Coating Process Making Radiation Sensitive Element Patents (Class 430/935)
  • Patent number: 8105756
    Abstract: A method and apparatus for preparing a relief printing form from a photosensitive element that includes a photopolymerizable composition layer having an exterior surface and capable of being partially liquefied. The method includes the steps of (a) heating the exterior surface of the photopolymerizable composition layer to a temperature sufficient to cause a portion of the layer to liquefy, forming the liquefied material; and (b) removing the liquefied material; wherein the heating step is performed using vibrationally-induced frictional energy.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: January 31, 2012
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Carl Bernard Arnold, Thomas William Harding
  • Patent number: 8084193
    Abstract: A coating process comprises forming a patterned material layer on a substrate using a self-segregating polymeric composition comprising a polymeric photoresistive material and an antireflective coating material. The polymeric photoresistive material and the antireflective coating material that make up the self segregating composition are contained in a single solution. When depositing this solution on a substrate and removing the solvent, the two materials self-segregate into two layers. The substrate can comprise one of a ceramic, dielectric, metal, or semiconductor material and in some instances a material such as a BARC material that is not from the self segregating composition. The composition may also contain a radiation-sensitive acid generator and a base quencher. This produces a coated substrate having a uniaxial bilayer coating oriented in a direction orthogonal to the substrate with a top photoresistive coating layer and a bottom antireflective coating layer.
    Type: Grant
    Filed: July 12, 2008
    Date of Patent: December 27, 2011
    Assignee: International Business Machines Corporation
    Inventors: Joy Cheng, Dario L Goldfarb, David R Medeiros, Daniel P Sanders, Dirk Pfeifer, Libor Vylicky
  • Patent number: 7823495
    Abstract: The present invention refers to a process for manufacturing ammunition labeled with a sequence of characters which allows identification multiple data items, being said sequence of characters (1) laser-engraved, in one or more components of said ammunition, affording positive identification upon retrieval of an engraved component of said ammunition, even if it is already spent.
    Type: Grant
    Filed: October 14, 2004
    Date of Patent: November 2, 2010
    Assignee: CBC - Companhia Brasileira De Cartuchos
    Inventor: Laudermiro Martini Filho
  • Patent number: 7651833
    Abstract: The present invention relates to a method of preparing a photochromic film or plate comprising printing a photochromic substance in the unit of an independent spot on a part or the whole of a basic material and forming a protective layer on the basic material, on which the photochromic substance is coated, so as to protect the photochromic substance. According to the present invention, the photochromic substance is printed in the unit of an independent spot so that the printed unit spots are isolated from each other, thereby prolonging the life of the photochromic substance.
    Type: Grant
    Filed: September 6, 2006
    Date of Patent: January 26, 2010
    Assignee: LG Chem, Ltd.
    Inventors: Tae-Sik Kang, Sang-Hyuk Im, Seung-Heon Lee, Young-Jun Hong
  • Patent number: 7643126
    Abstract: In the present invention, in the photolithography process in which a certain focus condition has been already set, a film on a substrate is exposed to only zero-order light of a light source transmitted, and then developed to reduce a first portion of the film on the substrate. Further, the film on the substrate is exposed to zero-order light and higher order light of the light source transmitted, and then developed to reduce a second portion of the film on the substrate. Thereafter, the film thicknesses of the first portion and the second portion are measured, and the measured film thicknesses of the first portion and the second portion are converted into line widths of a resist pattern by previously obtained correlations between the film thicknesses and the line widths. The converted line width of the second portion is then subtracted from the converted line width of the first portion, whereby the line width depending only on the focus component is calculated.
