Patents Represented by Attorney Timothy J. Keefer
  • Patent number: 6633115
    Abstract: A shadow mask comprises a frame member, a mask body formed in a plate shape as a grid element and mounted to the frame member and a plurality of slits formed to the mask body. The mask body is composed of an iron-based alloy containing 31.0-38.0 weight % of nickel and 1.0-6.5 weight % of cobalt and the iron-based alloy contains 0.01-0.10 weight % of carbon.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: October 14, 2003
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Akira Makita, Yutaka Matsumoto, Takahito Aoki
  • Patent number: 6627979
    Abstract: Disclosed is a semiconductor package capable of realizing a small and compact size and improving the reliability and the fabrication method of the same. The disclosed comprises: a main semiconductor chip having a plurality of main chip pads and operating as a lead frame or a substrate; a plurality of metal patterns electrically connected to each corresponding main chip pad and having electrodes formed on both ends; one or more sub semiconductor chip adhered to the main semiconductor chip by adhering bumps formed on a plurality of sub chip pads to each corresponding electrode; a dam formed on the main semiconductor chip in a shape surrounding the inner electrodes except for the outer electrodes on the outmost region of the main semiconductor chip; filling materials filled up in the dam; and a plurality of solder balls adhered on the outmost electrodes.
    Type: Grant
    Filed: June 12, 2002
    Date of Patent: September 30, 2003
    Assignee: Dongbu Electronics Co., Ltd.
    Inventor: Kye Chan Park
  • Patent number: 6605508
    Abstract: The disclosed semiconductor device includes a semiconductor substrate, a logic circuit area formed on the semiconductor substrate, the logic circuit area includes transistors for driving bit lines, and a ferroelectrics memory area laminated on the logic circuit area and including a transistor area and a capacitor area. Also the disclosed method of fabricating the semiconductor device includes the steps of forming a logic circuit area on a semiconductor substrate, the logic circuit area includes interconnection wirings connected to transistors for driving bit lines, forming bit lines electrically connected to the interconnection wirings at the upper side thereof, forming a silicon film connected to the bit lines at the upper side thereof and defining a cell forming area, forming transistors on the silicon film, each transistor including a gate electrode, a source electrode, and a drain electrode, and forming capacitors electrically connected to the source electrodes at the upper side of the transistor.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: August 12, 2003
    Assignee: Dongbu Electronics Co., Ltd.
    Inventor: Jae Kap Kim
  • Patent number: 6599825
    Abstract: A method for forming wiring in a semiconductor device comprises the steps of: forming a trench in a desired place on a silicon substrate, forming a thermal oxidation layer on the surface of the trench, forming wiring by filling a conductive layer in the lower part of the trench, forming an insulating layer on the wiring, removing the thermal oxidation layer over the insulating layer, forming an epitaxial silicon layer so that the trench is filled completely, forming a contact hole exposing the wiring by etching the epitaxial silicon layer and the insulating layer, forming an insulating spacer on the side walls of the contact hole, and forming a wiring plug in the contact hole in which the insulating layer has been formed. In the method for forming such wiring in the semiconductor device, metal wiring is formed in the silicon substrate.
    Type: Grant
    Filed: December 18, 2002
    Date of Patent: July 29, 2003
    Assignee: Dongbu Electronics Co., Ltd.
    Inventor: Cheol Soo Park
  • Patent number: 6600532
    Abstract: An object of the present invention is to provide a color filter for reliably preventing the liquid crystal layer from being contaminated with ionic materials, as well as a liquid crystal display excellent in display qualities. To achieve the object described above, the present invention provides a color filter comprises a substrate, a resin colored layer consisting of a plurality of colors formed in a predetermined pattern on the substrate, and a common transparent electrode layer, said resin colored layer bringing about a voltage holding ratio of 80% or more and a residual DC (&Dgr;E) of 0.5 V or less in a liquid crystal subjected to treatment for extraction of impurities.
