Abstract: Process for the production of valve metal powders, in particular niobium and tantalum powder, by reduction of corresponding valve metal oxide powders by means of vaporous reducing metals and/or hydrides thereof, preferably in the presence of an inert carrier gas, wherein the reduction is performed at a vapor partial pressure of the reducing metal/metal hydride of 5 to 110 hPa and an overall pressure of less than 1000 hPa, and tantalum powder obtainable in this way having a high stability of the powder agglomerate particles.

Abstract: The invention is related to a boride of a metal of transition group four of the periodic table of the elements, wherein at least 40 wt. % of the particles have a grain size of more than 106 ?m, determined by sieve analysis according to ASTM B 214, and these particles consist of grown, monocrystalline grains. The invention also relates to a cermet, wettable powder and a surface coating which contain the boride. The invention further relates to a process to prepare the boride. The invention additionally relates to a process to prepare a cermet or a wettable powder.

Abstract: The invention relates to compositions which include: (a) a polythiophene containing repeating units represented by the following general formula (I), wherein X represents, for example, —CH2—CH(CH2—O—(CH2)4SO3?H+)—; and (b) further polymers, that are different than polythiophene (a), and which contain SO3? M+ or COO?M+ groups. Also disclosed are electroluminescing (EL) arrangements that contain hole-injecting layers which include such compositions.

Abstract: The invention is related to a boride of a metal of transition group four of the periodic table of the elements, wherein at least 40 wt. % of the particles have a grain size of more than 106 ?m, determined by sieve analysis according to ASTM B 214, and these particles consist of grown, monocrystalline grains. The invention also relates to a cermet, wettable powder and a surface coating which contain the boride. The invention further relates to a process to prepare the boride. The invention additionally relates to a process to prepare a cermet or a wettable powder.

Abstract: The invention concerns a process for producing transparent multi-layer electrodes from conductive polymers, electrodes produced by this process and their use in electro-optical structures.

Abstract: The present invention relates to coatings comprising electrically conductive polymers and melamine derivatives, their preparation and use, and dispersions for the preparation of such coatings.

Abstract: Disclosed is a method of applying coatings to surfaces, wherein a gas flow forms a gas-powder mixture with a powder of a material selected from the group consisting of niobium, tantalum, tungsten, molybdenum, titanium, zirconium, nickel, cobalt, iron, chromium, aluminum, silver, copper, mixtures of at least two thereof or their alloys with at least two thereof or with other metals, the powder has a particle size of from 0.5 to 150 ?m, an oxygen content of less than 500 ppm oxygen and a hydrogen content of less than 500 ppm, wherein a supersonic speed is imparted to the gas flow and the jet of supersonic speed is directed onto the surface of an object. The coatings prepared are used, for example, as corrosion protection coatings.

Abstract: The present invention relates to a process for the deoxidation of valve metal primary powders by means of reducing metals and/or metal hydrides, and a process for the production of tantalum powders that are suitable as anode material for electrolytic capacitors.

Abstract: The invention is related to a boride of a metal of transition group four of the periodic table of the elements, wherein at least 40 wt. % of the particles have a grain size of more than 106 ?m, determined by sieve analysis according to ASTM B 214, and these particles consist of grown, monocrystalline grains. The invention also relates to a cermet, wettable powder and a surface coating which contain the boride. The invention further relates to a process to prepare the boride. The invention additionally relates to a process to prepare a cermet or a wettable powder.

Abstract: Macromolecular compounds having a core-shell structure are described. Also described is a process for preparing such macromolecular compounds, and their use as semiconductors in electronic structural elements.

Abstract: A tantalum powder consisting of agglomerated primary particle with a minimum primary particle dimension of 0.2 to 0.8 ?m, a specific surface area of 0.9 to 2.5 m2/g and a particle size distribution determined to ASTM B 822 corresponding to a D10 value of 5 to 25 ?m, a D50 value of 20 to 140 ?m and a D90 value of 40 to 250 ?m, wherein the powder does not comprise an effective content of sintering protection agents.

Abstract: Deoxidation of valve metal powders, in particular of niobium powders, tantalum powders or their alloys, by treating the valve metal powder with calcium, barium, lanthanum, yttrium or cerium as deoxidising agent, and valve metal powders that are distinguished by a ratio of the sum of the contents of sodium, potassium and magnesium to the capacitance of less than 3 ppm/10,000 ?FV/g.

Abstract: Aqueous polymeric dispersions comprising a mixture of: (a) a component selected from the group consisting of polyvinylacetates, polyvinylacetate copolymers, and combinations thereof; and (b) SiO2 particles having an average particle diameter of 1 to 400 nm; their use as adhesives and coatings; processes for preparing such dispersions; and substrates coated and/or adhered therewith.

Abstract: The present invention provides a new process for separating zirconium and hafnium compounds, in particular to remove traces of zirconium compounds from hafnium compounds, using fractional crystallisation, as well as hafnium compounds obtainable in accordance with this process.

Abstract: Methods of stabilizing thiophene derivatives of the general formula (I) by treatment with basic compounds: wherein R1 and R2 each independently represents a moiety selected from the group consisting of hydrogen, optionally substituted C1-20 alkyl groups which can contain up to 5 heteroatoms selected from the group consisting of oxygen and sulfur, optionally substituted C1-20 oxyalkyl groups which can contain up to 5 heteroatoms selected from the group consisting of oxygen and sulfur, or wherein R1 and R2 together represent a fused cyclic moiety selected from the group consisting of optionally substituted C1-20 dioxyalkylene groups and C1-20 dioxyarylene groups; and stabilized thiophene derivatives that can be prepared by such methods.

Abstract: Process for the production of valve metal powders, in particular niobium and tantalum powder, by reduction of corresponding valve metal oxide powders by means of vaporous reducing metals and/or hydrides thereof, preferably in the presence of an inert carrier gas, wherein the reduction is performed at a vapour partial pressure of the reducing metal/metal hydride of 5 to 110 hPa and an overall pressure of less than 1000 hPa, and tantalum powder obtainable in this way having a high stability of the powder agglomerate particles.

Abstract: Process for the production of a powdered spherical tungstic acid by acidification of an aqueous alkaline tungstate solution with mineral acid at elevated temperature, preferably in a continuous stirred tank or a cascade of at least 2 continuous stirred tanks, and tungstic acid obtainable in this way, which is characterised by a high bulk density and spherical morphology.

Abstract: Backing plate for sputter targets made of a composite material which comprises 5 to 99 wt. % of at least one refractory metal from the group consisting of Mo, W, Re and Ta and 95 to 1 wt. % of at least one fuirther metallic component from the group consisting of Cu, Ag and Au, process for the production thereof and unit which comprises the backing plate and a sputter target.

Abstract: The invention relates to the use of gluconates in the production of semiconductor wafers, preferably in the polishing of the semiconductor wafers during the production process, and to a polishing agent based on an abrasive substance and/or colloid and a mixture of disuccinates or methylglycine diacetic acid (MGDA) and gluconates.

Abstract: The invention relates to formulations comprising polythiophenes A) comprising at least one polythiophene containing recurring units of the general formula (I-a) and/or (I-b) and at least two further polymers, the use thereof and electroluminescent arrangements comprising hole-injecting layers comprising these formulations.