Methods (156/1)
Foreign Patent Art Collections
- Measuring, testing, or inspecting (156/626.1) (Class 438/FOR101)
- Altering the etchability of a substrate by alloying, diffusing, or chemical reacting (156/628.1) (Class 438/FOR103)
- With uniting of preforms (e.g., laminating, etc.) (156/629.1) (Class 438/FOR104)
- With in situ activation or combining of etching components on surface (156/635.1) (Class 438/FOR110)
- With thin film of etchant between relatively moving substrate and conforming surface (e.g., chemical lapping, etc.) (156/636.1) (Class 438/FOR111)
- With relative movement between the substrate and a confined pool of etchant (156/637.1) (Class 438/FOR112)
- Projection of etchant against a moving substrate or controlling the angle or pattern of projected etchant (156/640.1) (Class 438/FOR115)
- Recycling or regenerating etchant (156/642.1) (Class 438/FOR116)
- With treatment by high energy radiation or plasma (e.g., ion beam, etc.) (156/643.1) (Class 438/FOR117)
- Forming or increasing the size of an aperture (156/644.1) (Class 438/FOR118)
- With mechanical deformation, severing, or abrading of a substrate (156/ 645.1) (Class 438/FOR119)
- Etchant is a gas (156/646.1) (Class 438/FOR120)
- Etching according to crystalline planes (156/647.1) (Class 438/FOR121)
- Etching isolates or modifies a junction in a barrier layer (156/648.1) (Class 438/FOR122)
- Sequential application of etchant material (156/650.1) (Class 438/FOR124)
- Differential etching of a substrate (156/654.1) (Class 438/FOR128)
- Silicon, germanium, or gallium containing substrate (156/662.1) (Class 438/FOR134)
There are no patents to show for this class.
