Photomechanical Dye Image Prepared Patents (Class 430/145)
  • Patent number: 9376584
    Abstract: An image transfer member (ITM) is provided with a skin over its surface in which the skin incorporates a hygroscopic agent. The hygroscopic agent is operable to make the ITM skin very hydrophilic or to provide a high surface energy. One such hygroscopic agent is glycerol that may be applied to the surface of the ITM with a carrier, such as water. In an image transfer process, the carrier is completely or partially removed, such as by drying, leaving a thin skin of the hygroscopic agent. Ink drops applied in an image pattern onto the skin spread without puddling or draw-backs, producing an optimum wet image.
    Type: Grant
    Filed: September 20, 2013
    Date of Patent: June 28, 2016
    Assignee: Xerox Corporation
    Inventor: Chu-Heng Liu
  • Patent number: 8101332
    Abstract: A negative-working lithographic printing plate precursor is disclosed that can be developed on the press without going through a development processing step, and a method of lithographic printing is also disclosed that uses this negative-working lithographic printing plate precursor. A negative-working lithographic printing plate precursor is provided that exhibits excellent on-press developability, nonimage area fine line reproducibility and printing durability and that resists the production of scum during on-press development.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: January 24, 2012
    Assignee: Fujifilm Corporation
    Inventors: Norio Aoshima, Yu Iwai
  • Patent number: 5731110
    Abstract: An azo dye for use in color filters soluble in alkaline aqueous solutions and organic solvents and having in one molecule at least one sulfonamido group of which one hydrogen atom is substituted; and a method for producing a color filter having a plurality of color filter elements which comprises the steps of a) coating a substrate with an organic solvent solution of a photoresist composition containing said azo dye and drying the coat to form an adhering layer, b) exposing a specific part of said layer to radiation ray, c) developing the exposed or unexposed region with alkali to form a colored pattern, and d) repeating the steps a)-c) on every dye of different color present in said composition.
    Type: Grant
    Filed: August 29, 1996
    Date of Patent: March 24, 1998
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yoshiki Hishiro, Naoki Takeyama, Shigeki Yamamoto
  • Patent number: 5582952
    Abstract: A photosensitive lithographic printing plate which provides a wide range of proper conditions for development, high impression capacity, a flexible film sufficient in adhesion to a support and excellent processing suitability with a weakly alkaline developer (pH 12.5 or less) is disclosed. The photosensitive lithographic printing plate comprises a support and a photosensitive layer provided thereon, wherein the photosensitive layer is formed from a photosensitive composition containing at least a two-equivalent coupler residue-containing compound and a photosensitive compound or a photosensitive mixture acting as a positive type.
    Type: Grant
    Filed: March 7, 1995
    Date of Patent: December 10, 1996
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Koichi Kawamura, Keiji Akiyama, Toshifumi Inno, Katsuji Kitatani
  • Patent number: 5482804
    Abstract: A photo-setting resin composition is here disclosed which comprises a photo-setting resin precursor and a dyestuff for uniformly coloring the photo-cured resin; and there is also disclosed a method for preparing a color filter by the use of this photo-setting resin composition.
    Type: Grant
    Filed: March 30, 1993
    Date of Patent: January 9, 1996
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Hisato Itoh, Akio Karasawa, Kenichi Sugimoto
  • Patent number: 5268245
    Abstract: A filter is formed on a solid state imager by:forming, on the imaging surface of the imager, an adherent layer of a dye-containing photoresist composition comprising a photoresist resin and a thermochromic dye, this dye being substantially non-absorbent of actinic radiation of a first wavelength, but capable, upon heating, of undergoing a thermally-induced color change which renders it absorptive of actinic radiation of the first wavelength;imagewise exposing the adherent layer of dye-containing photoresist composition to actinic radiation of the first wavelength;removing one of the exposed and unexposed areas of the layer, while leaving the other of the exposed and unexposed areas on the imaging surface, to form a pattern of filter elements; andheating the solid state imager to a temperature and for a time sufficient to cause the dye to undergo its color change, thereby causing the filter elements to become absorptive of radiation of the first wavelength.
    Type: Grant
    Filed: July 9, 1992
    Date of Patent: December 7, 1993
    Assignee: Polaroid Corporation
    Inventor: Carl A. Chiulli
  • Patent number: 5225309
    Abstract: Disclosed is a light-sensitive litho printing plate comprising:a support, a light-sensitive layer and a silicone rubber layer provided thereon,wherein said light-sensitive layer contains a substance,whereby said substance forms a color during developing or after developing.
