Imaging Affecting Physical Property Of Radiation Sensitive Material, Or Producing Nonplanar Or Printing Surface - Process, Composition, Or Product Patents (Class 430/269)
  • Patent number: 7833617
    Abstract: The invention relates to a white, coextruded, oriented polyester film with a base layer (B) and with at least one outer layer (A), where the base layer (B) includes from 2 to 35% by weight, based on the weight of the base layer (B), of a whitening pigment and/or void-forming incompatible polymer, and from 0.01 to 15% by weight, based on the weight of the base layer (B), of pigment that absorbs laser energy. The outer layer (A) includes from 1.0 to 35% by weight (based on the weight of the outer layer (A) of whitening pigment and/or void-forming incompatible polymer, and this pigment and/or polymer is identical with or different from the pigment and/or polymer in the base layer (B). The invention further relates to processes for production of these films and to their use as laser-cuttable film.
    Type: Grant
    Filed: October 31, 2007
    Date of Patent: November 16, 2010
    Assignee: Mitsubishi Polyester Film GmbH
    Inventors: Holger Kliesch, Martin Jesberger, Bodo Kuhmann, Ingo Fischer, Cynthia Bennett
  • Patent number: 7811744
    Abstract: A non-photosensitive flexographic liquid or paste precursor comprising a mixture of acrylate oligomers and acrylic or methacrylate monomers, infrared absorbing material, fillers and heat decomposable peroxide, which when heated forms a non-thermoplastic elastomeric solid material in the form of a flexographic printing blank engravable by infrared laser ablation.
    Type: Grant
    Filed: February 21, 2005
    Date of Patent: October 12, 2010
    Assignee: Kodak IL. Ltd.
    Inventor: Murray Figov
  • Patent number: 7810552
    Abstract: In one embodiment, a method of making a heat exchanger is provided, comprising the steps of generating a stereolithography file from design data, slicing the stereolithography file into two-dimensional patterns, and depositing at least one layer of a material having a high thermal conductivity onto a top surface of a substrate to form a heat exchanger. Preferably, the heat exchanger does not require assembly of separate pieces to form the heat exchanger. In another embodiment a heat exchanger made by this embodiment of the method is provided wherein the heat exchanger may have a design comprising tapered fins and/or alternating airfoil cross-sections.
    Type: Grant
    Filed: December 20, 2006
    Date of Patent: October 12, 2010
    Assignee: The Boeing Company
    Inventor: Victor Blakemore Slaughter
  • Patent number: 7790347
    Abstract: A three-dimensional shaped structure is prepared from a multi-photon reactive composition including: (a) at least one reactive species; (b) a multi-photon photoinitiator system; and (c) a plurality of substantially inorganic particles, wherein the particles have an average particle size of less than about 10 microns in diameter.
    Type: Grant
    Filed: July 11, 2008
    Date of Patent: September 7, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Catherine A. Leatherdale, Craig R. Schardt, D. Scott Thompson, Wendy L. Thompson
  • Patent number: 7785494
    Abstract: Compositions consisting of a mixture of filamentary nickel powder(s) and a thermosetting epoxy resin form the basis of anisotropic conductive materials. The filamentary nickel powder has a three-dimensional chain-like network structure. When such filamentary nickel powder is dispersed in a polymer thin film, such as an epoxy resin, it exhibits anisotropic conductivity.
    Type: Grant
    Filed: August 3, 2007
    Date of Patent: August 31, 2010
    Assignee: Teamchem Company
    Inventor: Syh-Tau Yeh
  • Patent number: 7718714
    Abstract: An actinic energy ray-curable resin is obtained by reacting an unsaturated monocarboxylic acid (c) with a terminal epoxy group of an epoxy resin having an unsaturated group and a hydroxyl group in its side chains and an epoxy group in its terminal and further reacting a polybasic acid anhydride (d) with the hydroxyl group of the above-mentioned epoxy resin, wherein the above-mentioned epoxy resin is a product of the polyaddition reaction of a reaction product (I) of a polybasic acid anhydride (a) and a compound (b) having at least one unsaturated double bond and one alcoholic hydroxyl group in its molecule, a compound (II) having at least two carboxyl groups in its molecule, and a bifunctional epoxy compound (III), wherein at least either one of the carboxyl group-containing compound (II) and the bifunctional epoxy compound (III) is a compound containing no aromatic ring.
