Patents Assigned to Catalysts & Chemicals Industries Co., Ltd.
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Publication number: 20050037201Abstract: Inorganic compound particles constituted of a shell, a porous matter or a cavity enclosed therein, and the porous matter or the cavity being kept unchanged in a subsequently formed transparent coating film.Type: ApplicationFiled: July 26, 2004Publication date: February 17, 2005Applicant: Catalysts & Chemicals Industries Co., Ltd.Inventors: Toshiharu Hirai, Hiroyasu Nishida, Michio Komatsu
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Patent number: 6849112Abstract: Amorphous inorganic particles as a dental material includes silica and inorganic oxide(s) other than silica and has high x-ray impermeability. The inorganic particles as a dental material includes silica with the content in the range from 70 to 98 weight % and oxide(s) of one or more elements selected from the group of Zr, Ti, La, Ba, Sr, Hf, Y, Zn, AL, and B, wherein 5 to 70 weight % of the silica is originated from an acidic silicic acid solution and 30 to 95 weight % of the silica is originated from a sol of silica. The inorganic particles as a dental material have an average particle diameter in the range from 1 to 10 ?m, specific surface area in the range from 50 to 350 m2/g, pore volume in the range from 0.05 to 0.5 ml/g, amorphous crystallinity as observed by x-ray diffraction, and the refractive index in the range from 1.47 to 1.60.Type: GrantFiled: November 12, 2002Date of Patent: February 1, 2005Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Hiroyasu Nishida, Noboru Senju, Michio Komatsu
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Patent number: 6849797Abstract: A photovoltaic cell includes a first substrate having on its surface a first electrode layer having on its surface a semiconductor film on which a photosensitizer is adsorbed, and a second substrate having on its surface a second electrode layer. The first and second substrates are arranged so that the first electrode layer overlaid with the semiconductor film and the second electrode layer are opposite each other with an electrolyte disposed therebetween. Spacer particles are interposed between the semiconductor film and the second electrode layer, and at least one of the electrode-layer-having substrates is transparent. A coating liquid for forming the semiconductor film includes both a component for forming the semiconductor film as well as the spacer particles, dispersed in a dispersion medium.Type: GrantFiled: April 24, 2003Date of Patent: February 1, 2005Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Tsuguo Koyanagi, Michio Komatsu
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Patent number: 6827639Abstract: In polishing particles each having a core-shell structure, a polishing rate can be controlled by adjusting a thickness and/or density of a shell portion. The polishing particles have the core-shell structure with an average diameter in the range from 5 to 300 nm, and the shell portion of the polishing particles includes silica with a thickness in the range from 1 to 50 nm. A density of the shell portion is in the from 1.6 to 2.2 g/cc, while the Na content of the shell portion is less than 10 ppm.Type: GrantFiled: March 24, 2003Date of Patent: December 7, 2004Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Hiroyasu Nishida, Yoshinori Wakamiya, Michio Komatsu
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Patent number: 6825259Abstract: The resin-coated scale-like inorganic particles have soft feel, adhesivity to human skin and effective in suppressing excessive luster. The scale-like inorganic particles are those with the surface coated with resin, and are characterized in that the 100% modulus of the resin in the tensile test is in a rage from 50 to 3000 N/cm2. The resin is preferably one or more selected from the group consisting of polyurethane, a styrene-butadiene copolymer, an acrylonitrile-butadiene copolymer, a silicone-based elastomer, and a polyolefin-based elastomer. The resin-coated scale-like inorganic particles are blended in the cosmetics according to the present invention.Type: GrantFiled: February 21, 2002Date of Patent: November 30, 2004Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Takumi Miyazaki, Hirokazu Tanaka
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Transparent film-coated substrate, coating liquid for transparent film formation, and display device
