Patents Assigned to Carl Zeiss SMS GmbH
  • Patent number: 10353295
    Abstract: A method for generating a predetermined three-dimensional contour of a component and/or a wafer comprises: (a) determining a deviation of an existing three-dimensional contour of the component and/or the wafer from the predetermined three-dimensional contour; (b) calculating at least one three-dimensional arrangement of laser pulses having one or more parameter sets defining the laser pulses for correcting the determined existing deviation of the three-dimensional contour from the predetermined three-dimensional contour; and (c) applying the calculated at least one three-dimensional arrangement of laser pulses on the component and/or the wafer for generating the predetermined three-dimensional contour.
    Type: Grant
    Filed: September 22, 2016
    Date of Patent: July 16, 2019
    Assignees: Carl Zeiss SMS Ltd., Carl Zeiss SMT GmbH
    Inventors: Vladimir Dmitriev, Bernd Geh
  • Patent number: 9436080
    Abstract: The invention relates to a method for correcting at least one error on wafers processed by at least one photolithographic mask, the method comprises: (a) measuring the at least one error on a wafer at a wafer processing site, and (b) modifying the at least one photolithographic mask by introducing at least one arrangement of local persistent modifications in the at least one photolithographic mask.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: September 6, 2016
    Assignees: Carl Zeiss SMS GmbH, Carl Zeiss SMS Ltd.
    Inventors: Dirk Beyer, Vladimir Dmitriev, Ofir Sharoni, Nadav Wertsman
  • Patent number: 9431212
    Abstract: The invention relates to a method for determining a performance of a photolithographic mask at an exposure wavelength with the steps of scanning at least one electron beam across at least one portion of the photolithographic mask, measuring signals generated by the at least one electron beam interacting with the at least one portion of the photolithographic mask, and determining the performance of the at least one portion of the photolithographic mask at the exposure wavelength based on the measured signals.
    Type: Grant
    Filed: April 29, 2011
    Date of Patent: August 30, 2016
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Markus Waiblinger, Michael Budach, Thomas Scherübl, Dirk Beyer
  • Patent number: 9366637
    Abstract: A method for establishing distortion properties of an optical system in a microlithographic measurement system is provided. The optical system has at least one pupil plane, in which the distortion properties of the optical system are established on the basis of measuring at least one distortion pattern, which the optical system generates when imaging a predetermined structure in an image field. The distortion properties of the optical system are established on the basis of a plurality of measurements of distortion patterns, in which these measurements differ from one another in respect of the intensity distribution present in each case in the pupil plane.
    Type: Grant
    Filed: June 17, 2014
    Date of Patent: June 14, 2016
    Assignee: Carl Zeiss SMS GmbH
    Inventor: Mario Laengle
  • Patent number: 9354048
    Abstract: A method for measuring a substrate in the form of a lithography mask or a mask blank for producing a lithography mask comprises the alignment of a substrate coordinate system (SKS), predetermined by a first marker structure, relative to a position measurement system, a measurement of actual position data (IST) of a second marker structure with predetermined intended position data (POS) in the substrate coordinate system (SKS), and an establishment of a transformation (T) of the substrate coordinate system (SKS) into a transformed substrate coordinate system (tSKS), wherein the transformation (T) is established in such a way that deviations between the actual position data (IST) and the intended position data (POS) of the second marker structure are reduced.
    Type: Grant
    Filed: May 7, 2015
    Date of Patent: May 31, 2016
    Assignee: Carl Zeiss SMS GmbH
    Inventor: Carola Blaesing-Bangert
  • Patent number: 9303975
    Abstract: A method for determining a registration error of a feature on a mask, including providing a first aerial image that was captured by means of a position measuring device and includes at least the feature, simulating, from pattern specifications of the mask, a second aerial image that includes at least the feature, taking into account at least one effect that causes distortion of the first aerial image, and determining the registration error of the feature as the distance of the position of the feature in the first aerial image from the position of the feature in the second aerial image. Also provided is a method for simulating an aerial image from pattern specifications of a mask and a position measuring device for carrying out the method.
