Patents Represented by Attorney Slater & Matsil, L.L.P.
  • Patent number: 8351455
    Abstract: A system and method for multi-stage zero forcing beamforming in a wireless communications system is provided. A method includes receiving feedback information from each mobile station (MS) in a first plurality of mobile stations (MSs), selecting a first MS from the first plurality of MSs, and broadcasting information related to the first MS to the first plurality of MSs. The first MS having a largest value of a first metric based on the feedback information received from the first plurality of MSs. The method also includes receiving feedback information from each MS in a second plurality of MSs, selecting a second MS from the second plurality of MSs, and creating a precoding matrix from feedback information from the first MS and the second MS. The second MS having a largest value of a second metric based on the feedback information received from the second plurality of MSs.
    Type: Grant
    Filed: April 3, 2009
    Date of Patent: January 8, 2013
    Assignee: Futurewei Technologies, Inc.
    Inventors: Yang Tang, Young Hoon Kwon
  • Patent number: 8349528
    Abstract: Semiconductor devices and methods of manufacturing thereof are disclosed. A plurality of features is formed on a workpiece, the plurality of features being located in a first region and a second region of the workpiece. Features in the first region have a first lateral dimension, and features in the second region have a second lateral dimension, wherein the second lateral dimension is greater than the first lateral dimension. The first region is masked, and the second lateral dimension of features in the second region is reduced.
    Type: Grant
    Filed: June 20, 2011
    Date of Patent: January 8, 2013
    Assignee: Infineon Technologies AG
    Inventors: Matthias Lipinski, Alois Gutmann, Jingyu Lian, Chandrasekhar Sarma, Haoren Zhuang
  • Patent number: 8352120
    Abstract: A system and method for stability control of a vehicle using GPS data. The system and method can receive GPS data and optionally vehicle operating data or signals and define one of a brake-based stability control subsystem and a torque management-based stability control subsystem as the dominant stability control system. Based on the stability control subsystem defined as the dominant stability control system, the system and method provide stability control for the vehicle. The system and method also defines the dominant stability control system based on weather data.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: January 8, 2013
    Assignee: Lockheed Martin Corporation
    Inventors: William C Craig, Richard S Stevens, Thomas D'Onofrio, David Shivy, Charles T Disaverio
  • Patent number: 8349730
    Abstract: An integrated circuit structure and methods for forming the same are provided. The integrated circuit structure includes a semiconductor substrate; a dielectric layer over the semiconductor substrate; an opening in the dielectric layer; a conductive line in the opening; a metal alloy layer overlying the conductive line; a first metal silicide layer overlying the metal alloy layer; and a second metal silicide layer different from the first metal silicide layer on the first metal silicide layer. The metal alloy layer and the first and the second metal silicide layers are substantially vertically aligned to the conductive line.
    Type: Grant
    Filed: June 25, 2010
    Date of Patent: January 8, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chien-Hsueh Shih, Shau-Lin Shue
  • Patent number: 8350330
    Abstract: A method of forming an integrated circuit structure on a chip includes extracting an active pattern including a diffusion region; enlarging the active pattern to form a dummy-forbidden region having a first edge and a second edge perpendicular to each other; and adding stress-blocking dummy diffusion regions throughout the chip, which includes adding a first stress-blocking dummy diffusion region adjacent and substantially parallel to the first edge of the dummy-forbidden region; and adding a second stress-blocking dummy diffusion region adjacent and substantially parallel to the second edge of the dummy-forbidden region. The method further includes, after the step of adding the stress-blocking dummy diffusion regions throughout the chip, adding general dummy diffusion regions into remaining spacings of the chip. A structure includes a target diffusion region including a first edge with a first length and a second edge with a second edge perpendicular to the first length.
    Type: Grant
    Filed: May 2, 2011
    Date of Patent: January 8, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Lee-Chung Lu, Chien-Chih Kuo, Jian-Yi Li, Sheng-Jier Yang
  • Patent number: 8349732
    Abstract: A device and a method for forming a metal silicide is presented. A device, which includes a gate region, a source region, and a drain region, is formed on a substrate. A metal is disposed on the substrate, followed by a first anneal, forming a metal silicide on at least one of the gate region, the source region, and the drain region. The unreacted metal is removed from the substrate. The metal silicide is implanted with atoms. The implant is followed by a super anneal of the substrate.
