Abstract: An image recording apparatus has low intensity ink ejection parts for ejecting low intensity ink, and a high intensity ink ejection part for ejecting high intensity ink. With respect to a direction orthogonal to a moving direction of printing paper, a pitch of outlets in the high intensity ink ejection part is larger than that in the low intensity ink ejection part. Thus, manufacturing cost of the apparatus is reduced. With respect to each gray level in a middle grayscale range, if a tint image is recorded with the high intensity ink, a spatial frequency of this tint image is lower than that of a tint image recorded with the low intensity ink. By the above image recording control, even if the high intensity ink ejection part includes an abnormal outlet where a flight direction of droplet is abnormal, streak unevenness in a color halftone image can be suppressed.

Abstract: An image recording apparatus includes a head for ejecting ink, a moving mechanism for moving a recording medium, and a control part for controlling these constituent elements. The control part includes an information storage part, a conversion part, and a correction part. The conversion part converts input image data into converted image data which is suitable for image recording. The information storage part stores an LUT indicating a relation between the input image data and the converted image data for each head and each type of recording medium. The correction part updates the LUT on a representative recording medium on the basis of correction amounts determined in accordance with reference images which are recorded onto the representative recording medium and further updates the LUT on another type of recording medium. By virtue of providing this correction part, it is possible to simplify a correcting operation of recording densities.

Abstract: An image processing apparatus displays an object adopted and an object not adopted by an adoption/non-adoption process in a distinguishable manner. A user designates an object whose adoption/non-adoption result is desired to be reversed among the objects displayed by the image processing apparatus. The image processing apparatus changes an allowable range stored in a storage part so that the adoption/non-adoption result of the designated object is reversed. That is, the user views the adoption/non-adoption result of the objects to change the allowable range of a parameter so that the adoption/non-adoption result becomes proper. This makes the allowable range of the parameter for use in the adoption/non-adoption process proper with ease.

Abstract: By a first transport robot, n substrates are unloaded from a first retaining portion, then simultaneously transported, and respectively loaded into n substrate holders consecutively arranged from one side defined with respect to an arrangement direction. Thereafter, a rotation mechanism rotates n+m substrate holders so as to perform a substrate inverting operation and so as to arrange the n+m substrate holders along the arrangement direction in an arrangement sequence reverse to a pre-rotation arrangement sequence. Thereafter, the n substrates loaded into the n substrate holders are unloaded in a group of m in a sequence from the one side, and loaded into a second retaining unit by a second transport robot. After the substrate inverting operation, n substrates are unloaded from the first retaining unit, and loaded again into n substrate holders consecutively arranged from the one side by the first transport robot.

Abstract: A substrate treatment apparatus includes: substrate holding unit which horizontally holds a substrate; a rotating unit which rotates the substrate held by the substrate holding unit about a vertical axis; and a first nozzle having a first opposing face to be opposed to a region of a lower surface of the substrate inward of a peripheral portion of the substrate in spaced relation to the lower surface of the substrate during rotation of the substrate by the rotating unit and a treatment liquid spout provided in the first opposing face for filling a space defined between the lower surface of the substrate and the first opposing face with a treatment liquid spouted from the treatment liquid spout to keep the space in a liquid filled state.

Abstract: Preparation process of electrode for battery, comprising first application step for forming first linear part by relatively moving first nozzle which discharges first active material linearly with respect to current collector to form a plural of first linear parts on current collector, first drying step for drying first linear parts, second application step for forming second linear part between first linear parts by relatively moving second nozzle which discharges second active material with respect to current collector, and second drying step for drying first linear part and second linear part, wherein height H1 of first linear part and height H2 of second linear part satisfies the relational inequality (1): H1<H2. The active material layer has high aspect ratio, and gives lithium ion secondary battery excellent in high charge-discharge performance.

