Abstract: Methods for forming an Indium-containing film by a vapor deposition method using a heteroalkylcyclopentadienyl Indium (I) precursor having a general formula: In[R1R2R3R4CpL1] or In[CpL1L2y] wherein Cp represents a cyclopentadienyl ligand; R1 to R4 are each independently H, C1-C4 linear, branched or cyclic alkyls; L1 and L2 are each independently a substituent bonded to the Cp ligand and consisting of an alkyl chain containing at least one heteroatom, such as Si, Ge, Sn, N, P, B, Al, Ga, In, O, S, Se, Te, F, Cl, Br, I; and y=1-4. Examplary heteroalkylcyclopentadienyl Indium (I) precursors include In(Cp(CH2)3NMe2) or In(CpPiPr2).

Abstract: An etchant is described that includes an N-heterocyclic carbene and optionally an appropriate solvent. The etchant was effective at etching a metallic surface having, for example, a metal oxide and/or metal, in both solution phase and vapour-phase. The etchant has been shown to effectively etch oxidized copper and tungsten.

Abstract: A depositing arrangement for evaporation of a material is disclosed herein. The depositing arrangement has an alkali metal or alkaline earth metal for deposition of the material on a substrate. The deposition arrangement has a first chamber configured for liquefying the material; a valve being in fluid communication with the first chamber, and being downstream of the first chamber, wherein the valve is configured for control of the flow rate of the liquefied material through the valve. The deposition arrangement has an evaporation zone being in fluid communication with the valve, and being downstream of the valve, wherein the evaporation zone is configured for vaporizing the liquefied material; a heating unit to heat the material to higher temperatures before providing the liquid material in the evaporation zone; and one or more outlets for directing the vaporized material towards the substrate.

Abstract: A method of manufacturing a support pedestal for use in semiconductor processing includes applying a protective layer on a conductive member of the support pedestal with an atomic layer deposition (ALD) process. The support pedestal has a support plate bonded to a tubular shaft. The support plate has a substrate, an electric element embedded in the substrate, and a conductive member connected to the electric element, and the tubular shaft defines an internal chamber. The ALD process introducing first precursors into the chamber of the tubular shaft to form a first monolayer on the conductive member, and introducing second precursors into the chamber of the tubular shaft to form a second monolayer on the first monolayer.

Abstract: A deposition mask assembly for manufacturing a plurality of display devices includes a frame having an opening area, a first open mask disposed on the frame and having a first body portion defining a plurality of patterns overlapping the opening area, and a second open mask disposed on the first open mask and having a second body portion defining a plurality of opening portions overlapping the patterns of the first open mask, in which each of the patterns includes an auxiliary pattern spaced apart from the first body portion and a first bridge pattern connecting the first body portion and the auxiliary pattern.

Abstract: Provided is a plasma etching method which enables etching with high accuracy while controlling and reducing surface roughness of a transition metal film. The etching is performed for the transition metal film, which is formed on a sample and contains a transition metal element, by a first step of isotropically generating a layer of transition metal oxide on a surface of the transition metal film while a temperature of the sample is maintained at 100° C. or lower, a second step of raising the temperature of the sample to a predetermined temperature of 150° C. or higher and 250° C. or lower while a complexation gas is supplied to the layer of transition metal oxide, a third step of subliming and removing a reactant generated by an reaction between the complexation gas and the transition metal oxide formed in the first step while the temperature of the sample is maintained at 150° C. or higher and 250° C. or lower, and a fourth step of cooling the sample.

