Patents Represented by Attorney, Agent or Law Firm L. E. Carnahan
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Patent number: 6624760Abstract: A wireless monitoring system suitable for a wide range of remote data collection applications. The system includes at least one Electronic Sensor Platform (ESP), an Interrogator Transceiver (IT) and a general purpose host computer. The ESP functions as a remote data collector from a number of digital and analog sensors located therein. The host computer provides for data logging, testing, demonstration, installation checkout, and troubleshooting of the system. The IT transmits signals from one or more ESP's to the host computer to the ESP's. The IT host computer may be powered by a common power supply, and each ESP is individually powered by a battery.Type: GrantFiled: May 30, 2000Date of Patent: September 23, 2003Assignees: Sandia National Laboratories, Honeywell Federal Mfg. & Technologies, LLCInventors: Robert L. Kinzel, Larry R. Sheets
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Patent number: 6620458Abstract: A two-step method for producing monolithic alumina aerogels having porosities of greater than 80 percent. Very strong, very low density alumina aerogel monoliths are prepared using the two-step sol-gel process. The method of preparing pure alumina aerogel modifies the prior known sol method by combining the use of substoichiometric water for hydrolysis, the use of acetic acid to control hydrolysis/condensation, and high temperature supercritical drying, all of which contribute to the formation of a polycrystalline aerogel microstructure. This structure provides exceptional mechanical properties of the alumina aerogel, as well as enhanced thermal resistance and high temperature stability.Type: GrantFiled: September 27, 2001Date of Patent: September 16, 2003Assignee: The Regents of the University of CaliforniaInventors: John F. Poco, Lawrence W. Hrubesh
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Patent number: 6617228Abstract: A method for enhancing the equilibrium solubility of boron and indium in silicon. The method involves first-principles quantum mechanical calculations to determine the temperature dependence of the equilibrium solubility of two important p-type dopants in silicon, namely boron and indium, under various strain conditions. The equilibrium thermodynamic solubility of size-mismatched impurities, such as boron and indium in silicon, can be raised significantly if the silicon substrate is strained appropriately. For example, for boron, a 1% compressive strain raises the equilibrium solubility by 100% at 1100° C.; and for indium, a 1% tensile strain at 1100° C., corresponds to an enhancement of the solubility by 200%.Type: GrantFiled: September 18, 2002Date of Patent: September 9, 2003Assignee: The Regents of the University of CaliforniaInventors: Babak Sadigh, Thomas J. Lenosky, Tomas Diaz de la Rubia, Martin Giles, Maria-Jose Caturla, Vidvuds Ozolins, Mark Asta, Silva Theiss, Majeed Foad, Andrew Quong
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Patent number: 6602473Abstract: A silicon-based sleeve type chemical reaction chamber that combines heaters, such as doped polysilicon for heating, and bulk silicon for convection cooling. The reaction chamber combines a critical ratio of silicon and non-silicon based materials to provide the thermal properties desired. For example, the chamber may combine a critical ratio of silicon and silicon nitride to the volume of material to be heated (e.g., a liquid) in order to provide uniform heating, yet low power requirements. The reaction chamber will also allow the introduction of a secondary tube (e.g., plastic) into the reaction sleeve that contains the reaction mixture thereby alleviating any potential materials incompatibility issues.Type: GrantFiled: April 7, 2000Date of Patent: August 5, 2003Assignee: The Regents of the University of CaliforniaInventor: M. Allen Northrup
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Patent number: 6586734Abstract: A hyperbaric hydrothermal atomic force microscope (AFM) is provided to image solid surfaces in fluids, either liquid or gas, at pressures greater than normal atmospheric pressure. The sample can be heated and its surface imaged in aqueous solution at temperatures greater than 100° C. with less than 1 nm vertical resolution. A gas pressurized microscope base chamber houses the stepper motor and piezoelectric scanner. A chemically inert, flexible membrane separates this base chamber from the sample cell environment and constrains a high temperature, pressurized liquid or gas in the sample cell while allowing movement of the scanner. The sample cell is designed for continuous flow of liquid or gas through the sample environment.Type: GrantFiled: June 28, 2002Date of Patent: July 1, 2003Assignee: The Regents of the University of CaliforniaInventors: Kevin G. Knauss, Carl O. Boro, Steven R. Higgins, Carrick M. Eggleston
