Patents Assigned to AlliedSignal Inc.
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Patent number: 6514928Abstract: This invention provides azeotrope-like compositions of 1,1,1,3,3-pentafluoropropane and water that are environmentally desirable for use as refrigerants, aerosol propellants, metered dose inhalers, blowing agents for polymer foam, heat transfer media, and gaseous dielectrics.Type: GrantFiled: March 15, 1999Date of Patent: February 4, 2003Assignee: AlliedSignal Inc.Inventors: Leslie Bruce Bement, Mary Charlotte Bogdan, Clayton Herbert Carson, Peter Brian Logsdon, Hang Thanh Pham, Rajiv Ratna Singh, Hsueh Sung Tung, Ronald Riegal, David John Williams, Kevin Donald Uhrich
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Patent number: 6509259Abstract: The invention relates to cured dielectric films and a process for their manufacture which are useful in the production of integrated circuits. Dual layered dielectric films are produced in which a lower layer comprises a non-silicon containing organic polymer and an upper layer comprises an organic, silicon containing polymer. Such films are useful in the manufacture of microelectronic devices such as integrated circuits (IC's). In one aspect the upper layer silicon containing polymer has less than 40 Mole percent carbon containing substituents, and in another aspect it has at least approximately 40 Mole percent carbon containing substituents.Type: GrantFiled: June 9, 1999Date of Patent: January 21, 2003Assignee: AlliedSignal Inc.Inventors: Shi-Qing Wang, Jude Dunne, Lisa Figge
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Patent number: 6503850Abstract: The present invention relates to nanoporous dielectric films and to a process for their manufacture. Such films are useful in the production of integrated circuits. A precursor of an alkoxysilane, and low and high volatility solvents are mixed at a pH of about 2-5, raised to a pH of about 8 or above with a low volatility base and deposited on a semiconductor substrate. After exposure to atmospheric moisture, a nanoporous dielectric film is produced on the substrate.Type: GrantFiled: March 25, 1998Date of Patent: January 7, 2003Assignee: AlliedSignal Inc.Inventors: Stephen Wallace, Douglas M. Smith, Teresa Ramos, Kevin H. Roderick, James S. Drage, Lisa Beth Brungardt
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Patent number: 6504247Abstract: A microelectronic device having a self aligned metal diffusion barrier is disclosed. A microelectronic device having a substrate and a dielectric layer on the substrate. A trench having inside walls is formed through the dielectric layer. A lining of a barrier metal is on the inside walls of the trench and a fill metal is in the trench between the linings on the inside walls of the trench. The fill metal and the barrier metal have substantially different removal selectivities. A covering of the barrier metal is on the fill metal and the covering spans the linings on the inside walls of the trench and conforms to the top of the fill metal in the trench.Type: GrantFiled: January 29, 2002Date of Patent: January 7, 2003Assignee: AlliedSignal Inc.Inventor: Henry Chung
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Patent number: 6499545Abstract: A well drilling system with a miniature directional indication sensor capable of operating at elevated temperature. The present invention is implemented with power supply, sensor drive and sense circuits in thick film or multi-chip module electronic assemblies, mounted on a chassis with a high resonant frequency. The thick film or multi-chip module electronics assemblies also contribute to increased shock and vibration resistance. Sensor drive and sense functions may be implemented in one or more application specific integrated circuits and integrated with multi-chip module electronics assembly. Analog-to-digital conversion of sensor signals is implemented in a voltage-to-digital converter circuit provided by the present invention. Furthermore, the present invention eliminates data lag between channels by providing simultaneous sampling of all the sensor channels.Type: GrantFiled: July 18, 2000Date of Patent: December 31, 2002Assignee: AlliedSignal Inc.Inventor: Douglas C. MacGugan
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Patent number: 6498399Abstract: The invention provides microelectronic devices such as integrated circuit devices. Such have vias, interconnect metallization and wiring lines using dissimilar low dielectric constant intermetal dielectrics. The use of both organic and inorganic low-k dielectrics offers advantages due to the significantly different plasma etch characteristics of the two kinds of dielectrics. One dielectric serves as the etchstop in etching the other dielectric so that no additional etchstop layer is required. A microelectronic device is formed having a substrate and a layer of a first dielectric material positioned on the substrate. A layer of a second dielectric material is positioned on the first dielectric layer and an additional layer of the first dielectric material positioned on the second dielectric material.Type: GrantFiled: September 8, 1999Date of Patent: December 24, 2002Assignee: AlliedSignal Inc.Inventors: Henry Chung, James Lin
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Patent number: 6497995Abstract: A low cost, durable mask for use in structuring anodically bondable glass materials and other structurable glass materials.Type: GrantFiled: July 9, 1999Date of Patent: December 24, 2002Assignee: AlliedSignal Inc.Inventor: Amy V. Skrobis