Abstract: In an inkjet printer, a pattern for density correction that indicates a constant density image is printed on printing paper with a head having a plurality of outlet rows, and pattern image data that indicates the pattern is acquired. A target outlet that ejects ink toward a linear region having a missing part in the pattern is detected, and a reference outlet that is included in the same outlet row as the target outlet and located close to the target outlet is specified. A density correction value of the target outlet among density correction values that are acquired based on a density profile of the pattern is replaced with a representative value of a density correction value of the reference outlet. Through this, even if an ink ejection failure occurs in any of the outlets, appropriate density correction values can be obtained for a plurality of outlets.

Abstract: The inventive substrate treatment method includes: an organic solvent supplying step of supplying an organic solvent having a smaller surface tension than a rinse liquid to the upper surface of a substrate so that rinse liquid adhering to the upper surface of the substrate is replaced with the organic solvent; a higher temperature maintaining step of maintaining the upper surface of the substrate at a predetermined temperature higher than the boiling point of the organic solvent to thereby form a gas film of the organic solvent on the entire upper surface of the substrate including the gap of the minute pattern and to form a liquid film of the organic solvent on the gas film, the higher temperature maintaining step being performed after the organic solvent supplying step is started; and an organic solvent removing step of removing the organic solvent liquid film from the upper surface of the substrate.

Abstract: An image inspection apparatus includes a pre-printed element reduction section that reduces influence of a pre-printed element on inspection and generates an inspection object image, and a comparative inspection section that compares the inspection object image with the additionally-recorded data, to inspect a performance level of a result of overprinting. Captured image data of the pre-printed paper image and the overprinted image is given to the pre-printed element reduction section. By using the captured image data of the pre-printed paper image, the pre-printed element reduction section reduces the pre-printed element included in the captured image data of the overprinted image and newly prepares the inspection object image.

Abstract: A head includes first and second outlet rows, and records uniform images in check regions. In each uniform image, a combination of a first dot row formed with the first outlet row and a second dot row formed with the second outlet row while being spaced apart from the first dot row in a movement direction is repeatedly arranged with a repeat pitch in its direction. When recording the uniform image in each check region, a distance obtained by changing a reference distance, which is half the repeat pitch, by a set shift amount is assigned as a distance between each first dot row and each second dot row, the set shift amount being progressively changed for the check regions. A maximum density check region is specified, and ejection timing of the second outlet row is corrected based on the set shift amount corresponding to the maximum density check region.

Abstract: A substrate treating apparatus for drying substrates with a solvent vapor after treating the substrates with a treating liquid.

Abstract: A rinsing liquid (DIW) is discharged from a rinsing liquid discharge port formed in a blocking member to perform rinsing processing to a substrate surface while a nitrogen gas is supplied into a clearance space, and a liquid mixture (IPA+DIW) is discharged from a liquid mixture discharge port formed in the blocking member to replace the rinsing liquid adhering to the substrate surface with the liquid mixture while the nitrogen gas is supplied into the clearance space. Thus, an increase of the dissolved oxygen concentration of the liquid mixture can be suppressed upon replacing the rinsing liquid adhering to the substrate surface with the liquid mixture, which makes it possible to securely prevent from forming an oxide film or generating watermarks on the substrate surface.

Abstract: A working unit control device includes: a recognizing unit that recognizes the three-dimensional position and the three-dimensional posture of a first target; a setting unit that sets an access start location and an access route based on the three-dimensional position and the three-dimensional posture of the first target thereby recognized, the access start location indicating the three-dimensional position and the three-dimensional posture of a second target in which the second target starts to access, the access route indicating a route of movement of the second target; and a controller that controls the working unit to fit the second target to the first target. This allows control of the working unit while contact between the targets to be fitted to each other is prevented in the middle of the route of movement.

Abstract: A substrate treatment method includes a rinsing step of supplying a rinse liquid to a front surface of a substrate while rotating the substrate at a first rotation speed, a liquid mixture film forming step of forming a liquid film of a liquid mixture of water and an organic solvent having a smaller surface tension than the water on the front surface after the rinsing step by supplying the water and the organic solvent to the front surface while reducing the rotation speed of the substrate from the first rotation speed to a second rotation speed lower than the first rotation speed, and an organic solvent replacing step of replacing the liquid mixture supplied to the front surface with the organic solvent after the liquid mixture film forming step by supplying the organic solvent to the front surface.