    Type: Grant
    Filed: September 29, 2006
    Date of Patent: May 18, 2010
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventor: Shoji Minegishi
  • Patent number: 7662490
    Abstract: A near-infrared shield according to the present invention includes a base and a near-infrared absorption layer disposed on one main surface of the base. When the near-infrared shield is irradiated from the near-infrared absorption layer side with xenon light having a wavelength of 380 nm to 1200 nm at an illuminance of 60 W/m2 (an energy density in a range of 300 nm to 400 nm) for 16 hours under a condition of BPT of 63° C. and a relative humidity of 50%, chromaticity changes ?x, ?y of transmitted light, which are shown in a chromaticity diagram of a CIE1931XYZ color system, are 0.005 or less respectively. The near-infrared shield has an excellent near-infrared shielding property and an excellent light resistance, and its near-infrared absorptivity does not deteriorate even after long-term storage.
    Type: Grant
    Filed: November 17, 2005
    Date of Patent: February 16, 2010
    Assignee: Hitachi Maxell, Ltd
    Inventors: Noriaki Otani, Yuji Yamashita, Teruhisa Miyata, Tetsuya Taki
  • Patent number: 7655376
    Abstract: A process comprises (a) providing a substantially inorganic photoreactive composition comprising (1) at least one cationically reactive species, (2) a multi-photon photoinitiator system, and 10 (3) a plurality of precondensed, inorganic nanoparticles; (b) exposing, using a multibeam interference technique involving at least three beams, at least a portion of the photoreactive composition to radiation of appropriate wavelength, spatial distribution, and intensity to produce a two-dimensional or three-dimensional periodic pattern of reacted and non-reacted portions of the photoreactive composition; (c) exposing at least a portion of the non-reacted portion of the photoreactive composition to radiation of appropriate wavelength and intensity to cause multi-photon absorption and photoreaction to form additional reacted portion; (d) removing the non-reacted portion or the reacted portion of the photoreactive composition to form interstitial void space; and (e) at least partially filling the interstitial void space
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: February 2, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Mark T. Anderson, Catherine A. Leatherdale, D. Scott Thompson
  • Patent number: 7622239
    Abstract: A method for making a patterned SiO2 films over TiO2 (Si02/Ti02) under ambient atmospheric conditions, including room temperature, through photo and chemical reactions. The method is simple, convenient and can be performed in a short period of time, typically less than two hours. The patterned TiO2 film is fabricated through photo-irradiation of a photosensitive organic-titanium film using a mask. Silica particles are generated from silicate solution by adjusting pH values to 10 to 8 with hydrochloric acid. The pre-deposited TiO2 film has a strong attraction for the SiO2 particles, leading to the instant formation of SiO2 film over the TiO2 film. The silica films are also amino-silylated with 3-aminopropyltriethoxysilane toward applications such as patternable, location-specific silica-based separation and purification.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: November 24, 2009
    Assignee: University of South Florida
    Inventors: Xiaoling Ding, David P. Fries
  • Publication number: 20090283000
    Abstract: An intaglio printing plate includes a substrate and a photosensitive resin film provided on the substrate. The photosensitive resin film includes a plurality of concave patterns whose depths increase as aperture widths increase.
    Type: Application
    Filed: May 13, 2009
    Publication date: November 19, 2009
    Applicant: SONY CORPORATION
    Inventor: Akihiro Nomoto
  • Patent number: 7608384
    Abstract: Ternary optical data storage method and apparatus for Write Once Read Many Times (WORM) optical data storage with two-photon fluorescent writing and readout. The data storage capacity is limited by the optical resolution of a system. In CD/DVD systems, an increase in the aerial data density has been primarily achieved by decreasing the bit dimension. However, the size of the optical spot (bit) is restricted by limitations imposed by the diffraction of light (Rayleigh criterion). Therefore, technologies that can effectively create and detect spot sizes beyond the diffraction limit (sub-Rayleigh) hold promise to achieving high-density optical storage.
    Type: Grant
    Filed: April 9, 2004
    Date of Patent: October 27, 2009
    Assignee: University of Central Florida Research Foundation, Inc.
    Inventor: Kevin D Belfield
  • Patent number: 7601486
    Abstract: A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer material. The roughening can be achieved by ashing the dark polymer material in an ash chamber. The dark polymer material, preferably a black matrix resin or a polyimide black matrix resin, when ashed in an oxygen rich atmosphere for a short period of time, forms a surface that is capable of absorbing light as well as randomly refracting light it does not absorb. A protective cap layer may be formed on top of the ashed dark polymer material to provide protection for the dark polymer material.
