Abstract: A charged particle beam writing apparatus according to an embodiment, includes a storage device configured to store write data which is to be written by using a charged particle beam and in which a plurality of patterns with different writing precision is defined; a cutout unit configured to read data of each pattern from the storage device and to cut out a partial pattern, among a pattern, in the plurality of patterns, whose writing precision is on a low-precision side, positioned within a range of influence of a proximity effect from a region edge of a pattern, in the plurality of patterns, whose writing precision is on a high-precision side; a merge processing unit configured to perform merge processing of a cut-out partial pattern on the low-precision side and the pattern on the high-precision side; and a pattern writing unit configured to write a pattern obtained by the merge processing and a remaining partial pattern on the low-precision side remaining without being merged with the pattern on the high-p

Abstract: Reflected and scattered electrons generated by emitting an electron beam onto a substrate are detected by a detecting unit. The product of the area (SN) and the irradiation time (tN) of the Nth shot in a predetermined measurement unit obtained from writing data is computed by a computing unit. The value obtained by accumulating an instructed equivalent value in the predetermined measurement unit and the value obtained by integrating the signal (DN) from the detecting unit in the predetermined measurement unit are compared and determined by a comparing unit to determine whether or not abnormality occurs in the irradiation amount of the electron beam.

Abstract: The controller includes a deflection signal generator for generating a deflection signal for causing the electron beam to deflect and perform overwriting so that a beam spot of the electron beam follows the translation of the substrate over a period during which the substrate is rotated over a predetermined number of overwriting cycles; and a data output unit for outputting the drawing data, wherein, the deflection signal generator generates a deflection adjustment signal for irradiating the electron beam at a starting position for drawing a concentric circle to be subsequently overwritten after a predetermined deflection adjustment period has elapsed since overwriting of concentric circles based on the drawing data has completed.

Abstract: An optical disk device includes: a light emitting element which applies light to an optical disk; a light detection unit which receives the light emitted from the light emitting element and outputs an intensity signal corresponding to an intensity of the light emitting element; a difference detection unit which generates a control signal based on a difference between the intensity signal and a reference intensity signal; a first current supply unit which supplies a first current based on the control signal; a second current supply unit which supplies a second current; a current adding unit which adds the first and second currents to generate a third current and supplies the third current to the light emitting element; an optical pickup on which the first current supply unit and the adding unit are placed; and a circuit board on which the second current supply unit is placed.

Abstract: In an information memory apparatus having minute areas for storing information arranged in x, y and z directions three-dimensionally, parallel rays are irradiated to a memory area MA in a direction perpendicular to a z-axis to take projection images of the memory area MA while rotating the memory area MA around the z-axis little by little. The light rays irradiated at this time have a size which covers at least a direction of an x-y plane of the memory area. A computation unit PU finds data and addresses of minute areas distributed three-dimensionally by performing computation based upon the principle of computer tomography on the projection images. As for data writing, a change is given to optical transmissivity or light emission characteristics by irradiating laser light focused by a lens OL placed outside the memory area to a desired minute area and causing heat denaturation within the pertinent minute area.