Abstract: A dual damascene process and structure for fabricating semiconductor devices are disclosed. In one embodiment of the invention, a protection layer is deposited on top of a metal layer to protect the metal layer during subsequent etching of an oxide layer to form the via and damascene trench. Because the selectivity between the oxide layer and the protection layer is high, the number and complexity of processing steps are thereby reduced. Other embodiments of the present invention use a metal sealant layer and/or anti-reflective coating in conjunction with the protection layer in a dual-damascene process.

Abstract: A current source for providing matched currents at low and variable bias voltages. The current source includes a first circuit, a second circuit, and a biasing circuit. The first circuit provides a first current. The first circuit includes a first transistor with a control terminal, a first terminal, and second terminal. A second circuit provides an output current to an output node. The second circuit includes a second transistor with a control terminal, a first terminal, and second terminal. The biasing circuit includes a third transistor with a control terminal, a first terminal, and second terminal. The biasing circuit also includes a fourth transistor with a control terminal, a first terminal, and second terminal. The biasing circuit provides a voltage at the first terminal of the third transistor and a voltage at the control terminal of the second transistor so that a voltage at the first terminal of the second transistor and a voltage at the second terminal of the first transistor match.

Abstract: An active pixel sensor including low threshold voltage transistors advantageously provides an increased output swing over an active pixel sensor of the prior art. The low threshold voltage transistor can be achieved using either a native transistor or a depletion mode transistor. In a process in which a threshold adjustment implant step is separately masked, the active pixel sensor of the present invention can be manufactured with no additional masking requirements. In one embodiment, a low threshold voltage (VTN) allows a transistor acting as a reset switch to operate in the linear region, and allowing the reset switch transistor to share a common supply voltage source with a readout amplifier transistor.

Abstract: The present invention provides an improved interpreter for stack-based languages. In one embodiment, a method includes executing a first interpreter for a first state, and executing a second interpreter for a second state. In particular, the first state indicates that no elements of a stack are stored in registers of a microprocessor, and a second state indicates that an element of the stack is stored in a register of the microprocessor.