Patents Assigned to Ebara Research Co., Ltd.
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Patent number: 7029518Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.Type: GrantFiled: March 15, 2005Date of Patent: April 18, 2006Assignee: Ebara Research Co., Ltd.Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
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Publication number: 20050178267Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing means and adsorption and/or absorption means so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.Type: ApplicationFiled: March 15, 2005Publication date: August 18, 2005Applicant: Ebara Research Co., Ltd.Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
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Patent number: 6911064Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as an in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.Type: GrantFiled: December 29, 2003Date of Patent: June 28, 2005Assignee: Ebara Research Co., Ltd.Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
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Publication number: 20040149128Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing means and adsorption and/or absorption means so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.Type: ApplicationFiled: December 29, 2003Publication date: August 5, 2004Applicant: EBARA RESEARCH CO., LTD.Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
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Patent number: 6733570Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.Type: GrantFiled: June 2, 1995Date of Patent: May 11, 2004Assignee: Ebara Research Co., Ltd.Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
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Patent number: 6340381Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.Type: GrantFiled: July 20, 2000Date of Patent: January 22, 2002Assignee: Ebara Research Co., Ltd.Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
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Patent number: 6099731Abstract: A process for treating a water containing chlorinated organic compounds, wherein a microorganism is introduced from a degradation tank to a separation tank and an energy source is supplied to the microorganism separated in the separation tank. A water-treatment apparatus having a structure capable of continuously introducing water to be treated through a degradation tank, a separation tank and a reactivation tank. A loss of the energy source such as methane or propane discharged from the separation tank can be reduced. A water-treatment apparatus having a degradation tank and a separation tank, wherein a microorganism can be cultivated in the separation tank. The reactivation tank can be omitted, whereby the entire size of the apparatus can be reduced.Type: GrantFiled: September 11, 1998Date of Patent: August 8, 2000Assignees: Ebara Research Co., Ltd., Japan as represented by Director General of Agency of National Institute for Environmental StudiesInventors: Hiroo Uchiyama, Osami Yagi, Masayoshi Kitagawa, Tatsuo Shimomura, Takeshi Hasegawa
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Patent number: 6062819Abstract: An impeller in a turbomachinery has blades designed such that reduced static pressure difference .DELTA.Cp between the hub and the shroud on the suction surface of the blade shows a remarkably decreasing tendency near the impeller exit as it approaches the impeller exit between the impeller inlet and the impeller exit.Type: GrantFiled: October 23, 1997Date of Patent: May 16, 2000Assignees: Ebara Corporation, Ebara Research Co., Ltd., University College LondonInventors: Mehrdad Zangeneh, Hideomi Harada, Akira Goto
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Patent number: 5922105Abstract: A method and apparatus for preventing contamination of a substrate or a substrate surface, and particularly relates to prevention of contamination of raw materials, semi-finished products, base materials of products and substrate surface in a high-tech industry such as in the production of semiconductors and liquid crystals. A gas coming into contact with a base material or substrate is purified by dust removing apparatus and adsorption and/or absorption apparatus so that the concentration of fine particles in the gas is below class 1,000 and a non-methane hydrocarbon concentration is below 0.2 ppm. Thereafter, the base material or the substrate surface is exposed to this gas.Type: GrantFiled: March 19, 1998Date of Patent: July 13, 1999Assignee: Ebara Research Co., Ltd.Inventors: Toshiaki Fujii, Tsukuru Suzuki, Hidetomo Suzuki, Kazuhiko Sakamoto
