Patents Assigned to AZ Electronic Materials (Luxembourg) S.A.R.L.
  • Patent number: 10927220
    Abstract: The present invention relates to silazane-siloxane random copolymers as well as their production and their uses, particularly in LEDs.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: February 23, 2021
    Assignee: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Ralf Grottenmueller, Abraham Casas Garcia-Minguillan, Fumio Kita
  • Patent number: 10822459
    Abstract: The present invention relates to a formulation suitable for the preparation of a highly refractive encapsulation material with good barrier properties towards water vapor for an LED, to an encapsulation material for an LED having a high refractive index and good barrier properties towards water vapor which is obtainable from said formulation and to a light emitting device (LED) comprising said encapsulation material. The formulation comprises a polymer comprising a first repeating unit U1 and a second repeating unit U2; and a surface-modified nanoparticle, wherein the surface-modified nanoparticle does not contain any zirconium dioxide.
    Type: Grant
    Filed: July 14, 2017
    Date of Patent: November 3, 2020
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Ralf Grottenmueller, Abraham Casas Garcia-Minguillan, Fumio Kita, Dieter Wagner
  • Publication number: 20200319557
    Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
    Type: Application
    Filed: March 27, 2020
    Publication date: October 8, 2020
    Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Yuki HIRAYAMA, Tadashi KISHIMOTO, Masayoshi SUZUKI, Daishi YOKOYAMA, Katsuto TANIGUCHI, Toshiaki NONAKA
  • Publication number: 20200255599
    Abstract: The present invention relates to silazane-siloxane random copolymers as well as their production and their uses, particularly in LEDs.
    Type: Application
    Filed: January 19, 2017
    Publication date: August 13, 2020
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Ralf GROTTENMUELLER, Abraham CASAS GARCIA-MINGUILLAN, Fumio KITA
  • Patent number: 10719013
    Abstract: [Problem] To provide a material, which is a composition for a black matrix, and which is suitable for a display device structure having high luminance and suitable for producing a black matrix having high heat resistance and high light shielding properties. [Means for Solution] To use a composition for a black matrix comprising (I) a siloxane polymer having specific repeating unit(s), (II) a silanol condensation catalyst, (III) a black colorant, and (IV) a solvent.
    Type: Grant
    Filed: August 16, 2017
    Date of Patent: July 21, 2020
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Toshiaki Nonaka, Atsuko Noya
  • Publication number: 20200181332
    Abstract: The present invention relates to a formulation suitable for the preparation of a highly refractive encapsulation material with good barrier properties towards water vapor for an LED, to an encapsulation material for an LED having a high refractive index and good barrier properties towards water vapor which is obtainable from said formulation and to a light emitting device (LED) comprising said encapsulation material. The formulation comprises a polymer comprising a first repeating unit U1 and a second repeating unit U2; and a surface-modified nanoparticle, wherein the surface-modified nanoparticle does not contain any zirconium dioxide.
    Type: Application
    Filed: July 14, 2017
    Publication date: June 11, 2020
    Applicant: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Ralf GROTTENMUELLER, Abraham CASAS GARCIA-MINGUILLAN, Fumio KITA, Dieter WAGNER
  • Patent number: 10678134
    Abstract: The present invention relates to a photosensitive composition, and a color conversion film. The present invention further relates to a use of the photosensitive composition in a color conversion film fabrication process, and to a use of the color conversion film in an optical device. The invention further more relates to an optical device comprising the color conversion film and method for preparing the color conversion film and the optical device.
    Type: Grant
    Filed: August 30, 2016
    Date of Patent: June 9, 2020
    Assignees: MERCK PATENT GMBH, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Yuki Hirayama, Tadashi Kishimoto, Masayoshi Suzuki, Daishi Yokoyama, Katsuto Taniguchi, Toshiaki Nonaka
  • Patent number: 10670969
    Abstract: [Problem] To provide a composition, which is a reverse pattern formation composition comprising an aqueous solvent having little influence on a resist pattern, and which is excellent in flatness and filling properties after coating and has excellent etching resistance. Furthermore, a method for forming a pattern using the same is provided. [Means for Solution] A reverse pattern formation composition comprising a polysiloxane compound comprising a repeating unit having a nitrogen-containing group and a solvent comprising water, and a method for forming a fine pattern using the same.
