Patents Assigned to Hanyang Hak Won Co., Ltd.
  • Patent number: 8073547
    Abstract: A guiding apparatus and a method for cochlear implant are disclosed. In one embodiment, the guiding apparatus for cochlear implant comprises i) an optical tube for transmitting an optical signal, ii) an optical signal emitting module for converting an electrical signal into the optical signal and emitting the optical signal through another end of the optical tube, iii) an optical signal detecting module for receiving the optical signal that is reflected by an obstacle or an inner wall of cochlear through another end of the optical tube and converting the received optical signal into an electrical signal and iv) a central processor for analyzing optical emission energy information and optical detection energy information to generate inserting route information. According to one embodiment, it is possible to decrease injuries to the inner wall of a cochlear canal and optimize the position of an electrode to be inserted into the cochlear canal.
    Type: Grant
    Filed: January 13, 2006
    Date of Patent: December 6, 2011
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Sung-Hwa Hong, Sun-I Kim, In-Young Kim, Sang-Min Lee, See-Youn Kwon
  • Patent number: 7674557
    Abstract: An electrode active material further comprising an amphoteric compound, an alkali metal sulfide or an alkali metal oxide, and lithium secondary batteries using the electrode active material, are disclosed. The lithium secondary batteries neutralize acids generating around electrode active material so that it can inhibit the reduction in battery capacity. In addition, the lithium secondary batteries are excellent in its charge-discharge characteristics, cycle life and thermal stability. A method for preparing the electrode active material for lithium secondary batteries is also provided.
    Type: Grant
    Filed: September 19, 2002
    Date of Patent: March 9, 2010
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Yang-Kook Sun, Ho-Hyuk Lee
  • Patent number: 7614072
    Abstract: A method of transmitting multimedia data on demand by using a dynamic channel and apparatus thereof are disclosed. In one embodiment, the method includes i) continuously transmitting the multimedia data from beginning to end via a first static channel at a first static channel transmission point, ii) transmitting a portion of the multimedia data from beginning via a first to dth (d is a natural number not less than 1) dynamic channel at a first to dth dynamic channel transmission point and iii) reusing kth (k is more than 1 and less than d) dynamic channel as another dynamic channel after releasing the kth dynamic channel to be available after Tk from the kth dynamic channel transmission point, wherein the Tk is not less than an elapsed time from the first static channel transmission point to the kth dynamic channel transmission point.
    Type: Grant
    Filed: April 6, 2006
    Date of Patent: November 3, 2009
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Sung-Kwon Park, Suk-Won Lee, Kyung-Jin Seo
  • Publication number: 20070158309
    Abstract: A slurry composition for chemical-mechanical polishing capable of compensating nanotopography effect present on the surface of a wafer, and a method for planarizing the surface of a semiconductor device that utilizes the same are disclosed. The slurry composition of the present invention is aimed at compensating the nanotopography effect during chemical mechanical polishing process of the oxide layer formed on the surface of the wafer, and contains abrasive particles and an additive, wherein the size of the abrasive particles and the concentration of the additive are controlled within predetermined ranges in order to control the deviation of thickness (OTD) of the oxide layer below a certain level after the chemical mechanical polishing process.
    Type: Application
    Filed: May 11, 2004
    Publication date: July 12, 2007
    Applicants: Sumco Corporation, Hanyang Hak Won Co., Ltd.
    Inventor: Jea Park
  • Patent number: 7157548
    Abstract: The present invention relates to a new sulfonated polyimides, more specifically to new methods for preparing the polyimides, and cation exchange membranes containing the polyimides. The sulfonated polyimides of the presented invention have excellent proton conductivity and low preparation cost.
    Type: Grant
    Filed: August 21, 2002
    Date of Patent: January 2, 2007
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Young-Moo Lee, Ho-Burn Park, Chang-Hyun Lee
  • Patent number: 7100057
    Abstract: A method and device for retrieving data in low-power is provided. More specifically, it relates to a method and device for minimizing power consumption while retrieving the continuous media data from a disk drive for the purpose of real-time playback. The data reproducing device reproduces multimedia data by a determined playback strategy after it computes power consumption values according to various playback strategies and retrieves data from a storage medium by a playback strategy having the least power consumption by means of comparing respective power consumption values.