    Type: Grant
    Filed: January 24, 2001
    Date of Patent: July 29, 2003
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Takehide Kishimoto, Hideaki Yamagata, Takashi Nishimoto
  • Patent number: 6596326
    Abstract: The present invention comprises an additive for compound feed for pigs, sheep, goats, poultry, cattle, horses, dogs, cats and fur-bearing animals, which contains an organic or inorganic acid, or salts thereof, espacially formic acid, with a beneficial effect on the treatment of compound feed, and a spent sulphite liquor from an acidic or neutral cellulose sulphite cook. The additive contains the acid or salts thereof in an amount ranging from 10-90 percentage weight, and the spent sulphite liquor in an amount ranging from 10-90 percentage weight. The additive is added is added to the compound feed in an amount ranging from 0,2 to 3,0 %. The spent sulphite liquor can be adsorbed on a suitable carrier, such as soy meal or water-adsorbing silicates, in order to attain a dry composition.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: July 22, 2003
    Assignee: Borregaard Industires Limited
    Inventor: Hans Evju
  • Patent number: 6593684
    Abstract: A shadow mask for a Braun tube is composed of an iron-based alloy plate of a low thermal expansion structure containing nickel and cobalt, and the iron-based alloy plate has a crystal grain size of more than 6.0 and less than 9.0 measured by a grain size measuring method prescribed in JIS (Japanese Industrial Standard) G0551, and 0.2% proof stress of more than 240N/mm2 and less than 320N/mm2.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: July 15, 2003
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Akira Makita, Takahito Aoki, Nobuaki Kanayama
  • Patent number: 6589846
    Abstract: An method for fabricating a semiconductor device reduces a size of a MOSFET by self aligning a gate electrode with a device isolation insulation film. Thus, the gate electrode is not overlapped with the device isolation insulation film, differently from a conventional method for forming a MOSFET by partially overlapping the gate electrode with the device isolation insulation film in consideration of misalignment and CD variations in a mask process. As a result, a size of the MOSFET is reduced, thereby efficiently achieving the high integration of the semiconductor device.
    Type: Grant
    Filed: November 13, 2002
    Date of Patent: July 8, 2003
    Assignee: Dongbu Electronics Co., Ltd.
    Inventor: Jae Kap Kim
  • Patent number: 6590248
    Abstract: The present invention discloses a dynamic random access memory and the method for fabricating thereof. A first silicon substrate having a trench capacitor and a second silicon substrate having a transistor are formed with a double layer, which is interposed an insulation layer between therewith, thereby forming a trench capacitor at a region, which is used to be formed a transistor in the conventional art. Accordingly, when forming the trench capacitors, in which the numbers are the same as the conventional art, at the same silicon substrate area, a trench capacitor with large in diameter and shallow in depth can be formed, thereby performing a trench capacitor forming process. According to the present invention, after forming a trench, successive processes become easy and reliability of device can be enhanced.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: July 8, 2003
    Assignee: Dongbu Electronics Co., Ltd.
    Inventor: Jae Kap Kim
  • Patent number: 6586707
    Abstract: A UV laser beam is used to machine semiconductor. The beams intensity (IB) is chosen so that it lies in a range of such values for which there is an increasing (preferably linear) material removal rate for increasing IB An elongate formation such as a trough or a slot is machined in n scans laterally offset (O_centre), for each value of z-integer in the z direction.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: July 1, 2003
    Assignee: Xsil Technology Limited
    Inventors: Adrian Boyle, Kali Dunne, Maria Farsari
  • Patent number: 6582862
    Abstract: An object of the present invention is to provide a high photo-sensitivity curable resin. And another object is to prevent the viscosity increase, or to improve the transparency of said photo-curable resin, if necessary. An isocyanate compound containing a radical polymerizable group is reacted with a raw material polymer having a principal chain comprising an unit having an acid functional group and an unit having a hydroxyl group in the irate of 1.0 or more in terms of the equivalent ratio of the isocyanate group to the hydroxyl groups in said principal chain (NCO/OH). Moreover, when a raw material polymer is produced, its transparency is improved by using an azo polymerization initiator of non-nitrile series or a peroxide-based polymerization initiator. Use of any polymerization inhibitor selected from the groups of compounds shown in formula (9) or formula (15) can also improves transparency when introducing the isocyanate compound into the raw material.
    Type: Grant
    Filed: October 6, 2000
    Date of Patent: June 24, 2003
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Kazuhiko Nakamura, Shunsuke Sega
  • Patent number: 6577118
    Abstract: The system and the method are used for detecting a level of liquid metal at a given location, such as a launder set between an holding furnace and a casting pit. The system comprises an emitter coil and a receiver coil in a side-by-side configuration and in close proximity of the location. In use, an AC signal is applied to the emitter coil for producing an alternating magnetic flux. At least a part of the magnetic flux passes through the location where the level of liquid metal needs to be measured and goes back into the receiver coil. The signal in the receiver coil is monitored and the data are conveyed to a control module which determines the level of liquid metal from the variation of the signal in the receiver coil. The coils of the system are advantageously provided with respective core elements having a high magnetic permeability and which are configured and disposed to channel the magnetic flux.
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: June 10, 2003
    Assignee: B.D.H. Industries Inc.
    Inventors: Luc Parent, Daniel Audet
  • Patent number: 6561102
    Abstract: A floatable firework device includes a hollow base for fitting an explosive therein, a waterproof fuse, and a tubular buoyancy member sleeved fixedly around an upper portion of the base. The base has a center of gravity at a lower end portion thereof. As such, the firework device can float on a water surface, with a flame-spraying upper end slit in the base being disposed above the water surface.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: May 13, 2003
    Inventor: Chieh-Yih Wang
  • Patent number: 6559583
    Abstract: A shadow mask is composed of an iron-based alloy plate containing 31.0-38.0 weight % of nickel and 1.0-6.5 weight % of cobalt. The iron-based alloy has a crystal grain size number of 10 or more and 12 or less, has a crystal grain size of 50 &mgr;m or less in a cross section in a direction parallel and normal to a rolling direction of the iron-based alloy plate, and has an average crystal grain size of 30 &mgr;m or less in a cross section in a direction parallel to the rolling direction of the iron-based alloy plate.