Patent number: 6777069Abstract: The transparent film-coated substrate includes a substrate and a transparent coating film formed on the surface of the substrate, the transparent coating film comprising (i) a matrix containing a silicone having a fluorine-substituted alkyl group, and (ii) inorganic compound particles comprising a shell, and a porous matter or a cavity enclosed therein, wherein the porous matter or the cavity remains unchanged in the formed transparent coating film.Type: GrantFiled: November 8, 2002Date of Patent: August 17, 2004Assignees: Kabushiki Kaisha Toshiba, Asahi Glass Co., Ltd., Catalysts & Chemicals Industries Co., Ltd.Inventors: Takeo Ito, Hidemi Matsuda, Yoshimi Otani, Kazuhiko Yui, Toshiharu Hirai, Hiroyasu Nishida, Michio Komatsu -
Patent number: 6740702Abstract: The invention provides a recording sheet having an ink-receiving layer, which comprises a substrate sheet and an ink-receiving layer formed thereon, said ink-receiving layer comprising oxide particles, wherein the ink-receiving layer has pores having a diameter in the range of 3.4 to 2,000 nm, the pore volume of pores having a diameter of 3.4 to 30 nm is in the range of 0.2 to 1.8 ml/g, and the pore volume of pores having a diameter of 30 to 2,000 nm is in the range of 0.1 to 1.5 ml/g. It is preferable that the oxide particles have an average particle diameter of 2 to 1,000 nm and are a mixture of hydrophobic oxide particles and hydrophilic oxide particles. This recording sheet shows sufficient strength, has excellent printability such that images of uniform density and high sharpness can be printed thereon without bleeding, and is excellent in water resistance, weathering resistance and fading resistance.Type: GrantFiled: June 17, 2002Date of Patent: May 25, 2004Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Hiroyasu Nishida, Mitsuru Nakai, Michio Komatsu
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Patent number: 6716773Abstract: A process for producing semiconductor substrates with a coating film having excellent chemical resistance with high yield and excellent production reliability without any development of cracks and any generation or collection of foreign matter resulting from a projected portion of the coating film, which includes the steps of: (a) forming a coating film by coating an insulating film-forming coating liquid on a substrate mounted on a rotating disc of a spin coater according to a spin coating method; and (b) removing the projected portion of the coating film formed at a periphery of the substrate by ejecting a solvent through a nozzle moving from any point on a line drawn between the periphery edge and a center of the substrate toward the periphery edge while rotating the substrate.Type: GrantFiled: September 19, 2002Date of Patent: April 6, 2004Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Miki Egami, Ryo Muraguchi
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Publication number: 20040038047Abstract: A coating liquid for forming a silica-containing film with a low-dielectric constant which enables formation of low-density film having a dielectric constant as low as 3 or less and having excellent resistance to oxygen plasma and process adaptation but also in the adhesion to a substrate and film strength. A substrate coated with the silica-containing film having the above characteristics, obtained by the use of the above coating liquid.Type: ApplicationFiled: August 26, 2003Publication date: February 26, 2004Applicant: Catalysts & Chemicals Industries Co., LtdInventors: Akira Nakashima, Michio Komatsu
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Publication number: 20040016914Abstract: Disclosed is a coating liquid for forming a transparent conductive film, comprising conductive fine particles having an average particle diameter of 1 to 200 nm, silica particles having an average particle diameter of 4 to 200 nm and a polar solvent. The silica particles are in the form of chain silica particles having 2 to 10 silica particles on an average being connected. The content of an alkali in the silica particles is not more than 1000 ppm in terms of an alkali metal M.Type: ApplicationFiled: July 17, 2003Publication date: January 29, 2004Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.Inventors: Masayuki Matsuda, Mitsuaki Kumazawa, Yoichi Ishihara, Toshiharu Hirai, Michio Komatsu
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Patent number: 6680040Abstract: The porous composite oxide particle is coated with a porous silica-based inorganic oxide layer, and also a substrate has a coating film with the fine particles thereon, which has a low refractive index and excellent in adhesion with a resin or the like, strength, the ability to reduce reflection and the like. The fine particles include porous composite oxide with silica and an inorganic oxide other than silica, wherein the fine particles are coated with a porous silica-based inorganic oxide layer having a thickness from 0.5 to 20 nm. The fine particles include preferably an organic group directly bonded to silicon, and SR/ST, the ratio of the molar amount of silicon having the organic group directly bonded thereto (SR) vs the molar amount of the total silicon (ST), is preferably in the range from 0.001 to 0.9.Type: GrantFiled: June 21, 2001Date of Patent: January 20, 2004Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Hiroyasu Nishida, Mitsuru Nakai, Michio Komatsu, Hiroo Yoshitome