    Type: Grant
    Filed: March 19, 1992
    Date of Patent: July 6, 1993
    Assignees: Konica Corporation, Mitsubishi Kasei Corporation
    Inventors: Norihito Suzuki, Kiyoshi Goto, Hiroshi Tomiyasu, Kazuo Noguchi, Akeo Kasakura
  • Patent number: 5215865
    Abstract: An image development method is disclosed. In the method, a photoresist layer on a metal surface is exposed for development. The developer then used is a solution which will both develop the photoresist image and cause any exposed metal surface to change to a predetermined color. The development process then proceeds until the predetermined color is exposed whereupon the process ceases. The preferred metal is copper and the preferred developer is an aqueous solution of sodium sulphide and ammonium polysulfide.
    Type: Grant
    Filed: August 3, 1991
    Date of Patent: June 1, 1993
    Inventor: Ron-Hon Chen
  • Patent number: 5190845
    Abstract: A photosensitive resin composition comprising:(a) a polymer dyeable with an anionic dye(b) an azide photosensitive compound, and(c) a compound having at least two acryloyl and/or methacryloyl groups in the same molecule thereof, and a color filter obtained by using the resin composition.
    Type: Grant
    Filed: May 8, 1989
    Date of Patent: March 2, 1993
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Matsuo Hashimoto, Nobuyuki Futamura, Sumio Yoda, Yoshifumi Saiki
  • Patent number: 5057394
    Abstract: Method of forming a positive-positive type image is disclosed, which is characterized in that a photosensitive layer is formed on a substrate using a composition comprising water-soluble photo-crosslinking agent, water-soluble resin and synthetic resin emulsion and further coloring agent, if necessary, said photosensitive layer is exposed to active rays through manuscript, then this is immersed into warm water of 30.degree. to 60.degree. C. for not less than 3 seconds to allow the exposed area to swell and soften sufficiently with warm water and simultaneously to allow almost all water-soluble photo-crosslinking agent in the nonexposed area to dissolve out into warm water, and successively the swollen and softened exposed area is rubbed out to form an image having no coloring originating from water-soluble photo-crosslinking agent without using the development chemicals except water.
    Type: Grant
    Filed: March 14, 1989
    Date of Patent: October 15, 1991
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Norio Yabe, Hideaki Sasaki, Kuniaki Monden
  • Patent number: 5053299
    Abstract: A method of forming a color filter array which includes forming only a single image mordant layer on a device and then exposing the mordant to a pattern representing an array of filter elements and developing areas of the mordant to provide separated filter elements. These filter elements are then selectively dyed different colors.
    Type: Grant
    Filed: May 25, 1990
    Date of Patent: October 1, 1991
    Assignee: Eastman Kodak Company
    Inventors: Michael J. Hanrahan, Kathleen S. Hollis
  • Patent number: 4985344
    Abstract: A process for forming a pattern comprising forming an alkali-soluble polymer layer on a substrate, forming a radiation-sensitive composition layer containing a diazonium salt on the alkali-soluble polymer layer to form a resist layer having a two-layer structure, exposing the resist layer to a radiation to cause the change in solubility in an aqueous alkaline solution at the boundary between the two layers and forming a predetermined pattern in the resist layer by a usual resist process. The resist layer may comprise a plurality of layers comprising the two-layer structure as a repeating unit structure.
    Type: Grant
    Filed: October 13, 1989
    Date of Patent: January 15, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Shoichi Uchino, Takumi Ueno, Takao Iwayanagi, Saburo Nonogaki, Michiaki Hashimoto
  • Patent number: 4980260
    Abstract: A multicolor image-forming method which comprises image-exposing a light-sensitive heat-sensitive recording material having a diazo compound and a coupling component on a support using a positive image followed by developing to form a color image, image-exposing a light-solubilizing color image-forming material having a coloring material on a substantially transparent support using a positive image followed by developing to form a color image, and superposing the light-solubilizing color image-forming material having the color image on the light-sensitive heat-sensitive recording material having the color image or, further, heat-pressing the light-solubilizing color image-forming material having the color image superposed on the light-sensitive heat-sensitive recording material having the color image.
    Type: Grant
    Filed: April 25, 1988
    Date of Patent: December 25, 1990
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Fumiaki Shinozaki, Mikio Totsuka, Tomizo Namiki
  • Patent number: 4948693
    Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.