Abstract: A processing technique for creating nanowires and hierarchically porous micro/nano structures of ceramic materials is provided. The process includes evaporation of micron-sized water droplets containing dissolved organic salts on heated substrates followed by thermal decomposition of the deposited material. The micron-sized droplets may be generated by supercritical CO2 assisted nebulization, in which high-pressure streams of aqueous solution and supercritical CO2 are mixed, followed by controlled depressurization through a fine capillary. Rapid evaporation takes place on the heated substrates and structures are generated due to CO2 effervescence from the droplets and evaporation of water, along with the pinning of the three phase contact line. Depending on the mass deposited, a mesh of nano-wires or membrane-like structures may result. Sintering of the membrane-like scaffolds above the decomposition temperature of the organic salt creates nanopores within the structures, creating a dual hierarchy of pores.

Abstract: A non-foil packaging laminate for liquid food packaging comprises a layer of paper or other cellulose-based material, outermost liquid tight, heat sealable layers of polyolefin-based polymers and, vapour-deposition coated onto the inner side of the layer of paper or cellulose-based material, an induction heat susceptible metal coating. Also disclosed is a method for manufacturing of the packaging laminate, a packaging container that is made from the packaging laminate and a method of induction heat sealing the packaging laminate into packaging containers.

Abstract: The invention relates to a vapour generator for the deposition of a metal coating onto a substrate (7), preferably a steel strip, that comprises a vacuum chamber (6) in the form of a housing including a vapour deposition head or ejector (3) in tight communication via a supply duct (4) with at least one crucible (1) containing the coating metal in a liquid form and located outside the vacuum chamber (6), characterised in that the ejector (3) includes a longitudinal slot for the vapour outlet acting as a sonic throat and extending on the entire width of the substrate (7), a filtration medium or a charge loss member (3A) made of a sintered material being provided in the ejector immediately before said slot on the vapour path in order to equalise the flow speed of the vapour exiting the ejector (3) through the sonic throat.

Abstract: Methods and apparatus for increasing reflectivity of an aluminum layer on a substrate. In some embodiments, a method of depositing an aluminum layer on a substrate comprises depositing a layer of cobalt or cobalt alloy or a layer of titanium or titanium alloy on the substrate with a chemical vapor deposition (CVD) process, pre-treating the layer of cobalt or cobalt alloy with a thermal hydrogen anneal at a temperature of approximately 400 degrees Celsius if a top surface of the layer of cobalt or cobalt alloy is compromised, and depositing a layer of aluminum on the layer of cobalt or cobalt alloy or the layer of titanium or titanium alloy with a CVD process at a temperature of approximately 120 degrees Celsius. Pre-treatment of the layer of cobalt or cobalt alloy may be accomplished for a duration of approximately 60 seconds to approximately 120 seconds.

Abstract: A method of the present invention for producing a metallic ruthenium thin film on a substrate by atomic layer deposition includes: (A) a step of introducing a feedstock gas containing a specific ruthenium compound into a treatment atmosphere, and allowing the ruthenium compound to deposit on the substrate; and a step of introducing a reactive gas containing a specific compound into the treatment atmosphere, and allowing the reactive gas to react with the specific ruthenium compound deposited on the substrate.

Abstract: A method of purifying herbal extract(s) from an herbaceous plant composition includes heating the herbal extracts-containing composition to volatilize at least one of herbal extract(s) into a vapor and condensing the vapor on a substrate or wet extracting the herbal extract(s) by treatment of the herbaceous plant composition or a derivative thereof with a solvent for the herbal extract(s), separating the solution of herbal extract(s), forming a concentrate and casting the concentrate on the substrate to form a coating of the herbal extract(s) on the substrate. A corresponding delivery cartridge and delivery system can include a controllable heating element and the substrate coated with at least one of herbal extract(s). These are configured to allow passage of air over the substrate to volatilize or entrain the herbal extract(s) as a vapor, gas or aerosol for administration to a user.

Abstract: A new paint which makes it possible for a coating film to have both brightness and radiotransparency is demanded. The paint includes a flake, wherein the flake has a sea-island structure of including a plurality of island phases which are formed of metal, and a sea phase that is formed of resin or DLC, the sea phase linking the island phases to each other.

