Patents Assigned to ASML Netherlands B.V.
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Publication number: 20240005463Abstract: Disclosed herein is a method of reducing a sample charging effect in a scanning electron microscope (SEM) image, the method comprising: obtaining a first SEM image from a first electron beam scan with a parameter being a first quantity; obtaining a second SEM image from a second electron beam scan with the parameter being a second quantity different from the first quantity; and generating a reduced sample charging effect image based on convolution equations comprising a representation of the first SEM image, a representation of the second SEM image, a first point spread function corresponding to the first SEM image and a second point spread function corresponding to the second SEM image.Type: ApplicationFiled: September 18, 2023Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Shakeeb Bin HASAN, Maikel Robert GOOSEN
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Publication number: 20240004283Abstract: Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.Type: ApplicationFiled: July 28, 2023Publication date: January 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Maxim Aleksandrovich Nasalevich, Erik Achilles ABEGG, Nirupam BANERJEE, Michiel Alexander BLAUW, Derk Servatius Gertruda BROUNS, Paul JANSSEN, Matthias KRUIZINGA, Egbert LENDERINK, Nicolae MAXIM, Andrey NIKIPELOV, Arnoud Willem NOTENBOOM, Claudia PILIEGO, Mária PÉTER, Gijsbert RISPENS, Nadja SCHUH, Marcus Adrianus VAN DE KERKHOF, Willem Joan VAN DER ZANDE, Pieter-Jan VAN ZWOL, Antonius Willem VERBURG, Johannes Petrus Martinus Bernardus VERMEULEN, David Ferdinand VLES, Willem-Pieter VOORTHUIJZEN, Aleksandar Nikolov ZDRAVKOV
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Publication number: 20240004127Abstract: Optical components and methods of manufacture thereof. A first optical component has a hollow-core photonic crystal fiber includes internal capillaries for guiding radiation and an outer capillary sheathing the internal capillaries; and at least an output end section having a larger inner cross-sectional dimension over at least a portion of the output end section than an inner cross-sectional dimension of the outer capillary along a central portion of the hollow-core photonic crystal fiber prior to the output end section. A second optical component includes a hollow-core photonic crystal fiber and a sleeve arrangement.Type: ApplicationFiled: August 15, 2023Publication date: January 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Patrick Sebastian UEBEL, Peter Maximilian Götz, Sebastian Thomas Bauerschmidt, Coen Hubertus Matheus Baltis, Janneke Ravensbergen
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Publication number: 20240004319Abstract: A radiation source for generating broadband radiation, the source including: a pump source having only one single fiber amplifier configured to generate pump radiation including a plurality of radiation pulses having a pulse energy of 2.5 ?J or less; and a hollow core fiber having a hollow core region and a cladding surrounding the hollow core region, the hollow core region having a pressurized gas therein, and the hollow core fiber being arranged to receive, at an input end, the pump radiation, wherein the hollow core region is dimensioned such that the radiation pulses have a soliton order higher than 16 so as to broaden a spectrum of the pump radiation using modulation instability as the pump radiation propagates along the hollow-core fiber, for providing output broadband radiation from an output end of the hollow core fiber.Type: ApplicationFiled: November 25, 2021Publication date: January 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Patrick Sebastian UEBEL, Willem Richard PONGERS, Sebastian Thomas BAUERSCHMIDT, Peter Maximilian GOTZ, Ludovicus VAN DEN OETELAAR
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Publication number: 20240003809Abstract: Disclosed is a metrology apparatus and method for measurement of a diffractive structure on a substrate. The metrology apparatus comprises a radiation source operable to provide first radiation for excitation of the diffractive structure such that high harmonic second radiation is generated from said diffractive structure and/or substrate; and a detection arrangement operable to detect said second radiation, at least a portion of which having been diffracted by said diffractive structure.Type: ApplicationFiled: October 12, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Peter Michael KRAUS, Sylvianne Dorothea Christina ROSCAM ABBING, Filippo CAMPI, ZhuangYan ZHANG, Petrus Wilhelmus SMORENBURG, Nan LIN, Stefan Michiel WITTE, Arie Jeffrey DEN BOEF
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Publication number: 20240004313Abstract: Disclosed is an optical imaging system, and associated method, comprising a stage module configured to support an object such that an area of the object is illuminated by an illumination beam; an objective lens configured to collect at least one signal beam, the at least one signal beam originating from the illuminated area of the object; an image sensor configured to capture an image formed by the at least one signal beam collected by the objective lens; and a motion compensatory mechanism operable to compensate for relative motion of the stage module with respect to the objective lens during an image acquisition. The motion compensatory mechanism causes a compensatory motion of one or more of: said objective lens or at least one optical element thereof; said image sensor; and/or an optical element comprised within a detection branch and/or illumination branch of the optical imaging system.Type: ApplicationFiled: November 16, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Coen Adrianus VERSCHUREN, Ferry ZIJP, Nitesh PANDEY, Alexander Prasetya KONIJNENBERG
