Patents Represented by Attorney, Agent or Law Firm Michael B. Einschlag
  • Patent number: 5591494
    Abstract: A silicon nitride or silicon oxynitride film is deposited by plasma enhanced chemical vapor deposition from a precursor gas mixture of a silane, a nitrogen-containing organosilane and a nitrogen-containing gas at low temperatures of 300.degree.-400.degree. C. and pressure of 1-10 Torr. The silicon nitride films have low carbon content and low hydrogen content, low wet etch rates and they form conformal films over stepped topography.
    Type: Grant
    Filed: February 12, 1996
    Date of Patent: January 7, 1997
    Assignee: Applied Materials, Inc.
    Inventors: Tatsuya Sato, Atsushi Tabata, Naoaki Kobayashi
  • Patent number: 5589003
    Abstract: A shielded substrate support (2) for deposition chambers (6) includes a heated base (8) having a substrate support surface (16) and a sidewall (18). A corrosion-resistant base shield (10) has cover plate (14, 22) and skirt (24) portions and is used to cover and protect the support surface and a part of the sidewall during cleaning operations. The base and the base shield have first and second CTEs, the second CTE being smaller than the first CTE. The base and base shield include complementary locking surfaces sized and positioned so that only when at a higher temperature will the locking surfaces be opposite one another to prevent removal of the base shield from the base. This eliminates the need for mechanical locking elements, such as threads, pins or twist locks, which increase the cost and can be a source of particle contamination.
    Type: Grant
    Filed: February 9, 1996
    Date of Patent: December 31, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Jun Zhao, Frank P. Chang, Charles N. Dornfest
  • Patent number: 5571571
    Abstract: A method of forming conformal, high quality silicon oxide films that can be deposited over closely spaced, submicron lines and spaces without the formation of voids, comprises forming a plasma of TEOS and a selected halogen-containing gas in certain ratios. By proper control of the energy sources that create the plasma, the proper selection of the halogen-containing gas and selection of other processing parameters, high deposition rates can also be achieved.
    Type: Grant
    Filed: June 14, 1994
    Date of Patent: November 5, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Katsuyuki Musaka, Shinzuke Mizuno
  • Patent number: 5558910
    Abstract: A tungsten silicide film is deposited from WF.sub.6 and SiCl.sub.2 H.sub.2 onto a substrate so that the tungsten to silicon ratio is substantially uniform through the thickness of the WSi.sub.x film, and the WSi.sub.x film is substantially free of fluorine. The film can be deposited by a multi-stage process where the pressure in the chamber is varied, or by a high temperature, high pressure deposition process in a plasma cleaned deposition chamber. Preferably the SiCl.sub.2 H.sub.2 and the WF.sub.6 are mixed upstream of the deposition chamber. A seeding gas can be added to the process gases.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: September 24, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Susan G. Telford, Meng C. Tseng, Michio Aruga, Moshe Eizenberg
  • Patent number: 5552016
    Abstract: A method and apparatus (110) for determining the endpoint (e.g., TC1) of an etching step in a plasma etching process (101) for use in semiconductor wafer manufacturing. In one embodiment, an optical bandpass filter (e.g., 1542) is used for detecting a wavelength of electromagnetic emissions from elements of a chlorine-argon plasma employed to etch a titanium nitride layer from a semiconductor wafer so as to achieve a more precise determination of the endpoint of the process step. In another embodiment, a plurality of wavelengths (e.g., 1541-1544) in the electromagnetic emissions from elements in the plasma are combined for even more precise determination of the endpoint of a process step. The emissions of interest may be from the same or different elements in the plasma which may be produced by the etching materials or by materials from the wafer being etched.
    Type: Grant
    Filed: August 17, 1995
    Date of Patent: September 3, 1996
    Assignee: Applied Materials, Inc.