Abstract: A method of forming graphene layers is disclosed. A method of improving graphene deposition is also disclosed. Some methods are advantageously performed at lower temperatures. Some methods advantageously provide graphene layers with lower resistance. Some methods advantageously provide graphene layers in a relatively short period of time.

Abstract: The inventive concept relates to a cobalt precursor, a method for manufacturing a cobalt-containing layer using the same, and a method for manufacturing a semiconductor device using the same. More particularly, the cobalt precursor of the inventive concept includes at least one compound selected from the group consisting of a compound of Formula 1 and a compound of Formula 2.

Abstract: Provided is a multilayer zinc alloy plated steel material comprising a base steel material and multiple plating layers formed on the base steel material, wherein each of the multiple plating layers includes one of a Zn plating layer, a Mg plating layer, and a Zn—Mg alloy plating layer, and the ratio of the weight of Mg contained in the multiple plating layers to the total weight of the multiple plating layers is from 0.13 to 0.24.

Abstract: A method of forming a protective coating film for halide plasma resistance includes depositing a seed layer on a surface of an article via an atomic layer deposition (ALD) process, depositing a rare-earth containing oxide layer on the seed layer via an ALD process, and exposing the rare-earth containing oxide layer to fluorine-containing plasma.

Abstract: Provided is a plated steel sheet often used as materials for vehicles, home appliances, construction and the like and, more specifically, to a plated steel sheet having a multilayer structure and a method for manufacturing the same.

Abstract: Disclosed is a liquid polymerizable composition including a phosphine oxide or a phosphine sulphide monomer composition with mineral nanoparticles homogeneously dispersed therein, as well as its use for the preparation of a transparent polymeric material having a high refractive index and its use in the optical field.

Abstract: Metal coordination complexes comprising a metal atom coordinated to at least one diazabutadiene ligand having a structure represented by: where each R is independently a C1-C13 alkyl or aryl group and each R? is independently H, C1-C10 alkyl or aryl group are described. Processing methods using the metal coordination complexes are also described.

Abstract: The present application discloses a method of preparing quantum dots. The method includes combining a first quantum dots precursor and a second quantum dots precursor to form a first reaction mixture including a supercritical liquid medium; nucleating and growing the quantum dots from the first quantum dots precursor and the second quantum dots precursor in the first reaction mixture including the supercritical liquid medium; and forming a solid quantum dots material in the presence of the supercritical liquid medium.

Abstract: Cladding material is applied by laser to a net-shape. A method of cladding a host component includes installing the component in a fixture. A shroud component is located against the host component adjacent a select location for the cladding. Cladding is applied to the host component to the select location and adjacent to shroud component so that the shroud component defines an edge of the cladding as applied. The edge of the cladding as defined by the shroud component defines a desired cladding profile requiring no/approximately no post-cladding processing to remove over-cladded material.

Abstract: Provided is a method for depositing a gallium-containing thin film by atomic layer deposition (ALD) without using radical species such as plasma and ozone using a gallium-containing precursor having a high vapor pressure even at low temperature and high thermal stability. Gallium (I) having a cyclopentadienyl ligand as illustrated below has a sufficiently high thermal decomposition temperature, a sufficiently high vapor pressure at a low temperature, and high reactivity, and as a result, is suitable for low temperature ALD. An atomic layer deposition method of a metal-containing thin film using a precursor represented by the following general formula (1) (In general formula (1), R1 to R5 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms).

Abstract: Molybdenum complexes and use thereof in thin film deposition, such as CVD and ALD are provided herein. The molybdenum complexes correspond in structure to Formula (I): wherein R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 are independently selected from the group consisting of hydrogen, alkyl, and trialkylsilyl; and at least one of R1, R2, R3, R4, R5, R6, R7, R8, R9, and R10 is trialkylsilyl.

