Abstract: The present application relates to a scanning probe microscope comprising a probe arrangement for analyzing at least one defect of a photolithographic mask or of a wafer, wherein the scanning probe microscope comprises: (a) at least one first probe embodied to analyze the at least one defect; (b) means for producing at least one mark, by use of which the position of the at least one defect is indicated on the mask or on the wafer; and (c) wherein the mark is embodied in such a way that it may be detected by a scanning particle beam microscope.

Abstract: Methods for post-lithographic inspection using an e-beam inspection tool of organic extreme ultraviolet sensitive (EUV) sensitive photoresists generally includes conformal deposition of a removable metal carboxide or metal carboxynitride onto the relief image. The conformal deposition of the metal carboxide or metal carboxynitride includes a low temperature vapor deposition process of less than about 100° C. to provide a coating thickness of less than about 5 nanometers. Subsequent to e-beam inspection, the metal carboxide or metal carboxynitride coating is removed using a wet stripping process. Once stripped, the wafer can continue on to further process fabrication without being a sacrificial wafer.

Abstract: A developing method includes: forming a puddle of a developer on a surface of the substrate held by the substrate holding unit by a first developer nozzle; subsequently spreading the puddle of the developer over the whole substrate surface, by moving the first developer nozzle discharging the developer from a central or peripheral part to the peripheral or central part of the rotating substrate, with a contacting part of the first developer nozzle contacting with the puddle; supplying the developer from a second developer nozzle onto the rotating substrate, thereby to uniformize, in the substrate plane, distribution of a degree of progress of development by the developer spreading step; and removing the developer between the developer spreading step and the developer supplying step to remove the developer on the substrate.

Abstract: A development method according to an embodiment includes exposing a photosensitive film formed on a substrate at a predetermined exposure amount, carrying out a first development process that develops the exposed photosensitive film at a predetermined first development condition so as to leave the photosensitive film, obtaining a sensitivity information of the photosensitive film from a film thickness reduction of the photosensitive film developed by the first development process and the exposure amount, predicting pattern dimensions of multiple types of patterns to be formed when a second development process is carried out following the first development process from the sensitivity information, and determining a first acceptable range of a development condition in the second development process, determining a second acceptable range of the development condition in the second development process from the first acceptable range and a variation amount of the pattern dimension after the development process betw

Abstract: An apparatus for detecting developer liquid (108) level in a plate developer section tank (104) includes a reflective surface (204) installed on at least on one edge of the developer tank; a light emitter (232) which emits light onto the reflective surface; a light detector (236) adapted to detect reflected light from the reflective surface, wherein the light emitter and the light detector are positioned relative to the reflective surface such that the emitted light from the light emitter is deflected by the developer liquid hitting the reflective surface at 90 degrees.

Abstract: A coating/developing apparatus includes a first storage section that stores data comprising correlations of different pattern information units including at least a line width of the resist pattern, different values of a film thickness of the underlying film, and different light information profiles. The apparatus further includes a mechanism configured to use a film thickness distribution to obtain an estimated film thickness of the underlying film at a light-irradiation area on the surface of the substrate, and to check the estimated film thickness and a light information profile obtained at the light-irradiation area against the data to determine pattern information at the light-irradiation area.

Abstract: A photo development apparatus for use in fabricating a color filter substrate for a display panel is disclosed. The disclosed photo apparatus includes a development solution supplier to supply a negative development solution. The photo apparatus also includes a first photo apparatus to form a positive photo-resist pattern to be used in forming a black matrix, wherein the positive photo-resist pattern is formed by patterning a light shielding layer formed on a substrate using the negative development solution and a positive photo-resist.

Abstract: In a developing method for performing developing treatment of a substrate by supplying a developing solution onto a resist film formed on a surface of the substrate, the present invention controls a zeta potential of the surface of the substrate at a predetermined potential in the same polarity as that of a zeta potential of insoluble substances floating in the developing solution, thereby preventing or reducing the adhesion of the insoluble substances to the resist film and the substrate. This remedies the occurrence of development defects. The adhesion of the insoluble substances to the resist film and the substrate can also be prevented or inhibited by supplying an acid liquid to a liquid on the substrate, or controlling a pH value of the liquid on the substrate to control an absolute value of the zeta potential of the insoluble substances.