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Patent number: 6669748Abstract: The present invention provides a dispersion liquid of silica particles for polishing with a low content of Na ions and also with a content of ions other than Na ions in a prespecified range. This dispersion liquid is a dispersion liquid of silica particles in which the silica particles having the average particle diameter in the range from 5 to 300 nm is dispersed, and a content of Na ions in the silica particle is less than 100 ppm, while a contents of ions other than Na ions is in the range from 300 ppm to 2 weight %.Type: GrantFiled: September 26, 2002Date of Patent: December 30, 2003Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Hiroyasu Nishida, Yoshinori Wakamiya, Manabu Watanabe, Michio Komatsu
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Patent number: 6652612Abstract: Silica particles for polishing have a three-dimensional polycondensation structure with an average particle diameter in a range from 5 to 300 nm. The silica particles have residual alkoxy groups therein and a carbon content in a range from 0.5 to 5 weight % retained in the residual alkoxy groups.Type: GrantFiled: November 12, 2002Date of Patent: November 25, 2003Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Kazuhiro Nakayama, Akira Nakashima, Michio Komatsu
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Publication number: 20030201010Abstract: A photovoltaic cell includes a first substrate having on its surface a first electrode layer having on its surface a semiconductor film on which a photosensitizer is adsorbed, and a second substrate having on its surface a second electrode layer. The first and second substrates are arranged so that the first electrode layer overlaid with the semiconductor film and the second electrode layer are opposite each other with an electrolyte disposed therebetween. Spacer particles are interposed between the semiconductor film and the second electrode layer, and at least one of the electrode-layer-having substrates is transparent. A coating liquid for forming the semiconductor film includes both a component for forming the semiconductor film as well as the spacer particles, dispersed in a dispersion medium.Type: ApplicationFiled: April 24, 2003Publication date: October 30, 2003Applicant: Catalysts & Chemicals Industries Co., Ltd.Inventors: Tsuguo Koyanagi, Michio Komatsu
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Patent number: 6639015Abstract: A coating liquid for forming a silica-containing film with a low-dielectric constant, which enables the formation of a low-density film having a dielectric constant as low as 3 or less and having excellent resistance to oxygen plasma and process adaptation but also in the adhesion to a substrate and film strength, is provided. The coating liquid for forming a silica-containing film with a low-dielectric constant comprises a polymer composition mainly constituted by (i) a polysiloxane and (ii) a readily decomposable resin, said polysiloxane being a reaction product between fine particles of silica and a hydrolyzate of at least one alkoxysilane represented by the following formula (I): XnSi(OR)4−n (I), wherein X represents a hydrogen atom, a fluorine atom, an unfluorinated or fluorinated alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; R represents a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group or a vinyl group; and n is an integer of 0 to 3.Type: GrantFiled: April 28, 2000Date of Patent: October 28, 2003Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Akira Nakashima, Michio Komatsu