    Type: Grant
    Filed: February 27, 2006
    Date of Patent: January 5, 2010
    Assignee: Tokyo Electron Limited
    Inventors: Michio Tanaka, Masahide Tadokoro
  • Patent number: 7635553
    Abstract: A pattern forming method comprising: coating a resist composition on a substrate; adjusting a rotational speed of the substrate within a range of 500 to 1,500 rpm so that a film thickness of the resist composition coated is adjusted; and subjecting the resist composition to drying, exposure and development, wherein the resist composition includes: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation; (B) a resin of which dissolution rate in an alkali developer increases under the action of an acid; (C) a mixed solvent; and (D) a surfactant, and the mixed solvent (C) includes at least one member selected from a group A of solvents and at least one member selected from a group B of solvents, or includes at least one member selected from the group A of solvents and at least one member selected from a group C of solvents: Group A: propylene glycol monoalkyl ether carboxylates, Group B: propylene glycol monoalkyl ethers, alkyl lactates, acetic acid esters, one of cha
    Type: Grant
    Filed: September 28, 2006
    Date of Patent: December 22, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Shinji Tarutani
  • Patent number: 7632631
    Abstract: A method is provided for forming a stable thin film on a substrate. The method includes depositing a co-polymer composition having a first component and a second component onto a substrate to form a stable film having a first thickness. The first component has first dielectric properties not enabling the first component by itself to produce the stable film having the first thickness. However, the second component has second dielectric properties which impart stability to the film at the first thickness. In a preferred embodiment, the second component includes a leaving group, and the method further includes first thermal processing the film to cause a solvent but not the leaving group to be removed from the film, after which second thermal processing is performed to at least substantially remove the leaving group from the film. As a result, the film is reduced to a second thickness smaller than the first thickness, and the film remains stable during both the first and the second thermal processing.
    Type: Grant
    Filed: January 5, 2005
    Date of Patent: December 15, 2009
    Assignee: International Business Machines Corporation
    Inventors: Steven A. Scheer, Colin J. Brodsky
  • Patent number: 7595146
    Abstract: A method of creating a graded anti-reflective coating (ARC) layer on a thin film is described. The method includes forming the thin film on a substrate, forming an ARC layer on the thin film, and applying a solvent to the ARC layer causing it to swell. A photo-resist layer is formed on the swollen ARC layer. A mixing layer is formed by the diffusion of components from the swollen ARC layer to the photo-resist layer and vice versa. The mixing layer has optical qualities that are distinct from those of either of the ARC layer or the photo-resist layer. The mixing layer forms the graded ARC layer.
    Type: Grant
    Filed: March 31, 2008
    Date of Patent: September 29, 2009
    Assignee: Tokyo Electron Limited
    Inventor: Mark H. Somervell
  • Patent number: 7547561
    Abstract: An advanced process control (APC) architecture comprising a process model that incorporates a target offset term is provided. The APC architecture may be applied to a so-called develop inspect critical dimension (DICD) model using the target offset term to correct at least one exposure parameter on the occurrence of an abrupt event. A corresponding event may, for example, concern a modified reflectivity of processed substrates, for example due to a rework of substrates covered by amorphous carbon material.
    Type: Grant
    Filed: November 17, 2005
    Date of Patent: June 16, 2009
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Uwe Schulze, Martin Mazur, Andreas Becker
  • Patent number: 7498122
    Abstract: A solvent-less process for producing a transient document which is capable of self-erasing, wherein the solvent-less process includes a) heating and reacting a photochromic compound and a polymer to form a coating composition, and b) coating the coating composition onto an image-receiving side of a transient document substrate, and further an image forming method using the same solvent-less process and including (i) providing a reimageable medium of a substrate and a photochromic material, wherein the medium is capable of exhibiting a color contrast and an absence of the color contrast; (ii) exposing the medium to an imaging light corresponding to a predetermined image to result in an exposed region and a non-exposed region, wherein the color contrast is present between the exposed region and the non-exposed region to allow a temporary image corresponding to the predetermined image to be visible for a visible time; (iii) subjecting the temporary image to an indoor ambient condition for an image erasing time t
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: March 3, 2009
    Assignee: Xerox Corporation
    Inventors: Gabriel Iftime, Peter M. Kazmaier, Naveen Chopra, San-Ming Yang, Raymond W. Wong
  • Patent number: 7479362
    Abstract: Aspects of the invention provide a method of controlling the solid-state property of the solid-phase surface or controlling forming reactive region. The method can be attained by using a device for ejecting droplets and a molecule for inclusion in a SAM which can be photo-patterned in a short period of time using low energy UV radiation, that is TV radiation having a relatively long wavelength. The invention can provide monomolecular film that is formed from molecules comprising a structural component (B) which is hydrophobic and/or lipophobic, and a structural component (A) which decomposes when irradiated with UV light having a wavelength in the range 254-400 nm to cleave away a part of the molecule having the structural component (B) leaving a residual hydrophilic structural component (C).