Abstract: A deposition apparatus includes a chamber, a susceptor that supports a substrate in the chamber, an upper electrode facing the susceptor, a showerhead defining a gas inlet space between the upper electrode and the susceptor, a metal source storage to store a metal source supplied to the chamber, a vaporizer to vaporize the metal source, a first gas source to supply a first gas to move the metal source toward the vaporizer, a second gas source to supply a second gas to move the metal source in the vaporizer toward the chamber, a third gas source connected to the chamber to supply a third gas into a reaction space defined between the susceptor and the upper electrode such that the third gas reacts with the metal source, and a fourth gas source connected to the chamber to supply a fourth gas used to clean an inside of the chamber.

Abstract: Methods for depositing rhenium-containing thin films are provided. In some embodiments metallic rhenium-containing thin films are deposited. In some embodiments rhenium sulfide thin films are deposited. In some embodiments films comprising rhenium nitride are deposited. The rhenium-containing thin films may be deposited by cyclic vapor deposition processes, for example using rhenium halide precursors. The rhenium-containing thin films may find use, for example, as 2D materials.

Abstract: A shadow mask having two or more levels of openings enables selective step coverage of micro-fabricated structures within a micro-optical bench device. The shadow mask includes a first opening within a top surface of the shadow mask and a second opening within the bottom surface of the shadow mask. The second opening is aligned with the first opening and has a second width less than a first width of the first opening. An overlap between the first opening and the second opening forms a hole within the shadow mask through which selective coating of micro-fabricated structures within the micro-optical bench device may occur.

Abstract: A method of measuring temperature reached by a part, for example a turbine engine part, in operation, the method including: mechanically treating the part; oxidizing the part; and depositing a layer including a temperature indicator for indicating the temperature reached by the part in operation.

Abstract: ZnO sputtering is performed while a rolling body is housed in a basket made of a metal wire and is rotated. By setting a ratio of a mesh size of the basket to a diameter of the rolling body in a range of 40 to 95%, fine and uniform ZnO coating can be formed on a surface of the rolling body. By using the rolling body with ZnO coating prepared in this manner in a bearing which is rotated at high speed in a high-load state, a friction coefficient can significantly be lowered in comparison with a case of no coating.

Abstract: The present invention provides a chromium-free coating composition having high blackening resistance and corrosion resistance, the composition comprising: 20 to 70 wt % of waterborne silane modified polyurethane; 0.5 to 5 wt % of a hardener; 0.5 to 5 wt % of a blackening inhibitor; 0.5 to 5 wt % of a corrosion inhibitor; and 0.5 to 5 wt % of a lubricant, with the balance being a solvent. The chromium-free coating composition has the effect of improving blackening resistance, corrosion resistance, alkali resistance, solvent resistance and fingerprint resistance of a steel sheet on which a coating layer comprising the composition is formed.

Abstract: The present invention provides a Cr-rich cathodic arc coating, an article in turbine blade coated with the chromizing over cathodic arc coating, and a method to produce the coating thereof. The Cr-rich cathodic arc coating in the present invention comprises a cathodic arc coating and a diffusion coating deposited atop the cathodic arc coating to enforce hot corrosion resistance. The hardware coated with the chromizing over cathodic arc coating in the present invention is reinforced with superior-hot corrosion resistance. The present invention further provides a novel method for producing the chromizing over cathodic arc coating by re-sequencing coating deposition order. The method in the present invention is efficient and cost-reducing by eliminating some operations, e.g., DHT and peening, between the cathodic arc coating and the diffusion coating. The hot corrosion resistance in the present invention results from the high Cr content in the surface of the coating.

Abstract: The invention relates to compositions and methods for coating a zirconium alloy cladding of a fuel element for a nuclear water reactor. The composition includes a master alloy including one or more alloying elements selected from chromium, silicon and aluminum, a chemical activator and an inert filler. The alloying element(s) is deposited or are co-deposited on the cladding using a pack cementation process. When the coated zirconium alloy cladding is exposed to and contacted with water in a nuclear reactor, a protective oxide layer can form on the coated surface of the cladding.