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Publication number: 20020189703Abstract: A yarn having good entanglement and good quality, preferably a multifilament polyamide yarn, a method for making the yarn, and a woven fabric made from the yarn wherein the yarn comprises the following properties: the yarn length per defect is greater than or equal to about 3000 meters per defect; the maximum skip length is less than or equal to about 120 millimeters; the ratio between yarn length per defect to maximum skip length is greater than or equal to about 50; the entanglements per meter times the average entanglement strength is greater than or equal to about 120; and the yarn can be woven sizeless. The yarn of the invention is useful in the sizeless weaving of fabric used in air bags.Type: ApplicationFiled: April 18, 2002Publication date: December 19, 2002Applicant: AlliedSignal Inc.Inventors: Robert Walter Medeiros, Eugene James Corrigan, Thomas Yiu-Tai Tam, Elsaid Hassan Salem, Jiunn-Yow Chen, Michael James Reynolds, John Kenneth. Yasnowsky
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Patent number: 6495906Abstract: The present invention relates to low dielectric constant nanoporous silica films and to processes for their manufacture. A substrate, e.g., a wafer suitable for the production of an integrated circuit, having a plurality of raised lines and/or electronic elements present on its surface, is provided with a relatively high porosity, low dielectric constant, silicon-containing polymer film composition.Type: GrantFiled: February 7, 2002Date of Patent: December 17, 2002Assignee: AlliedSignal Inc.Inventors: Douglas M. Smith, Teresa Ramos, Kevin H. Roderick, Stephen Wallace, James Drage, Hui-Jung Wu, Neil Viernes, Lisa B. Brungardt
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Patent number: 6492022Abstract: The present invention provides load leveling and impact energy absorption webbing comprising warp yarn. If the webbing is used in seat belts, the webbing provides load leveling behavior from about 450 pounds (about 2,000 Newtons) to about 1,800 pounds (about 8,000 Newtons) in vehicle collision. The yarn has a force-displacement profile such that: (a) when the yarn is subjected to an initial barrier stress of from about 0.2 gram/denier to less than or equal to about 1.4 grams/denier, the yarn elongates to less than 3 percent and the initial modulus ranges from about 20 grams/denier to about 150 grams/denier; (b) upon subjecting the yarn to greater than the initial barrier stress and less than or equal to 1.8 grams/denier, the yarn elongates further to at least about 10 percent and the energy absorbed from 0 to the elongation at 1.8 grams/denier is at least about 0.0008 Joule/denier·meter; and (c) upon subjecting the yarn to greater than 1.Type: GrantFiled: September 4, 2001Date of Patent: December 10, 2002Assignee: AlliedSignal Inc.Inventors: Weiming Tang, Frank Mares, Robert Clark Morgan
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Patent number: 6488817Abstract: A process for the purification of difluoromethane comprising: (a) subjecting a mixture comprising at least difluoromethane (HFC-32) and dichlorodifluoromethane (CFC-12) to a first distillation step in which a majority of either CFC-12 or HFC-32 is concentrated in a first distillate and a majority of the other component is concentrated in a first bottoms; and (b) subjecting the first distillate in step (a) to at least one additional second distillation step conducted at a different pressure in which a majority of the component concentrated in said first distillate is concentrated in a second bottoms and in which the other component is concentrated in a second distillate; and (c) recovering purified HFC-32 from one of said first or second bottoms.Type: GrantFiled: March 31, 1998Date of Patent: December 3, 2002Assignee: AlliedSignal Inc.Inventors: Charles Francis Swain, Rajiv Ratna Singh, Hang Thanh Pham
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Patent number: 6484510Abstract: A fuel control system for supplying metered quantities of fuel from a fuel supply (11), through a fuel pump (13), a metering valve (15) and a pressurizing valve (17) to a plurality of engine fuel manifolds (31a, 31b, 33) includes an ecology valve (43) for withdrawing fuel from the engine fuel manifolds (31a, 31b, 33) during cessation of engine operation and for returning fuel to the engine fuel manifolds (31a, 31b, 33) to be burned during normal engine operation. The ecology valve (43) includes a valve housing (44) having a plurality of ecology ports (50, 52, 54) adapted to be coupled to corresponding ones of the engine fuel manifolds (31a, 31b, 33) and a control port (46) adapted to be connected to a corresponding control port (45) of the fuel pressurizing valve (17).Type: GrantFiled: December 11, 2001Date of Patent: November 26, 2002Assignee: AlliedSignal Inc.Inventors: Paul W. Futa, Jr., Steven F. Fisher, Kevin R. Sharp
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Patent number: 6484578Abstract: A pendulous accelerometer wherein the active reaction mass is pendulously mounted external to a fixed support structure and may include sensor cover of covers in the total active reaction mass.Type: GrantFiled: September 20, 1999Date of Patent: November 26, 2002Assignee: AlliedSignal Inc.Inventors: James R. Woodruff, Steven A. Foote
