Patents Assigned to Carl-Zeiss-Stiftung
  • Patent number: 6496306
    Abstract: A projection exposure lens system has an object side catadioptric system, and intermediate image and a refractive lens system. The refractive lens system from its intermediate image side and in the direction of its image plane has a first lens group of positive refractive power, a second lens group of negative refractive power, a third lens group of positive refractive power, a fourth lens group of negative refractive power, and a fifth lens group of positive refractive power.
    Type: Grant
    Filed: July 29, 1999
    Date of Patent: December 17, 2002
    Assignee: Carl-Zeiss Stiftung
    Inventors: David R. Shafer, Helmut Beierl, Gerhard Fürter, Karl-Heinz Schuster, Wilhelm Ulrich
  • Patent number: 6483573
    Abstract: A projection exposure system having a light source generating a pulsed light, in particular a laser 1 generating linearly polarized light, is provided with an illuminating beam path, with an illuminating device 2 and a lens system 3 as objective. A rotating element 7 changing the polarization is preferably arranged between the light source 1 and the illuminating device 2 in the illuminating beam path in such a way that the polarizing effects of the pulses cancel one another out in the illuminating device 2.
    Type: Grant
    Filed: February 14, 2000
    Date of Patent: November 19, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Karl-Heinz Schuster
  • Patent number: 6483597
    Abstract: A method for the production of multi-layer systems with N layers having predetermined thickness, especially for the production of multi-layer systems for wavelength ranges in the extreme ultraviolet and soft X-ray wavelength range is described, in which N layers are deposited and if need be one or more layers are partially removed after deposited and in wich at the same time as deposition and/or removal of layers, the layers' reflectivity dependent on layer thickness is measured. The method includes the following steps: Calculation of a reflectivity-time curve of the multi-layer system to be produced Determination of points in time ti (i=1, 2, . . . , N), at which the deposition of the i-th layer is to be stopped; and if need be determination of points in time ti′ (i=1, 2, . . .
    Type: Grant
    Filed: April 17, 2001
    Date of Patent: November 19, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Andrey E. Yakshin, Eric Louis, Frederik Bijkerk
  • Publication number: 20020164882
    Abstract: A process for the structuring of a substrate with structures in the micrometer to nanometer range that does not involve the provision of gaseous fluoro-organic compounds is described. The process is carried out by means of reactive ion etching using a mask arranged on the substrate and a plasma as well as fluorine-containing organic compounds, which fluorine-containing organic compound(s) is/are provided in the form of solid polymers. A process for the etching of a coating on a substrate or the surface of a substrate is also described.
    Type: Application
    Filed: September 13, 2001
    Publication date: November 7, 2002
    Applicant: CARL-ZEISS-STIFTUNG
    Inventors: Uwe W. Hamm, Markus Kasparek, Oliver Jacobs
  • Patent number: 6473119
    Abstract: A photogrammetric camera for airborne or spaceborne terrain recording includes several electro-optical sensors that can be arranged at a distance from each other in the flight direction. The electro-optical sensors scan the overflown terrain and record each scanned terrain region at least twice from a respectively different perspective. At least two surface detectors are provided as the electro-optical sensors.
    Type: Grant
    Filed: April 8, 1998
    Date of Patent: October 29, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Wolf Dieter Teuchert
  • Patent number: 6473239
    Abstract: The invention relates to an imaging system for optical automatic analysers, especially fluorescence readers. On the sample side, the imaging system contains a cylindrical lens array and a prism array, which is arranged upstream of the cylindrical lens array. The prismatic effect of the prisms of the prism array lies in the direction of the cylinder axes of the cylindrical lenses. Together with a telescopic imaging system, the inventive imaging system creates a number of parallel cylindrical focussing volumes between the cylindrical lens array and a detector array, these focussing volumes being slanted towards the optical axis of the telescopic system in relation to the vertical. The arrangement enables the detection of fluorescence with a large aperture in one direction, and at the same time enables depth selective analysis of the fluorescence signal, especially the discrimination of the fluorescent radiation originating from the solution above.
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: October 29, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Martin Völcker, Christof Fattinger
  • Publication number: 20020155384
    Abstract: In a system for flushing at least one internal space of an objective, in particular an exposure projection objective for semiconductor lithography, flushing is performed by mixing at least two inert gasses in such a way that the refractive index resulting therefrom corresponds at least approximately to the refractive index of air.