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Patent number: 6575965Abstract: A medical device is constructed in the basic form of a catheter having a distal end for insertion into and manipulation within a body and a proximal end providing for a user to control the manipulation of the distal end within the body. A fiberoptic cable is disposed within the catheter and having a distal end proximate to the distal end of the catheter and a proximal end for external coupling of laser light energy. A laser-light-to-mechanical-power converter is connected to receive light from the distal end of the fiber optic cable and may include a photo-voltaic cell and an electromechanical motor or a heat-sensitive photo-thermal material. An electronic sensor is connected to receive electrical power from said distal end of the fiberoptic cable and is connected to provide signal information about a particular physical environment and communicated externally through the fiberoptic cable to the proximal end thereof.Type: GrantFiled: November 16, 2000Date of Patent: June 10, 2003Assignee: The Regents of the University of CaliforniaInventors: Joseph P. Fitch, Dennis L. Matthews, Karla G. Hagans, Abraham P. Lee, Peter Krulevitch, William J. Benett, Robert E. Clough, Luiz B. DaSilva, Peter M. Celliers
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Patent number: 6576459Abstract: A sample preparation and analysis device which incorporates both immunoassays and PCR assays in one compact, field-portable microchip. The device provides new capabilities in fluid and particle control which allows the building of a fluidic chip with no moving parts, thus decreasing fabrication cost and increasing the robustness of the device. The device can operate in a true continuous (not batch) mode. The device incorporates magnetohydrodynamic (MHD) pumps to move the fluid through the system, acoustic mixing and fractionation, dielectropheretic (DEP) sample concentration and purification, and on-chip optical detection capabilities.Type: GrantFiled: March 23, 2001Date of Patent: June 10, 2003Assignee: The Regents of the University of CaliforniaInventors: Robin R. Miles, Amy W. Wang, Christopher K. Fuller, Asuncion V. Lemoff, Kerry A. Bettencourt, June Yu
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Patent number: 6576116Abstract: Joule (ohmic) heating and electro-osmosis are combined in a hybrid process for removal of both water-soluble contaminants and non-aqueous phase liquids from contaminated, low-permeability soil formations that are saturated. Central to this hybrid process is the partial desaturation of the formation or layer using electro-osmosis to remove a portion of the pore fluids by induction of a ground water flow to extraction wells. Joule heating is then performed on a partially desaturated formation. The joule heating and electro-osmosis operations can be carried out simultaneously or sequentially if the desaturation by electro-osmosis occurs initially. Joule heating of the desaturated formation results in a very effective transfer or partitioning of liquid state contaminants to the vapor phase. The heating also substantially increases the vapor phase pressure in the porous formation.Type: GrantFiled: June 13, 1997Date of Patent: June 10, 2003Assignee: The Regents of the University of CaliforniaInventors: Charles R. Carrigan, John J. Nitao
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Patent number: 6569293Abstract: A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for producing hardened surfaces, surfacing machine tools, etc. and for ultra-thin band pass filters as well as the low Z element in low Z/high Z optical components, such as mirrors which enhance reflectivity from grazing to normal incidence.Type: GrantFiled: June 9, 1997Date of Patent: May 27, 2003Assignee: The Regents of the University of CaliforniaInventors: Daniel M. Makowiecki, Alan F. Jankowski
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Patent number: 6562054Abstract: Highly flexible liposuction cannulas are constructed of metal and plastic, with the metal cannulas having diameters of between 2.0 and 3.5 mm, and with the plastic cannulas having diameters greater than 3.5 mm (i.e., 3.5 to 9.0 mm). These long shaft flexible cannulas, when utilized in combination with a reinforced neck, allow the cannula point of entry to act as a fulcrum (with an optional interposed insert) and in concert with the surgeon's guiding hand to deflect the cannulas. The cannula tip is preferably highly beveled with an adjacent set of three openings, and the cannula easily penetrates fibrous fat and may reach fast deposits relatively distant from the entrance wounds. The long shaft, highly flexible, reinforced swan neck cannulas move in an easily controllable manner within the subcutaneous tissue below the dermal envelope in an arciform fashion. Benefits include a reduced need to move a patient's body position intraoperatively.Type: GrantFiled: July 26, 2000Date of Patent: May 13, 2003Inventors: Paul J. Weber, Luiz B. DaSilva, Michael R. Weber