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: January 20, 2009
    Assignee: Seiko Epson Corporation
    Inventors: Hitoshi Fukushima, Hiroshi Takiguchi, Tatsuya Shimoda, Takashi Masuda, Richard James Bushby, Stephan Evans, J.P. Jeyadevan, Kevin Critchley
  • Patent number: 7422840
    Abstract: The invention pertains to an apparatus and a process for forming a printing form from a photosensitive element having a cylindrical support, and in particular, to an apparatus and a process for thermally treating the photosensitive element to form a relief pattern and particularly to form a cylindrically-shaped flexographic printing form. The apparatus and process includes supporting the cylindrical support to accommodate thermal treating of photosensitive elements with various sizes of the cylindrical support.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: September 9, 2008
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Dietmar Dudek, Allan Banke, Soren Michael Juul Jorgensen, Helmut Luetke, Andreas Koch
  • Patent number: 7419775
    Abstract: A method of manufacturing a micro-particle dispersion having a hydrophobic protective colloid comprising the steps of: (a) dispensing micro-particles in a hydrophilic dispersant to form a hydrophilic micro-particle dispersion having the hydrophilic dispersant as a protective colloid, and (b) adding a dispersant to the hydrophilic micro-particle dispersion, the dispersant having a functional group capable of ion bonding with a hydrophilic group of the hydrophilic dispersant.
    Type: Grant
    Filed: November 8, 2005
    Date of Patent: September 2, 2008
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventors: Hiroto Ito, Kazuhito Ihara
  • Patent number: 7384732
    Abstract: The invention provides a method of manufacturing a photothermographic material excellent in coating stability with less haze in images, wherein the photothermographic material has, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder and at least one non-photosensitive layer above the image forming layer relative to the support, wherein (1) both the image forming layer and the non-photosensitive layer are formed with an aqueous coating solution, and (2) the coating solution for the image forming layer contains a phthalic acid salt or a salt of a derivative thereof, as well as a photothermographic material formed therewith.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: June 10, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Hajime Nakagawa
  • Patent number: 7323285
    Abstract: A thermal donor element having a dye layer on an extruded substrate, wherein the extruded substrate includes a polyester-containing material and a slip agent, but does not contain silica particles, is disclosed.
    Type: Grant
    Filed: November 15, 2005
    Date of Patent: January 29, 2008
    Assignee: Eastman Kodak Company
    Inventors: David G. Foster, Narasimharao Dontula, Maurice L. Gray, William H. Simpson
  • Patent number: 7314706
    Abstract: A photothermographic material containing an image forming layer having at least a photosensitive silver halide, a non-photosensitive organic silver salt, and a reducing agent for the organic silver salt on one side of a support, and a first non-photosensitive layer containing a dye fixing agent for a water-soluble dye, a second non-photosensitive layer disposed between the support and the first non-photosensitive layer, and a third non-photosensitive layer forming an outermost layer on the other side of the support, wherein at least one layer among the first, second and third non-photosensitive layers contains the water-soluble dye. The invention provides a photothermographic material which exhibits high image quality and excellent image storability, and a manufacturing method thereof.
    Type: Grant
    Filed: December 2, 2005
    Date of Patent: January 1, 2008
    Assignee: FUJIFILM Corporation
    Inventor: Seiichi Yamamoto
  • Patent number: 7294450
    Abstract: A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer is changed under an action of an acid; (C) a basic compound; (D) a surfactant; and (E) a solvent, the production process comprising: preparing a solution containing the component (A); and mixing the solution containing the component (A) with the components (B) to (E), and a chemical amplification-type resist composition produced by the production process.