    Type: Grant
    Filed: August 29, 1988
    Date of Patent: August 14, 1990
    Assignee: Hoechst Celanese Corporation
    Inventors: Richard L. Shadrach, Stephan J. W. Platzer, Gabor I. Koletar
  • Patent number: 4943512
    Abstract: A photocurable resin composition is described, which comprises a specific type of photosensitive polymer obtained by copolymerization of a monomer of the following general formula [I] ##STR1## in which R.sup.1 represents H, CH.sub.3 or C.sub.2 H.sub.5, X represents --O-- or --NH--, Y represents a linear or branched hydrocarbon group having from 1 to 4 carbon atoms, and .PHI. represents ##STR2## Z.sup..crclbar., in which Z.sup..crclbar. represents an anion, and R.sup.2, R.sup.3 and R.sup.4 are independently an alkyl group having from 1 to 4 carbon atoms, and a monomer of the following general formula [II] ##STR3## in which R.sup.5 represents H, CH.sub.3 or C.sub.2 H.sub.5, and n and x are independently an integer of from 1 to 4. The photosensitive polymer is photocrosslinked with a diazide compound. The resin composition is particularly suitably for use in formation of a color filter because of good dyeability and good adhesion to a substrate.
    Type: Grant
    Filed: October 4, 1988
    Date of Patent: July 24, 1990
    Assignee: Chisso Corporation
    Inventors: Hiroshi Kawabata, Katsuhiko Kobayashi, Hideo Sato
  • Patent number: 4937170
    Abstract: A photographic element formed from a substrate and light sensitive coating on the substrate wherein the coating comprises a mixture of a diazo compound and an aromatic carboxylic coupling agent having phenolic hydroxy groups, in an acidic medium.
    Type: Grant
    Filed: March 1, 1988
    Date of Patent: June 26, 1990
    Assignee: Hoechst Celanese Corporation
    Inventor: Dieter Mohr
  • Patent number: 4937176
    Abstract: A method of manufacturing a semiconductor device, in which a layer of photolacquer (5) containing as a photoactive component a diazo oxide is provided on a semiconductor substrate. Of this layer, parts (9) are irradiated by a first patterned irradiation (7) and these parts are then rendered poorly developable by an intermediate treatment. Subsequently, the lacquer layer (5) is subjected to a second non-patterned irradiation (11) and is then developed. According to the invention, in the parts (9) irradiated by the first irradiation a pigment is formed, which absorbs radiation having a wavelength at which diazo oxide is photosensitive. The second irradiation is carried out with radiation of that wavelength. Thus, lacquer tracks having a rectangular profile can be obtained in a simple manner.
    Type: Grant
    Filed: September 27, 1988
    Date of Patent: June 26, 1990
    Assignee: U.S. Philips Corporation
    Inventors: Franciscus A. Vollenbroek, Wilhelmus P. M. Nijssen, Marcellinus J. H. J. Geomini
  • Patent number: 4904568
    Abstract: Disclosed is a method of forming a printed image, which method comprises coating an electrodeposition coating composition on a plate with a conductive film and for use in a printed circuit to form a photo-sensitive resist film, and exposing the photo-sensitive resist film to light through a pattern mask, followed by development, the surface of said photo-sensitive resist film being colored with a dye.
    Type: Grant
    Filed: July 14, 1988
    Date of Patent: February 27, 1990
    Assignee: Kansai Paint Co., Ltd.
    Inventors: Koshio Kondo, Koji Takezoe
  • Patent number: 4869993
    Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The element is composed of a substrate, colored photosensitive layer and adhesive layer. The adhesive layer contains an optical brightener compound which reduces residual yellow staining derived from the naphthoquinone diazide sensitizer.
    Type: Grant
    Filed: August 29, 1988
    Date of Patent: September 26, 1989
    Inventors: Wahib Farahat, Dennis J. Bellville, Richard L. Shadrach
  • Patent number: 4863827
    Abstract: A process for forming a multi-level positive working photosensitive element. One forms a composition containing an alkali soluble resin, an o-quinonediazide compound and an in-situ generated acid catalyzed crosslinker in a solvent mixture. After coating on a substrate, drying and partially cross-linking the first layer, a second positive working light sensitive layer is applied. Each light sensitive layer is activated by u.v. radiation in different parts of the spectrum. The top layer is imagewise exposed and developed to form a mask. The second layer is flood exposed through this mask and developed. Each development is conducted with an aqueous alkaline solution.
