Abstract: An animal fluid injector, replaceable syringe and method of replacement of the syringe in the injector are provided in which the syringe is loadable and unloadable into and from the injector through the open front end of a pressure jacket of the injector, thereby permitting replacement without retraction of the syringe plunger drive or disconnection of the injection tubing. The syringe is provided with a pressure restraining front end, such as an integral or removable cap with structure such as threads that lock the syringe to the front end of the jacket by mating with threads on the jacket. A mechanism in the injector, which includes, for example, a key on cam ring operated by a lever with one hand of an operator, interacts with structure such asymmetrically spaced notches on the back end of the syringe to, for example, rotate the syringe and simultaneously translate or rotate a coupling on the syringe plunger into and out of engagement with the plunger drive in the injector.

Abstract: A paving stone is provided that can be laid in a plurality of open patterns, each presenting a different amount of drainage area, while retaining an interlocking relationship between adjacent stones of the pattern. In the preferred embodiment, the stone can also be laid in a closed pattern, with no drainage areas provided other than the drainage at the boundaries of the stones. Each side surface of the stone has an odd number of faces, arranged in a stair-step shape. Preferably, each of the side surfaces is symmetrical about the center face, and all sides, or at least opposite sides, are identical.

Abstract: An expendable target of sputter coating material is provided having secured thereto a storage medium having recorded thereon, in machine readable indicia, information relating to a characteristic of the target. The information preferably includes target identifying information and may also include information relating to the target composition, the history of the use of the target, and other information usable by the apparatus to automatically set machine parameters or to record process information. Information, particularly of the use of the target, may be updated and written to a medium on the target or target assembly, or to a machine readable medium which may be affixed to the target assembly when the target is removed. The apparatus preferably includes a read head in the sputtering chamber and may also include a write head for writing information to the target assembly.

Abstract: An animal fluid injector, replaceable syringe and method of replacement of the syringe in the injector are provided in which the syringe is loadable and unloadable into and from the injector through the open front end of a pressure jacket of the injector, thereby permitting replacement without retraction of the syringe plunger drive or disconnection of the injection tubing. The syringe is provided with a pressure restraining front end, such as an integral or removable cap with structure such as threads that lock the syringe to the front end of the jacket by mating with threads on the jacket. A mechanism in the injector, which includes, for example, a key on cam ring operated by a lever with one hand of an operator, interacts with structure such asymmetrically spaced notches on the back end of the syringe to, for example, rotate the syringe and simultaneously translate or rotate a coupling on the syringe plunger into and out of engagement with the plunger drive in the injector.

Abstract: An electron cyclotron resonance plasma generator is provided in a semiconductor wafer plasma processing apparatus and cluster tool module, particularly for use in soft etching. The generator generates a uniform plasma by rotating a plasma producing resonance supporting magnetic field about the axis of a resonance cavity within the vacuum chamber of a plasma processor. The rotated field preferably is a single-cusp or multicusp field. Gas uniformly flows into and through the cavity from a gas distribution shower. Microwave energy is evenly divided and coupled into the cavity in a TM.sub.01 mode by a plurality of axially and radially aligned loops.

Abstract: A semiconductor wafer processing apparatus, particularly a CVD reactor, is provided with plasma cleaning electrodes integrated into process gas flow shaping structure that smoothly directs the gas past the wafer on a susceptor. The processing apparatus preferably has a showerhead or other inlet to direct a gas mixture onto a wafer and a plurality of baffles to reduce turbulence. Plasma cleaning electrodes are included in the baffles or the showerhead or both, one or more of which preferably have cleaning gas outlet orifices therein, preferably evenly distributed around the axis of the susceptor to provide uniform cleaning gas flow.

Abstract: A cold wall CVD reactor, particularly one for use in depositing TiN in a TiCl.sub.4 +NH.sub.3 reaction, is provided with a metallic liner insert in partially thermally insulated from the reactor wall which serves as one plasma electrode to form a weak secondary plasma when energized along with a second electrode near the vacuum exhaust port of the reactor. The plasma, in cooperation with radiant lamps provided to heat a wafer substrate onto which the primary CVD film is to be applied, heats the liner and a portion of the space adjacent the reactor walls and susceptor surfaces downstream of the reaction volume to cause the formation of deposits to be of the nature that can be removed by plasma cleaning without opening the reactor volume. Deposits such as TiN.sub.x Cl.sub.y and TiN form at temperatures of approximately 200.degree. C. to 650.degree. C., preferably between 300.degree. C. and 450.degree. C., rather than adduct ammonia salts of TiCl.sub.4, which would tend to form at temperatures of 200.degree. C.

Abstract: A nail and dimpler driving apparatus for a nailing gun is provided having a barrel with a short hardened metal dimpler which slides longitudinally in the end of the barrel and comprises a hardened metal piston having a broadened face at its end extending symmetrically on opposite sides of a metal plunger which extends longitudinally from the lower center of the piston face in alignment with an orifice through the dimpler. The piston reciprocates to impact a shoulder at the inner end of the dimpler. The barrel has a longitudinal rail extending along the top of its bore to maintain the piston and dimpler in angular alignment and to guide nails fed into the bore from an opening located in the side of the barrel between the tip of the retracted plunger and the dimpler shoulder. The rail has a longitudinal groove in its lower edge to aid in guiding the nails and in providing clearance for the residue of web material used to join the nails in flexible collated strips.