    Type: Grant
    Filed: December 15, 2005
    Date of Patent: October 13, 2009
    Assignee: Texas Instruments Incorporated
    Inventor: Jason Michael Neidrich
  • Patent number: 7541088
    Abstract: The present invention is directed to a biaxially oriented, heat-set, at least two-layer coextruded film formed from polyethylene terephthalate (PET) or polyethylene 2,6-naphthalate (PEN) that optionally includes additional comonomer-derived units. The film includes a base layer and at least one outer layer. The base layer includes a white pigment and a laser absorber which has been coated with a carbonizing polymer.
    Type: Grant
    Filed: September 24, 2007
    Date of Patent: June 2, 2009
    Assignee: Mitsubishi Polyester Film GmbH
    Inventors: Cynthia Bennett, Holger Kliesch, Bodo Kuhmann, Martin Jesberger
  • Patent number: 7541391
    Abstract: Disclosed is an optical device structure comprising a low shrinkage mixture wherein the shrinkage of the mixture is limited after the curing of the mixture during optical device formation. Disclosed also are methods for forming optical devices which comprise the low shrinkage mixture.
    Type: Grant
    Filed: September 2, 2005
    Date of Patent: June 2, 2009
    Assignee: General Electric Company
    Inventors: Thomas Bert Gorczyca, Renato Guida, Kung-Li Justin Deng, Hua Xia
  • Patent number: 7518128
    Abstract: A cleaning arrangement is provided for use in an EUV lithographic apparatus, for example an EUV lithographic apparatus with a Sn source. The cleaning arrangement includes a gas source for a hydrogen containing gas and a hydrogen radical source. The hydrogen radical source is a source of (UV) radiation which induces photo dissociation of the hydrogen. Radicals may reduce Sn oxides (if present) and my form volatile hydrides of Sn deposition and/or carbon deposition. In this way the cleaning arrangement can be used to clean optical elements from Sn and/or C deposition. The EUV source may be used as hydrogen radical source. An optical filter is used to remove undesired EUV radiation and transmit desired UV radiation.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: April 14, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Maarten Marinus Johannes Wilhelmus Van Herpen, Derk Jan Wilfred Klunder
  • Patent number: 7514477
    Abstract: A biocompatible, low-viscosity, radiation-curable composition for producing antimicrobial earpieces contains: a) 20-75 wt. % of one or a plurality of monomeric/oligomeric urethane(meth)acrylates having an acrylate functionality of <4, viscosity <30 Pa s, and molecular weight <3500; b) 5-45 weight % of a monomeric or oligomeric dimethacrylate of bisphenol A or bisphenol F and or of a monomeric aliphatic or cycloaliphatic di(meth)acrylate having a viscosity <6 Pa s; c) 2.5-25 weight % of a cross-linking monomeric or oligomeric component containing 4 methacrylate and/or acrylate functionalities; d) 0-15 wt. % of one or a plurality of monofunctional (meth)acrylates; e) 0.01-5 wt. % of one or a combination of antimicrobially active glass fillers and silver particles; and f) 0.5-6 wt. % of one or a plurality of photoinitiators whose absorption is in the wavelength range of an ND:YVO4 laser beam used or of an actinic radiation source used to promote free radical formation.
    Type: Grant
    Filed: October 12, 2006
    Date of Patent: April 7, 2009
    Assignee: Derve-Otoplastik GmbH
    Inventors: Martin Klare, Reiner Altmann, Michael Kutschinski, Thomas Veit
  • Patent number: 7510815
    Abstract: A removing solution for photosensitive composition for removal of colored pigment-containing photosensitive compositions, comprising at least one solvent selected from the group consisting of alkylene glycol monoalkyl ether carboxylic acid esters, alkoxycarboxylic acid esters and alicyclic ketones, at least one solvent selected from the group consisting of linear amides, cyclic amides, sulfur-containing compounds and cyclic esters, and if desired an aromatic hydrocarbon having 9 or more carbon atoms. The removing solution for photosensitive composition exhibits excellent photosensitive composition removing performance.
    Type: Grant
    Filed: February 9, 2006
    Date of Patent: March 31, 2009
    Assignee: Showa Denko K.K.
    Inventor: Masato Kaneda
  • Patent number: 7507976
    Abstract: A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.
    Type: Grant
    Filed: May 31, 2006
    Date of Patent: March 24, 2009
    Assignee: ASML Netherlands B.V.
