Abstract: An apparatus for thin film deposition on fixed objects can be carried out using a portable vacuum deposition plant having a forechamber surrounding the deposition chamber and in which a process gas chamber slightly higher than that of the deposition chamber is maintained. The forechamber and the deposition chamber can be separately evacuated and vacuum seals can be provided between the chambers and the substrate. The source of the coating material may include a sputtering magnetron and a grid can be provided between the magnetron and the substrate.
Abstract: A plastic wrapping film is provided with one or more aluminum layers by vapor deposition and the or each layer is only partially oxidized in an oxidizing plasma so that the resulting barrier layer is distinguishable by slight reduction in transparency but excellent prevention of penetration by moisture and oxygen.
Type:
Grant
Filed:
September 22, 1997
Date of Patent:
May 4, 1999
Assignee:
CE.TE.V. Centro Technologie Del Vuoto
Inventors:
Carlo Misiano, Enrico Simonetti, Francesco Staffeti
Abstract: A plastic wrapping film is provided with one or more aluminum layers by vapor deposition and the or each layer is only partially oxidized in an oxidizing plasma so that the resulting barrier layer is distinguishable by slight reduction in transparency but excellent prevention of penetration by moisture and oxygen.
Type:
Grant
Filed:
April 30, 1996
Date of Patent:
January 6, 1998
Assignee:
CE.TE.V. Centro Technologie del Vuoto
Inventors:
Carlo Misiano, Enrico Simonetti, Francesco Staffeti
Abstract: Thin film deposition apparatus, utilizing PECVD, sputtering technologies, etc., essentially constituted by a chamber equipped with one or more electrodes and respective counter-electrodes, screens, gas supply lines, and one or more magnetron sputtering cathode. The chamber is provided with a rotating device loading substrates able to rotate through 180 degrees objects to treat. The chamber can have polygonal geometry, provided to consent installation of one or more kinds of sources. The invention consents, in a single vacuum cycle the deposition of hardening and anti-reflecting layers on plastic material and it does not need frequent recharges.
Type:
Grant
Filed:
April 4, 1994
Date of Patent:
November 14, 1995
Assignee:
CE.TE.V Centro Technologie Del Vuoto
Inventors:
Carlo Misiano, Enrico Simonetti, Giovanni Taglioni
Abstract: Apparatus and method for coating a plastic web with dielectric coatings formed in-situ by the reaction of a reactive gas with deposited metal as the web passes over lower and upper arrays of rollers in a vacuum chamber. The lower rollers are in a lower-pressure zone at which metal is deposited onto the web by vaporization, and the upper rollers are in a higher-pressure zone where the reactive gas reacts with the deposited metal. The reactive gas can be excited by a magnetron. The rollers of one array can be lower than other rollers thereof and be larger than rollers of the other array such that curvature of the web as it passes around the larger rollers is minimized.