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Publication number: 20030196692Abstract: Disclosed is a photovoltaic cell comprising a substrate having an electrode layer (1) on the surface and having a porous metal oxide semiconductor film (2) which is formed on the electrode layer (1) and on which a photosensitizer is adsorbed, a substrate having an electrode layer (3) on the surface, both of said substrates being arranged in such a manner that the electrode layer (1) and the electrode layer (3) face each other, and an electrolyte layer provided between the semiconductor film (2) and the electrode layer (3), wherein the semiconductor film (2) contains an inhibitor of back current, and at least one pair of substrate and electrode layer thereon have transparency. The photovoltaic cell is capable of inhibiting back current and decomposition of a spectrosensitizing dye caused by the ultraviolet rays, has high photoelectric conversion efficiency and is capable of generating high electromotive force.Type: ApplicationFiled: April 17, 2003Publication date: October 23, 2003Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.Inventors: Tsuguo Koyanagi, Michael Graetzel
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Publication number: 20030186634Abstract: In the polishing particles each having a core-shell structure, the polishing rate can be controlled by adjusting the thickness and/or density of the shell portion. The polishing particles having the core-shell structure with the average diameter (D) in the range from 5 to 300 nm, and the shell portion of the polishing particles comprises silica with the thickness (ST) in the range from 1 to 50 nm, and the density of the shell portion is in the range from 1.6 to 2.2 g/cc, while the Na content of the shell portion is less than 10 ppm.Type: ApplicationFiled: March 24, 2003Publication date: October 2, 2003Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.Inventors: Hiroyasu Nishida, Yoshinori Wakamiya, Michio Komatsu
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Publication number: 20030171475Abstract: The resin-coated scale-like inorganic particles have soft feel, adhesivity to human skin and effective in suppressing excessive luster. The scale-like inorganic particles are those with the surface coated with resin, and are characterized in that the 100% modulus of the resin in the tensile test is in a rage from 50 to 3000 N/cm2. The resin is preferably one or more selected from the group consisting of polyurethane, a styrene-butadiene copolymer, an acrylonitrile-butadiene copolymer, a silicone-based elastomer, and a polyolefin-based elastomer. The resin-coated scale-like inorganic particles are blended in the cosmetics according to the present invention.Type: ApplicationFiled: February 21, 2002Publication date: September 11, 2003Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.Inventors: Takumi Miyazaki, Hirokazu Tanaka
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Publication number: 20030150485Abstract: The first photoelectric cell of the present invention comprises: an insulating base having on its surface an electrode layer (1), the electrode layer (1) having on its surface a metal oxide semiconductor film (2) on which a photosensitizer is adsorbed; an insulating base having on its surface an electrode layer (3), the electrode layer (1) and the electrode layer (3) arranged opposite to each other; and an electrolyte sealed between the metal oxide semiconductor film (2) and the electrode layer (3), wherein at least one of the electrode-having insulating bases is transparent; and the metal oxide semiconductor film (2) comprises anatase titanium oxide particles. This first photoelectric cell includes a semiconductor film comprising anatase titanium oxide particles, having a high proportion of photosensitizer adsorbed, so that the electron mobility in the semiconductor film is high to thereby realize excellent photoelectric transfer efficiency.Type: ApplicationFiled: February 6, 2003Publication date: August 14, 2003Applicant: Catalysts & Chemicals Industries Co., LTD.Inventors: Tsuguo Koyanagi, Michio Komatsu, Hirokazu Tanaka, Katsuhiro Shirono
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Patent number: 6599846Abstract: The present invention provides a method for forming a silica-containing film with a low-dielectric constant of 3 or less on a semiconductor substrate steadily, which comprises steps of (a) applying a coating liquid for forming the silica-containing film with the low-dielectric constant onto the semiconductor substrate, (b) heating the thus coated film at 50 to 350° C., and then (c) curing the thus treated film at 350 to 450° C. in an inert-gas atmosphere containing 500 to 15,000 ppm by volume of oxygen, and also provides a semiconductor substrate having a silica-containing film formed by the above method. The above step (b) for the thermal treatment is preferably conducted at 150 to 350° C. for 1 to 3 minutes in an air atmosphere. Also, the above curing step (c) is preferably conducted by placing the semiconductor substrate on a hot plate kept at 350 to 450° C.Type: GrantFiled: August 28, 2001Date of Patent: July 29, 2003Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Michio Komatsu, Akira Nakashima, Miki Egami, Ryo Muraguchi