    Inventors: Hako Botma, Ewoud Vreugdenhil, Joe Sakai
  • Patent number: 7498115
    Abstract: Photoresists of the invention contain an added acid reaction component together with one or more resins and a photoactive component. Preferred photoresists of the invention can provide processes substrates such as microelectronic wafers with desired iso-dense bias values. Particularly preferred photoresists of the invention are chemically-amplified positive-acting resists and contain an ester-based solvent such as ethyl lactate or propylene glycol methyl ether acetate in addition to the acid reaction component.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: March 3, 2009
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Joan M. Mintz, Michael J. Kaufman, Norman S. Jessiman
  • Patent number: 7479510
    Abstract: Compositions suitable for support in building a three-dimensional object are described. The compositions may include a non-curable component and a curable component not reactive with the non-curable component. The composition may further include a surface-active agent and a stabilizer, wherein the composition has a first viscosity of about 20-500 cps at ambient temperature, and a viscosity lower than 20 cps at a temperature higher than the ambient temperature. After irradiation, the composition results in a solid, a semi-solid or liquid material.
    Type: Grant
    Filed: September 11, 2006
    Date of Patent: January 20, 2009
    Assignee: Objet Geometries Ltd.
    Inventors: Eduardo Napadensky, Avi Levy
  • Publication number: 20080311516
    Abstract: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photobase generator and coupling agent. In the image forming medium, irradiation of the imaging layer causes the photobase generator to generate base that reacts with the coupling agent to produce an image.
    Type: Application
    Filed: June 13, 2007
    Publication date: December 18, 2008
    Applicant: XEROX CORPORATION
    Inventors: Gabriel IFTIME, Tyler B. NORSTEN, Peter M. KAZMAIER
  • Publication number: 20080311517
    Abstract: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photoacid generator and an acid-base indicator. In the image forming medium, irradiation of the imaging layer causes the photoacid generator to generate an acid that reacts with the acid-base indicator to produce an image.
    Type: Application
    Filed: June 13, 2007
    Publication date: December 18, 2008
    Applicant: XEROX CORPORATION
    Inventors: Gabriel IFTIME, Tyler B. NORSTEN, Peter M. KAZMAIER
  • Publication number: 20080311518
    Abstract: An image forming medium includes a substrate and an imaging layer coated on or impregnated into the substrate, where the imaging layer includes a photobase generator and an acid-base indicator. In the image forming medium, irradiation of the imaging layer causes the photobase generator to generate a base that reacts with the acid-base indicator to produce an image.
    Type: Application
    Filed: June 13, 2007
    Publication date: December 18, 2008
    Applicant: XEROX CORPORATION
    Inventors: Gabriel IFTIME, Tyler B. NORSTEN, Peter M. KAZMAIER
  • Patent number: 7462653
    Abstract: A photocurable and thermosetting composition for an ink jet system comprises (A) a monomer having a (meth)acryloyl group and a thermosetting functional group in its molecule, (B) a photoreactive diluent having a weight-average molecular weight of not more than 700 other than the component (A) mentioned above, and (C) a photopolymerization initiator and has a viscosity of not more than 150 mPa·s at 25° C. A solder resist pattern is directly drawn on a printed circuit board by means of an ink jet printer using the above-mentioned composition, and the pattern is primarily cured by irradiation with an active energy ray and then further cured by heating.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: December 9, 2008
    Assignee: Taiyo Ink Manufacturing Co., Ltd.
    Inventors: Masahisa Kakinuma, Masatoshi Kusama, Shigeru Ushiki
  • Publication number: 20080292974
    Abstract: An exposure process is described, for defining in a photoresist layer a plurality of first patterns having a first pitch and a second pattern between them that is wider than one first pattern. A first exposure step is conducted to the photoresist layer with a first photomask that has a plurality of the first patterns without a second pattern between them, wherein the first patterns on the first photomask have the first pitch only. A second exposure step is conducted to the photoresist layer with a second photomask that has a third pattern narrower than the second pattern at a position corresponding to the second pattern. The exposure dose of the first or second exposure step alone is not sufficient to define any pattern in the photoresist layer.
    Type: Application
    Filed: May 21, 2007
    Publication date: November 27, 2008
    Applicant: MACRONIX INTERNATIONAL CO., LTD.