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Publication number: 20240005457Abstract: Described herein is a method, and system for training a deblurring model and deblurring an image (e.g., SEM image) of a patterned substrate using the deblurring model and depth data associated with multiple layers of the patterned substrate. The method includes obtaining, via a simulator using a target pattern as input, a simulated image of the substrate, the target pattern comprising a first target feature to be formed on a first layer, and a second target feature to be formed on a second layer located below the first layer; determining, based on depth data associated with multiple layers of the substrate, edge range data for features of the substrate; and adjusting, using the simulated image and the edge range data associated with the target pattern as training data, parameters of a base model to generate the deblurring model to a deblur image of a captured image.Type: ApplicationFiled: September 27, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Hairong LEI, Wei FANG
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Publication number: 20240006147Abstract: Disclosed herein is a flood column for projecting a charged particle flooding beam along a beam path towards a sample to flood the sample with charged particles prior to assessment of the flooded sample using an assessment column, the flood column comprising: an anchor body arranged along the beam path; a lens arrangement arranged in a down-beam part of the flood column; and a lens support arranged between the anchor body and the lens arrangement; wherein the lens support is configured to position the lens arrangement and the anchor body relative to each other; the lens support comprises an electrical insulator; and the lens support is in the direct line of sight of at least a portion of the beam path in the down-beam part.Type: ApplicationFiled: September 18, 2023Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Christiaan OTTEN, Christan TEUNISSEN, Paul Hendricus SCHEEPERS, Joseph Reinier MEIJER
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Publication number: 20240004312Abstract: Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.Type: ApplicationFiled: October 28, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Peter Michael KRAUS, Sylvianne Dorothea Christina ROSCAM ABBING, Filippo CAMPI, ZhuangYan ZHANG, Petrus Wilhelmus SMORENBURG, Nan LIN, Stefan Michiel WITTE, Arie Jeffrey DEN BOEF
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Publication number: 20240004307Abstract: A method of forming a pattern on a substrate using a lithographic apparatus provided with a patterning device and a projection system having chromatic aberrations, the method including: providing a radiation beam having a plurality of wavelength components to the patterning device; forming an image of the patterning device on the substrate using the projection system to form the pattern, wherein a position of the pattern is dependent on a wavelength of the radiation beam due to the chromatic aberrations; and controlling a spectrum of the radiation beam to control the position of the pattern.Type: ApplicationFiled: November 29, 2021Publication date: January 4, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Pioter NIKOLSKI, Rick Jeroen MEIJERINK
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Publication number: 20240004184Abstract: A micromirror array comprises a substrate, a plurality of mirrors for reflecting incident light and, for each mirror of the plurality of mirrors, at least one piezoelectric actuator for displacing the mirror, wherein the at least one piezoelectric actuator is connected to the substrate. The micromirror array further comprises one or more pillars connecting the mirror to the at least one piezoelectric actuator. Also disclosed is a method of forming such a micromirror array. The micromirror array may be used in a programmable illuminator. The programmable illuminator may be used in a lithographic apparatus and/or in an inspection and/or metrology apparatus.Type: ApplicationFiled: November 8, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Luc Roger Simonne HASPESLAGH, Nitesh PANDEY, Ties Wouter VAN DER WOORD, Halil Gökay YEGEN, Sebastianus Adrianus GOORDEN, Alexis HUMBLET, Alexander Ludwig KLEIN, Jim Vincent OVERKAMP, Guilherme BRONDANI TORRI, Edgar Alberto OSORIO OLIVEROS
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Patent number: 11860553Abstract: The invention provides an assembly having a cryostat and a flat coil layer of superconducting coils for use with a magnetic levitation and/or acceleration motor system of a lithographic apparatus. The cryostat has two insulation coverings. The coil layer is arranged between the two coverings. The coverings each have an inner plate configured to be cryocooled and an outer plate parallel to the inner plate, and an insulation system with a vacuum layer between the inner and outer plate. The insulation system of said covering has a layers of circular bodies, the central axes of these bodies extending perpendicular to the inner and outer plate, and is configured to provide a layer of point contacts between two layers of circular bodies or between a layer of circular bodies and the inner and/or outer plate.Type: GrantFiled: January 23, 2023Date of Patent: January 2, 2024Assignee: ASML Netherlands B.V.Inventors: Hessel Bart Koolmees, Johannes Petrus Martinus Bernardus Vermeulen
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Patent number: 11862427Abstract: Systems and methods for implementing a detector array are disclosed. According to certain embodiments, a substrate comprises a plurality of sensing elements including a first element and a second element. The detector comprises a switching element configured to connect the first element and the second element. The switching region may be controlled based on signals generated in response to the sensing elements receiving electrons with a predetermined amount of energy.Type: GrantFiled: September 13, 2022Date of Patent: January 2, 2024Assignee: ASML Netherlands B.V.Inventors: Yongxin Wang, Zhonghua Dong, Rui-Ling Lai