    Type: Grant
    Filed: July 27, 2006
    Date of Patent: November 13, 2007
    Assignee: FUJIFILM Corporation
    Inventor: Shinji Tarutani
  • Patent number: 7264915
    Abstract: A manufacturing method using an additional heat-treatment process for a donor film with improved surface roughness. The improved donor film, used in a laser induced thermal imaging method, is capable of enhancing the lifetime of products and reducing the defect rates thereof. A manufacturing method for a donor film according to the invention, includes: providing a donor film comprising a base film, a light-to-heat conversion layer and an organic film; heating the donor film to provide a heat-treated donor film; and cooling the heat-treated donor film. The surface roughness of a donor film can be improved, and the non-uniform distribution of a laser on a region subjected to the LITI process can be minimized to prevent the over- or under-transfer of an transferred organic film, etc., and the non-uniform adhesion of the transferred organic film with an acceptor substrate.
    Type: Grant
    Filed: September 12, 2006
    Date of Patent: September 4, 2007
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Myung Won Song, Tae Min Kang, Sam Il Kho, Young Gil Kwon, Mu Hyun Kim, Sun Hoe Kim, Sok Won Noh, Yeun Joo Sung, Jin Wook Seong, Nam Choul Yang, Byeong Wook Yoo, Seong Taek Lee, Jae Ho Lee
  • Patent number: 7223514
    Abstract: A method of fabricating a donor substrate and a method of fabricating an organic light emitting display (OLED) using the donor substrate. The method of fabricating the donor substrate includes preparing a base substrate that includes at least one transfer region and at least one non-transfer region, forming a light-to-heat conversion layer on the base substrate and depositing a transfer layer selectively on the light-to-heat conversion layer and in the at least one transfer region of the base substrate using a shadow mask. To then make the OLED, laser induced thermal imaging is used to transfer the patterned transfer layer from the donor substrate to display regions in an acceptor substrate.
    Type: Grant
    Filed: September 28, 2005
    Date of Patent: May 29, 2007
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Tae-Min Kang, Jae-Ho Lee, Seong-Taek Lee, Jin-Soo Kim
  • Patent number: 7205093
    Abstract: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: April 17, 2007
    Assignee: International Business Machines Corporation
    Inventor: William Dinan Hinsberg, III
  • Patent number: 7195865
    Abstract: Disclosed are a method for preparing grains of silver salt of an organic acid by reacting a solution containing silver ions and a solution containing an alkali metal salt of an organic acid, in which the reaction is performed in sealed mixing means and which comprises steps of supplying the solution containing silver ions into a reaction field solution before introduced into the sealed mixing means, and supplying the solution containing an alkali metal salt of an organic acid into the reaction field solution or sealed mixing means to which the solution containing silver ions has been supplied, etc. According to the present invention, high quality grains of silver salt of an organic acid can be efficiently produced at low cost.
    Type: Grant
    Filed: April 2, 2004
    Date of Patent: March 27, 2007
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoyuki Kawanishi, Takashi Ando, Yoichi Nagai
  • Patent number: 7192680
    Abstract: This invention relates to a method of coating multiple layers on a support comprising a) taking a support; b) simultaneously coating on said support a chill settable layer and a non-chill settable layer; c) lowering the temperature of the layers to immobilize said layers; and d) drying said layers. It further relates to imaging elements made by this process.
    Type: Grant
    Filed: October 17, 2003
    Date of Patent: March 20, 2007
    Assignee: Eastman Kodak Company
    Inventors: Hwei-Ling Yau, James L. Johnston, Yongcai Wang, John L. Pawlak, Douglas H. Axtell
  • Patent number: 7175967
    Abstract: Positive-working imageable elements are prepared by providing a first layer and second layers onto a substrate. Both layers include the same or different radiation absorbing compounds dispersed within different polymeric binders. After both layers are dried, they are heat treated at from about 40 to about 90° C. for at least 4 hours under conditions that inhibit the removal of moisture from the dried first and second layers. This method of preparation provides elements with improved imaging speed and good shelf life.