    Type: Grant
    Filed: October 20, 1986
    Date of Patent: September 5, 1989
    Assignee: American Hoechst Corporation
    Inventors: Sangya Jain, Yuh-Loo Chang
  • Patent number: 4828947
    Abstract: A method for making a relief pattern of a cured resin on a transparent colored layer which comprises applying a coating of a photocurable resin composition whose spectral sensitivity varies depending on the pH of the composition, on a transparent colored layer, adjusting the pH of the composition to a predetermined level, and exposing the coating to visible light irradiation through the transparent colored layer. The irradiated layer is developed to obtain a relief pattern corresponding to visible spectra transmitted through the transparent colored layer.
    Type: Grant
    Filed: September 21, 1987
    Date of Patent: May 9, 1989
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Shigehiro Sato, Tokihiko Shimizu
  • Patent number: 4820619
    Abstract: A photosensitive resin composition contains a co-polymer of a glycidyl (meth)acrylate or glycidyl (.alpha.-methyl)vinyl ether with a (meth)acrylic amide or ester having a quaternary ammonium salt structure, and an aromatic azide as a photosensitizer. A color filter can be prepared by coating the composition on a substrate, and exposing and developing the coated composition to form a pattern. The resultant pattern is then dyed.
    Type: Grant
    Filed: November 21, 1986
    Date of Patent: April 11, 1989
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shinichi Sanada, Masataka Miyamura
  • Patent number: 4808501
    Abstract: A color filter is formed on a support, such as a charge coupled device, by (a) forming a layer on a support with a composition comprising a positive photoresist and a dye; said dye being soluble in the solvent of said photoresist; (b) exposing predetermined portions of said layer to radiation adapted to increase the solubility of said coating in the exposed areas; (c) developing said exposed areas to form a pattern of filter elements; and (d) repeating said steps with a different color dye in said composition; wherein said dye constitutes in excess of 10% by weight, dry basis of said composition, is substantially non-absorptive in the exposure wavelength of said composition, and provides predetermined absorptive characteristics for the specified filter element and said dye possessing substantially the same polarity as said composition.
    Type: Grant
    Filed: May 15, 1987
    Date of Patent: February 28, 1989
    Assignee: Polaroid Corporation, Patent Dept.
    Inventor: Carl A. Chiulli
  • Patent number: 4783390
    Abstract: A multi-color image forming material which is in the form of multiple layers on a support, and having, at least two photosensitive layers, the farthest layer from the support being the uppermost photosensitive layer, the photosensitive layers being formed from a water-soluble resin having photocrosslinking ability with diazo resin, a photosensitive water-soluble, organic solvent insoluble diazo resin, and a water dispersible coloring agent which can produce a color tone, each photosensitive layer having a coloring agent which can produce a different color tone; and at least one intermediate layer, each intermediate layer being positioned between each photosensitive layer and the next adjacent photosensitive layer, the intermediate layer being formed from a hydrophobic, water-resistant, organic solvent softenable resin.
    Type: Grant
    Filed: April 1, 1987
    Date of Patent: November 8, 1988
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Hisashi Mino, Norio Yabe, Takeshi Iijima
  • Patent number: 4777111
    Abstract: This invention relates to a composition and method for enhancing the contrast of images of an underlying photolithographic layer. A photographic element, including a photoresist layer, is applied to a substrate. The photoresist layer contains a contrast-enhancing layer including at least one light-sensitive compound capable of producing acidic photoproducts upon exposure to actinic radiation, at least one indicator dye that changes color on exposure to acidic conditions and at least one polymeric binder soluble in water or weakly alkaline aqueous solutions. The photographic element is exposed to active radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer. The photographic element is exposed to actinic radiation sufficient to cause photobleaching of the contrast enhancement layer and exposure of the photoresist layer.
    Type: Grant
    Filed: March 23, 1987
    Date of Patent: October 11, 1988
    Assignee: Fairmount Chemical Company, Inc.
    Inventors: David B. Blumel, Albert S. Deutsch
  • Patent number: 4737436
    Abstract: A method of forming an image on a substrate is described which comprises blending a desired coloring pigment, adding the coloring pigment to a water soluble photoresist, coating the substrate with the pigmented photoresist, exposing the photoresist to actinic radiation to harden the parts of the photoresist occupying the desired image area, and removing with a water based solvent the unexposed photoresist.