    Type: Grant
    Filed: October 27, 2000
    Date of Patent: May 6, 2003
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Nobuaki Kanayama, Takahito Aoki, Yutaka Matsumoto
  • Patent number: 6555120
    Abstract: The 2-(2,14-Dimethyl-pentadecanoylamin)-pentanedioic acid (I) and compounds of the formula (II), wherein the substituents have the meaning disclosed in the specification, are used as oviposition deterring pheromones against the following fruit flies (Diptera: Tephritidae) of economical importance: Anastrepha fraterculus (south America fruit fly), A. grandis, A. ludens (Mexican fruit fly), A. obliqua (mango fly), A. serpentina (sapodilla fly), A. striata (guayabi fly) and A. suspensa (Caribbean fruit fly). The above-mentioned substances, if conveniently formulated, can be used to reduce the damage caused by these insects to fruits which are cultivated in commercial and semi-commercial orchards, in garden orchards and in isolated trees in residential gardens.
    Type: Grant
    Filed: July 25, 2001
    Date of Patent: April 29, 2003
    Assignee: Instituto de Ecologia, A.C.
    Inventors: Martin Ramon Aluja-Schuneman, Francisco Diaz-Fleischer, Andrew J. F. Edmunds, Leonhard Hagmann
  • Patent number: 6530936
    Abstract: An apparatus for harvesting cartilage comprises a cartilage harvesting pipe(1) having a cutting blade(3), a drive unit for moving the cartilage harvesting pipe(1), a connecting member(21) for connecting the cartilage harvesting pipe(1) and the drive unit, and a cutting member(11) made of a wire to separate the cartilage from a cartilaginous tissue by cutting the cartilage which is harvested with the cartilage harvesting pipe(1). The apparatus harvests easily and safely cartilage as much as is necessary with minimal scaring of the chest wall or pain.
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: March 11, 2003
    Inventor: Yeong Seok Yun
  • Patent number: 6517730
    Abstract: Apparatus is described for sanitizing a flow of water recirculated from a body of water such as a swimming pool by a pump (16) having an inlet conduit (10) and an outlet conduit (18) both in fluid communication with the body of water. The apparatus comprises a container (22) which is adapted to hold sources of silver and copper metal and halogen reagent which, under the action of oxidising agents forms colloidal dissolved metals. Metering means (12) is adapted to deliver hydrogen peroxide reagent into the inlet conduit (10). Water is pumped from outlet conduit (18) through feed conduit (20) which is connected to the container (22) and then through return conduit (24) which connects to either inlet conduit (10) or the outlet conduit (18) to a position upstream of the connection of the feed conduit (10) to the outlet conduit (18). The amount of hydrogen peroxide and halogen added are predetermined by the volume of water to be sanitized.
    Type: Grant
    Filed: October 16, 2000
    Date of Patent: February 11, 2003
    Assignee: Aquagem Holdings Pty Limited
    Inventor: Hans Rex
  • Patent number: 6517141
    Abstract: A water-proof car covering includes an integral water-proof plastic sheet having a base portion that is adapted to confine a bottom side of a car and that has a periphery, and a plurality of side portions that extend from the periphery of the base portion, that are adapted to confine the remaining sides of the car, and that respectively have peripheral side edges which are connected to form a continuous loop. A closure unit is secured to and extends along the entire length of the loop, and includes male and female interlocking members that are engageable with each other so as to permit watertight enclosing of the car by the plastic sheet.
    Type: Grant
    Filed: January 31, 2002
    Date of Patent: February 11, 2003
    Inventor: Tsun-Cheng Su
  • Patent number: 6518131
    Abstract: A method that includes: providing a substrate where a memory cell array region and a peripheral region are defined; forming a buried layer on the substrate; forming a gate material by positioning a gate insulating film on the substrate having the buried layer; forming first gates by covering the peripheral region, and etching the gate material of the memory cell array region according to a photolithography process; forming an insulating pattern on the substrate to fill up a space between the first gates and expose the surfaces of the first gates; forming second gates by covering the memory cell array region, and etching the gate material of the peripheral region according to the photolithography process; and forming a low resistance layer on the first gates, and simultaneously forming a source/drain at both sides of the second gates, by doping an impurity to the substrate having the first and second gates.
    Type: Grant
    Filed: November 7, 2001
    Date of Patent: February 11, 2003
    Assignee: Dongbu Electronics, Co. Ltd.
    Inventor: Min Gyu Lim
  • Patent number: D478972
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: August 26, 2003
    Inventor: Shane Hunter