in the source beam and divides it into a first measurement beam and a second measurement beam. The dual beam assembly outputs the first and second measurement beams along first and second measurement axes to different workpiece regions and returns workpiece measurement light arising from the first and second measurement beams back to the optical pen. A second reflective element may be included and configured to deflect the second measurement beam along a desired direction. An offset may be provided between the measuring ranges of the first and second measurement beams.
    Type: Application
    Filed: August 26, 2010
    Publication date: March 1, 2012
    Applicant: MITUTOYO CORPORATION
    Inventors: Casey Edward Emtman, Yong Xie
  • Publication number: 20110279812
    Abstract: Provided is a test apparatus that tests a device under test including an optical coupler transmitting optical signals in a direction perpendicular to a device surface. The test apparatus comprises a substrate on which the device under test is to be loaded; an optical transmission path that transmits the optical signals: and a lens section that is provided facing the optical coupler on the substrate and that focuses the optical signals from an end of one of the optical coupler and the optical transmission path to an end of the other.
    Type: Application
    Filed: March 4, 2011
    Publication date: November 17, 2011
    Applicant: ADVANTEST CORPORATION
    Inventor: Shin MASUDA
  • Patent number: 8027813
    Abstract: A system and method of calculating estimated image profiles. The system and method includes providing lens characteristic data and performing simulation calculations for various levels of aberration components using the lens characteristic data. A response surface functional relation is built between selected variables of the lens characteristics, in particular the lens aberration components, and the Image Profile using the simulation calculations. Evaluation is then performed on the arbitrary specified aberration values of a lens in relation to the response surface functional relations to provide a calculated estimate of the Image Profile for the specified aberration values. A machine readable medium and exposure apparatus are also provided.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: September 27, 2011
    Assignee: Nikon Precision, Inc.
    Inventor: Steven Douglas Slonaker
  • Publication number: 20110212389
    Abstract: A focus test reticle for measuring focus information includes an outer pattern. The outer pattern has a line pattern composed of a light shielding film extending in the Y direction, a phase shift portion provided on a side in the +X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the ?X direction of the line pattern and formed to have a line width narrower than the line pattern, a transmitting portion provided on a side in the +X direction of the phase shift portion, and a phase shift portion provided on a side in the ?X direction of the transmitting portion. Focus information of a projection optical system is measured at a high measuring reproducibility and a high measuring efficiency.
    Type: Application
    Filed: November 5, 2010
    Publication date: September 1, 2011
    Applicant: NIKON CORPORATION
    Inventors: Shigeru HIRUKAWA, Shinjiro KONDO
  • Publication number: 20110134416
    Abstract: A focal position detecting apparatus, for detecting a focusing condition and a tilting condition of an object, includes a planar beam generating module, an optical system, an optical sensor and a cylindrical lens. The planar beam generating module generates a planar light beam along a first path. The optical system is disposed on the first path, wherein the planar light beam, reflected by the object, passes through the optical system along a second path. The optical sensor is disposed on the second path. The cylindrical lens is disposed on the second path between the optical system and the optical sensor and an axis of the cylindrical lens is perpendicular to the second path. The planar light beam passes through the optical system and the cylindrical lens along the second path, before it is incident on the optical sensor to form a linear light spot for determining defocusing degree.
    Type: Application
    Filed: February 11, 2010
    Publication date: June 9, 2011
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Shun-Sheng Ke, Meng-Che Tsai, Yang-Cheng Lin, Pin-Hao Hu, Yu-Hsiu Chang
  • Publication number: 20110102774
    Abstract: A focus sensor comprises a confocal sensor. Within the confocal sensor there are a plurality of aperture plates positioned in front of a plurality of detectors. Rather than a conventional pinhole aperture shape there is a central aperture surrounded by a plurality of outer aperture portions.
    Type: Application
    Filed: March 30, 2009
    Publication date: May 5, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Arnold Sinke, Johan Maria Van Boxmeer
  • Publication number: 20110019184
    Abstract: A light receiving device that receives light having passed through an image forming optical system and outputs a light reception signal includes: a light receiving element array formed by arraying a plurality of light receiving elements; a micro-lens array disposed between the image forming optical system and the light receiving element array, which includes a plurality of micro-lenses arrayed in correspondence to the plurality of light receiving elements; and a storage unit that stores position-related information pertaining to a relative positional relationship assumed by the micro-lens array and the light receiving element array with respect to a plane perpendicular to optical axes of the micro-lenses.
    Type: Application
    Filed: October 1, 2008
    Publication date: January 27, 2011
    Applicant: NIKON CORPORATION
    Inventor: Toru Iwane
  • Publication number: 20110007304
    Abstract: The invention relates to a process and an apparatus for automatic laser focusing. The core concept of the process is the automatable and especially preferably the automated photographing of the focal spot generated during a focus series by camera and a determination of the particular focal spot diameter as well as an evaluation of this data by an interpolated or approximating function that allows a conclusion about the focal spot with the smallest focal spot diameter and thus with the associated optimal focal distance. A series of disadvantages present in the state of the art can be avoided by using the process in accordance with the invention, in particular the great expenditure of time in the determining of the optimal focal distance and the uncertainty in the selection of the optimal focal spot associated with an operator are eliminated in the framework of the photographing of a focus series.
    Type: Application
    Filed: February 18, 2009
    Publication date: January 13, 2011
    Applicant: MTU AERO ENGINES GMBH
    Inventor: Mark Geisel
  • Patent number: 7864308
    Abstract: This invention discloses a position detection method for detecting the focus position of an optical position detection apparatus including an image sensor and an optical system which forms an image of a target object on the image sensing surface of the image sensor. In this method, the relationship between the position of the target object in the optical-axis direction of the optical system and the evaluation value of the signal output from the image sensor is measured, and the position of a peak close to a reference focus position, which is selected if the evaluation value has a plurality of peaks in the measured relationship, is detected as the focus position.
    Type: Grant
    Filed: February 10, 2009
    Date of Patent: January 4, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventor: Hiroshi Sato