    Type: Grant
    Filed: November 18, 1985
    Date of Patent: April 12, 1988
    Assignee: Grafmark International Limited
    Inventor: Colin G. Thompson
  • Patent number: 4729935
    Abstract: A process for the production of photographic images utilizing a photographic element comprising a transparent support and a coating on the support comprising a diazonium composition having a light absorbency of about 45% or less, and a colorant composition, said coating having a light transmission of not more than about 0.1%.
    Type: Grant
    Filed: October 18, 1985
    Date of Patent: March 8, 1988
    Assignee: Hoechst Celanese Corporation
    Inventors: John E. Walls, Major S. Dhillon
  • Patent number: 4692397
    Abstract: A method of producing a light sensitive element wherein a substrate is coated with a photosensitive layer having a particular class of diazonium salts, a colorant and a polyvinyl acetal resin. Upon imagewise exposure it is developed with an aqueous composition of salts and surfactants in the absence of organic solvents.
    Type: Grant
    Filed: November 27, 1985
    Date of Patent: September 8, 1987
    Assignee: American Hoechst Corporation
    Inventor: Shuchen Liu
  • Patent number: 4687728
    Abstract: Radiation sensitive compositions are image-wise exposed and developed to form an image which is then heated to improve its strength as a lithographic printing image or etch resist. The heating is carried out in the presence of a heat sensitive dye which undergoes a color change at a temperature of at least 180.degree. C. so as to obtain an indication of whether or not the heating has been adequate. The dye may be an integral component of the composition or it may be applied to the image, after development, in combination with a substance capable of forming a shield against contaminating residues produced during the heating step.
    Type: Grant
    Filed: May 29, 1984
    Date of Patent: August 18, 1987
    Assignee: Vickers PLC
    Inventors: Christopher W. Folkard, Christopher R. Millross
  • Patent number: 4670371
    Abstract: An image-forming method, wherein the uppermost photosensitive layer of a photosensitive coated face of the multicolor image-forming material is subjected to (A) pattern exposure and the non-exposed area (non-image area) is removed by washing with water and is then dried. Also, an image-forming process, wherein the second photosensitive layer from the top of the photosensitive coated face of a multicolor image-forming material is subjected to (B) pattern exposure through the upper intermediate layer which is contacted with the photosensitive layer and immersed into the organic solvent which softens the resin in the intermediate layer and does not dissolve the components in the photosensitive layer before and after the photocrosslinking reaction except for area on which the image is already formed on the upper layer thereof, the non-exposed area (non-image area) of the second photosensitive layer is removed together with the upper intermediate layer thereof by washing with water and is then dried.
    Type: Grant
    Filed: May 29, 1985
    Date of Patent: June 2, 1987
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Hisashi Mino, Norio Yabe, Takeshi Iijima
  • Patent number: 4659642
    Abstract: This invention relates to positive working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process.
    Type: Grant
    Filed: October 22, 1984
    Date of Patent: April 21, 1987
    Assignee: American Hoechst Corporation
    Inventors: Stephan J. W. Platzer, Gabor I. Koletar, Richard L. Shadrach
  • Patent number: 4642283
    Abstract: A negative working light-sensitive lithographic plate requiring no dampening solution and a plate making process are described, the negative working light-sensitive lithographic plate comprising a support having, in sequence, on said support, (A) a light-sensitive layer containing (1) an o-quinonediazide compound and (2) a coupling component which causes a diazo coupling reaction under a basic environment, and (B) a silicone rubber layer, and the plate making process comprising imagewise exposing the negative working light-sensitive lithographic plate and developing said exposed plate to obtain a lithographic plate requiring no dampening solution, wherein a step of processing with base is carried out after imagewise exposure.
    Type: Grant
    Filed: March 14, 1985
    Date of Patent: February 10, 1987
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hiroshi Takahashi, Yasuhisa Narutomi, Yoshimasa Aotani, Keisuke Shiba
  • Patent number: 4614701
    Abstract: A photocurable resin composition comprising(A) a copolymer composed of, as structural units,(a) 20 to 70% by weight of a hydroxyl group-containing acrylic monomer unit represented by the following formula ##STR1## wherein R.sub.1 and R.sub.2, independently from each other, represent a hydrogen atom, a methyl group or an ethyl group and n is 1, 2 or 3, and(b) 5 to 80% by weight of a nitrogen-containing acrylic monomer unit represented by the following formula ##STR2## wherein R.sub.3 represents a hydrogen atom or a methyl group, X represents 0 or NH, R.sub.4 represents a linear or branched alkylene group having 2 or 3 carbon atoms, R.sub.5, R.sub.6 and R.sub.7, independently from each other, represent a hydrogen atom or a linear or branched alkyl group having 1 to 4 carbon atoms and Y.sup..crclbar. represents an anion of an acid, and(B) a diazo compound or an azide compound.