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Patent number: 11860548Abstract: A method of determining a characteristic of one or more processes for manufacturing features on a substrate, the method including: obtaining image data of a plurality of features on a least part of at least one region on a substrate; using the image data to obtain measured data of one or more dimensions of each of at least some of the plurality of features; determining a statistical parameter that is dependent on the variation of the measured data of one or more dimensions of each of at least some of the plurality of features; determining a probability of defective manufacture of features in dependence on a determined number of defective features in the image data; and determining the characteristic of the one or more processes to have the probability of defective manufacture of features and the statistical parameter.Type: GrantFiled: February 6, 2020Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Wim Tjibbo Tel, Hermanus Adrianus Dillen, Marc Jurian Kea, Mark John Maslow, Koen Thuijs, Peter David Engblom, Ralph Timotheus Huijgen, Daan Maurits Slotboom, Johannes Catharinus Hubertus Mulkens
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Patent number: 11860546Abstract: A fluid handling structure for a lithographic apparatus, the structure having: an aperture for the passage therethrough of a beam; a first part; and a second part, wherein the first and/or second part define a surface for the extraction of immersion fluid, relative movement between the first and second parts is effective to change a position of fluid flow into or out of the surface relative to the aperture, and the first or second part has at least one through-hole for the fluid flow and the other of the first or second part has at least one opening for the fluid flow, the at least one through-hole and at least one opening being in fluid communication when aligned, the relative movement allowing alignment of the at least one opening with different ones of the through-hole to change the position of the fluid flow into or out of the surface.Type: GrantFiled: September 23, 2022Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Pepijn Van Den Eijnden, Cornelius Maria Rops, Theodorus Wilhelmus Polet, Floor Lodewijk Keukens, Gheorghe Tanasa, Rogier Hendrikus Magdalena Cortie, Koen Cuypers, Harold Sebastiaan Buddenberg, Giovanni Luca Gattobigio, Evert Van Vliet, Nicolaas Ten Kate, Mark Johannes Hermanus Frencken, Jantien Laura Van Erve, Marcel Maria Cornelius Franciscus Teunissen
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Patent number: 11860549Abstract: A method for determining a correction for control of at least one manufacturing apparatus used in a manufacturing process for providing structures to a region on a substrate, the region including a plurality of sub-regions. The method includes obtaining measurement data relating to a process parameter of the manufacturing process for the region; and determining a correction for the manufacturing apparatus based on the measurement data. The correction is configured to maintain the process parameter within a specified range across a boundary between two of the sub-regions and/or to better correct the process parameter across the boundary between two of the sub-regions with respect to within the remainder of the region.Type: GrantFiled: May 1, 2019Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Wolter Siemons, Daan Maurits Slotboom, Erik Peter De Kort
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Patent number: 11861818Abstract: A defect inspection system is disclosed. According to certain embodiments, the system includes a memory storing instructions implemented as a plurality of modules. Each of the plurality of modules is configured to detect defects having a different property. The system also includes a controller configured to cause the computer system to: receive inspection data representing an image of a wafer; input the inspection data to a first module of the plurality of modules, the first module outputs a first set of points of interests (POIs) having a first property; input the first set of POIs to a second module of the plurality of modules, the second module output a second set of POIs having the second property; and report that the second set of POIs as defects having both the first property and the second property.Type: GrantFiled: April 18, 2022Date of Patent: January 2, 2024Assignee: ASML Netherlands B.V.Inventors: Zhichao Chen, Wei Fang
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Patent number: 11860552Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.Type: GrantFiled: June 12, 2017Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan Janssens, Bert Dirk Scholten, Sjoerd Nicolaas Lambertus Donders, Teunis Van Dam, Peter Mark Overschie, Theresa Mary Spaan-Burke, Siegfried Alexander Tromp
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Patent number: 11860554Abstract: The invention provides an object positioner comprising:—an object support having an object support surface which is configured to engage at least a part of an object, said object support surface having a support surface temperature,—a thermal device, which thermal device is configured to provide at least a part of the object with a first object temperature, which first object temperature differs from the support surface temperature by a first predetermined temperature difference.Type: GrantFiled: March 27, 2020Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Mark Johannes Hermanus Frencken, Theodorus Marcus Nagtegaal, Oleg Viacheslavovich Voznyi
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Patent number: RE49784Abstract: A new multi-beam apparatus with a total FOV variable in size, orientation and incident angle, is proposed. The new apparatus provides more flexibility to speed the sample observation and enable more samples observable. More specifically, as a yield management tool to inspect and/or review defects on wafers/masks in semiconductor manufacturing industry, the new apparatus provide more possibilities to achieve a high throughput and detect more kinds of defects.Type: GrantFiled: August 27, 2020Date of Patent: January 2, 2024Assignee: ASML Netherlands B.V.Inventors: Weiming Ren, Xuedong Liu, Xuerang Hu, Zhong-wei Chen