    Type: Grant
    Filed: April 24, 2003
    Date of Patent: August 29, 2006
    Assignee: Hanyang Hak Won Co. Ltd.
    Inventors: Youjip Won, Jungwan Choi
  • Patent number: 7034847
    Abstract: A method of forming pixel cell for three-dimensional image display is provided. The method of forming pixel cell according to this invention relates to a method of forming pixel-cell in a three-dimensional image display system including an image display panel in which a plurality of unit patterns are arranged in a vertical direction and horizontal direction and an optical plate having repetitive pattern. The method according to this invention comprising regarding each side of rhombus pattern having an arbitrary vertex angle as a straight line having a predetermined slant; calculating a number of unit pattern in vertical direction and a number of unit pattern in horizontal direction, corresponding to said predetermined slant; approximating said predetermined slant to stepped patterns with said number of unit pattern in vertical direction and said number of unit pattern in horizontal direction; and forming said pixel cell using said stepped patterns.
    Type: Grant
    Filed: June 18, 2004
    Date of Patent: April 25, 2006
    Assignee: Hanyang Hak Won Co., Ltd
    Inventors: Jung-Young Son, Sang-Hoon Shin, Yong-Jin Choi, Saveliev Vladmir, Kae-Dal Kwack
  • Patent number: 6937027
    Abstract: Disclosed herein is a hybrid type sensor for detecting high frequency partial discharge which can detect high frequency partial discharge at a high signal-to-noise ratio without being influenced by power noise and surrounding noise, and guarantee the safety of a test when breakdown occurs. The sensor forms two or three signal paths with different impedances wherein a low frequency power signal is bypassed to ground through a first path, and a high frequency partial discharge current is allowed to flow through a second path and is detected as a resistance component through a resistor. Further, a surge voltage input to the sensor due to breakdown is input to the ground through a third path.
    Type: Grant
    Filed: October 9, 2003
    Date of Patent: August 30, 2005
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Ja Yoon Koo, Jee Hong Kim
  • Publication number: 20050139294
    Abstract: An iron-based (Fe-based) hardfacing alloy is provided. The Fe-based hardfacing alloy has excellent wear resistance, excellent cavitation erosion resistance, and excellent corrosion resistance, thereby being substituted for a cobalt-based (Co-based) stellite alloy, which has been used for the hardfacing of a nuclear power plant valve. When the provided Fe-based hardfacing alloy is used for the hardfacing of the nuclear power plant valve, inexpensive Fe can be substituted for expensive Co and radiation fields formed by 58Co and 60Co radioactive isotopes can be efficiently reduced.
    Type: Application
    Filed: August 26, 2002
    Publication date: June 30, 2005
    Applicant: Hanyang Hak Won Co. Ltd.
    Inventors: Seon-Jin Kim, Young-Min Oh, Jun-Gi Kim
  • Patent number: 6802949
    Abstract: Disclosed are a method for manufacturing a half-metallic magnetic oxide and a plasma sputtering apparatus used in the method. A conductor provided with at least one hole is disposed between a metal target and a substrate holder in the plasma sputtering apparatus, thereby improving the bonding of metal ions discharged from the metal target to oxygen ions, and a magnetic field with a coercive force larger than that of a thin film to be formed on the substrate, thereby obtaining a magnetic oxide film with excellent properties. In a preferred embodiment of the present invention, a conductor-side power supply unit is connected to the conductor, thereby additionally supplying power to the conductor and generating second plasma. The plasma sputtering apparatus supplies high power so as to decompose oxygen, and discharges metal ions with different electrovalences at a precise ratio by the additional power supply, thereby being effectively used in manufacturing a half-metallic oxide at low temperatures.