    Type: Grant
    Filed: September 28, 1984
    Date of Patent: September 30, 1986
    Assignee: Sekisui Fine Chemical Co., Ltd.
    Inventors: Hirofumi Mori, Hitoshi Hori
  • Patent number: 4599295
    Abstract: Disclosed is a photosensitive material which has a first photosensitive layer formed on a support body such as an aluminum plate, a peel-off layer thereon and a second photosensitive layer formed on the peel-off layer in such a manner that the second layer can be photographically exposed to light and photographically developed independently from the first photosensitive layer and the first photosensitive layer may be subsequently photographically exposed with the picture image formed on the second photosensitive layer acting as a photographic mask. After the first photosensitive layer has been photographically developed, the two photosensitive layers may be used for different purposes, for instance, using the first photosensitive layer as a printing plate and the second photosensitive layer as a photographic film for making duplicate printing plates.
    Type: Grant
    Filed: September 14, 1983
    Date of Patent: July 8, 1986
    Assignee: Dainippon Screen Seizo K.K.
    Inventors: Syuzi Kondo, Akira Yamano, Keiji Toei
  • Patent number: 4592992
    Abstract: The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) .alpha.-hydroxy toluene; and(b) C.sub.12 sodium alkyl ether sulfate.
    Type: Grant
    Filed: April 11, 1985
    Date of Patent: June 3, 1986
    Assignee: American Hoechst Corporation
    Inventors: Shane Hsieh, Wayne A. Mitchell
  • Patent number: 4588669
    Abstract: A photosensitive lithographic plate comprising a hydrophilic substrate, a photosensitive diazo resin layer superposed on the substrate, and a layer of a photosensitive polyvinyl acetal resin containing an aromatic azide group in a side chain thereof and having an acid number of 10 to 100 and superposed on the diazo resin layer, and a method for the manufacture of this photosensitive lithographic plate.
    Type: Grant
    Filed: May 9, 1984
    Date of Patent: May 13, 1986
    Assignee: Fuji Chemicals Industrial Co., Ltd.
    Inventor: Takateru Asano
  • Patent number: 4581313
    Abstract: A photosensitive composition containing a polymer, and a photosensitive material utilizing the composition are disclosed. The polymer, which may be in the form of a copolymer, includes a repeating unit of the formula (I): ##STR1## wherein Y is a divalent substituent; Z.sub.1 and Z.sub.2 independently each represents monovalent substituents; p and q are each 0 or an integer of 1 to 4; when p and q are each 2 or more, each of Z.sub.1 and Z.sub.2 may be the same or different; X.sup..crclbar. is an anion. The composition has high sensitivity and is capable of forming an image on a suitable photographic support without causing fog under incandescent lamps. The composition can be used to produce lithographic printing plates having high sensitivity as well as excellent ware resistance.
    Type: Grant
    Filed: December 1, 1983
    Date of Patent: April 8, 1986
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Junji Minamizono, Toshiyuki Sekiya
  • Patent number: 4581308
    Abstract: The present invention relates to a photosensitive masking element for plate making including a support made of a transparent film; a metal thin film layer formed on the support; and a photosensitive masking layer formed on said metal thin film layer and strongly adhering thereto. In preparing masks for various colors, the photosensitive masking material of the present invention makes it unnecessary to fill and retouch ditches corresponding to unnecessary enclosing lines with a correction liquid, resulting in a marked improvement in the efficiency of plate making.
    Type: Grant
    Filed: August 21, 1984
    Date of Patent: April 8, 1986
    Assignee: Kimoto & Co., Ltd.
    Inventors: Takeo Moriya, Yamagata Toshio, Ogura Masako
  • Patent number: 4568628
    Abstract: A water developable printing plate is provided with a photopolymerizable system as a latex comprising a water soluble diazopolymer reaction product of a diazoaryl amine and an aldehyde and an aqueous cationic or nonionic dispersion of a water insoluble polymer. The inclusion of a water miscible organic solvent improves the shelf-life of the photopolymerizable system and the printing plate especially under high humidity conditions.
