Patents Assigned to Canon Anelva Corporation
  • Patent number: 11140763
    Abstract: An X-ray generation apparatus includes an X-ray generation unit, a storage container configured to store the X-ray generation unit, and an insulating component arranged between an inner surface of the storage container and at least a part of the X-ray generation unit. The insulating component includes a first insulating member and a second insulating member, the first insulating member includes a first portion having a first surface, and a second portion having a second surface, a step difference is formed by the first surface and the second surface, and the second portion has a thickness smaller than that of the first portion, an adhesive surface of the second insulating member and the second surface of the first insulating member are connected by an adhesive material, and a flatness of the second surface is better than a flatness of the first surface.
    Type: Grant
    Filed: March 8, 2021
    Date of Patent: October 5, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventor: Junya Kawase
  • Patent number: 11103852
    Abstract: A structure in which a plurality of particles each containing a hydrogen absorption metal element are arranged in a fixed member such that the plurality of particles are apart from each other. An entire surface of each of the plurality of particles is surrounded by the fixed member. The fixed member contains at least one of an oxide and a nitride.
    Type: Grant
    Filed: September 3, 2019
    Date of Patent: August 31, 2021
    Assignees: CANON ANELVA CORPORATION, CANON KABUSHIKI KAISHA
    Inventors: Manabu Ikemoto, Hiroyuki Tokunaga
  • Patent number: 11092506
    Abstract: An ionization gauge includes an anode having a rod shape, and a cathode including a cathode plate having a through hole through which the anode extends. The cathode includes a first cathode plate including a through hole through which the anode extends, and a storage portion configured to store the electromagnetic wave source, a second cathode plate arranged separately from the first cathode plate, a third cathode plate arranged between the first cathode plate and the second cathode plate to be in contact with the first cathode plate, and a member configured to surround the first cathode plate, the second cathode plate, and the third cathode plate.
    Type: Grant
    Filed: January 6, 2021
    Date of Patent: August 17, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventor: Yohsuke Kawasaki
  • Patent number: 11069503
    Abstract: An electron generating apparatus includes a filament, a power supply configured to supply power to the filament so as to make the filament emit an electron, and a controller configured to repeatedly detect a value having a correlation with power supplied from the power supply to the filament, determine whether a state of the filament satisfies a notification condition, by using a plurality of detected values, and perform notification when the state satisfies the notification condition.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: July 20, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventors: Noriyuki Saito, Kyuma Iizuka, Eriko Chida
  • Publication number: 20210212188
    Abstract: An X-ray generation apparatus includes an X-ray generation unit, a storage container configured to store the X-ray generation unit, and an insulating component arranged between an inner surface of the storage container and at least a part of the X-ray generation unit. The insulating component includes a first insulating member and a second insulating member, the first insulating member includes a first portion having a first surface, and a second portion having a second surface, a step difference is formed by the first surface and the second surface, and the second portion has a thickness smaller than that of the first portion, an adhesive surface of the second insulating member and the second surface of the first insulating member are connected by an adhesive material, and a flatness of the second surface is better than a flatness of the first surface.
    Type: Application
    Filed: March 8, 2021
    Publication date: July 8, 2021
    Applicant: Canon Anelva Corporation
    Inventor: Junya KAWASE
  • Patent number: 11035034
    Abstract: The present invention provides a film formation method and a film formation apparatus which can fabricate an epitaxial film with +c polarity by a sputtering method. In one embodiment of the present invention, the film formation method of epitaxially growing a semiconductor thin film with a wurtzite structure by the sputtering method on an epitaxial growth substrate heated to a predetermined temperature by a heater includes the following steps. First, the substrate is disposed on a substrate holding portion including the heater to be located at a predetermined distance away from the heater. Then, the epitaxial film of the semiconductor film with the wurtzite structure is formed on the substrate with the impedance of the substrate holding portion being adjusted.
    Type: Grant
    Filed: January 26, 2017
    Date of Patent: June 15, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventors: Yoshiaki Daigo, Takuya Seino, Yoshitaka Ohtsuka, Hiroyuki Makita, Sotaro Ishibashi, Kazuto Yamanaka
  • Publication number: 20210123827
    Abstract: An ionization gauge includes an anode having a rod shape, and a cathode including a cathode plate having a through hole through which the anode extends. The cathode includes a first cathode plate including a through hole through which the anode extends, and a storage portion configured to store the electromagnetic wave source, a second cathode plate arranged separately from the first cathode plate, a third cathode plate arranged between the first cathode plate and the second cathode plate to be in contact with the first cathode plate, and a member configured to surround the first cathode plate, the second cathode plate, and the third cathode plate.