    Type: Grant
    Filed: July 18, 2008
    Date of Patent: January 8, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Harry Chuang, Hung-Chih Tsai, Keh-Chiang Ku, Kong-Beng Thei, Mong Song Liang
  • Patent number: 8350381
    Abstract: A device includes a first semiconductor chip and a first encapsulant that encapsulates the first semiconductor chip and that includes a cavity. A carrier and an electrical component are mounted on the carrier. The carrier is arranged such that the electrical component is enclosed by the cavity.
    Type: Grant
    Filed: April 1, 2010
    Date of Patent: January 8, 2013
    Assignee: Infineon Technologies AG
    Inventor: Horst Theuss
  • Patent number: 8350355
    Abstract: Electrostatic discharge devices and methods of forming thereof are disclosed. In one embodiment, a semiconductor device includes an electrostatic discharge (ESD) device region disposed within a semiconductor body. A first ESD device is disposed in a first region of the ESD device region, and a second ESD device disposed in a second region of the ESD device region. The second region is separated from the first region by a first trench.
    Type: Grant
    Filed: March 1, 2010
    Date of Patent: January 8, 2013
    Assignee: Infineon Technologies AG
    Inventor: Kai Esmark
  • Patent number: 8350273
    Abstract: Some embodiments show a semiconductor structure including a substrate with a {100} crystal surface plane which includes a plurality of adjacent structured regions at a top side of the substrate. The plurality of adjacent structured regions includes adjacent substrate surfaces with {111} crystal planes and a III-V semiconductor material layer above the top side of the substrate. A semiconductor device region includes at least one semiconductor device structure. The semiconductor device region is arranged above the plurality of adjacent structured regions at the top side of the substrate.
    Type: Grant
    Filed: August 31, 2009
    Date of Patent: January 8, 2013
    Assignee: Infineon Technologies AG
    Inventor: Martin Henning Albrecht Vielemeyer
  • Patent number: 8352695
    Abstract: A memory system includes a selection element for selecting a selectable access rate from a plurality of access rates and a memory element for providing or for accepting data at the selectable access rate.
    Type: Grant
    Filed: May 29, 2007
    Date of Patent: January 8, 2013
    Assignee: Lantiq Deutschland GmbH
    Inventors: Christian Klein, Stefan Linz, Helmut Reinig
  • Patent number: 8350961
    Abstract: A scaling engine, blending mechanism, memory controller, frame buffer and video driver are included within a semiconductor, such as a Field Programmable Gate Array (FPGA), to provide broadcasting of signals at a high resolution format by combining two or more low resolution video signals to create a high resolution signal in real-time High Definition format, such as 1080p. The high resolution signals can be concurrently displayed as one or more image areas on a display device in any contemplated size, number and arrangement.
    Type: Grant
    Filed: April 24, 2007
    Date of Patent: January 8, 2013
    Inventors: Geno Valente, Mary Beth Valente
  • Patent number: 8351792
    Abstract: A system and communication method for the system interconnecting the optical network with the radio communication network is provided. The solution mainly applies to an optical access network employing fiber for transmission and the radio communication network connected to the optical access network, wherein a base station of the radio communication network is connected to the optical access network and communicates to an entity in the optical access network to achieve interconnection between the optical network and the radio communication network. After the interconnection is established, a user equipment can enjoy communication services through the interconnected radio communication network and the optical network.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: January 8, 2013
    Assignee: Huawei Technologies Co., Ltd.
    Inventor: Ruobin Zheng
  • Patent number: 8345102
    Abstract: An image processing method can be performed on a video image that includes an initial frame and a plurality of subsequent frames. An object is located within the initial frame of the video image and a histogram related to the object is generated. A foreground map that includes the object is also generated. For each subsequent frame, a mean shift iteration is performed to adjust the location of the object within the current frame. The histogram related to the object and the foreground map can then be updated.
    Type: Grant
    Filed: January 13, 2010
    Date of Patent: January 1, 2013
    Assignee: Futurewei Technologies, Inc.
    Inventors: Yu Huang, Hongbing Li, Jun Tian, Hong Heather Yu
  • Patent number: 8345776
    Abstract: A system and method for video coding include an encoder and decoder. The encoder/decoder respectively include a base layer encoding/decoding apparatus, at least one enhancement layer encoding/decoding apparatus, and an encoder/decoder drift control apparatus. The encoder drift control apparatus is configured to determine the amount of local error drift for the encoder according to local information of the base layer encoding apparatus and the enhancement layer encoding apparatus and control the value of an encoder leaky factor according to the amount of error drift. The decoder drift control apparatus is configured to determine the amount of local error drift for the decoder according to local information of the base layer decoding apparatus and the enhancement layer decoding apparatus and control a decoder leaky factor according to the amount of error drift.