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Patent number: 5723029Abstract: A photo-electric chemical apparatus comprising an electrolyte, a first electrode having an n-type semiconductor member disposed to be in touch with the electrolyte and a second electrode having a carbon cluster member disposed to be in touch with the electrolyte. The first and second electrodes are short-circuited and irradiated with a light beam to thereby generate oxygen and hydrogen. The first electrode is a laminated member consisting of a light transmitting glass, a transparent conducting layer and an n-type semiconductor layer. The second electrode is a laminated member consisting of a light transmitting glass, a transparent conducting layer and a carbon cluster thin film.Type: GrantFiled: March 28, 1997Date of Patent: March 3, 1998Assignee: Ebara Research Co., Ltd.Inventor: Masashi Shimoyama
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Patent number: 5685696Abstract: An impeller in a turbomachine has blades designed such that a reduced static pressure difference .DELTA.Cp between a hub and a shroud on a suction surface of a blade has a tendency to remarkably decrease in the vicinity of an impeller exit as it approaches the impeller exit from an inlet.Type: GrantFiled: February 1, 1995Date of Patent: November 11, 1997Assignees: Ebara Corporation, Ebara Research Co., Ltd., University College LondonInventors: Mehrdad Zangeneh, Hideomi Harada, Akira Goto
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Patent number: 5614663Abstract: The improved cantilever for use with an atomic force microscope comprises a single-crystal silicon base 11 having adequate mechanical strength, a cantilever beam 12 that is made from a silicon oxide film and which is joined at one end to the base, and a conical stylus 13 with a sharp tip that is formed of single-crystal silicon on the cantilever beam 12 at the 6 other end which is opposite the end joined to the base 11, and all surfaces of the cantilever are covered with a thin electroconductive film 14. If desired, protective plates 15 for protecting the cantilever beam against mechanical damage may be provided that are processed from the base material in such a way that they hold the beam therebetween and which have satisfactory strength. The stylus has an abrupt profile with a sharp tip and a high aspect ratio, and the cantilever beam has an invariable spring constant and supports the stylus at an end. The cantilever can be produced by a process comprising steps (a)-(k).Type: GrantFiled: May 24, 1995Date of Patent: March 25, 1997Assignees: Ebara Research Co., Ltd., Agency of Industrial Science and TechnologyInventors: Junju Itoh, Yasushi Toma
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Patent number: 5594166Abstract: The improved cantilever for use with an atomic force microscope comprises a single-crystal silicon base 11 having adequate mechanical strength, a cantilever beam 12 that is made from a silicon oxide film and which is joined at one end to the base, and a conical stylus 13 with a sharp tip that is formed of single-crystal silicon on the cantilever beam 12 at the other end which is opposite the end joined to the base 11, and all surfaces of the cantilever are covered with a thin electroconductive film 14. If desired, protective plates 15 for protecting the cantilever beam against mechanical damage may be provided that are processed from the base material in such a way that they hold the beam therebetween and which have satisfactory strength. The stylus has an abrupt profile with a sharp tip and a high aspect ratio, and the cantilever beam has an invariable spring constant and supports the stylus at an end.Type: GrantFiled: September 22, 1994Date of Patent: January 14, 1997Assignees: Ebara Research Co., Ltd., Agency of Industrial Science and TechnologyInventors: Junju Itoh, Yasushi Toma
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Patent number: 5380503Abstract: A stocker for accommodating, storing or transporting articles in clean, contamination-free conditions for either a long time or temporarily. The stocker has a particle collector provided in a part thereof. The particle collector includes an irradiation source such as ultraviolet light source, and a photoelectron emitting material that emits photoelectrons on irradiation with irradiation energy from the irradiation source. The particle collector further includes an electric field forming electrode, and a charged particle collecting material. The space where the particle collector is provided is preferably partitioned from the other space of the stocker by an irradiation energy screening material.Type: GrantFiled: March 11, 1993Date of Patent: January 10, 1995Assignee: Ebara Research Co., Ltd.Inventors: Toshiaki Fujii, Hidetomo Suzuki