    Type: Grant
    Filed: March 2, 2006
    Date of Patent: February 13, 2007
    Assignee: Eastman Kodak Company
    Inventors: James L. Mulligan, Eric Clark, Kevin B. Ray
  • Patent number: 7157218
    Abstract: A photothermographic material contains a support having thereon an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, and a non-photosensitive outermost layer on a side of the support where the image forming layer is provided, The photosensitive silver halide contains silver iodide in an amount of from 40 to 100% by mole, and a binder contained in the outermost layer contains at least one of a latex polymer and a water soluble polymer that is not derived from an animal protein in an amount of 50% by mass or more.
    Type: Grant
    Filed: December 30, 2003
    Date of Patent: January 2, 2007
    Assignee: Fujifilm Corporation
    Inventor: Keiichi Suzuki
  • Patent number: 7153626
    Abstract: Methods of forming a dye donor layer of a dye-donor element for a thermal dye transfer system are described. The methods include coating colored particles in a compressed carrier fluid on the substrate of the dye-donor element.
    Type: Grant
    Filed: May 23, 2005
    Date of Patent: December 26, 2006
    Assignee: Eastman Kodak Company
    Inventors: David G. Foster, Maurice L. Gray, Rajesh V. Mehta, Ramesh Jagannathan
  • Patent number: 7144695
    Abstract: The invention relates to a photothermographic material, comprising a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder on a same surface of a support, wherein the non-photosensitive organic silver salt is the non-photosensitive organic silver salt in a dispersion that has been subjected to an annealing treatment at 30° C. or more.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: December 5, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Takayoshi Oyamada
  • Patent number: 7067243
    Abstract: A process for preparing a photothermographic material with increased photosensitivity, the photothermographic material comprising a support and a photo-addressable thermally developable element, exclusive of a compound R—S(M)n wherein R is an aliphatic hydrocarbon, aryl or heterocyclic group, M is a hydrogen atom, or cation, and letter n is a number determined so as to render the molecule neutral and also exclusive of a compound capable of releasing a mobile dye corresponding to or inversely corresponding to the reduction of silver halide to silver at elevated temperatures, the photo-addressable thermally developable element containing a photosensitive agent in catalytic association with a light-insensitive organic silver salt, a reducing agent for the light-insensitive organic silver salt in thermal working relationship therewith and a binder, comprising the steps of: (i) increasing the photosensitivity of a photosensitive silver halide by chemical sensitisation with a chemical sensitising merocyanine dye co
    Type: Grant
    Filed: March 7, 2003
    Date of Patent: June 27, 2006
    Assignee: Agfa Gevaert
    Inventors: Herman Uytterhoeven, Paul Callant
  • Patent number: 6982141
    Abstract: A GaAs substrate 200 is rotated, a photosensitive silicone resist 260 is applied on a surface of the GaAs substrate 200 on which an aperture of a hole 310 to be a via hole, and an inside of the hole 310 to be the via hole is filled in with the photosensitive silicone resist 260. Next, the GaAs substrate 200 is further rotated, changing the number of revolutions (rpm), and the photosensitive silicone resist 260 on the GaAs substrate is flattened. Next, a reverse side of the GaAs substrate is grinded, the hole 310 to be the via hole penetrates the GaAs substrate 200 from the surface to the reverse side and the via hole 220 is formed. Next, a reverse side electrode 240 is formed on the reverse side of the GaAs substrate 200. Next, the GaAs sustrate 200 is divided chip by chip and chips are laid on a substrate for assembly 270 via an adhesive metal 280.
    Type: Grant
    Filed: September 10, 2004
    Date of Patent: January 3, 2006
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Masanobu Nogome, Akiyoshi Tamura, Keiichi Murayama, Kazutsune Miyanaga, Yoshitaka Kuroishi
  • Patent number: 6911300
    Abstract: There is provided a photogravure plate making method capable of performing a quite superior photogravure plate making operation while it has a requisite and sufficient developing latitude under non-heating condition after forming a coating film and while applying a positive O-type thermal resist.
    Type: Grant
    Filed: November 10, 2003
    Date of Patent: June 28, 2005
    Assignee: Think Laboratory Co., Ltd.