    Inventor: Steve G. Ghanayem
  • Patent number: 5549114
    Abstract: Apparatus for measuring the speed of blood in blood vessels in biological samples, for example, in retinal blood vessels, which apparatus includes: (a) a source of a beam of radiation having a principal wavelength, which radiation is substantially spatially coherent and has a temporal coherence length which is less than 1 picosecond; (b) a beam splitter for splitting the beam into a sample beam and reference beam; (c) optical apparatus for directing the sample beam to an area within the biological sample; (d) a reflector for reflecting the reference beam; (e) a detector for detecting an interference between the sample beam reflected from the area and the reflected reference beam and for generating an interference signal; (f) apparatus for altering an optical path length of the reference beam from the beam splitter to the detector at an alteration velocity; and (g) an analyzer for analyzing the interference signal to determine the speed of the blood in the area from a shift of a central frequency of a frequenc
    Type: Grant
    Filed: October 23, 1995
    Date of Patent: August 27, 1996
    Assignee: Carl Zeiss, Inc.
    Inventors: Christopher L. Petersen, Thomas Hellmuth
  • Patent number: 5537162
    Abstract: Apparatus for illuminating the fundus of an eye with a scanned sample beam of radiation, the scanned sample beam emerging from a beam scanner which is exposed to a sample beam, which apparatus is for use in optical coherence tomography. An embodiment of the apparatus includes: (a) scanner lens and a beamsplitter for transferring radiation from the scanned sample beam, including chief rays of the sample beam which emerge from a point of final deflection of the beam scanner, and (b) a lens for focusing the transferred radiation so that the scanned sample beam is focused onto the fundus by the eye. In accordance with the invention the scanner lens is fixed with respect to the beam scanner so that the point of final deflection is located substantially in the back focal plane of the scanner lens and the scanner lens is movable.
    Type: Grant
    Filed: December 17, 1993
    Date of Patent: July 16, 1996
    Assignee: Carl Zeiss, Inc.
    Inventors: Thomas Hellmuth, Jay Wei
  • Patent number: 5522932
    Abstract: A metal structure, such as an apparatus used in plasma processing of substrates, is rendered resistant to corrosion by coating components exposed to the plasma with a coating of rhodium. The rhodium coating can be made by electroplating, and preferably has a thickness of at least about 10 microinches, and preferably from about 10 to about 100 microinches. A coating of nickel can be applied between the rhodium coating and the metal component.
    Type: Grant
    Filed: May 14, 1993
    Date of Patent: June 4, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Manus K. Wong, Sandy M. Chew
  • Patent number: 5523063
    Abstract: The present invention discloses an apparatus and method for the turbulent mixing of gases. The invention has particular application when it is desired to produce a gas mixture including a very small quantity (ppm or less) of at least one component gas and/or wherein there is a substantial density difference between the component gases to be used to make up the gas mixture.
    Type: Grant
    Filed: December 2, 1992
    Date of Patent: June 4, 1996
    Assignee: Applied Materials, Inc.
    Inventor: Roger N. Anderson
  • Patent number: 5516367
    Abstract: Vacuum CVD chambers are disclosed which provide a more uniformly deposited thin film on a substrate. The chamber susceptor mount for the substrate is heated resistively with a single coil firmly contacting the metal of the susceptor on all sides, providing uniform temperatures across the susceptor mount for a substrate. A purge gas line is connected to openings in the susceptor outside of the periphery of the substrate to prevent edge and backside contamination of the substrate. A vacuum feed line mounts the substrate to the susceptor plate during processing. A refractory purge guide, or a plurality of placement pins, maintain a fixed gap passage for the purge gases to pass alongside the edge of the wafer and into the processing area of the chamber. An exhaust pumping plate improves the uniformity of exhaustion of spent gases from the chamber.