    Type: Grant
    Filed: July 3, 2017
    Date of Patent: June 2, 2020
    Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Xiaowei Wang, Tatsuro Nagahara
  • Patent number: 10656522
    Abstract: The present invention relates to a shrink material composition for fattening a resist pattern prepared from a negative-tone lithography process, comprising at least one polymer and at least one organic solvent, wherein the at least one polymer comprises at least one structural unit of a nitrogen heteroaromatic ring system.
    Type: Grant
    Filed: November 2, 2016
    Date of Patent: May 19, 2020
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventor: Xiaowei Wang
  • Patent number: 10620538
    Abstract: The present invention provides a positive type photosensitive siloxane composition in which a film formed by the same has high heat resistance, high strength and high crack resistance, an active matrix substrate in which by-product is not generated, an occurrence of defects is suppressed, and an interlayer insulating film is easily formed at a low cost while having good transmittance, a display apparatus including the active matrix substrate, and a method of manufacturing the active matrix substrate. An active matrix substrate includes a plurality of gate wirings provided so as to extend parallel to each other on an insulating substrate, and a plurality of source wirings provided so as to extend parallel to each other in a direction intersecting the respective gate wirings. An interlayer insulating film and a gate insulating film are interposed at portions including the intersecting portions of the gate wirings and the source wirings, on a lower side of the source wiring.
    Type: Grant
    Filed: February 3, 2016
    Date of Patent: April 14, 2020
    Assignees: Sakai Display Products Corporation, AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Nobutake Nodera, Akihiro Shinozuka, Shinji Koiwa, Masahiro Kato, Takao Matsumoto, Takashi Fuke, Daishi Yokoyama, Katsuto Taniguchi
  • Patent number: 10606173
    Abstract: [Object] To provide a composition capable of forming a cured film having low permittivity and excellence in chemical resistance, in heat resistance and in resolution; and further to provide a production process employing the composition. [Means] The present invention provides a composition comprising: an alkali-soluble resin, namely, a polymer comprising a carboxyl-containing polymerization unit and an alkoxysilyl-containing polymerization unit; a polysiloxane; a diazonaphthoquinone derivative; a compound generating acid or base when exposed to heat or light; and a solvent.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: March 31, 2020
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Megumi Takahashi, Daishi Yokoyama, Naofumi Yoshida, Katsuto Taniguchi, Masahiro Kuzawa
  • Patent number: 10563093
    Abstract: [Object] To provide a polysilazane-containing composition for forming a film. In order to form a dense and processable siliceous film, the composition is intended to be employed in a two-step conversion process comprising the steps of: forming a film having a dry surface from the composition provided that the conversion in to the siliceous substance proceeds insufficiently; and then subjecting the film to secondary processing. [Means] The present invention provides a polysilazane-containing film-forming composition comprising a particular amine compound, a polysilazane compound, and a solvent; and the invention also provides a process for forming a siliceous substance. In the process, the composition is applied to coat a substrate and thereafter converted into the siliceous substance. The particular amine compound has two amine groups, and the amine groups have at least one phenyl-substituted hydrocarbon group.
    Type: Grant
    Filed: April 28, 2017
    Date of Patent: February 18, 2020
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Yoshio Nojima, Masakazu Kobayashi
  • Patent number: 10509319
    Abstract: The present invention relates to a photosensitive composition comprising at least one nanosized fluorescent material and polysiloxane, to a color conversion film, and to a use of the color conversion film in an optical device. The invention further relates to an optical device comprising the color conversion film and a method for preparing the color conversion film and the optical device.
    Type: Grant
    Filed: February 5, 2016
    Date of Patent: December 17, 2019
    Assignees: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Masayoshi Suzuki, Tadashi Kishimoto, Yuki Hirayama, Stephan Dertinger, Toshiaki Nonaka, Daishi Yokoyama
  • Patent number: 10487243
    Abstract: The present invention relates to a formulation suitable for the preparation of a highly refractive encapsulation material with good barrier properties towards water vapor for an LED, to an encapsulation material for an LED having a high refractive index and good barrier properties towards water vapor which is obtainable from said formulation and to a light emitting device (LED) comprising said encapsulation material. The formulation comprises a polymer comprising a first repeating unit M1 and a second repeating unit M2; and a surface-modified zirconium dioxide nanocrystal.