    Type: Grant
    Filed: October 15, 2002
    Date of Patent: October 12, 2004
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Jin Pyo Hong, Chang Hyo Lee, Chae Ok Kim, Kap Soo Yoon, Sung Bok Lee
  • Patent number: 6774692
    Abstract: An apparatus and method for providing an input signal having a desired pulse width and amplitude to atomic force miscoscopes (AFMs) for use in nano-lithography are provided. An input signal providing apparatus for a contact type AFM includes: a pulse width adjusting unit which adjusts the width of a positive pulse of an input square wave to a predetermined pulse width; and an amplitude adjusting unit which adjusts the amplitude of the positive pulse of the square wave to a predetermined voltage. An input signal providing method for the contact type AFM uses the apparatus having this structure. An input signal providing apparatus for a non-contact type AFM further includes a square pulse generating unit which generates a square pulse having a predetermined phase in synchronization with an input resonance signal, and an input signal providing method for the non-contact type AFM further involves generating the square pulse having a predetermined phase in synchronization with the input resonance signal.
    Type: Grant
    Filed: April 17, 2002
    Date of Patent: August 10, 2004
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Young-hwan Kim, Chung Choo Chung, Haiwon Lee
  • Publication number: 20040130328
    Abstract: Disclosed herein is a hybrid type sensor for detecting high frequency partial discharge. The hybrid type sensor of the present invention can detect high frequency partial discharge at a high signal-to-noise ratio without being influenced by power noise and surrounding noise, and guarantee the safety of a test when breakdown occurs. The sensor of the present invention forms two or three signal paths with different impedances. A low frequency power signal is bypassed to ground through a first path, and a high frequency partial discharge current is allowed to flow through a second path and is detected as a resistance component through a resistor. Further, a surge voltage input to the sensor due to breakdown is input to the ground through a third path. Therefore, the present invention can precisely and safely detect the amount of high frequency partial discharge.
    Type: Application
    Filed: October 9, 2003
    Publication date: July 8, 2004
    Applicant: Hanyang Hak Won Co., Ltd.
    Inventors: Ja Yoon Koo, Jee Hong Kim
  • Publication number: 20040097696
    Abstract: The present invention relates to a method of preparing a polyether poly(N-substituted urethane) comprising an electrolytic compound and a polymer matrix, wherein the polymer matrix is a copolymer comprising polyether unit and polyurethane unit and has 50,000-2,000,000 of a weight average molecular weight, where N-positions of the polyurethane unit are substituted with oligo(ethylene oxide) derivatives which provide flexibility and electrolytic conduction of the polymer matrix by controlling its length, composition, structure and crosslinked degree. Accordingly, the solid polymer electrolyte of the present invention provides excellent thermal stability, electrochemical stability and mechanical properties and thus, is suitable for use in polymer secondary batteries and electrochemical devices.
    Type: Application
    Filed: November 13, 2003
    Publication date: May 20, 2004
    Applicant: Hanyang Hak Won Co., Ltd
    Inventors: Si-Tae Noh, Jung-Ohk Kweon, Hee-Sung Choi
  • Publication number: 20040092125
    Abstract: Disclosed herein is a method for forming quantum dots, comprising the steps of (a) depositing a metal thin layer onto a substrate, (b) coating a dielectric precursor onto the metal thin layer, and (c) stepwisely heating the resultant substrate; or a method for forming quantum dots, comprising the steps of (a) mixing a dielectric precursor diluted in a solvent and a metal powder and stirring the mixture, (b) coating the mixture onto a substrate, and (c) heating the resultant substrate. The method can easily control the size, density and uniformity of metal oxide quantum dots.
    Type: Application
    Filed: October 29, 2003
    Publication date: May 13, 2004
    Applicant: HANYANG HAK WON CO., LTD.
    Inventors: Young-Ho Kim, Yoon Chung, Hyoung-Jun Jeon, Hwan-Pil Park, Chong-Seung Yoon
  • Patent number: 6699398
    Abstract: A process for gas-phase etching of actinide oxides from a substrate by using plasma power comprising the steps of: a) preheating actinide oxides on the substrate within a process chamber filled with fluorine-containing gas and exposing it to plasma power, and subsequently b) etching actinide oxides from the substrate using a plasma gas-phase reactant system.