    Inventors: Chih-Hao Huang, Chin-Cheng Yang
  • Patent number: 7435763
    Abstract: Compositions, methods of using the compositions, and solid freeform fabrication (SFF) systems for producing three-dimensional objects are disclosed. One exemplary composition, among others, includes a basic component, an acidic component, at least one monoacrylate component, a light sensitive initiator, and a polar binder. A polymerization reaction between the at least one monoacrylate component and the light sensitive initiator occurs upon exposure to optical energy. The polar binder includes a viscosity modifier and a surface tension modifier. The polar binder is capable of stimulating a crosslinking reaction between the basic component and the acidic component.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: October 14, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Isaac Farr, Terry M. Lambright, Vladek P Kasperchik, Christopher Oriakhi, David A Neel
  • Publication number: 20080241754
    Abstract: A radiation-sensitive composition includes a free-radically polymerizable component, an initiator composition capable of generating free radicals sufficient to initiate polymerization upon exposure to imaging radiation, an infrared radiation absorbing compound, and a polymeric binder. The initiator composition includes a unique polyonium borate comprising a polyvalent onium cation with multiple onium moieties and sufficient organic borate counterions to provide a net neutral charge. The radiation-sensitive composition can be used to prepare a negative-working imageable element that is sensitive to suitable imaging infrared radiation, can be imaged at relatively low energy, and can be developed either on-press or off-press.
    Type: Application
    Filed: March 28, 2007
    Publication date: October 2, 2008
    Inventors: Koji Hayashi, Jianbing Huang
  • Publication number: 20080239263
    Abstract: A lithographic system is arranged to project a pattern from a patterning device onto a substrate. The patterning device includes a first pattern on a first region of the patterning device and a second pattern on a second region of the patterning device. A filter arrangement selectively reduces transmission through the second region of the patterning device of radiation, so as to reduce the intensity of one or more images of the second pattern caused by a portion of the radiation beam which is indirectly incident on the second region of the patterning device.
    Type: Application
    Filed: March 29, 2007
    Publication date: October 2, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Anton Josef Gerard De Vries
  • Publication number: 20080212634
    Abstract: An optical irradiation device for the polarization of alkali metal atoms for the hyperpolarization of noble gases by spin exchange includes at least one semiconductor laser device which can generate laser light which, with regard to its wavelength, is suitable for the polarization of the alkali metal atoms. A polarizer effects circular polarization of the laser light generated by the semiconductor laser device. A device for introducing the laser light into a working region in which the alkali metal atoms to be polarized can be present, and a device for defining a wavelength of the laser light, which can couple part of the laser light back into the semiconductor laser device in order thereby to define the wavelength of the laser light at a predetermined wavelength or a predetermined wavelength range.
    Type: Application
    Filed: June 8, 2005
    Publication date: September 4, 2008
    Applicant: LIMO PATENTVERWALTUNG GMBH & CO. KG
    Inventors: Thomas Mitra, Markus Revermann, Frank Felice
  • Publication number: 20080212057
    Abstract: A substrate comprises a first mark and a second mark. The first mark comprises a first pattern with at least one mark feature formed by a first material and at least one region formed by a second material. The first and second materials have different material characteristics with respect to a substrate treatment process such that a step height in a direction substantially perpendicular to the surface of the substrate may be created by applying the substrate treatment process. The second mark can be provided with a second step height by applying the substrate treatment process. The second step height is substantially different from the first step height.
    Type: Application
    Filed: December 12, 2007
    Publication date: September 4, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Richard Johannes Franciscus Van Haren, Bartolomeus Petrus Rijpers, Harminder Singh, Gerald Arthur Finken
  • Patent number: 7399978
    Abstract: For irradiating a layer a radiation beam is directed and focussed to a spot on the layer, relative movement of the layer relative to the optical element is caused so that, successively, different portions of the layer are irradiated and an interspace between a surface of the optical element nearest to the layer is maintained. Furthermore, at least a portion of the interspace through which the radiation irradiates the spot on the layer is maintained filled with a liquid, the liquid being supplied via a supply conduit and flowing out of an outflow opening through a total projected cross-sectional passage area in a plane parallel to the layer. The outflow opening or a plurality of the outflow openings are positioned such that, seen in a direction perpendicular to the layer, the total cross-sectional area has a centre in the portion of the interspace through which the radiation irradiates the spot.
    Type: Grant
    Filed: November 20, 2003
    Date of Patent: July 15, 2008
    Assignee: Koninklijke Philips Electronics N.V.