    Type: Grant
    Filed: July 14, 2017
    Date of Patent: November 26, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Ralf Grottenmueller, Abraham Casas Garcia-Minguillan, Fumio Kita, Dieter Wagner, Robert J. Wiacek, Daniel P. Russell, Zehra Serpil Gonen Williams
  • Patent number: 10451971
    Abstract: [Problem] To provide a composition for an underlayer, which can form an underlayer having flattened surface. [Means for Solution] A composition for forming an underlayer, comprising a polymer having a repeating unit containing nitrogen and a solvent. An underlayer is formed by coating this composition on a substrate, preferably baking in an inert atmosphere, and then baking in the air containing oxygen.
    Type: Grant
    Filed: February 2, 2016
    Date of Patent: October 22, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Masato Suzuki, Yusuke Hama, Hiroshi Yanagita, Go Noya, Shigemasa Nakasugi
  • Patent number: 10451974
    Abstract: The present invention relates to a new rinse composition, the forming of resist patterns using the rinse composition, and a semiconductor device manufacturing method using the rinse composition in a photolithography method.
    Type: Grant
    Filed: June 19, 2017
    Date of Patent: October 22, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Kazuma Yamamoto, Yuriko Matsuura, Tomoyasu Yashima, Tatsuro Nagahara
  • Patent number: 10435555
    Abstract: To provide a composition for gap formation capable of forming sacrifice areas made of a sacrificial material decomposable completely into vapor at a desired temperature, and also to provide a semiconductor device-manufacturing method using the composition. Disclosed is a composition for gap formation comprising a polymer and a solvent: wherein said polymer comprising five or more of repeating units which are represented by at least one kind of the following formula (1) or (2): Ar1-L1??(1) Ar2-L2-Ar2???(2) [each of Ar1, Ar2 and Ar2? is independently a substituted or unsubstituted aromatic group; and each of L1 and L2 is independently oxygen, sulfur, alkyl, sulfone, amide, ketone or a group represented by the following formula (3): {Ar3 is an aromatic group; and L3 is a trivalent atom selected from the group consisting of nitrogen, boron and phosphorus}].
    Type: Grant
    Filed: May 26, 2015
    Date of Patent: October 8, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l
    Inventors: Shigemasa Nakasugi, Takafumi Kinuta, Go Noya
  • Patent number: 10421841
    Abstract: The present invention relates to a method for producing silazane-siloxa copolymers and the use of such copolymers, particularly in LEDs.
    Type: Grant
    Filed: October 4, 2016
    Date of Patent: September 24, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Ralf Grottenm├╝ller, Abraham Casas Garcia-Minguillan, Fumio Kita, Dieter Wagner
  • Patent number: 10409161
    Abstract: To provide a positive type photosensitive composition capable of forming a pattern of high resolution, of high heat resistance and of high transparency without emitting harmful volatile substances such as benzene, also capable of reducing pattern defects caused by development residues, by undissolved residues, or by reattached hardly-soluble trace left in pattern formation, and further capable of being excellent in storage stability. The present invention provides a positive type photosensitive siloxane composition comprising: a polysiloxane having a phenyl group, a diazonaphthoquinone derivative, a hydrate or solvate of a photo base-generator having a particular nitrogen-containing hetero-cyclic structure, and an organic solvent.
    Type: Grant
    Filed: January 20, 2017
    Date of Patent: September 10, 2019
    Assignee: AZ Electronic Materials (Luxembourg) S.a.r.l.
    Inventors: Motoki Misumi, Daishi Yokoyama, Megumi Takahashi, Toshiaki Nonaka
  • Publication number: 20190153307
    Abstract: The present invention relates to a color conversion sheet (100) and an optical device comprising a color conversion sheet (100). The present invention further relates to a use of the color conversion sheet (100) in an optical device (200). The invention further more relates to method for preparing the color conversion sheet (100) and method for preparing the optical device (200).
    Type: Application
    Filed: March 29, 2017
    Publication date: May 23, 2019
    Applicants: Merck Patent GmbH, AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Bernhard RIEGER, Christian MATUSCHEK, Ralf GROTTENMUELLER