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Patent number: 6465103Abstract: The present invention provides highly oriented multilayer films. They are produced by coextruding or laminating films having at least one layer of a fluoropolymer, at least one layer of a polyolefin homopolymer or copolymer and an intermediate adhesive layer of a polyolefin having at least one functional moiety of an unsaturated carboxylic acid or anhydride thereof. With this structure the polyolefin layer allows the fluoropolymer layer to be stretched up to ten times its original length. Such a high orientation ratio for the fluoropolymer film increases the mechanical strength, toughness, and water vapor barrier properties of the film while using a thinner gauge fluoropolymer film. Coextrusion processing can be done at higher temperatures, i.e. in the range of from at about 280° C. to about 400° C. These temperatures allow films to be produced in the absence of polymer degradation and film melt fracture.Type: GrantFiled: January 21, 2001Date of Patent: October 15, 2002Assignee: AlliedSignal Inc.Inventors: Mingliang Lawrence Tsai, Yash Pal Khanna, Joseph Edgar Mackey
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Patent number: 6455130Abstract: The present invention relates to nanoporous dielectric films and to a process for their manufacture. A substrate having a plurality of raised lines on its surface is provided with a relatively high porosity, low dielectric constant, silicon containing polymer composition positioned between the raised lines and a relatively low porosity, high dielectric constant, silicon containing composition positioned on the lines.Type: GrantFiled: November 3, 2000Date of Patent: September 24, 2002Assignee: AlliedSignal Inc.Inventors: Stephen Wallace, Douglas M. Smith, Teresa Ramos, Kevin H. Roderick, James S. Drage
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Patent number: 6452275Abstract: The invention relates to the formation of structures in microelectronic devices such as integrated circuit devices by means of borderless via architectures in intermetal dielectrics. An integrated circuit structure has a substrate, a layer of a second dielectric material positioned on the substrate and spaced apart metal contacts are on the layer of the second dielectric material. The metal contacts have side walls, and a lining of a first dielectric on the side walls; a space between the linings on adjacent metal contact side walls filled with the second dielectric material, a top surface of each of the metal contacts, the linings and the spaces are at a common level. An additional layer of the second dielectric material is on some of the metal contacts, linings and filled spaces. At least one via extends through the additional layer of the second dielectric material and extends to the top surface of at least one metal contact and optionally at least one of the linings.Type: GrantFiled: June 9, 1999Date of Patent: September 17, 2002Assignee: AlliedSignal Inc.Inventor: Henry Chung
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Publication number: 20020128388Abstract: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.Type: ApplicationFiled: February 14, 2002Publication date: September 12, 2002Applicant: AlliedSignal Inc.Inventors: Joseph Kennedy, Teresa Baldwin, Nigel P. Hacker, Richard Spear
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Patent number: 6440340Abstract: This invention provides improved methods and compositions for achieving material coloration using particle scattering. These coloration effects can be designed to be either highly stable or dependent upon the switching effects of either temperature, integrated thermal exposure, moisture absorption, or exposure to actinic radiation. Articles employing materials with these coloration effects are described Composition comprise a solid, light-transmitting matrix component having a non-liquid particle scattering colorant dispersed. Articles are produced wherein another solid second matrix component has an electronic transition colorant dispersed therein and the first and second compositions are disposed on one another and optionally interpenetrate each other. Colored articles are produced in the form of fibers, films and molded articles.Type: GrantFiled: November 20, 2000Date of Patent: August 27, 2002Assignee: AlliedSignal Inc.Inventors: Tammy Lynn Smith, Ray Baughman, Mary Frances Martin, Wonsik Choi, Jeffrey Moulton
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Patent number: 6437760Abstract: The visibility of an image projected onto a background of spatially and temporally varying brightness can be optimized by dynamically adjusting the brightness of the projected image. The brightness of the background is detected on a zone-by-zone basis and the brightnesses of the corresponding portions of the projected image are adjusted accordingly.Type: GrantFiled: August 4, 2000Date of Patent: August 20, 2002Assignee: AlliedSignal Inc.Inventors: Robert G. Simpson, Richard A. Burne
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Patent number: 6432542Abstract: The present invention provides halopolymer-containing multicomponent structures comprising at least one halopolymer layer and at least one adhesive layer. The adhesive layer comprises a base polymer having at least one functional moiety selected from the group consisting of unsaturated acids and anhydrides thereof, amines and epoxy compounds, wherein said adhesive layer has an ASTM D-2240 shore hardness number of less than about 25 in the D scale and less than about 75 in the A scale. Multicomponent structures such as films, tubing, sheet and injection molded and blow molded articles prepared with these adhesives exhibit superior adhesion as well as the excellent barrier properties typically associated with halopolymer-containing multicomponent structures. A method of improving the adhesion of halopolymers is disclosed as well.Type: GrantFiled: September 28, 1998Date of Patent: August 13, 2002Assignee: AlliedSignal Inc.Inventor: Mingliang Lawrence Tsai