Abstract: A composition and a coating structure applying with the same are provided. The composition includes 3 wt % to less than 15 wt % of Al, 10 wt % to less than 30 wt % of Cr, higher than 0 wt % to 15 wt % of O, higher than 0 wt % to 15 wt % of Y, and the remainder being at least one of Co or Ni.

Abstract: A multi-walled pipe and a method for its manufacture involves a steel sheet forming a steel source layer to which a nickel source layer is applied on at least one or both sides. A solder source layer is applied to the one nickel source layer, or one of the two, or both, nickel source layers. The multi-walled pipe is formed from a strip of the coated metal sheet by rolling. The walls of the pipe are soldered by heating. In one form, the heating takes place by radiation. In another, it takes place by induction.

Abstract: An apparatus and method for controlling the composition of liquid metal fed to an evaporator in a vacuum chamber used in a physical vapor deposition process.

Abstract: The invention provides a raw material for chemical deposition having properties required for a CVD compound, that is, which has a high vapor pressure, can be formed into a film at low temperatures (about 250° C. or less), and also has moderate thermal stability. The invention relates to a raw material for chemical deposition, for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, the raw material for chemical deposition including an organoruthenium compound represented by the following formula, in which a cyclohexadienyl group or a derivative thereof and a pentadienyl group or a derivative thereof are coordinated to ruthenium: wherein the substituents R1 to R12 are each independently a hydrogen atom, a linear or cyclic hydrocarbon, an amine, an imine, an ether, a ketone, or an ester, and the substituents R1 to R12 each have 6 or less carbon atoms.

Abstract: A three-dimensional ceramic heater, such as a cylindrical ceramic heater, is proposed in which the conductive ceramic heating element is multi-furcated into lanes at least in the folded-back sections so that the electric current tends to flow in a more uniform and hence laminar manner with the effect that the localized over heating is suppressed greatly.

Abstract: A braze composition, brazing process, and brazed article are disclosed. The braze composition includes a MCrAlY alloy at a concentration, by weight, of between 50% and 70%, where M is selected from the group consisting of nickel, cobalt, iron, alloys thereof, and combinations thereof, and a nickel-based alloy at a concentration, by weight, of between 30% and 50%. The brazing process includes forming a braze paste, brazing the braze paste to a portion of a component, and shaping the braze paste to form a brazed article. The brazed article includes a component and a braze composition brazed to the component, the braze composition including a MCrAlY alloy at a concentration, by weight, of between 50% and 70%, where M is selected from the group consisting of nickel, cobalt, iron, alloys thereof, and combinations thereof, and a nickel-based alloy at a concentration, by weight, of between 30% and 50%.

Abstract: A process for applying a chromium layer on a substrate, specifically a turbine engine airfoil, by contacting at least a portion of the substrate with a gaseous chromium wherein the gaseous chromium is generated from a substantially nitrogen free source.

Abstract: An optical film to be arranged on a display surface is adapted so as to allow uniform application of an interlayer filler and thus also is applicable to an image display device equipped with a front plate. Preferably, such optical film is for use in an image display device. The optical film is adapted so that a relationship of the following formula (1) is satisfied: b?0.2a+1.8??(1), where a is the viscosity (Pa·s) of an interlayer filler at the time of attaching the front plate to a surface of the optical film via the interlayer filler, and b is the atomic percentage (atm %) of silicon atoms on the surface of the optical film. The atomic percentage of oxygen atoms on the surface of the optical film is at least 26 atm %.

Abstract: Disclosed herein are methods and related apparatus for formation of tungsten wordlines in memory devices. Also disclosed herein are methods and related apparatus for deposition of fluorine-free tungsten (FFW). According to various embodiments, the methods involve deposition of multi-component tungsten films using tungsten chloride (WClx) precursors and boron (B)-containing, silicon (Si)-containing or germanium (Ge)-containing reducing agents.