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Patent number: 6562404Abstract: A process for coating the inside surfaces of silicon microflow devices, such as electrophoresis microchannels, with a low-stress, conformal (uniform) silicon nitride film which has the ability to uniformly coat deeply-recessed cavities with, for example, aspect ratios of up to 40:1 or higher. The silicon nitride coating allows extended exposure to caustic solutions. The coating enables a microflow device fabricated in silicon to be resistant to all classes of chemicals: acids, bases, and solvents. The process involves low-pressure (vacuum) chemical vapor deposition. The ultra-low-stress silicon nitride deposition process allows 1-2 &mgr;m thick films without cracks, and so enables extended chemical protection of a silicon microflow device against caustics for up to 1 year. Tests have demonstrated the resistance of the films to caustic solutions at both ambient and elevated temperatures to 65° C.Type: GrantFiled: August 25, 2000Date of Patent: May 13, 2003Assignee: The Regents of the University of CaliforniaInventors: James A. Folta, Mark Zdeblick
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Patent number: 6558523Abstract: An input port geometry, with injector-concentrator electrodes, for planar microchannel array for electrophoresis. This input port geometry enables efficient extraction and injection of the DNA sample from a single input port. The geometry, which utilizes injector-concentrator electrodes, allows simultaneous concentration, in different channels, of the sample into a longitudinally narrow strip just before releasing it for a run with enhanced injection spatial resolution, and time resolution. Optional multiple electrodes, at a different bias than the concentrator electrodes, may be used to discriminate against sample impurity ions. Electrode passivation can be utilized to prevent electrolysis. An additional electrode in or on the input hole can better define the initial loading. The injector-concentrator electrodes are positioned so that they cross the drift channel in a narrow strip at the bond plane between the top and bottom plates of the instrument and are located close to the inlet hole.Type: GrantFiled: April 10, 2000Date of Patent: May 6, 2003Assignee: The Regents of the University of CaliforniaInventor: Stefan P. Swierkowski
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Patent number: 6555017Abstract: An apparatus and method for modifying the surface of an object by contacting said surface with a liquid processing solution using the liquid applicator geometry and Marangoni effect (surface tension gradient-driven flow) to define and confine the dimensions of the wetted zone on said object surface. In particular, the method and apparatus involve contouring or figuring the surface of an object using an etchant solution as the wetting fluid and using realtime metrology (e.g. interferometry) to control the placement and dwell time of this wetted zone locally on the surface of said object, thereby removing material from the surface of the object in a controlled manner. One demonstrated manifestation is in the deterministic optical figuring of thin glasses by wet chemical etching using a buffered hydrofluoric acid solution and Marangoni effect.Type: GrantFiled: October 13, 2000Date of Patent: April 29, 2003Assignee: The Regents of the University of CalioforniaInventors: Michael C. Rushford, Jerald A. Britten
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Patent number: 6554968Abstract: A method for producing film thickness control of ion beam sputter deposition films. Great improvements in film thickness control is accomplished by keeping the total current supplied to both the beam and suppressor grids of a radio frequency (RF) in beam source constant, rather than just the current supplied to the beam grid. By controlling both currents, using this method, deposition rates are more stable, and this allows the deposition of layers with extremely well controlled thicknesses to about 0.1%. The method is carried out by calculating deposition rates based on the total of the suppressor and beam currents and maintaining the total current constant by adjusting RF power which gives more consistent values.Type: GrantFiled: September 29, 2000Date of Patent: April 29, 2003Assignee: The Regents of the University of CaliforniaInventors: Patrick A. Kearney, Scott C. Burkhart
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Patent number: 6541316Abstract: A process for direct integration of a thin-film silicon p-n junction diode with a magnetic tunnel junction for use in advanced magnetic random access memory (MRAM) cells for high performance, non-volatile memory arrays. The process is based on pulsed laser processing for the fabrication of vertical polycrystalline silicon electronic device structures, in particular p-n junction diodes, on films of metals deposited onto low temperature-substrates such as ceramics, dielectrics, glass, or polymers. The process preserves underlayers and structures onto which the devices are typically deposited, such as silicon integrated circuits. The process involves the low temperature deposition of at least one layer of silicon, either in an amorphous or a polycrystalline phase on a metal layer. Dopants may be introduced in the silicon film during or after deposition.Type: GrantFiled: December 22, 2000Date of Patent: April 1, 2003Assignee: The Regents of the University of CaliforniaInventors: Daniel Toet, Thomas W. Sigmon