    Inventors: Helmar Van Santen, Jacobus Hermanus Maria Neijzen
  • Publication number: 20080149313
    Abstract: In one embodiment, a method of making a heat exchanger is provided, comprising the steps of generating a stereolithography file from design data, slicing the stereolithography file into two-dimensional patterns, and depositing at least one layer of a material having a high thermal conductivity onto a top surface of a substrate to form a heat exchanger. Preferably, the heat exchanger does not require assembly of separate pieces to form the heat exchanger. In another embodiment a heat exchanger made by this embodiment of the method is provided wherein the heat exchanger may have a design comprising tapered fins and/or alternating airfoil cross-sections.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Inventor: Victor Blakemore Slaughter
  • Publication number: 20080149304
    Abstract: In an embodiment of the invention, there is provided a method of making a heat exchanger core component comprising the steps of generating a stereolithography file from design data, slicing the stereolithography file into two-dimensional patterns, repeating the two-dimensional patterns sequentially to produce a three-dimensional core component, and depositing at least one layer of a material having a high thermal conductivity onto a top surface of a base. In another embodiment there is provided a heat exchanger core component made by an embodiment of the method wherein the core component comprises a triply periodic design that is repeated in three dimensions.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Inventor: Victor Blakemore Slaughter
  • Publication number: 20080149299
    Abstract: A method of using a minimal surface or a minimal skeleton to make a heat exchanger component is provided. The method comprises the steps of generating a stereolithography file from design data, slicing the stereolithography file into two-dimensional patterns, repeating the two-dimensional patterns sequentially to produce a three-dimensional minimal surface component or minimal skeleton component, and depositing at least one layer of a material having a high thermal conductivity onto a top surface of a base, wherein the deposited material forms either a three-dimensional minimal surface component or a three-dimensional minimal skeleton component. Also provided are the heat exchanger components made by the embodiments of the method using either minimal surfaces or minimal skeletons.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Inventor: Victor Blakemore Slaughter
  • Patent number: 7387969
    Abstract: A patterned hardmask and method for forming the same, the method including providing a substrate comprising an overlying resist sensitive to activating radiation; forming an overlying hardmask insensitive to the activating radiation; exposing the resist through the hardmask to the activating radiation; baking the resist and the hardmask; and, developing the hardmask and resist to form a patterned resist and patterned hardmask.
    Type: Grant
    Filed: March 18, 2005
    Date of Patent: June 17, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: George Liu, Vencent Chang, Norman Chen, Yao-Ching Ku, Chin-Hsiang Lin, Kuei Shun Chen
  • Publication number: 20080118876
    Abstract: In an embodiment, a ring seal forming apparatus is disclosed, the apparatus including a substrate holder arranged to hold a substrate coated at least in part with resist, and a deep ultraviolet radiation outlet configured to irradiate an area of the resist, relative movement between the substrate holder and the deep ultraviolet radiation outlet being possible, the movement being arranged such that, in use of the apparatus, the area of resist irradiated by the deep ultraviolet radiation outlet is ring-shaped.
    Type: Application
    Filed: December 21, 2006
    Publication date: May 22, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Cheng-Qun Gui, Rudy Jan Maria Pellens
  • Patent number: 7371783
    Abstract: Provided is an alkali-soluble maleimide-based copolymer which comprises, as essential constituents, 5 to 50% by mass of a maleimide monomer unit which is at least one unit selected from the group consisting of a N-cyclohexylmaleimide monomer unit, a N-benzylmaleimide monomer unit and a substituted N-benzylmaleimide monomer unit, 8 to 30% by mass of the (meth)acrylic acid monomer unit and 30 to 87% by mass of a (meth)acrylic acid ester monomer unit and which satisfies the condition represented by the formula: 0.4×X?Y?0.5×X+10 where X is the content, in % by mass, of the N-cyclohexylmaleimide monomer unit, the N-benzylmaleimide monomer unit and the substituted N-benzylmaleimide monomer unit and Y is the content, in % by mass, of the (meth)acrylic acid monomer unit. Also provided are a color filter and a liquid crystal display which are formed by using the ionizing radiation-curable resin composition.
    Type: Grant
    Filed: September 24, 2002
    Date of Patent: May 13, 2008
    Assignees: Nippon Shokubai Co., Ltd., Dainippon Printing Co., Ltd.