    Type: Grant
    Filed: November 21, 1994
    Date of Patent: May 14, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Lawrence C. Lei, Ilya Perlov, Karl A. Littau, Alan F. Morrison, Mei Chang, Ashok K. Sinha
  • Patent number: 5508067
    Abstract: A silicon nitride or silicon oxynitride film is deposited by plasma enhanced chemical vapor deposition from a precursor gas mixture of a silane, a nitrogen-containing organosilane and a nitrogen-containing gas at low temperatures of 300.degree.-400.degree. C. and pressure of 1-10 Torr. The silicon nitride films have low carbon content and low hydrogen content, low wet etch rates and they form conformal films over stepped topography.
    Type: Grant
    Filed: July 26, 1995
    Date of Patent: April 16, 1996
    Assignee: Applied Materials, Inc.
    Inventors: Tatsuya Sato, Atsushi Tabata, Naoaki Kobayashi
  • Patent number: 5506634
    Abstract: Apparatus for illuminating the fundus of an eye with a scanned sample beam of radiation. An embodiment of the present invention is an optical system which includes three, separated radiation path systems--a tilted illumination path system, a decentered observation path system, and an optical path system--which are combined by a beamsplitter into an ocular lens. In accordance with the present invention, an illuminating path provided by the illumination path system and an optical beam path provided by the optical beam path system are obliquely oriented with respect to the optical axis of the ocular lens.
    Type: Grant
    Filed: July 5, 1994
    Date of Patent: April 9, 1996
    Assignee: Carl Zeiss, Inc.
    Inventors: Jay Wei, Thomas Hellmuth
  • Patent number: 5501226
    Abstract: Apparatus for measuring the speed of blood in blood vessels in biological samples, for example, in retinal blood vessels, which apparatus includes: (a) a source of a beam of radiation having a principal wavelength, which radiation is substantially spatially coherent and has a temporal coherence length which is less than 1 picosecond; (b) a beam splitter for splitting the beam into a sample beam and reference beam; (c) optical apparatus for directing the sample beam to an area within the biological sample; (d) a reflector for reflecting the reference beam; (e) a detector for detecting an interference between the sample beam reflected from the area and the reflected reference beam and for generating an interference signal; (f) apparatus for altering an optical path length of the reference beam from the beam splitter to the detector at an alteration velocity; and (g) an analyzer for analyzing the interference signal to determine the speed of the blood in the area from a shift of a central frequency of a frequenc
    Type: Grant
    Filed: October 19, 1994
    Date of Patent: March 26, 1996
    Assignee: Carl Zeiss, Inc.
    Inventors: Christopher L. Petersen, Thomas Hellmuth
  • Patent number: 5493109
    Abstract: Ophthalmologic surgical microscope which is combined internally with an optical coherence tomography ("OCT") apparatus wherein auto-focusing is provided by driving a motorized internal focusing lens of the ophthalmologic surgical microscope with a signal output from the OCT apparatus. An embodiment of the inventive ophthalmologic surgical microscope includes: (a) an optical coherence tomography ("OCT") apparatus; (b) a beamcombiner for internally coupling output from the OCT apparatus into the ophthalmologic surgical microscope; and (c) a motor for moving an internal focusing lens of the ophthalmologic surgical microscope in response to a signal from the OCT apparatus, whereby the ophthalmologic surgical microscope is auto-focused.
    Type: Grant
    Filed: August 18, 1994
    Date of Patent: February 20, 1996
    Assignee: Carl Zeiss, Inc.
    Inventors: Jay Wei, Thomas Hellmuth
  • Patent number: 5491524
    Abstract: Optical coherence tomography ("OCT") corneal mapping apparatus includes an OCT apparatus having a rotating helical mirror for altering a reference beam path in the OCT apparatus; a raster scanner for raster scanning sampling optical output from the OCT apparatus; a curved mirror for transferring the sampling optical output from the raster scanner to an eye and for transferring sampling optical output reflected from the eye back to the OCT apparatus through the raster scanner; and an analyzer, coupled to the raster scanner, the rotating helical mirror, and reference and sampling interaction output from the OCT apparatus. The analyzer causes the raster scanner to scan the sampling optical output to points in a raster; causes the rotating mirror to alter the length of the reference beam path over a predetermined amount at each of the points in the raster; and provides the corneal mapping from the reference and sampling interaction output at the points in the raster.