Abstract: An apparatus for reusing developer liquid in a plate processor device includes: a new developer liquid container (13); a work in progress developer liquid tank (10) for plate processing is filled with developer liquid (15) from the new developer liquid container (13); a waste developer liquid container (14) configured to receive spilled over developer liquid (16) from the work in progress developer liquid tank (10); and replenish means configured to replenish the waste developer liquid (21) from the waste developer liquid container (14) back according to the conductivity level of the waste developer liquid.

Abstract: A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.

Abstract: A method for monitoring photolithography processing includes monitoring application of a light sensitive material to the surface of each of a plurality of substrates and detecting that a supply of the light sensitive material applied to the substrates has changed from a first batch of light sensitive material to a second batch light sensitive material. A change in photolithography process results caused by the change from the first batch to the second batch of light sensitive material is determined. Also included is initiating corrective action based on the change in photolithography process results.

Abstract: A coating and developing system prevents wetting its component units with water when the coating and developing system forms a resist film on a substrate and processes the substrate processed by immersion exposure by a developing process. A substrate having a surface coated with a resist film and processed by immersion exposure is placed on a substrate support device and a liquid detector detects at least the liquid formed a liquid film for immersion exposure and remaining on the surface of the substrate. A decision is made as to whether or not the substrate needs to be dried on the basis of the result of detection made by the liquid detector. If it is decided that the substrate needs to be dried, the substrate is dried by a drying means. Thus wetting the interior of the coating and developing system with water can be prevented. Since only substrates that need to be dried are subjected to a drying process, the coating and developing system is able to operate at a high throughput.

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

Abstract: The electric conductivity of the developer is measured every constant period, a development replenisher is replenished every constant time as a time lapse replenisher in an amount based on a set value of a time lapse replenishment rate, a development replenisher is replenished every processing of a constant area of a photosensitive lithographic printing plate precursor(s) as a processing replenisher in an amount based on a set value of a processing replenishment rate, a calculated value of electric conductivity is calculated from the amounts of the time lapse replenisher and the processing replenisher, the set values of the time lapse replenishment rate and the processing replenishment rate are increased or decreased according to the result of the comparison of the calculated value with the measured value, and the value of the difference between the calculated value and the measured value is displayed as a degree of a developer activity.

Abstract: A resist pattern forming apparatus comprising a controller having a controlling portion that controls a processing of a coating and developing apparatus with a coating unit and a developing unit being provided therewith and an aligner being connected thereto, while an inspecting portion and the like measures at least one of a plurality of measurement items selected from, a reflection ratio and a film thickness of a base film and a resist film, a line width after the development, an accuracy that the base film matches with a resist pattern, a defect after the development, and so on. The measured data is transmitted to the controller. At the controller, a parameter subject to an amendment is selected based on the corresponding data of each of the measurement item such as the film thickness of the resist and the line width after the development, and the amendment of the parameters subject to the amendment is performed.

Abstract: A method of detecting developer endpoint. The method includes illuminating a device region of a substrate with a first optical beam prior to initiating a development stage of processing and detecting a baseline optical signal reflected from the device region of the substrate. The method also includes illuminating the device region of the substrate with a second optical beam during a development stage of processing and detecting an endpoint optical signal reflected from the device region of the substrate. The method further includes comparing the baseline optical signal to the endpoint optical signal and determining a developer endpoint based on the comparing step.

Abstract: A development replenisher replenishment method in an automatic developing machine for a photosensitive lithographic printing plate precursor, the method comprising: developing a plurality of sheets of exposed photosensitive lithographic printing plate precursors with a developer containing an electrolyte while replenishing a development replenisher to keep a developer activity constant, wherein an electric conductivity of the developer is measured every constant period; a development replenisher is replenished every constant time as a time lapse replenisher in an amount based on a set value of a time lapse replenishment rate; a development replenisher is replenished every processing of a constant area of a photosensitive lithographic printing plate precursor(s) as a processing replenisher in an amount based on a set value of a processing replenishment rate; a calculated value of an electric conductivity is calculated from an amount of the time lapse replenisher and an amount of the processing replenisher; and

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

Abstract: A method for replenishing a development replenisher in an automatic developing machine for a photosensitive lithographic printing plate precursor, wherein a value of an electric conductivity of a developer obtained by measuring an electric conductivity is compared with a reference value, and a development replenisher is replenished to the developer when the value of the developer is lower than the reference value, the method comprising: using a reference value of an electric conductivity optimal for a high resolution image as the reference value when developing a precursor having an exposed high resolution image in which an output datum of 50% area ratio is 210 lpi or more in terms of a peripheral length of an image area in an image unit that constitutes a gradation of a screen image: and changing the reference value to an ordinary reference value when developing a precursor not having a high resolution image.

