Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
July 11, 2002
Date of Patent:
May 31, 2005
Molecular Imprints, Inc.
Sidlgata V. Sreenivasan, Michael P. C. Watts, Byung Jin Choi, Mario J. Meissl, Norman E. Schumaker, Ronald D. Voisin