    Type: Application
    Filed: December 7, 2001
    Publication date: October 24, 2002
    Applicant: Carl-Zeiss-Stiftung trading as Carl Zeiss
    Inventors: Joachim Schroeder, Gerald Richter, Dieter Schmerek, Uwe Schubert, Maria Johanna Agnes Rubingh, Willem van Schaik, Siebe Landheer
  • Patent number: 6466382
    Abstract: An optical arrangement, in particular a projection exposure system for microlithography, has, in particular, a slit-shaped image field or a non-rotational-symmetric illumination. As a result, an optical element (101) is exposed in a non-rotational-symmetric manner to the radiation of the light source (110, 111, 112). The optical element (101) has an absorbing coating (104, 105). The absorption of the coating (104, 105) is distributed in such a manner that it is non-rotation-symmetrical in a manner that is at least approximately complementary to the intensity distribution of the exposure to the radiation (107, 108, 109) of the light source (110, 111, 112). As a result of the energy absorbed in the coating (104, 105), an additional heating of the optical element (101) takes place that results in a better non-rotational-symmetric temperature distribution and, consequently, a compensation for light-induced imaging errors.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: October 15, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Werner Müller-Rissmann, Hubert Holderer, Rudolf Von Bünau, Christian Wagner, Jochen Becker, Stefan Xalter, Wolfgang Hummel
  • Patent number: 6466380
    Abstract: An iris diaphragm, in particular for an exposure lens in semiconductor lithography, is provided with a diaphragm base (2) and a grooved ring (1) which can be rotated relative to one another, having a multiplicity of leaves (4) which in each case are mounted in the diaphragm base (2) and in the grooved ring (1) and are guided by curved tracks (6), arranged in the grooved ring (1), for the purpose of adjusting the diaphragm aperture. A drive device (11) serves the purpose of twisting the diaphragm base (2) and grooved ring (1) relative to one another. The curved tracks are designed as circumferential tracks (6) in the grooved ring (1). The circumferential track (6) is split up into alternating useful-region curves (6a) and return curves (6b). The diaphragm base (2) or the grooved ring (1) can be rotated in a preselected rotary drive direction by a drive device (11), the leaves (4) being guided in a circulating fashion in the circumferential track (6).
    Type: Grant
    Filed: April 3, 2001
    Date of Patent: October 15, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Thomas Bischoff
  • Patent number: 6457866
    Abstract: A rotary bearing, in particular for optical measuring technology, such as measuring the image fidelity of an optical element, with an aperture and central axis, is provided with an outer mounting part (1) and with an inner bearing part (2). The inner bearing part (2) is connected to a drive output part (6), which can be rotated with respect to the outer mounting part (1) about the central axis. The outer mounting part (1) and the inner bearing part (2) lie in a common plane and are interconnected by articulated joints. The inner bearing part (2) is divided into a plurality of segments, which are respectively connected to the drive output part (6) via resilient articulated joints.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: October 1, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Lothar Scheibl
  • Patent number: 6451462
    Abstract: The invention is directed to an optical unit having elements (6, 7) which are juxtaposed without an air gap therebetween. The two elements (6, 7) are joined by wringing the same to each other. At least one element (7) is of crystalline material and has an amorphous inorganic layer (70) on the side thereof facing toward the other element (6). The invention is also directed to a method of preparing an element made of crystalline material, such as a fluoride, as well as a method for making a thin optical element of the crystalline material.
    Type: Grant
    Filed: February 2, 1998
    Date of Patent: September 17, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Karl-Heinz Schuster
  • Patent number: 6453005
    Abstract: Mirror substrate consisting of crystal, especially silicon crystal, on which an amorphous layer, especially a quartz glass layer, is applied.
    Type: Grant
    Filed: January 5, 2001
    Date of Patent: September 17, 2002
    Assignee: Carl-Zeïss-Stiftung
    Inventor: Winfried Kaiser
  • Publication number: 20020126380
    Abstract: An optical arrangement is disclosed wherein an entering beam is converted into an exiting beam having a total cross section of light which is linearly polarized essentially in the radial direction by rotation. For this purpose, rasters of half-wave plates (41, 42, 4i), a combination of birefringent quarter-wave plate 420 and a circular plate 430 is suggested in combination with a conical polarizer 21′. This arrangement is preferably utilized in the illumination portion of a microlithographic projection exposure system. It is important that the arrangement be mounted behind all asymmetric or polarizing component elements 103a.
    Type: Application
    Filed: May 9, 2002
    Publication date: September 12, 2002
    Applicant: Carl-Zeiss-Stiftung
    Inventor: Karl-Heinz Schuster
  • Patent number: 6449581
    Abstract: The invention is directed to a coordinate measuring apparatus having drives (14, 23) for moving the components (2, 7) of the apparatus. The drives are displaced in accordance with sets of desired drive values (Li, Fdes) which are sequentially pregiven at a fixed clock frequency. The operation of the control can be integrated into a control computer unit (3, 4, 5) by making available a control computer unit (3, 4, 5) having an operating system without real-time performance in which the desired drive values (Li, Fdes) are correspondingly computed as well as by providing a subassembly (1) wherein the desired drive values (Li, Fdes) can be stored and driven to at subsequent clock pulses in advance in response to a command of the control computer unit (3, 4, 5).