    Type: Grant
    Filed: October 23, 1984
    Date of Patent: February 4, 1986
    Assignee: Polychrome Corporation
    Inventor: Nils Eklund
  • Patent number: 4556625
    Abstract: The present invention discloses a method of photolytically developing a colored image on a cellulosic material. In this method, the material is contacted with a nitrogen containing polymer in solution and a mono-sulfonyl azide compound in solution. The sample is thereafter exposed to a UV-containing light source for an amount of time sufficient to develop a color thereon.
    Type: Grant
    Filed: November 25, 1983
    Date of Patent: December 3, 1985
    Assignee: Armstrong World Industries, Inc.
    Inventors: Ronald S. Lenox, Anne L. Schwartz, Charles E. Hoyle
  • Patent number: 4551408
    Abstract: A color image forming method wherein a colored, water soluble polymer and a photo-sensitive polymerization initiator are layered upon a transparent base material, exposed to light through a negative original, washed with water to remove unpolymerized material, proofed, and then dyed to an optical density of at least 2.5.
    Type: Grant
    Filed: October 4, 1983
    Date of Patent: November 5, 1985
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Hisashi Mino, Takeshi Iizima
  • Patent number: 4544619
    Abstract: This invention relates to a light sensitive laminate comprising a light sensitive layer of photoresist, a support therefor, and an intermediate protective layer preferably of a light transmitting material disposed between said photoresist layer and said support. In use, the photoresist layer of the laminate is adhered to a base material and the support stripped therefrom, thereby leaving a composite comprising the base material, photoresist layer and intermediate protective layer disposed over said photoresist layer. The intermediate layer serves to protect the photoresist layer from damage such as by abrasion or otherwise during processing, thereby permitting storage of the so-formed composite prior to use. Since the intermediate layer may be of a light transmitting material, photoimaging may take place through the intermediate layer with the intermediate layer subsequently removed by contact with a solvent that is a non-solvent for those areas of photoresist left after development.
    Type: Grant
    Filed: February 29, 1984
    Date of Patent: October 1, 1985
    Assignee: Shipley Company Inc.
    Inventors: Carl W. Christensen, Calvin Isaacson
  • Patent number: 4537851
    Abstract: A water-soluble, positive-working photoresist composition is disclosed which comprises water-soluble aromatic diazonium salt, water-soluble phenolic compound, and water-soluble polymeric compound. When the film of this composition is irradiated with a pattern of actinic ray and then brought into contact with an alkaline gas or solution, the coating of unexposed areas hardens to become water-insoluble. Preferably, when the film is brought into contact with a suspension of powder or dry powder after being hardened, a positive pattern of powder is obtained by the development with water.
    Type: Grant
    Filed: September 12, 1983
    Date of Patent: August 27, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Saburo Nonogaki, Nobuaki Hayashi, Yoshifumi Tomita
  • Patent number: 4530895
    Abstract: The aqueous-alkaline developer solution for radiation-sensitive, positive-working reproduction layers contains silicate and a quaternary ammonium base, such as tetraalkylammonium hydroxide; it may further contain a salt of an organic, optionally substituted, aromatic monocarboxylic acid, for example, a benzoate. This solution is in particular used for developing reproduction layers which contain an o-naphthoquinone diazide as the radiation-sensitive compound and an alkali-soluble resin and which are applied to a support material based on aluminum, which comprises at least one aluminum oxide layer produced by anodic oxidation.
    Type: Grant
    Filed: April 11, 1984
    Date of Patent: July 23, 1985
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Ulrich Simon, Rainer Beutel
  • Patent number: 4530896
    Abstract: This invention relates to a light-sensitive laminate comprising a light-sensitive layer of photoresist, a support therefor, and an intermediate protective layer preferably of a light-transmitting material disposed between said photoresist layer and said support. In use, the photoresist layer of the laminate is adhered to a base material and the support stripped therefrom, thereby leaving a composite comprising the base material, photoresist layer and intermediate protective layer disposed over said photoresist layer. The intermediate layer serves to protect the photoresist layer from damage such as by abrasion or otherwise during processing, thereby permitting storage of the so-formed composite prior to use. Since the intermediate layer may be of a light-transmitting material, photo-imaging may take place through the intermediate layer with the intermediate layer subsequently removed by contact with a solvent that is a non-solvent for those areas of photoresist left after development.