Abstract: An automatic processing method by developing a plural number of exposed photosensitive lithographic printing plates with a developer, which comprises the previously calculating step, the measuring step and the replenishing step as defined herein, wherein during a period from immediately after start of operation of an automatic processing apparatus until the measured electric conductivity value of the developer exceeds the target electric conductivity value, the target electric conductivity value is corrected using a first operation expression as previously defined for every replenishment of the developer replenisher; and after the measured electric conductivity value of the developer first exceeds the target electric conductivity value after start of operation of the automatic processing apparatus, the target electric conductivity value is corrected using a second operation expression for every replenishment of the developer replenisher.

Abstract: A developing device for developing a latent image formed on an image carrier with a developing liquid includes a liquid storing section for storing the liquid including a developing substance and a carrier liquid. A developer carrier deposits the liquid fed from the liquid storing section thereon. A float type liquid level sensor senses a liquid level in the liquid storing section. The liquid level sensor includes a magnetic force generating member for generating a magnetic force, a magnetic force sensing device for sensing the magnetic force, and floats movable up and down in accordance with the liquid level in the liquid storing section. A distance between the magnetic force generating member and the magnetic force sensing device varies in accordance with the movement of the floats, allowing the liquid level to be determined on the basis of the output of the magnetic force sensing device.

Abstract: A method of processing photographic material includes the steps of processing the photographic material in a processing solution, monitoring the concentration of a process-retarding by-product of the processing in the processing solution during operation of the method, reducing the concentration of the by-product in the processing solution by a first method and as the by-product concentration in the processing solution exceeds a predetermined level, activating simultaneous operation of a second method for a period of time to thereby ensure that the photographic material is always adequately processed. The invention enables rapid processing of film whilst maintaining low replenishment rates and low fixer solution temperature such that inadequately fixed film is avoided.

Abstract: In this developing method and apparatus, a concentration measuring unit 222 picks part of developing fluid in a blending tank 186 to measure the resist concentration by an absorption photometry and feeds the detected resist concentration to a control unit 240. The control unit 240 controls respective valves 210, 212, 216 of a TMAH concentrate solution 200, a solvent pipe 204 and a drain pipe 208 in a manner that the developing fluid in the blending tank 186 has a TMAH concentration corresponding to a measured resist-concentration value to accomplish a constant developing rate, performing component control of the developing fluid. The developing fluid transferred from the blending tank 186 to a supply tank 188 is fed to a developer nozzle DN in a developing section 126 through a developer pipe 224 owing to the drive of a pump 228. Accordingly, even if the developing fluid is reused in the developing process in multiple times, it is possible to make sure of the uniformity in development.

Abstract: A heat developing method having the steps of: initially making the overall surface of a heat developing photosensitive material or a photosensitive and thermosensitive recording material (hereinafter called a “heat developing recording material”) to a predetermined temperature not lower than a glass transition temperature and not higher than heat development start temperature; and performing heat development.

Abstract: In an electric conductivity-based replenishing system, a developer replenishing method for a photosensitive lithographic printing plate is provided which is capable of minimizing the fluctuations in sensitivity of a developer with respect to the changes in development treatment conditions. An electric conductivity value of the developer is measured in a predetermined given cycle, when the measured electric conductivity value of the developer is lower than the target electric conductivity value, the developer is replenished with a predetermined amount of a developer replenisher, the time interval between the previous supply of the developer replenisher and the present supply of the developer replenisher is measured, a target electric conductivity arithmetic expression is selected based on the measured replenishment time interval and the replenishment time interval threshold value.