    Type: Application
    Filed: January 6, 2021
    Publication date: April 29, 2021
    Applicant: CANON ANELVA CORPORATION
    Inventor: Yohsuke KAWASAKI
  • Patent number: 10969347
    Abstract: X-ray generation apparatus includes X-ray generation tube having cathode and anode, voltage supply for supplying voltage to the X-ray generation tube via conductive line, storage container including first portion forming first space storing the voltage supply, second portion forming second space having width smaller than that of the first space and storing the X-ray generation tube, and connecting portion connecting the first and second portions to form internal space in which the first space and the second space communicate, and insulating member arranged in the internal space to block shortest path between the conductive line and convex portion of the connecting portion. The insulating member is formed by connecting members by adhesive material, and is configured to block linear path between the adhesive material and the conductive line and linear path between the adhesive material and the cathode.
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: April 6, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventor: Junya Kawase
  • Patent number: 10971322
    Abstract: An electron gun includes a cathode including an electron emitting portion, an extraction electrode for extracting electrons emitted from the electron emitting portion, and a focusing electrode for focusing the electrons extracted by the extraction electrode. The focusing electrode includes an outside electrode having a tubular shape, and an inside electrode arranged inside the outside electrode. The inside electrode defines a first space having a columnar shape, and includes a first surface on a side of the cathode, and a second surface on an opposite side of the first surface. An inside surface of the outside electrode and the second surface of the inside electrode define a second space. The inside electrode includes an electron passage hole, and a communicating portion which makes the first space and the second space communicate with each other.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: April 6, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventors: Kazuya Tsujino, Ichiro Nomura
  • Patent number: 10971332
    Abstract: A plasma processing apparatus includes a processing chamber configured to process a substrate, a plasma generator configured to generate a plasma, a transport unit configured to transport, to the processing chamber, the plasma generated by the plasma generator, and a scanning magnetic field generator configured to generate a magnetic field which deflects the plasma so as to scan the substrate by the plasma. The scanning magnetic field generator is configured to be capable of adjusting a center of a locus of the plasma.
    Type: Grant
    Filed: May 11, 2020
    Date of Patent: April 6, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventors: Hiroshi Yakushiji, Yuto Watanabe, Masahiro Shibamoto
  • Patent number: 10969291
    Abstract: An ionization gauge includes an anode, a cathode, and an electromagnetic wave source. The cathode includes a first cathode plate having a through hole through which the anode passes, a storage portion configured to store the electromagnetic wave source, and a passage arranged between the storage portion and the through hole and configured to pass an electromagnetic wave generated by the electromagnetic wave source.
    Type: Grant
    Filed: September 14, 2020
    Date of Patent: April 6, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventor: Yohsuke Kawasaki
  • Publication number: 20210090840
    Abstract: An electron generating apparatus includes a filament, a power supply configured to supply power to the filament so as to make the filament emit an electron, and a controller configured to repeatedly detect a value having a correlation with power supplied from the power supply to the filament, determine whether a state of the filament satisfies a notification condition, by using a plurality of detected values, and perform notification when the state satisfies the notification condition.
    Type: Application
    Filed: September 14, 2020
    Publication date: March 25, 2021
    Applicant: Canon Anelva Corporation
    Inventors: Noriyuki SAITO, Kyuma IIZUKA, Eriko CHIDA
  • Publication number: 20210080336
    Abstract: An ionization gauge includes an anode, a cathode, and an electromagnetic wave source. The cathode includes a first cathode plate having a through hole through which the anode passes, a storage portion configured to store the electromagnetic wave source, and a passage arranged between the storage portion and the through hole and configured to pass an electromagnetic wave generated by the electromagnetic wave source.
    Type: Application
    Filed: September 14, 2020
    Publication date: March 18, 2021
    Applicant: CANON ANELVA CORPORATION
    Inventor: Yohsuke KAWASAKI
  • Publication number: 20210063324
    Abstract: X-ray generation apparatus includes X-ray generation tube having cathode and anode, voltage supply for supplying voltage to the X-ray generation tube via conductive line, storage container including first portion forming first space storing the voltage supply, second portion forming second space having width smaller than that of the first space and storing the X-ray generation tube, and connecting portion connecting the first and second portions to form internal space in which the first space and the second space communicate, and insulating member arranged in the internal space to block shortest path between the conductive line and convex portion of the connecting portion. The insulating member is formed by connecting members by adhesive material, and is configured to block linear path between the adhesive material and the conductive line and linear path between the adhesive material and the cathode.
    Type: Application
    Filed: September 2, 2020
    Publication date: March 4, 2021
    Applicant: Canon Anelva Corporation
    Inventor: Junya KAWASE
  • Patent number: 10914649
    Abstract: An ionization gauge includes an anode having a rod shape, and a cathode including a cathode plate having a through hole through which the anode extends. A shape of the through hole on a section along an axial direction of the anode includes a concave portion sandwiched between two convex portions.