    Type: Grant
    Filed: May 16, 1972
    Date of Patent: July 23, 1985
    Assignee: Shipley Company Inc.
    Inventors: Carl W. Christensen, Calvin Isaacson
  • Patent number: 4526854
    Abstract: A method for forming a pattern of a non-light-emitting black material on the inner surface of a faceplate of a color cathode ray tube is provided, which comprises the steps of forming a photoresist layer of a photoresist containing a water-soluble bisazidocompound, a water-soluble diazocompound, and a water-soluble polymeric material, on an inner surface of a faceplate of a color cathode ray tube, selectively exposing parts of the photoresist layer using a shadow mask so as to photocure the exposed parts, developing the photoresist layer to remove unexposed parts of the photoresist layer, thereby forming dots of the photoresist, forming a film of a non-light-emitting black material on the inner surface of the faceplate including the dots, and removing the dots and the non-light-emitting black material on the dots so as to form holes in the film of the non-light-emitting black material.
    Type: Grant
    Filed: February 18, 1983
    Date of Patent: July 2, 1985
    Assignee: Tokyo Shibaura Denki Kabushiki Kaisha
    Inventors: Shingo Watanabe, Takeo Itou
  • Patent number: 4504566
    Abstract: Multilayer photosolubilizable litho element comprising (1) support, (2) photosolubilizable dye or pigment-containing layer having an optical density in the visible region of the spectrum of at least 2.0 comprising a quinone diazide and at least one acidic polymeric binder, and (3) photosolubilizable layer comprising a quinone diazide compound and at least two acidic polymeric binders having carboxylic acid substituents, one binder having an acid number below 110, preferably poly(methylmethacrylate/methacrylic acid). The element is useful as a single exposure positive contact litho film.
    Type: Grant
    Filed: June 22, 1984
    Date of Patent: March 12, 1985
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Thomas E. Dueber
  • Patent number: 4486529
    Abstract: This invention relates to an improvement in a photochemical process for the preparation of printing plates wherein a printing plate comprising a photosensitive composition coated on a support is exposed to a pattern of laser light, the intensity of which is modulated in accordance with an input source of information and said printing plate is subsequently developed by removal from said support of that portion of the photosensitive coating composition which is not exposed to said pattern of laser light, the improvement comprising utilizing a pattern of laser light generated by a laser at a wavelength greater than about 450 nm, and utilizing as a photosensitive composition a negative-working condensate of a para-aminobenzene diazonium compound, said compound being present in a quality of at least 25% of the total coating weight.
    Type: Grant
    Filed: December 7, 1978
    Date of Patent: December 4, 1984
    Assignee: American Hoechst Corporation
    Inventors: William Jeffers, Douglas Seeley, Raimund J. Faust, Shuchen Liu
  • Patent number: 4486518
    Abstract: A non-silver, positive-working, essentially alkali-insoluble, radiation-sensitive composition, which becomes alkali-soluble on exposure to radiation, comprising a non-silver, positive-acting, essentially alkali-insoluble radiation-sensitive component a radiation absorbing component and an essentially alkali-soluble polymeric binder. A radiation-sensitive element comprising a transparent substrate overcoated with said radiation-sensitive composition. A duplicating film comprising the said element prepared by exposing said composition through the substrate and then image-wise exposing said composition through a mask in front of the composition followed by treatment with an alkaline developer to remove those areas of the composition subjected to both exposures.
    Type: Grant
    Filed: September 21, 1982
    Date of Patent: December 4, 1984
    Assignee: Polychrome Corporation
    Inventors: Jerome Kesselman, James Shelnut, Alan Wilkes
  • Patent number: 4477552
    Abstract: Light-sensitive compositions and materials incorporating such compositions, such as coated films for the production of polymeric resists, comprise a diazo-resin as a sensitizer for the composition and a water-soluble or water-dispersible colloid. In order to stabilize the diazo-resin sensitizer and increase the time between manufacture and use of such light-sensitive compositions and material, a poly-(vinylpyridine) is incorporated in the composition, preferably in the form of a water-soluble salt such as the hydrochloride or sulphate.
    Type: Grant
    Filed: October 28, 1982
    Date of Patent: October 16, 1984
    Assignee: Autotype International Limited
    Inventors: Peter M. G. Day, John W. Jones, John A. Sperry