    Inventors: Tsutomu Sato, Kaku Shigeta, Tatsuo Shigeta
  • Patent number: 6900000
    Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 ?m or smaller) features.
    Type: Grant
    Filed: June 28, 2002
    Date of Patent: May 31, 2005
    Assignee: Brewer Science Inc.
    Inventors: Ram W. Sabnis, Douglas J. Guerrero, Terry Brewer, Mary J. Spencer
  • Patent number: 6894104
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: May 23, 2002
    Date of Patent: May 17, 2005
    Assignee: Brewer Science Inc.
    Inventors: Gu Xu, Jimmy D. Meador, Mandar R. Bhave, Shreeram V. Deshpande, Kelly A. Nowak
  • Patent number: 6861203
    Abstract: A method for making a printing plate is disclosed comprising mounting a printing plate to a holder; applying a non-permanent patterned coating to an outer surface of the printing plate by moving a coating applicator relative to the holder; and, exposing the printing plate to actinic radiation through the patterned coating without removing the printing plate from the holder. The invention avoids handling-induced damage by performing coating and exposure steps in a single apparatus.
    Type: Grant
    Filed: December 12, 2002
    Date of Patent: March 1, 2005
    Assignee: CREO Inc.
    Inventor: Daniel Gelbart
  • Patent number: 6844129
    Abstract: The present invention provides a heat-developable photosensitive material having a substrate, an undercoat layer and photosensitive layer containing silver behenate in this order, wherein an adhesive roll having an adhesive force of at least 35 hPa is brought into contact with one face or both faces of the photosensitive material before the photosensitive layer is formed, and a method of producing the same.
    Type: Grant
    Filed: September 27, 2002
    Date of Patent: January 18, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yoshimitsu Ito
  • Publication number: 20040253533
    Abstract: The present invention provides a negative working printing plate precursor including a substrate and a thermally sensitive layer. The thermally sensitive layer includes nitrocellulose particles and a photothermal conversion material. The printing plate precursor may be imagewise exposed to radiation and then mounted on a printing press without requiring a separate development step.
    Type: Application
    Filed: June 12, 2003
    Publication date: December 16, 2004
    Inventors: Jeffrey W. Leon, Elizabeth Knight
  • Publication number: 20040234890
    Abstract: Various imaging members including lithographic imaging members can be prepared by applying to a support, an aqueous formulation comprising one or more imaging components to form an imaging layer. Over the imaging layer is directly applied a non-aqueous inverse emulsion comprising highly hydrophilic, water-swellable microgel particles dispersed in a water-immiscible organic solvent to form a protective layer. This protective layer provides physical durability but it is still readily removed during or after imaging with water or fountain solutions.
    Type: Application
    Filed: May 20, 2003
    Publication date: November 25, 2004
    Applicant: Eastman Kodak Company
    Inventors: Jeffrey W. Leon, David B. Bailey
  • Patent number: 6821720
    Abstract: A method of producing a thermal-developable photosensitive material is provided, which prevents mixing of materials between layers to ensure that the coating surface is in a good condition. In this method, liquids for forming a photosensitive layer, an intermediate layer and a protective layer are simultaneously applied in a multilayer form on a substrate to produce a thermal-developable photosensitive material. A pH of the intermediate layer coating liquid is adjusted within a range from 5 to 10 and a viscosity of the intermediate layer coating liquid is adjusted within a range from 20 to 150 mPa·s. Moreover, a pH buffering salt is added to the intermediate layer coating liquid.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: November 23, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Junpei Iwado
  • Patent number: 6811964
    Abstract: A coating liquid for photothermographic materials excellent in photographing performance with high sensitivity and reduced fogging and having satisfactory surface conditions is produced. A silver halide particle feeding solution is added and mixed in a mother liquid of coating liquid during a time period between the instant 30 minutes before a substrate is coated with the produced coating liquid by a coating head and the instant just before the coating is started, and in addition, an in-plant mixer is configured such that a mixing container has an inner surface of a spherical shape, an oblate-spherical shape or a prolate-spherical shape so that a mixing blade forms a mixing area in proximity to any part of the inner surface of the mixing container when a rotation axis supporting the mixing blade is driven in a reciprocal manner, whereby the mixing performance of the in-plant mixer is significantly improved.