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: March 2, 2004
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventor: Yong-Soo Kim
  • Publication number: 20040014201
    Abstract: The present invention provides a micro-magnetoelastic biosensor array for detection of the hybridization of target DNA and a method of fabricating such biosensor arrays. The biosensor array activate the magnetoelastic biosensors vibrated by an AC magnetic field, thus simply and quickly analyzing genetic materials as well as obtaining a large amount of evolving information through a real-time solution monitoring of the DNA immobilization and hybridization processes, without labeling the target sample using radioactive isotopes, enzymes or fluorescent dyes.
    Type: Application
    Filed: October 9, 2002
    Publication date: January 22, 2004
    Applicant: HANYANG HAK WON CO., LTD.
    Inventors: Chang-Kyung Kim, Chong-Seung Yoon, Ji-Hyun Lee, Cheong-Sik Yu
  • Patent number: 6680149
    Abstract: The present invention relates to a solid polymer electrolyte of polyether poly(N-substituted urethane) comprising an electrolytic compound and a polymer matrix, wherein the polymer matrix is a copolymer comprising polyether unit and polyurethane unit and has 50,000-2,000,000 of a weight average molecular weight, where N-positions of the polyurethane unit are substituted with oligo(ethylene oxide) derivatives which provide flexibility and electrolytic conduction of the polymer matrix by controlling its length, composition, structure and crosslinked degree. Accordingly, the solid polymer electrolyte of the present invention provides excellent thermal stability, electrochemical stability and mechanical properties and thus, is suitable for use in polymer secondary batteries and electrochemical devices.
    Type: Grant
    Filed: October 1, 2001
    Date of Patent: January 20, 2004
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Si-Tae Noh, Jung-Ohk Kweon, Hee Sung Choi
  • Patent number: 6664355
    Abstract: Disclosed are a process for synthesizing conductive polymers by gas polymerization and product thereof. The process for synthesizing conductive polymers includes the steps of coating oxidant on a substrate surface in the unit of several microns and drying in a dryer, contacting monomers of a gas phase to cause a polymerization to the surface on the substrate, and cleaning the substrate for removing the non-reacted monomers and the oxidant after the polymerization. The present invention reduces the manufacturing process to 2˜3 steps by using the gas polymerization, thereby decreasing the manufacturing cost to two third or more compared with conventional methods. Moreover, the present invention has an excellent thin film property and can freely adjust the electric conductivity.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: December 16, 2003
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Jin Yeol Kim, Eung Ryul Kim
  • Patent number: 6628034
    Abstract: A brushless DC motor with armature windings is compensated by auxiliary windings wound around linking parts of each pair of adjacent teeth of the slotted stator, to increase the number of effective turns, thus improving the torque constant and efficiency of the motor. The motor includes a slotted stator formed with a number of teeth, main windings concentrically wound around the teeth of the stator, auxiliary windings for compensating the main windings wound concentrically around the linking parts of the teeth and connected to the main windings, and a rotor with permanent magnets and a yoke.
    Type: Grant
    Filed: June 12, 2001
    Date of Patent: September 30, 2003
    Assignee: Hanyang Hak Won Co., Ltd.
    Inventors: Gunhee Jang, Junghwan Chang, Kyungsu Kim
  • Patent number: 6596830
    Abstract: Polymeric compounds for use in a chemically amplified resist are represented by the following chemical formulas 1 and 2: wherein R1 and R2, which may be identical or different, are each selected from the group consisting of —H and —CH3; R3 and R4, which may be identical or different, are each selected from the group consisting of —H, —CH3 and —CH2CH3; and 0.1≦m≦0.9 and 0.1≦n≦0.9, with the equation of m+n=1. wherein R3, R4, and R5, which may be identical or different, are each selected from the group consisting of —H and —CH3; R6 and R7, which may be identical or different, are each selected from the group consisting of —H, —CH3 and —CH2CH3; R8 is —CH3 or —CH2CH2OH; and 0.1≦p≦0.9, 0.05≦q≦0.8, and 0.05≦r≦0.5, with the equation of p+q+r=1.
    Type: Grant
    Filed: May 10, 2002
    Date of Patent: July 22, 2003
    Assignee: Hanyang Hak Won Co., LTD
    Inventors: Haiwon Lee, Sung Soo Kim