Abstract: For the transport of a substrate from a cassette to a back surface cleaning processing unit in a cleaning processing block, a transfer robot rotates the substrate through 90 degrees from a horizontal attitude in which the front surface of the substrate is positioned to face upward into a standing attitude while transporting the substrate out of a cassette to a substrate passing part, and passes the substrate in the standing attitude to the substrate passing part. The substrate passing part holds the substrate in the standing attitude. A main transport robot receives the substrate held in the standing attitude. The main transport robot rotates the substrate through 90 degrees from the standing attitude into a horizontal attitude in which the back surface of the substrate is positioned to face upward while transporting the substrate from the substrate passing part to the back surface cleaning processing unit.

Abstract: The inventive substrate treatment apparatus includes a spin chuck which horizontally holds and rotates a wafer; a heater which is disposed in opposed relation to a lower surface of the wafer held by the spin chuck and heats the wafer from a lower side; a phosphoric acid nozzle which spouts a phosphoric acid aqueous solution to a front surface (upper surface) of the wafer held by the spin chuck; and a suspension liquid nozzle which spouts a silicon suspension liquid to the front surface of the wafer held by the spin chuck. The wafer is maintained at a higher temperature on the order of 300° C. and, in this state, a liquid mixture of the phosphoric acid aqueous solution and the silicon suspension liquid is supplied to the front surface of the wafer.

Abstract: Flash lamps connected to short-pulse circuits and flash lamps connected to long-pulse circuits are alternately arranged in a line. The duration of light emission from the flash lamps connected to the long-pulse circuits is longer than the duration of light emission from the flash lamps connected to the short-pulse circuits. A superimposing of a flash of light with a high peak intensity from the flash lamps that emit light for a short time and a flash of light with a gentle peak from the flash lamps that emit light for a long time can increase the temperature of even a deep portion of a substrate to an activation temperature or more without heating a shallow portion near the substrate surface more than necessary. This achieves the activation of deep junctions without causing substrate warpage or cracking.

Abstract: A nested relationship acquisition part (21) of a page data generation part (2) acquires a nested relationship among a plurality of page components within page data (32) that uses the page components having the nested relationship. A modified page data generation part (22) generates hierarchical structure display information (331) on the basis of the nested relationship and adds the hierarchical structure display information (331) to the page data (32) so as to easily generate modified page data file (33) that enables the nested relationship among the page components to be displayed as a hierarchical structure. An operator can easily notice a problem with the page data (32) through the displayed hierarchical structure in a short time.

Abstract: Page-group data indicating many pages is analyzed to acquire the degree of reuse of page components as an analysis result. A set of page data pieces in the page-group data is acquired as a data block, the number of the pieces corresponding to a unit page number that is the number of pages to be processed collectively as a single task when a conversion processor in a system actually converts the page-group data into drawing data. A predetermined conversion processor converts the data block into drawing data to acquire a conversion processing time. A predicted value of a conversion processing time required for the conversion processor in the system to actually convert the page-group data is accurately obtained using the conversion processing time of the data block. An operator is notified of the analysis result and the predicted value and can easily ascertain the appropriateness of the page-group data.

Abstract: A substrate treatment method is provided, which includes: a liquid film forming step of forming a liquid film of a treatment liquid on a front surface of a substrate; a hydrophobization liquid supplying step of supplying a hydrophobization liquid to a center portion of the front surface of the substrate for hydrophobizing the front surface of the substrate, while rotating the substrate; an inactivation suppressing step of suppressing inactivation of the supplied hydrophobization liquid on a peripheral edge portion of the front surface of the substrate simultaneously with the hydrophobization liquid supplying step; and a drying step of drying the substrate to which the hydrophobization liquid has been supplied.