Abstract: Ternary hard material layers are described to which a small proportion of yttrium is added to increase the resistance to wear at elevated temperatures.
Type:
Grant
Filed:
November 3, 1997
Date of Patent:
March 7, 2000
Assignee:
Hauzer Industries BV
Inventors:
Wolf-Dieter Muenz, Ian Smith, Lee Adrian Donohue, John Stuart Brooks
Abstract: A machine for covering a substrate (FIG. 14, 540) by means of both cathodic arc plasma deposition (CAPD) (FIG. 2) and magnetron sputtering (FIG. 1) without breaking vacuum in a single chamber (FIG. 14, 421). A computer system monitors (FIG. 3, 403, 405) and controls all coating process parameters to coat in any sequence multiple thin film layers using either the CAPD or magnetron sputtering process. A rotating substrate table (FIG. 14, 470) used in conjunction with internal and external targets coats both sides of the substrate simultaneously.
Type:
Grant
Filed:
August 25, 1988
Date of Patent:
August 10, 1993
Assignee:
Hauzer Industries bv
Inventors:
Harbhajan S. Randhawa, Jeffrey M. Buske