    Inventors: Masahiro Tatsuzawa, Kiyoshi Ito, Shinji Hayashi, Shunsuke Sega, Tomonobu Sumino, Minoru Yamaguchi, Tomomasa Kaneko, Kenichi Ueda
  • Patent number: 7368220
    Abstract: A positive resist composition, which comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and a silicon atom; and (D) a solvent, wherein the resin (C) contains at least one of: (C1) a resin having at least one of a fluorine atom and a silicon atom and having an alicyclic structure; and (C2) a resin containing a repeating unit having at least one of a fluorine atom and a silicon atom in a side chain and a repeating unit having an unsubstituted alkyl group in a side chain; and a pattern forming method.
    Type: Grant
    Filed: December 11, 2006
    Date of Patent: May 6, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Hiromi Kanda, Shinichi Kanna
  • Patent number: 7368484
    Abstract: The present invention relates to novel polymeric compositions that exhibit Reverse Thermal Gelation (RTG) properties for use as Support Materials (SM) in the manufacture of three-dimensional objects. These polymers are Temperature Sensitive Polymers that respond with a significant change of properties to a small change in temperature. Temperature Sensitive Polymers exhibit cloud point (CP) or lower critical solution temperature (LCST) in aqueous solutions. Water-soluble Temperature Sensitive Polymers are chosen to give low viscosity liquid at low temperature when dissolved in water and by that to permit easy dispensing at low temperature. Raising the temperature above their gelation temperature (Tgel) will result in solidification of the composition. At its gel position the material has favorable characteristics as a support and building material. The gel layers have the appropriate toughness and dimensional stability to support the model layers during the building process.
    Type: Grant
    Filed: October 10, 2006
    Date of Patent: May 6, 2008
    Assignee: Objet Geometries Ltd.
    Inventor: Avraham Levy
  • Publication number: 20080090058
    Abstract: A thin-film layer structure (100) includes a substrate (102), a plurality of banks (104) with a roughly same height formed on the substrate, and a plurality of thin-film layers (106). The plurality of banks defines a plurality of spaces therein, and the plurality of spaces is arranged in rows and columns. A volume distribution of the plurality of spaces receiving the thin-film layers made of a same material in each row is irregular. A method for manufacturing a thin-film layer structure is also provided.
    Type: Application
    Filed: July 23, 2007
    Publication date: April 17, 2008
    Applicant: ICF TECHNOLOGY LIMITED.
    Inventor: CHING-YU CHOU
  • Patent number: 7358283
    Abstract: A radiation curable composition comprising: A) at least one urethane poly(meth) acrylate compound; B) at least one poly(meth)acrylate compound; C) at least one polyester poly(meth)acrylate compound; D) at least one silicone poly(meth)acrylate compound; E) at least one visible light range free radial photopolymerization initiator; and F) at least one UV light range free radical polymerization initiator.
    Type: Grant
    Filed: April 1, 2005
    Date of Patent: April 15, 2008
    Assignee: 3D Systems, Inc.
    Inventor: Pingyong Xu
  • Publication number: 20080085462
    Abstract: A device manufacturing method is disclosed that includes providing a substrate on a substrate table, the substrate having a target region comprising a plurality of generally planar surfaces, each surface having a different height relative to the substrate table, determining the relative heights of each generally planar surface, projecting a patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of one of the generally planar surfaces, moving the substrate table in a direction substantially parallel to the axis of the beam, and projecting the patterned beam of radiation onto the target region of the substrate such that the focal plane of the beam substantially coincides with the plane of another of the generally planar surfaces.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 10, 2008
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Keith Frank Best, Enno Van Den Brink, Cheng-Qun Gui, Budiman Sutedja, Peter Ten Berge
  • Patent number: 7348128
    Abstract: A photosensitive resin which exhibits excellent storage stability, affinity, miscibility, or solubility with respect to a variety of compounds, and high sensitivity can be solidified even under hydrous conditions as well as exhibiting high cure-related sensitivity and high flexibility and being uniformly solidified even under highly hydrous conditions, a photosensitive resin composition containing the resin, and a novel compound. The photosensitive resin is a saponified poly(vinyl acetate)-based photosensitive resin having a structural unit represented by formula (1): (wherein R1 represents H or Me; R2 represents a linear or branched C2-C10 alkylene group; n is an integer of 1 to 3; X represents m is an integer of 0 to 6; and Y represents an aromatic ring or a single bond).
    Type: Grant
    Filed: November 13, 2003
    Date of Patent: March 25, 2008
    Assignee: Toyo Gosei Co., Ltd.