    Type: Grant
    Filed: September 24, 2008
    Date of Patent: January 1, 2013
    Assignee: Huawei Technologies Co., Ltd.
    Inventors: Lianhuan Xiong, Steffen Kamp, Mathias Wien
  • Patent number: 8344447
    Abstract: A composite semiconductor structure and method of forming the same are provided. The composite semiconductor structure includes a first silicon-containing compound layer comprising an element selected from the group consisting essentially of germanium and carbon; a silicon layer on the first silicon-containing compound layer, wherein the silicon layer comprises substantially pure silicon; and a second silicon-containing compound layer comprising the element on the silicon layer. The first and the second silicon-containing compound layers have substantially lower silicon concentrations than the silicon layer. The composite semiconductor structure may be formed as source/drain regions of metal-oxide-semiconductor (MOS) devices.
    Type: Grant
    Filed: April 5, 2007
    Date of Patent: January 1, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsien-Hsin Lin, Weng Chang, Chien-Chang Su, Kuan-Yu Chen, Hsueh-Chang Sung, Ming-Hua Yu
  • Patent number: 8347132
    Abstract: A system and method for reducing active power in processors is disclosed. A method embodiment comprises the steps of determining when a particular logic block is inactive, determining the powered state of the particular logic block, isolating the particular logic block from a main processor core, and powering off the particular logic block. When the system needs the particular logic block, the method further comprises reactivating the block. A system embodiment comprises software and a processor coupled to a clock control module, an isolation control module and a header/footer module, operable to isolate a particular logic block and power off a particular logic block, thereby reducing power. Another embodiment comprises a logic module coupled to a clock by a clock gating module, an isolation module for isolating the logic module, a header/footer module for disabling power to the logic module, and a power and clock gating control module for controlling the clock gating module and the header/footer module.
    Type: Grant
    Filed: November 16, 2009
    Date of Patent: January 1, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Lee-Chung Lu, Chung-Hsing Wang, Myron Shak, Wei-Pin Changchien, Kuo-Yin Chen, Chi Wei Hu, Kevin Hung, Wu-An Kuo
  • Patent number: 8344355
    Abstract: Semiconductor structures and devices including strained material layers having impurity-free zones, and methods for fabricating same. Certain regions of the strained material layers are kept free of impurities that can interdiffuse from adjacent portions of the semiconductor. When impurities are present in certain regions of the strained material layers, there is degradation in device performance. By employing semiconductor structures and devices (e.g., field effect transistors or “FETs”) that have the features described, or are fabricated in accordance with the steps described, device operation is enhanced.
    Type: Grant
    Filed: December 15, 2011
    Date of Patent: January 1, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Matthew T. Currie, Anthony J. Lochtefeld, Richard Hammond, Eugene A. Fitzgerald
  • Patent number: 8344429
    Abstract: Embodiments of the invention describe compact memory arrays. In one embodiment, the memory cell array includes first, second, and third gate lines disposed over a substrate, the second gate lines are disposed between the first and the third gate lines. The first, the second, and the third gate lines form adjacent gate lines of the memory cell array. The memory cell array further includes first metal lines disposed over the first gate lines, the first metal lines coupled to the first gate lines; second metal lines disposed over the second gate lines, the second metal lines coupled to the second gate lines; and third metal lines disposed over the third gate lines, the third metal lines coupled to the third gate lines. The first metal lines, the second metal lines and the third metal lines are disposed in different metallization levels.
    Type: Grant
    Filed: September 17, 2008
    Date of Patent: January 1, 2013
    Assignee: Infineon Technologies AG
    Inventors: Jan Otterstedt, Thomas Nirschl, Michael Bollu, Wolf Allers
  • Patent number: 8344242
    Abstract: Solar cell structures including multiple sub-cells that incorporate different materials that may have different lattice constants. In some embodiments, solar cell devices include several photovoltaic junctions.
    Type: Grant
    Filed: June 26, 2008
    Date of Patent: January 1, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: James Fiorenza, Anthony J. Lochtefeld
  • Patent number: 8338231
    Abstract: A method includes providing a carrier; applying a dielectric layer to the carrier; applying a metal layer to the dielectric layer; placing a first semiconductor chip on the metal layer with contact pads of the first semiconductor chip facing the metal layer; covering the first semiconductor chip with an encapsulation material; and removing the carrier.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: December 25, 2012
    Assignee: Infineon Technologies AG
    Inventor: Georg Meyer-Berg