    Type: Grant
    Filed: March 26, 2003
    Date of Patent: November 2, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yasushi Sano
  • Publication number: 20040161714
    Abstract: A photothermographic material contains a support having thereon an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder, and a non-photosensitive outermost layer on a side of the support where the image forming layer is provided, The photosensitive silver halide contains silver iodide in an amount of from 40 to 100% by mole, and a binder contained in the outermost layer contains at least one of a latex polymer and a water soluble polymer that is not derived from an animal protein in an amount of 50% by mass or more.
    Type: Application
    Filed: December 30, 2003
    Publication date: August 19, 2004
    Inventor: Keiichi Suzuki
  • Patent number: 6777163
    Abstract: The invention relates to a process and apparatus for forming a photopolymerizable element useful as a flexographic printing plate having at least one layer of particulate material. The process includes forming a layer of a molten photopolymerizable material onto a support; and applying the particulate material onto an exterior surface of the photopolymerizable layer opposite the support within 48 hours of forming the layer of photopolymerizable material. The process optionally includes heating of the surface of the photopolymerizable layer.
    Type: Grant
    Filed: October 2, 2002
    Date of Patent: August 17, 2004
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Roxy Ni Fan, William John Hommes
  • Publication number: 20040146813
    Abstract: A photothermographic material that comprises a support having thereon one or more thermally-developable imaging layers comprising a binder and in reactive association, a photosensitive silver halide, a non-photosensitive source of reducible silver ions, and a reducing composition for the non-photosensitive source reducible silver ions. The thermally-developable layers further comprises one or more radiation absorbing compounds that provide a total absorbance of greater than 0.6 and up to and including 3 in the thermally-developable imaging layer(s). These photothermographic materials are independently coated and dried while the material is conveyed at a rate of at least 5 meters per minute.
    Type: Application
    Filed: January 8, 2004
    Publication date: July 29, 2004
    Inventors: Bryan V. Hunt, Steven H. Kong, William D. Ramsden, Gary E. Labelle
  • Patent number: 6749992
    Abstract: A printing plate for computer-to plate lithography having a laser-ablatable member supported by a substrate. At least one portion of the laser-ablatable member is formed form an acrylic polymer containing laser-sensitive particles. The laser-sensitive particles absorb imaging radiation and cause the portion of the laser-ablatable member containing the laser sensitive particles and any overlying layers to be ablated.
    Type: Grant
    Filed: February 5, 2003
    Date of Patent: June 15, 2004
    Assignee: Alcoa Inc.
    Inventors: David S. Bennett, Sallie L. Blake, Daniel L. Serafin, Jean Ann Skiles, Robert E. Bombalski, Clinton S. Zediak, Gary A. Nitowski, Joseph D. Guthrie
  • Patent number: 6746831
    Abstract: Thermographic and photothermographic materials comprise a barrier layer to provide physical protection and to prevent migration of diffusible imaging components and by-products resulting from high temperature imaging and/or development The barrier layer comprises 15 to 100 weight % of a film-forming cellulose ether polymer. This barrier layer is capable of retarding diffusion of mobile chemicals such as fatty carboxylic acids, developers, and toners. This barrier layer can also include other film-forming polymers to provide a clear and scratch-resistant surface.
    Type: Grant
    Filed: January 27, 2003
    Date of Patent: June 8, 2004
    Assignee: Eastman Kodak Company
    Inventor: Bryan V. Hunt
  • Patent number: 6730461
    Abstract: A photothermographic material that comprises a support having thereon one or more thermally-developable imaging layers comprising a binder and in reactive association, a photosensitive silver halide, a non-photosensitive source of reducible silver ions, and a reducing composition for the non-photosensitive source reducible silver ions. The thermally-developable layers further comprises one or more radiation absorbing compounds that provide a total absorbance of greater than 0.6 and up to and including 3 in the thermally-developable imaging layer(s). These photothermographic materials are independently coated and dried while the material is conveyed at a rate of at least 5 meters per minute.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: May 4, 2004
    Assignee: Eastman Kodak Company
    Inventors: Bryan V. Hunt, Steven H. Kong, William D. Ramsden, Gary E. Labelle
  • Patent number: 6699640
    Abstract: A direct-to-plate method for obtaining a high quality lithographic printing plate is disclosed. The method comprises the application of a continuous layer of a radiation sensitive solution onto a lithographic substrate by means of an ink-jet printhead. Hereby waste of coating solution and contamination of the environment are avoided.