    Type: Grant
    Filed: September 9, 2011
    Date of Patent: April 5, 2016
    Assignees: Carl Zeiss SMT GmbH, Carl Zeiss SMS GmbH, Carl Zeiss Meditec AG
    Inventors: Michael Arnz, Dirk Seidel, Gerd Klose
  • Patent number: 9297994
    Abstract: There is provided an autofocus device for an imaging device which has an imaging lens system with a first focal plane, an object stage for holding an object and a first movement module for the relative movement of object stage and imaging lens system, wherein the autofocus device comprises an image-recording module with a second focal plane the position of which relative to the first focal plane is known, a second movement module for the relative movement of object stage and image-recording module, a focus module for producing a two-dimensional, intensity-modulated focusing image in a focus module plane which intersects the second focal plane and a control module which controls the image-recording module for focusing the imaging device, which then records a first two-dimensional image of the object together with the focusing image during a predetermined first exposure time, and wherein the control module, using the first two-dimensional image recorded by means of the image-recording module and taking into
    Type: Grant
    Filed: September 7, 2012
    Date of Patent: March 29, 2016
    Assignees: Carl Zeiss SMS GmbH, Carl Zeiss SMT GmbH
    Inventors: Sascha Perlitz, Michael Arnz, Dirk Seidel
  • Patent number: 9268124
    Abstract: A microscope includes an illumination unit for illuminating a mask at a predetermined non-axial illumination angle, an imaging unit for imaging an aerial image of the mask within a predetermined defocus region, and an imaging field stop, in which as a result of the lateral displacement of the aerial image depending on the position within the defocus region and on the non-axial illumination angle, the opening of the imaging field stop is dimensioned such that the aerial image is either completely encompassed or circumferentially cut within the defocus region. A method for characterizing a mask having a structure includes illuminating the mask at at least one illumination angle using monochromatic illumination radiation such that a diffraction image of the structure is created, recording the diffraction image, establishing the intensities of the maxima of the adjacent orders of diffraction, and establishing an intensity ratio of the intensities.
    Type: Grant
    Filed: June 3, 2013
    Date of Patent: February 23, 2016
    Assignees: Carl Zeiss SMS GmbH, Carl Zeiss AG
    Inventors: Holger Seitz, Thomas Frank, Thomas Trautzsch, Norbert Kerwien
  • Patent number: 9261775
    Abstract: A method for analyzing a photomask comprises the determination of a Bossung plot.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: February 16, 2016
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Anthony Garetto, Thomas Scheruebl, Gilles Tabbone, Vahagn Sargsyan, Doug Uzzel, Jon Morgan
  • Patent number: 9255876
    Abstract: A temperature sensor is provided which comprises a measurement light source for generating measurement light and two optical waveguides. The two optical waveguides are arranged such that they respectively receive a measurement light portion of the measurement light and that the measurement light portions are superimposed after passing through the optical waveguides. Furthermore, the two optical waveguides have an optical property with different temperature dependency.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: February 9, 2016
    Assignee: Carl Zeiss SMS GmbH
    Inventor: Dietmar Schnier
  • Patent number: 9213003
    Abstract: A method is provided for characterizing a mask having a structure, comprising the steps of: —illuminating said mask under at least one illumination angle with monochromatic illuminating radiation, so as to produce a diffraction pattern of said structure that includes at least two maxima of adjacent diffraction orders, —capturing said diffraction pattern, —determining the intensities of the maxima of the adjacent diffraction orders, —determining an intensity quotient of the intensities. A mask inspection microscope for characterizing a mask in conjunction with the performance of the inventive method is also provided.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: December 15, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventor: Sascha Perlitz
  • Patent number: 9207544
    Abstract: An aerial image is generated by imaging an object with the use of an imaging optic, the object being illuminated by an illuminating optic by using a light source emitting illuminating radiation, the illuminating optic having a pupil plane. A first data set is defined to represent the object, a second data set is defined to represent the intensity distribution of the illuminating radiation in the pupil plane of the light source, and the aerial image is calculated from the first and the second data set, in which the resolution of the second data set varies according to the intensity or according to the location of the pupil plane. A microscope includes an imaging optic for imaging an object, a detector for capturing an aerial image of the object, and a processing unit for simulating aerial images generated by the microscope.
    Type: Grant
    Filed: June 13, 2012
    Date of Patent: December 8, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventor: Ulrich Matejka
  • Patent number: 9134626
    Abstract: A microscope is provided for space-resolved measurement of a predetermined structure. The microscope includes a source of radiation, which emits electromagnetic radiation of a predetermined wavelength, an optical system, which irradiates the electromagnetic radiation onto the structure to be measured and images the structure, irradiated with the electromagnetic radiation, onto a detector. The optical system has two eigen polarization conditions, and the optical system includes a polarization module by which a polarization condition can be set for the electromagnetic radiation of the source of radiation, the polarization conditions corresponding to the eigen polarization conditions.