    Inventors: Seigo Yamada, Masahiro Takano, Mitsuharu Miyazaki, Shin Utsunomiya
  • Publication number: 20080038665
    Abstract: The present invention discloses a photosensitive resin composition which comprises (A) a compound having a molecule with at least one thiirane ring and a total number of a thiirane ring and/or an epoxy ring of at least 2 in the molecule, and (B) a photo acid generator, said composition having a refractive index of at least 1.6, and a method of obtaining a high refractive index periodical structure which comprises subjecting the photosensitive resin composition to photolithography.
    Type: Application
    Filed: June 17, 2004
    Publication date: February 14, 2008
    Inventors: Christopher K. Ober, Yasuharu Murakami
  • Patent number: 7313253
    Abstract: The present invention relates generally to steganography and data hiding. In one implementation we provide a method including: obtaining auxiliary data; providing a mask for a photo-reactive material, the mask corresponding at least in part to the auxiliary data; and exposing the material through the mask to steganographically impart the auxiliary data in the photo-reactive material. The auxiliary data is machine-readable from the exposed material. In another implementation the material is exposed through photolithographic illumination. Of course, other implementations are described and claimed as well.
    Type: Grant
    Filed: January 10, 2007
    Date of Patent: December 25, 2007
    Assignee: Digimarc Corporation
    Inventors: Bruce L. Davis, Geoffrey B. Rhoads
  • Publication number: 20070279605
    Abstract: Exposure systems are disclosed that suppress incidence of infrared radiation from a vacuum pump into a chamber in which exposures are performed under vacuum. An exemplary system includes a chamber, a vacuum pump, an evacuation duct connecting the pump to the chamber, and an infrared-radiation propagation-inhibiting device. The chamber accommodates “exposure components” of the exposure system. The vacuum pump evacuates gas from the chamber. The infrared-radiation propagation-inhibiting device is situated, for example, in the chamber, in an inlet from the chamber into the evacuation duct, and/or in the evacuation duct itself, and impedes the incidence of infrared radiation from the pump into the chamber.
    Type: Application
    Filed: April 24, 2007
    Publication date: December 6, 2007
    Inventor: Shintaro Kawata
  • Patent number: 7300619
    Abstract: A pseudo composite material, may include, inter alia, a first phase and a second phase, wherein each phase may include, inter alia, an organic compound, wherein each phase comprising a multiplicity of construction layers, wherein the layers were deposited by ink-jet printing, wherein the pseudo composite material exhibits non-homogeneous three-dimensional structure. A method is disclosed for the preparation of a pseudo composite material. An apparatus is disclosed for printing a pseudo composite material. Furthermore, there is disclosed a method for printing a three-dimensional object using various suitable materials.
    Type: Grant
    Filed: December 3, 2003
    Date of Patent: November 27, 2007
    Assignee: Objet Geometries Ltd.
    Inventors: Eduardo Napadensky, Eliahu M. Kritchman, Avi Cohen
  • Patent number: 7294446
    Abstract: A data storage device and method of making the storage device wherein a digital and analog image may be stored thereon. The storage device includes a photosensitive layer capable of retaining an optical image thereon, which may be written in a digital format that can also be read digitally.
    Type: Grant
    Filed: October 29, 2001
    Date of Patent: November 13, 2007
    Assignee: Eastman Kodak Company
    Inventors: John P. Spoonhower, David L. Patton
  • Publication number: 20070246441
    Abstract: A resist composition used for the imprint lithography process, a method for forming resist pattern using the same, an array substrate manufactured using the same, and method of fabricating the array substrate includes an additive and the adhesion promoter inducing the chemical bond of the base layer contacting to the UV curable resin. As a result, it is possible for the resist composition to form a high-resolution pattern and to improve the durability of the mold for molding a UV curable resin.
    Type: Application
    Filed: April 23, 2007
    Publication date: October 25, 2007
    Inventors: Jin Wuk Kim, Yeon Heui Nam
  • Patent number: 7285363
    Abstract: A method for crosslinking one or more molecules comprises crosslinking the one or more molecules with a photactivatable crosslinker by one-photon or multi-photon excitation, wherein the crosslinker comprises at least two photoactive groups linked by a bridging moiety, and further wherein the point volume of the activation has at least one dimension of less than about 1 micron. The method is of particular utility for water-soluble molecules, particularly biologically active water-soluble molecules.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: October 23, 2007
    Assignee: The University of Connecticut
    Inventors: Paul J. Campagnola, Amy R. Howell, Jun Wang, Steven L. Goodman