    Type: Grant
    Filed: January 12, 2000
    Date of Patent: September 10, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Otto Ruck
  • Patent number: 6445515
    Abstract: An optical element housing or mounting connector (4), in particular for lens elements (13) in lens systems (12) for semi-conductor-lithography projection printing machines, is provided with electro-permanent magnets (1), the electro-permanent magnets being magnetized by the magnetic field of a coil (5) connected to an activating device (8) in such a way that the housings or mountings (4) are connected to one another by magnetic forces.
    Type: Grant
    Filed: April 19, 2001
    Date of Patent: September 3, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Thomas Moennig
  • Patent number: 6445442
    Abstract: An illuminating device of a projection-microlithographic device includes a light source, an objective, and a device which produces a particular image field configuration. The device has fields which, in the direction of scanning movement, are separated at least in parts by a free zone, and are located in a peripheral region of the circular image field of a downstream projection objective in a manner at least approximating rotation symmetry. The integral of the quantity of light passing through the fields in the scanning direction are constant over the entire extent of the image field configuration in the direction at right angles to the scanning direction. Such an image field configuration replaces a conventional rectangular scanner slot formation whose width in the scanning direction corresponds to the forementioned integral of the image field configuration. The design of the image field configuration permits an approximately rotationally symmetric illumination of the projection objective.
    Type: Grant
    Filed: August 20, 2001
    Date of Patent: September 3, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Rudolf Von Bünau, Jörg Schultz, Johannes Wangler
  • Patent number: 6445516
    Abstract: In the case of a lens system, in particular a projection lens system in semiconductor lithography, with a plurality of optical elements, such as lenses, which are mounted in mounts, the mounts being connected to one another, if appropriate by means of adjusting rings, at least one inner mount of an optical element which is intended for removal and/or later fitting is connected to an outer mount by means of a three-point mounting.
    Type: Grant
    Filed: June 5, 2001
    Date of Patent: September 3, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventor: Karlfrid Osterried
  • Patent number: 6445510
    Abstract: An optical imaging device, in particular a lens system, has a system diaphragm (1). An aperture of the system diaphragm (1) is adjustable in its opening diameter (D). The axial position of the aperture of the system diaphragm (1) with respect to the optical axis (4) of the system diaphragm (1) is fixed in dependence on the opening diameter (D) of the system diaphragm (1).
    Type: Grant
    Filed: October 4, 2000
    Date of Patent: September 3, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Karlheinz Schuster, Thomas Bischoff, Bernhard Gellrich, Michael Muehlbeyer, Guenter Maul
  • Patent number: 6438857
    Abstract: In a coordinate measurement device with a base frame, a measurement table supported at the latter for holding an object to be measured, a sensing device for sensing the surface of this object, and with a positioning device for moving the sensing device in three spatial axes over the measurement table, which positioning device is mounted at the base frame and carries the sensing device, the positioning device has a first slide which is guided at the base frame in a first direction and which is movable on one side of the measurement table toward and away from the latter and on which a second slide is movable in a second direction vertical to the first direction, this second slide being provided at its end area remote of the measurement table (considered in its movement direction) with a supporting portion which projects lateral to the measurement table and at which there is arranged a stirrup arm which projects over the measurement table in a direction vertical to a principal work plane of the measurement table
    Type: Grant
    Filed: December 1, 2000
    Date of Patent: August 27, 2002
    Assignee: Carl-Zeiss Stiftung
    Inventors: Klaus Jacobs, Volker Piwek, Joerg Walther
  • Patent number: 6441975
    Abstract: A device for the low-deformation support of an optical element (2), in particular of an end plate of a lens in a projection printing system for semiconductor elements, is provided with a mount (1), the optical element (2) being connected to the mount (1) at least partly via a bonding layer which is located between the adjacent circumferential walls (4, 5) of mount (1) and optical element (2). The mount (1) is provided with at least three bearing feet (3) which are distributed over the circumference and on which the optical element (2) rests. The bonding layer is located in an annular gap (6) between the adjacent circumferential walls (4, 5) of mount (1) and optical element (2) over at least one section thereof.
    Type: Grant
    Filed: November 27, 2000
    Date of Patent: August 27, 2002
    Assignee: Carl-Zeiss-Stiftung
    Inventors: Michael Ebert, Franz Sorg, Michael Trunz, Frank Marianek, Karlfried Osterried, Markus Kasparek