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Patent number: 5322674Abstract: Halogen-containing waste gases resulting from the dry etching step of the process of fabricating semiconductor devices are rendered harmless by removing the halogen compounds concomitant with said waste gases. Waste gases containing halogen compounds are treated by bringing them into contact first with activated carbon and then into contact with a member selected from the group consisting of an alkali agent and a ferric oxide, at a linear velocity of about 3-50 cm/min at ambient temperature, volume ratios of said activated carbon to the alkali agent or the ferric oxide in terms of a substantially dried base being about 2-4, and said alkali agent being selected from a group consisting of calcium hydroxide, calcium oxide, magnesium hydroxide and magnesium oxide.Type: GrantFiled: December 21, 1992Date of Patent: June 21, 1994Assignees: Ebara Corporation, Ebara Research Co., Ltd.Inventor: Yoichi Mori
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Patent number: 5294280Abstract: A gas measuring device includes a dissolving unit for dissolving gas to be measured in solvent medium, a measuring unit for measuring the amount of ions generated when the gas to be measured is ionized in the liquid medium, and a calculating unit for calculating the amount of the gas to be measured from a value measured by the measuring unit.Type: GrantFiled: June 26, 1992Date of Patent: March 15, 1994Assignees: Tokyo Electron Limited, Ebara Research Co., Ltd.Inventors: Tsuyoshi Wakabayashi, Takenobu Matsuo, Shuji Moriya, Hidenobu Arimitsu
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Patent number: 5225000Abstract: Cleaning a closed space such as safety cabinets, clean boxes, safes and wafer storage spaces are performed by irradiating a photoelectron emitting member with ultraviolet rays and/or other forms of radiation to emit photoelectrons into the closed space, electrically charging the fine particles in the closed space with the emitted photoelectrons, and removing the charged fine particles from the closed space.Type: GrantFiled: October 29, 1991Date of Patent: July 6, 1993Assignee: Ebara Research Co., Ltd.Inventors: Toshiaki Fujii, Hidetomo Suzuki, Naoaki Ogure, Kazuhiko Sakamoto
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Patent number: 5194805Abstract: An inductance-type displacement sensor which can measure the displacement of a measured object of magnetic material without any contact with the object. A pair of series connected coils is provided adjacent to the object so that the inductance of the coils varies in response to a displacement of the object from a predetermined position. The inductance, the number of windings, the direction of the windings and the section of each of the cores are so set that the magnetic flux produced by one of the coils runs in a direction opposite to that of the magnetic flux produced by the other coil and the densities of the respective magnetic fluxes are identical with each other.Type: GrantFiled: December 26, 1990Date of Patent: March 16, 1993Assignees: National Aerospace Laboratory, Ebara Research Co., Ltd., Ebara CorporationInventors: Atsushi Nakajima, Minoru Takizawa, Chikara Murakami, Yoichi Kanemitsu, Yuji Shirao
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Patent number: 5190627Abstract: Ultrapure water is formed by a process employing a simple system for safely and easily removing oxygen from water containing dissolved oxygen; which process comprises dissolving a reducing agent in water containing dissolved oxygen and irradiating the resulting water with ultraviolet rays. The ultrapure water is particularly utilized as a rinsing water in the electronics industry.Type: GrantFiled: April 24, 1992Date of Patent: March 2, 1993Assignees: Ebara Corporation, Ebara Research Co., Ltd.Inventors: Takayuki Saito, Hidenobu Arimitsu, Ken Nakajima, Yoko Iwase, Hiroyuki Shima
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Patent number: 5186213Abstract: An improved hydraulic servo-valve including a spool (10, 10R, 10L) adapted to slidably move in a valve body (1) to change the direction of flow of a working liquid and vary a flow rate of the working liquid, nozzle back-pressure chambers (18, 18R, 18L) to which a pilot pressure is applied for displacing the spool (10, 10R, 10L), and a flapper mechanism comprising nozzles (19, 19R, 19L) and flappers (20, 20R, 20L) is disclosed. Static pressure bearings (14R, 14L, 141R, 141L, 142R, 142L) are formed at opposite ends of the spool (10, 10R, 10L). In addition, the hydraulic servo-valve is formed with passages extend from a pump port (P) to the nozzle back-pressure chambers (18, 18R, 18L) via the static pressure bearings (14R, 14L, 141R, 141L, 142R, 142L).Type: GrantFiled: June 10, 1991Date of Patent: February 16, 1993Assignees: Ebara Research Co. Ltd., Eizo UrataInventors: Eizo Urata, Shinpei Miyakawa