Abstract: A developing apparatus for organic electroluminescent display panels comprises a developing unit for supplying a developing solution to be uniformly dispensed to the surface of an organic electroluminescent display panel by immersing the organic electroluminescent display panel into the developing solution or spreading the developing solution over the organic electroluminescent display panel, a cleaning unit having at least a bath connected to the end of the developing unit for spraying a recycled cleaning liquid or cleaning liquid over the organic electroluminescent display panel, a drying unit having at least an airflow driers, and a transporting unit for transporting the electroluminescent display panel; wherein the organic electroluminescent display panel is transported at a constant speed by the transporting unit of the developing apparatus.

Abstract: A photographic film with a row of sprocket holes formed on each side thereof includes a sensitometric step wedge of different light intensity values exposed along one side of the film, preferably located between the sprocket holes.

Abstract: A method for in process monitoring of the parameters of a substrate undergoing a processing within a photolithography tools arrangement which includes substrate loading and unloading stations, and substrate coating, exposure and developing stations. The method includes the step of supplying the substrate after being developed to a monitoring station and analyzing the monitoring data to estimate the photolithography process to be used for controlling thereof.

Abstract: A processing method has been provided for an exposed silver halide black-and-white negative working sound recording film element, said processing method comprising the steps of processing said sound recording film element in a processing apparatus providing processing ability in a daylight environment, said processing method comprising the steps of developing in a time of less than 20 seconds; fixing in a fixer; rinsing and drying; making use of an automatic processing machine, the mentioned processing steps being followed by a step of controlling black-and-white densitometry, therefor providing the processing machine with a densitometer; further recording in a motion picture color print film and processing therein image area frames originating from an exposed and processed color negative recording film and from (an) optical soundtrack(s) originating from a silver halide black-and-white negative working sound recording film element, wherein said film element has been processed, after having been exposed, by t

Abstract: A method and system of TMAH concentration adjustment. Absorption values A1, Y1 to Ym of a recycled developer solution at wavelength 210 nm and m wavelengths between 220 nm and 250 nm are measured respectively, wherein m is equal to or greater than 2. Y1 to Ym are input to an nth-degree polynomial to generate a wavelength-absorption relationship Y=C1Xn+ . . . +Cn−1X+Cn, wherein X is wavelength, n is a positive integer and C1 to Cn are coefficients of the relationship. Wavelength 210 nm is input into the wavelength-absorption relationship to generate an absorption value Y210. A difference A3 between the A1 and Y210 is calculated as the absorption value of TMAH in the developer solution and A3 is then input to an absorption calibration curve of TMAH at 210 nm to generate a corresponding TMAH concentration. TMAH is then added to provide the corresponding TMAH concentration.

Abstract: One embodiment is a system for the development of a film includes an infrared light source and a visible light source. The system also includes at least one sensor operable to collect a first set of optical data from light associated the infrared light source and a second set of optical data from light associated with the visible light source. The system further includes a processor in communication with the at least one sensor, the processor operable to determine an image on the film in response to the first and second sets of optical data.

Abstract: The invention relates to an apparatus for thermal development having a receiver for receiving an imagewise exposed thermal film, an accumulator for gathering the film, a drive for advancing the film from the receiver to the accumulator, a heater located between the receiver and the accumulator for developing the film, a compound image scanner for scanning the film after it has been thermally developed, the scanner having a first light source and a first sensor placed for forming a first electronic record of the image formed on the developed film by reflection, a second light source and a second sensor placed for forming a second electronic record of the image by an opposing reflection, and a third sensor and a third light source placed for forming a third electronic record of the image formed by transmission, and a lighttight container for the receiver and the heater.

Abstract: In an electric conductivity-based replenishing system, a developer replenishing method of an automatic developing apparatus for a photosensitive lithographic printing plate is provided which is capable of minimizing the fluctuations in sensitivity of a developer with respect to the changes in development treatment conditions while implementing a developing unit of the automatic developing apparatus in a simple and low cost structure, in which an electric conductivity value of the developer is measured in a predetermined given cycle, when the measured electric conductivity value of the developer is lower than the target electric conductivity value, the developer is replenished with a predetermined amount of a developer replenisher, the time interval between the previous supply of the developer replenisher and the present supply of the developer replenisher is measured, a target electric conductivity arithmetic expression is selected based on the measured replenishment time interval and the replenishment time i

Abstract: A system for regulating (e.g., terminating) a development process is provided. The system includes one or more light sources, each light source directing light to one or more patterns and/or gratings on a wafer. Light reflected from the patterns and/or gratings is collected by a measuring system, which processes the collected light. The collected light is indicative of the dimensions achieved at respective portions of the wafer. The measuring system provides development related data to a processor that determines the acceptability of the development of the respective portions of the wafer. The collected light may be analyzed by scatterometry and/or reflectometry systems to produce development related data and the development related data may be examined to determine whether a development process end point has been reached, at which time the system can control the development process and terminate development.