    Type: Grant
    Filed: October 1, 2020
    Date of Patent: February 9, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventor: Yohsuke Kawasaki
  • Patent number: 10917960
    Abstract: A deposition apparatus includes a plasma generator for generating a plasma by arc discharge, and a deposition unit for forming a film on a member by the plasma generated by the plasma generator. The plasma generator includes a target holder for holding a target and applying a negative potential to the target, an anode to which a positive potential is applied, and a capture for capturing droplets from the target. The anode has an opening, and the capture is arranged in the opening.
    Type: Grant
    Filed: December 30, 2016
    Date of Patent: February 9, 2021
    Assignee: CANON ANELVA CORPORATION
    Inventors: Masahiro Atsumi, Hidekazu Nishimura, Masahiro Shibamoto, Hiroshi Yakushiji
  • Publication number: 20210005429
    Abstract: A plasma processing apparatus includes an impedance matching circuit, a balun having a first unbalanced terminal connected to the impedance matching circuit, a grounded second unbalanced terminal, a first balanced terminal and a second balanced terminal, a grounded vacuum container, a first electrode electrically connected to the first balanced terminal, a second electrode electrically connected to the second balanced terminal, an adjustment reactance configured to affect a relationship between a first voltage applied to the first electrode and a second voltage applied to the second electrode, a high-frequency power supply configured to supply a high frequency between the first unbalanced terminal and the second unbalanced terminal via the impedance matching circuit, and a controller configured to control an impedance of the impedance matching circuit and a reactance of the adjustment reactance.
    Type: Application
    Filed: September 17, 2020
    Publication date: January 7, 2021
    Applicant: Canon Anelva Corporation
    Inventors: Masaharu TANABE, Kazunari SEKIYA, Tadashi INOUE, Hiroshi SASAMOTO, Tatsunori SATO, Nobuaki TSUCHIYA, Atsushi TAKEDA
  • Patent number: 10879040
    Abstract: Provided is an ion beam processing apparatus including an ion generation chamber, a processing chamber, and electrodes to form an ion beam by extracting ions generated in the ion generation chamber to the processing chamber. The electrodes includes a first electrode disposed close to the ion generation chamber and provided with an ion passage hole to allow passage of the ions, and a second electrode disposed adjacent to the first electrode and closer to the processing chamber than the first electrode is, and provided with an ion passage hole to allow passage of the ions. The apparatus also includes a power unit which applies different electric potentials to the first electrode and the second electrode, respectively, so as to accelerate the ions generated by an ion generator in the ion generation chamber. A material of the first electrode is different from a material of the second electrode.
    Type: Grant
    Filed: December 5, 2018
    Date of Patent: December 29, 2020
    Assignee: CANON ANELVA CORPORATION
    Inventors: Yasushi Yasumatsu, Naoyuki Okamoto, Masashi Tsujiyama, Fumihito Suzuki
  • Patent number: 10844470
    Abstract: The present invention provides an epitaxial film forming method for epitaxially growing a high-quality group III nitride semiconductor thin film on an ?-Al2O3 substrate by a sputtering method. In the epitaxial film forming method according to an embodiment of the present invention, when an epitaxial film of a group III nitride semiconductor thin film is to be formed on the ?-Al2O3 substrate arranged on a substrate holder provided with a heater electrode and a bias electrode of a sputtering apparatus, in a state where the ?-Al2O3 substrate is maintained at a predetermined temperature by the heater electrode, high-frequency power is applied to a target electrode and high-frequency bias power is applied to a bias electrode and at that time, the powers are applied so that frequency interference between the high-frequency power and the high-frequency bias power does not occur.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: November 24, 2020
    Assignee: CANON ANELVA CORPORATION
    Inventors: Yoshiaki Daigo, Keiji Ishibashi
  • Patent number: 10841515
    Abstract: X-ray generation tube includes electron gun, and anode having target to generate X-rays upon collision with electrons from the electron gun. The electron gun includes cathode having electron emitting portion, extraction electrode to extract the electrons from the electron emitting portion, and focusing electrode to focus the extracted electrons. The focusing electrode includes first portion having tubular shape, and second portion arranged inside the first portion. The first portion includes distal end facing the anode, the second portion includes opposing surface facing the anode, and the opposing surface includes electron passage hole through which the electrons from the electron emitting portion pass. Distance between the distal end and the anode is shorter than that between the opposing surface and the anode. Thermal conductivity of the distal end is lower than that of the second portion.
    Type: Grant
    Filed: May 1, 2020
    Date of Patent: November 17, 2020
    Assignee: CANON ANELVA CORPORATION
    Inventor: Kazuya Tsujino