    Type: Grant
    Filed: July 24, 2001
    Date of Patent: March 2, 2004
    Assignee: AGFA-Gevaert
    Inventors: Eric Verschueren, Luc Leenders, Joan Vermeersch, Ludo Joly
  • Patent number: 6692886
    Abstract: An object of the present invention is to provide a method for manufacturing an aluminum printing plate which is superior in fine line reproduction and has no occurrence of spot-like defect in the silver image part. According to the present invention, a method for manufacturing a lithographic printing plate is provided, wherein an aluminum plate subjected to at least graining treatment and anodizing treatment is rinsed with water, then coated with a liquid containing physical development nuclei, and subsequently coated with a silver halide emulsion layer.
    Type: Grant
    Filed: March 8, 2002
    Date of Patent: February 17, 2004
    Assignee: Mitsubishi Paper Mills Limited
    Inventor: Jun Yamada
  • Publication number: 20030235786
    Abstract: Anti-reflective compositions and methods of using these compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system.
    Type: Application
    Filed: June 25, 2002
    Publication date: December 25, 2003
    Applicant: BREWER SCIENCE, INC.
    Inventors: Vandana Krishnamurthy, Charles J. Neef, Juliet A.M. Snook
  • Publication number: 20030232131
    Abstract: In a method and an apparatus for coating an object with photosensitive material, a roller stabilizes a supply amount of the photosensitive material and is disposed between the object and a slit coater, so that the stabilized photosensitive material is supplied to the object through the slit coater. The photosensitive material includes additives for controlling amount of a solid powder, a boiling point and a surface tension thereof. Accordingly, the photosensitive material may be uniformly coated on the object.
    Type: Application
    Filed: May 1, 2003
    Publication date: December 18, 2003
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Sung-Ki Jung
  • Publication number: 20030219663
    Abstract: The present invention relates to an imaging member comprising an imaging layer and at least one stiffening layer comprising a blend of polyolefin polymer and amorphous hydrocarbon resin. The invention further describes a method for making the imaging member, comprising extruding a foam polymer sheet, orienting the foam polymer sheet, bringing a stiffening layer comprising a blend of polyolefin polymer and amorphous hydrocarbon resin into contact with the oriented foam polymer sheet, and applying an imaging layer above the stiffening layer. A second method of forming an imaging member comprises extruding a foam polymer sheet, bringing at least one stiffening layer comprising a blend of polyolefin polymer and amorphous hydrocarbon resin into contact with the foam polymer sheet, orienting said foam polymer sheet and said stiffening layer and applying an imaging layer above said stiffening layer.
    Type: Application
    Filed: May 24, 2002
    Publication date: November 27, 2003
    Applicant: Eastman Kodak Company
    Inventors: Suresh Sunderrajan, Narasimharao Dontula, Peter T. Aylward, Nicholas I. Phippen
  • Patent number: 6649320
    Abstract: A process for producing a donor sheet for a thin-film formation comprising: while transporting a sheet on which a light-to-heat conversion layer has already been formed, forming a transfer layer on the light-to-heat conversion layer and drying the transfer layer.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: November 18, 2003
    Assignee: Sharp Kabushiki Kaisha
    Inventor: Yoshitaka Kawase
  • Patent number: RE40920
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: May 1, 2007
    Date of Patent: September 22, 2009
    Assignee: Brewer Science Inc.
    Inventors: Gu Xu, Jimmy D. Meador, Mandar R. Bhave, Shreeram V. Deshpande, Kelly A. Nowak