Abstract: A method and system for environmental control in film processing is disclosed. In general, photographic film is coated with a processing solution, such as a developer solution, and is then developed within a controlled air environment. In the preferred embodiments, the temperature and humidity within the air environment is strictly controlled, which allows the development process to be more accurately and consistently controlled. This also allows fewer processing chemicals to be used and reduces harmful effluents caused by photographic film processing.

Abstract: Embodiments of the invention provide a liquid delivery system. The liquid delivery system generally includes a plurality of vessels flexibly coupled to a frame to provide vibration isolation therefrom. In one embodiment, the liquid delivery system includes tubing coupling liquids to/from the plurality of vessels, wherein the tubing is selected to minimize the transmission of mechanical noise to the plurality of vessels. In another embodiment, the liquid delivery system includes a controller adapted to monitor and control the delivery of the liquids throughout the system. In another embodiment, a method is provided to deliver liquids from storage vessels to substrate processing systems.

Abstract: A manifold communicatively connects a plurality of coating processing units with an air conditioning unit. The manifold is formed by branching a common pipe into a plurality of distributing pipes. The air conditioning unit performs temperature control to set air passing through a branch point of the manifold to a temperature slightly lower than a target temperature in processing units. Secondary heaters secondarily heat air passing through joints between the distributing pipes and the processing units to the target temperature thereby supplying accurately temperature-controlled air to processing parts. Air from the air conditioning unit is diverted thereby suppressing the height of the overall apparatus. Thus, a substrate processing apparatus capable of inhibiting the height of the overall apparatus from remarkable increase also when vertically stacking processing parts in multiple stages and supplying temperature-controlled air to the processing parts with sufficient accuracy.

Abstract: An apparatus for processing photographic materials has at least one photographic processing station enclosed in a housing. The housing and the processing station are each independently mounted through their own oscillation-damping connections to a common support base, so that any connections between the housing and the processing station run exclusively through the common support base.

Abstract: In this developing method and apparatus, a concentration measuring unit 222 picks part of developing fluid in a blending tank 186 to measure the resist concentration by an absorption photometry and feeds the detected resist concentration to a control unit 240. The control unit 240 controls respective valves 210, 212, 216 of a TMAH concentrate solution 200, a solvent pipe 204 and a drain pipe 208 in a manner that the developing fluid in the blending tank 186 has a TMAH concentration corresponding to a measured resist-concentration value to accomplish a constant developing rate, performing component control of the developing fluid. The developing fluid transferred from the blending tank 186 to a supply tank 188 is fed to a developer nozzle DN in a developing section 126 through a developer pipe 224 owing to the drive of a pump 228. Accordingly, even if the developing fluid is reused in the developing process in multiple times, it is possible to make sure of the uniformity in development.

Abstract: A bundle for photographic processing chemicals containing the concentrates for all the processing steps for processing a photographic material, wherein the concentrations of chemicals in the individual concentrates are selected such that all the concentrates are prepared with the same quantity of water in each case and the resultant replenishing liquids for all the processing steps are sufficient for the same quantity of photographic material, makes it possible largely to avoid operating errors and provides simple monitoring of the replenishment rate of the individual baths.

Abstract: A method and system of TMAH concentration adjustment. Absorption values A1, Y1 to Ym of a recycled developer solution at wavelength 210 nm and m wavelengths between 220 nm and 250 nm are measured respectively, wherein m is equal to or greater than 2. Y1 to Ym are input to an nth-degree polynomial to generate a wavelength-absorption relationship Y=C1Xn+ . . . +Cn−1X+Cn, wherein X is wavelength, n is a positive integer and C1 to Cn are coefficients of the relationship. Wavelength 210 nm is input into the wavelength-absorption relationship to generate an absorption value Y210. A difference A3 between the A1 and Y210 is calculated as the absorption value of TMAH in the developer solution and A3 is then input to an absorption calibration curve of TMAH at 210 nm to generate a corresponding TMAH concentration. TMAH is then added to provide the corresponding TMAH concentration.