    Type: Grant
    Filed: November 20, 2007
    Date of Patent: September 15, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Hans-Juergen Mann, Michael Totzeck, Norbert Kerwien
  • Patent number: 9115981
    Abstract: The present invention refers to an apparatus and a method for investigating an object with a scanning particle microscope and at least one scanning probe microscope with a probe, wherein the scanning particle microscope and the at least one scanning probe microscope are spaced with respect to each other in a common vacuum chamber so that a distance between the optical axis of the scanning particle microscope and the measuring point of the scanning probe microscope in the direction perpendicular to the optical axis of the scanning particle microscope is larger than the maximum field of view of both the scanning probe microscope and the scanning particle microscope, wherein the method comprises the step of determining the distance between the measuring point of the scanning probe microscope and the optical axis of the scanning particle microscope.
    Type: Grant
    Filed: September 26, 2013
    Date of Patent: August 25, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Christof Baur, Klaus Edinger, Thorsten Hofmann, Gabriel Baralia, Michael Budach
  • Patent number: 9116447
    Abstract: A mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure of a reticle arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source that emits projection light, at least one illumination beam path, and a first diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane of the illumination beam path, that is optically conjugate with respect to the object plane. The mask inspection microscope has at least one further diaphragm for generating the resultant intensity distribution. The first diaphragm and the at least one further diaphragm influence the resultant intensity distribution of the projection light at least partly at different locations of the pupil plane.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: August 25, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventor: Ulrich Stroessner
  • Patent number: 9097911
    Abstract: The invention relates to a microscope illumination that includes a laser light source that emits a light beam, beam-guiding optical elements for generating an illumination beam path that includes pupil and field planes, and a homogenizing arrangement for forming a luminous field having a homogenized intensity and configured to be directed onto a sample.
    Type: Grant
    Filed: May 31, 2008
    Date of Patent: August 4, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Mario Längle, Matthias Wald
  • Patent number: 9034539
    Abstract: A system for processing a substrate includes a light source to provide light pulses, a stage to support a substrate, optics to focus the light pulses onto the substrate, a scanner to scan the light pulses across the substrate, a computer to control properties of the light pulses and the scanning of the light pulses such that color centers are generated in various regions of the substrate, and at least one of (i) an ultraviolet light source to irradiate the substrate with ultraviolet light or (ii) a heater to heat the substrate after formation of the color centers to stabilize a transmittance spectrum of the substrate.
    Type: Grant
    Filed: June 21, 2011
    Date of Patent: May 19, 2015
    Assignees: Carl Zeiss SMS GmbH, Carl Zeiss SMT GmbH, Carl Zeiss SMS Ltd.
    Inventors: Sergey Oshemkov, Ralph Klaesges, Markus Mengel, Vladimir Kruglyakov, Eitan Zait, Vladimir Dmitriev, Guy Ben-Zvi, Steven Labovitz
  • Patent number: 9023666
    Abstract: The invention relates to a method for electron beam induced etching of a material (100, 200) with the method steps providing at least one etching gas at a position of the material (100, 200) at which an electron beam impacts on the material (100, 200) and simultaneously providing at least one passivation gas which is adapted for slowing down or inhibiting a spontaneous etching by the at least one etching gas.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: May 5, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Nicole Auth, Petra Spies, Rainer Becker, Thorsten Hofmann, Klaus Edinger
  • Patent number: 8970951
    Abstract: During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an equivalent image generation, during mask inspection the illumination and, on the object side, the numerical aperture are adapted to the scanner used. The invention relates to a mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure (150) of a reticle (145) arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source (5) that emits projection light, at least one illumination beam path (3, 87, 88), and a diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane (135) of the illumination beam path (3, 87, 88) that is optically conjugate with respect to the object plane.
    Type: Grant
    Filed: August 28, 2010
    Date of Patent: March 3, 2015
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Ulrich Matejka, Holger Seitz, Norbert Rosenkranz, Mario Laengle
  • Patent number: 8913120
    Abstract: In mask inspection, the defects that are of interest are primarily those that will also show up on wafer exposure. The aerial images generated in the resist and by emulation should be as identical as possible. This also applies to methods in which an overall structure that is divided into at least two substructures on at least two masks. A system and a method are provided for emulating a photolithographic process for generating on a wafer an overall structure that is divided into at least two substructures on at least two masks. The method includes generating aerial images of the at least two substructures, at least one of the aerial images being captured with a mask inspection microscope; correcting, by using a processing unit, errors in the at least one aerial image captured with a mask inspection microscope; and overlaying the aerial images of the at least two substructures to form an overall aerial image with the overall structure.
    Type: Grant
    Filed: August 24, 2010
    Date of Patent: December 16, 2014
    Assignee: Carl Zeiss SMS GmbH
    Inventors: Eric Poortinga, Thomas Scherübl, Rigo Richter, Arne Seyfarth