Abstract: An object of the present invention is to provide an electromagnetic wave penetrative metal film having high mass productivity and an extremely low attenuation rate in the electromagnetic wave penetrated through, a manufacturing method of the electromagnetic wave penetrative metal film, and a radome for a vehicle-mounted radar devices using the electromagnetic wave penetrative metal file. To achieve the object, the present invention provides an electromagnetic wave penetrative metal film composed of more than 10000 of fine metal film pieces per unit area (1 mm2) provided on a surface of a substrate through an electroless plating step, wherein fine metal film pieces adjacent to each other are electrically isolated, a manufacturing method of the electromagnetic wave penetrative metal film, and a radome for a vehicle-mounted radar devices using the electromagnetic wave penetrative metal film.

Abstract: A mechanism is provided for fabricating a thermally assisted magnetoresistive random access memory device. A bottom thermal barrier is formed on a bottom contact. A magnetic tunnel junction is formed on the bottom thermal barrier. The magnetic tunnel junction includes a top ferromagnetic layer formed on a tunnel barrier. The tunnel barrier is formed on a bottom ferromagnetic layer. A top thermal barrier is formed on the top ferromagnetic layer. A top contact is formed on the top thermal barrier. The top contact is reduced to a first diameter. The tunnel barrier and the bottom ferromagnetic layer each have a second diameter. The first diameter of the top contact is smaller than the second diameter.

Abstract: A method of manufacturing a chrome plated component can include performing a two-shot (2K) molding process to form a component comprising first and second \members. A non-plateable resin can be molded to form the first member defining a front surface that defines a recess. A plateable resin can be molded to form the second member defining a back surface that defines the protrusion. The component can then be removed from its mold, where (i) an exposed surface of the second member defines a front surface of the component and (ii) the recess receives the protrusion such that the front surface of the first member is substantially flush with the back surface of the second member. An exposed surface of the second member can then be chrome plated to obtain the chrome plated component.

Abstract: Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R1 represents a methyl group or an ethyl group, R2 represents a hydrogen atom or a methyl group, R3 represents a C1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

Abstract: A slurry composition for aluminizing a superalloy component is provided, wherein the slurry includes an organic binder and a solid content including at least aluminum, silicon, and at least one of hafnium or yttrium.

Abstract: The invention relates to a method for the production of carbon fiber reinforced aluminum matrix composite wires by drawing carbon fibers through molten salt and molten aluminum in such a way that the molten aluminum and the molten salt are spatially separated, and the carbon fibers are drawn through first the molten salt, then the molten aluminum separated from it. The invention further relates to an apparatus for the implementation of the method.

Abstract: A new set of branched nanowire or nanotree structures and their fabrication process. Some structures have one or more of the following distinctions from other branched nanowires: (1) the trunk and branch diameter and branching number density can be changed along the trunk's length; (2) the branch's azimuthal direction can be controlled along the trunk's length; (3) the branch's diameter can be modulated along its length; (4) the crystal orientation and branches of the ensemble of nanowires can be aligned on a non-epitaxially matched substrate. The structures are made by a geometrically controlled kinetic growth method.

Abstract: A removable mask for a platform or a nozzle sector of a turbine engine blade, the blade or sector configured to be covered in an electrolytic deposit, the mask including a mechanism to engage on the platform and a mechanism to cover outer surfaces of the platform that are not to be covered by the electrolytic deposit.

Abstract: A vacuum deposition process suitable for coating discrete articles with a zinc-rich, fully alloyed layer is described. In a process step of contacting the article with metallic Zn vapor, the temperature of the article is equal to or higher than the dew point of the Zn vapor. The process results in a coating having a uniform thickness, even on less accessible surfaces. Additionally, the roughness of the steel substrate is essentially preserved. By properly engineering the surface of the substrate, coated articles can be obtained having a roughness providing for optimal paint adhesion.