Abstract: A processor for photographic material includes a multitude of treatment tanks through which the photographic material to be treated is sequentially moved and in which photographic treatment solutions are found during operation, especially developing, bleaching, fixing and stabilizing solutions. The processor includes a refill pump and conduit system for pumping the treatment solutions and the water used from storage containers for treatment solutions and a water tank into the treatment tanks. A refill pump and a corresponding refill conduit is provided for each storage container and the water tank. A control for the refill pumps cooperates with level sensors associated with the storage containers in such a way that the refill process is stopped when one of the storage containers is empty.

Abstract: Since it is possible to exhaust air from a first peripheral region &agr; around a substrate undergoing processing and further exhaust air from a second peripheral region &bgr; between the first peripheral region and substrate, it is possible to reduce effects of the current of air on a developing solution on a substrate and to cause the developing solution used in development processing to act on the exposed resist on the substrate properly.

Abstract: The invention relates to an arrangement for preparing a liquid treatment solution for treating photosensitive material, said arrangement including a storage container for storing fresh treating solution to be fed to a development compartment of a development apparatus, a supply portion for supplying a dry component or components and/or one or several mixtures of components for preparing the treatment solution and a reception container for receiving a solvent, wherein according to the invention a mixing tank is interposed between said supply portion, said reception container and said storage container.

Abstract: A photographic processing apparatus includes a photographic paper processing bath train. A drier, positioned downstream from the train, heats air and dries the photographic paper. Feeding racks feed the paper in a predetermined travel path which begins on an upstream side of the train, extends therethrough, and ends at the drier. A memory is accessed to estimate expected travel time t1 for passing of the paper through the travel path. The memory is accessed to estimate expected warmup time t2 for warming up the air in the drier to a target temperature T2. A controller compares the time t1 and the time t2, initially starts heating in the drier if the time t2 is longer than the time t1, and starts actuation of the feeding racks when a time difference (t2-t1) elapses after start of the heating to synchronize drier warmup to temperature T2 with paper reaching the drier.

Abstract: A photographic processor for a silver halide photographic material is disclosed, comprising a means for supplying a replenisher or water in accordance with processing amount information, wherein the processor further comprises a correction means for correcting the replenisher- or water-supplying rate on the basis of measurement data of a specific gravity or a pH of the processing solution. A remote control system of the processor is also disclosed, which is connected to a host computer through communication network.

Abstract: There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.

Abstract: A thermal development apparatus for developing a thermal development film, having a heating section, which has at least a partially cylindrical surface for transporting and heating the film; plural parallel pressing rollers for pressing the film onto the cylindrical surface;

Abstract: At least two (groups of) sensors forming an insertion detection sensor are offset from each other in the conveyance direction of a photosensitive material. An insertion speed, which is different for each manual insertion event, is obtained based on the time difference when sensors that have been offset from each other detect the leading end of the photosensitive material. The length of the photosensitive material in the conveyance direction thereof is accurately computed based on the insertion speed and other information. By correcting the errors due to the changeable insertion state of the photosensitive material caused by manual insertion by the operator, the process area of the photosensitive material, required for calculating the amount of replenisher to be replenished, is accurately obtained. Therefore, the amount of the replenisher is appropriately determined and the process capacity of the developer or the fixing solution can constantly be maintained at the satisfactory level.

Abstract: The present invention provides for a processing system and method of operating a photographic processor which comprises monitoring an average consumption of water, chemistry, packaging material and energy per unit amount of photographic film processed in the processor. By taking into account the inter-relationship between all of the above-noted parameters, a fully-automated color film processor having a specified eco-efficiency property can be designed. The eco-efficiency property of the processor is characterized in that it provides more function for the processor with less environmental impacts than comparable products and combines attributes such as minimization of mass and a volume of solution that is heated by a processor, effective use of energy, simplification of power consumption, minimization of time required to process film, recovery of waste produced during operation of the processor, and recovery and reuse of water evaporated during use of the processor.