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Patent number: 6524532Abstract: A silicon-based sleeve type chemical reaction chamber that combines heaters, such as doped polysilicon for heating, and bulk silicon for convection cooling. The reaction chamber combines a critical ratio of silicon and non-silicon based materials to provide the thermal properties desired. For example, the chamber may combine a critical ratio of silicon and silicon nitride to the volume of material to be heated (e.g., a liquid) in order to provide uniform heating, yet low power requirements. The reaction chamber will also allow the introduction of a secondary tube (e.g., plastic) into the reaction sleeve that contains the reaction mixture thereby alleviating any potential materials incompatibility issues.Type: GrantFiled: December 11, 1996Date of Patent: February 25, 2003Assignee: The Regents of the University of CaliforniaInventor: M. Allen Northrup
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Patent number: 6520034Abstract: A high air volume to low liquid volume aerosol collector. A high volume flow of aerosol particles is drawn into an annular, centripetal slot in a collector which directs the aerosol flow into a small volume of liquid pool contained is a lower center section of the collector. The annular jet of air impinges into the liquid, imbedding initially airborne particles in the liquid. The liquid in the pool continuously circulates in the lower section of the collector by moving to the center line, then upwardly, and through assistance by a rotating deflector plate passes back into the liquid at the outer area adjacent the impinging air jet which passes upwardly through the liquid pool and through a hollow center of the collector, and is discharged via a side outlet opening. Any liquid droplets escaping with the effluent air are captured by a rotating mist eliminator and moved back toward the liquid pool.Type: GrantFiled: April 3, 2002Date of Patent: February 18, 2003Assignee: The Regents of the University of CaliforniaInventors: Donald A. Masquelier, Fred P. Milanovich, Klaus Willeke
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Patent number: 6521181Abstract: A detector cell for a silicon-based or non-silicon-based sleeve type chemical reaction chamber that combines heaters, such as doped polysilicon for heating, and bulk silicon for convection cooling. The detector cell is an electrochemiluminescence cell constructed of layers of silicon with a cover layer of glass, with spaced electrodes located intermediate various layers forming the cell. The cell includes a cavity formed therein and fluid inlets for directing reaction fluid therein. The reaction chamber and detector cell may be utilized in any chemical reaction system for synthesis or processing of organic, inorganic, or biochemical reactions, such as the polymerase chain reaction (PCR) and/or other DNA reactions, such as the ligase chain reaction, which are examples of a synthetic, thermal-cycling-based reaction. The ECL cell may also be used in synthesis instruments, particularly those for DNA amplification and synthesis.Type: GrantFiled: December 26, 1996Date of Patent: February 18, 2003Assignee: The Regents of the University of CalforniaInventors: M. Allen Northrup, Yun-Tai Hsueh, Rosemary L. Smith
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Patent number: 6521897Abstract: A collimating grid for an ion source located after the exit grid. The collimating grid collimates the ion beamlets and disallows beam spread and limits the beam divergence during transients and steady state operation. The additional exit or collimating grid prevents beam divergence during turn-on and turn-off and prevents ions from hitting the periphery of the target where there is re-deposited material or from missing the target and hitting the wall of the vessel where there is deposited material, thereby preventing defects from being deposited on a substrate to be coated. Thus, the addition of a collimating grid to an ion source ensures that the ion beam will hit and be confined to a specific target area.Type: GrantFiled: November 17, 2000Date of Patent: February 18, 2003Assignee: The Regents of the University of CaliforniaInventors: Walter B. Lindquist, Patrick A. Kearney
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Patent number: 6521101Abstract: Beryllium-based multilayer structures and a process for fabricating beryllium-based multilayer mirrors, useful in the wavelength region greater than the beryllium K-edge (111 Å or 11.1 nm). The process includes alternating sputter deposition of beryllium and a metal, typically from the fifth row of the periodic table, such as niobium (Nb), molybdenum (Mo), ruthenium (Ru), and rhodium (Rh). The process includes not only the method of sputtering the materials, but the industrial hygiene controls for safe handling of beryllium. The mirrors made in accordance with the process may be utilized in soft x-ray and extreme-ultraviolet projection lithography, which requires mirrors of high reflectivity (>60%) for x-rays in the range of 60-140 Å (60-14.0 nm).Type: GrantFiled: December 9, 1996Date of Patent: February 18, 2003Assignee: The Regents of the University of CaliforniaInventors: Kenneth M. Skulina, Richard M. Bionta, Daniel M. Makowiecki, Craig S. Alford