    Type: Grant
    Filed: October 5, 1994
    Date of Patent: February 13, 1996
    Assignee: Carl Zeiss, Inc.
    Inventors: Thomas Hellmuth, Jay Wei
  • Patent number: 5469261
    Abstract: Method and apparatus for measuring the following lens characteristics: (a) curvature of the front and back surfaces of the lens; (b) physical thickness; and (c) index of refraction of the lens to determine the front vertex power, back vertex power; and the lens material.
    Type: Grant
    Filed: September 6, 1994
    Date of Patent: November 21, 1995
    Assignee: Carl Zeiss, Inc.
    Inventors: Thomas Hellmuth, Charles E. Campbell, Jay Wei
  • Patent number: 5450484
    Abstract: Voice detector for detecting whether a telephone signal has been produced by a voice. The voice detector obtains, on a per frame basis, measures of the following quantities relating to the telephone signal: total energy; energy and frequency of two largest energy peaks in a frequency spectrum; and signal-to-noise ratio (SNR). If the measure of total energy exceeds a predetermined threshold, the voice detector increments running sums of the following measures: total energy; frequency of the largest peak in the frequency spectrum; and SNR. Until a predetermined number of frames, referred to as a window, has been reached, for each frame, the voice detector determines whether the telephone signal was produced by ringing (incrementing a ring count if it was) and whether there is a local energy maximum (incrementing a local energy maximum count if there was).
    Type: Grant
    Filed: March 1, 1993
    Date of Patent: September 12, 1995
    Assignee: Dialogic Corporation
    Inventor: Chris A. Hamilton
  • Patent number: 5450485
    Abstract: Apparatus for detecting whether a telephone call has been disconnected, which apparatus includes: (a) a click detector for detecting a click and for generating a "click indication"; (b) a telephone handset impact detector for detecting a telephone handset impact and for generating a "handset impact indication"; (c) a silence detector for detecting silence and for storing a "silent indication"; (d) a timer for determining a predetermined time interval and for transmitting a signal to a controller whenever the time period expires; wherein, in response to the signal, the controller analyzes the "click indication", the handset impact indication", and the "silent indication" to determine whether a predetermined sequence of handset impact, clicks, and silence was detected and, if so, for generating a signal indicating that the telephone call has been disconnected.
    Type: Grant
    Filed: April 19, 1994
    Date of Patent: September 12, 1995
    Assignee: Dialogic Corporation
    Inventor: Chris A. Hamilton
  • Patent number: 5440262
    Abstract: An embodiment of the present invention is a power generator which provides a power waveform for applying power to ringing circuits and message-waiting lamps (Ring/MWL) in standard analog telephones in a PBX and which power generator reduces power dissipation. In particular, an embodiment of the inventive power generator includes: (a) a controller which generates a low-level signal representing the power waveform and a timing and control signal indicative of various portions of the low-level analog signal; (b) a circuit, responsive to the timing and control signal, which alters the output of a power supply; and (c) a power amplifier, responsive to the low-level signal and the output of the power supply, which amplifies the low-level signal to produce the power waveform.
    Type: Grant
    Filed: August 24, 1993
    Date of Patent: August 8, 1995
    Assignee: Rolm Company
    Inventors: Jack G. S. Lum, Peter Pong
  • Patent number: 5440616
    Abstract: Interconnecting a messaging system (voice, facsimile, and so forth) with a PBX which provides entirely digital voice transmission and which provides high bandwidth and redundant transmission of control information between the messaging system and the PBX.
    Type: Grant
    Filed: February 10, 1994
    Date of Patent: August 8, 1995
    Assignee: Rolm Company
    Inventors: Daniel A. Harrington, Maura E. Higgins, Ivan M. Lee, Joseph D. Remson, Kenneth E. Waln