Patents Assigned to Heraeus Quarzglas GmbH & Co., KG
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Patent number: 10947146Abstract: Known heating burners for producing a welded joint between components of quartz glass include a burner head in which at least one burner nozzle is formed, a burner-head cooling system for the temperature control of the burner head and a supply line connected to the burner nozzle for a fuel gas. Starting from this, to modify a heating burner in such a way that impurities in the weld seam between quartz-glass components to be connected are largely avoided, it is suggested that the burner head should include a base body of silver or of a silver-based alloy.Type: GrantFiled: June 28, 2018Date of Patent: March 16, 2021Assignee: Heraeus Quarzglas GmbH & Co. KGInventor: Oliver Ganz
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Patent number: 10908097Abstract: Measurement methods are known for determining the concentration of an ingredient in a body of ceramic or glassy material, in which the optical path length or the signal propagation time of a measurement wave penetrating the body of ceramic or glassy material in a measurement direction is determined and evaluated. Starting therefrom, in order to indicate a non-destructive method for determining a concentration of an ingredient in a body of ceramic or glassy material, which is also suitable for measurement in the production process of the body concerned, it is suggested according to one embodiment that modulated gigahertz radiation is used as the measurement wave.Type: GrantFiled: November 28, 2018Date of Patent: February 2, 2021Assignee: Heraeus Quarzglas GmbH & Co. KGInventor: Helmut Friedrich
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Publication number: 20210009461Abstract: Described is a process for the refinement of a quartz powder, comprising the step of separating microparticles of refractory minerals, in particular minerals containing rare earth metal compounds, from the quartz powder by an elutriation step.Type: ApplicationFiled: July 10, 2020Publication date: January 14, 2021Applicants: Heraeus Quarzglas GmbH & Co. KG, Heraeus Conamic UK LimitedInventors: Ian George Sayce, Michael Schindler, Fabian Schildt, Eduard Visnow
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Patent number: 10879537Abstract: Known lithium-ion cells for a secondary battery including an electrode have an active material layer containing active material particles in contact with a non-aqueous electrolyte and a particulate, porous additive. Using this as a basis, it is desired to achieve an improvement in the lithium-ion cells in respect of their gravimetric and volumetric energy density and in respect of inexpensive and reproducible production, and in particular to ensure that the desired properties of the active material layer are not changed, or are not changed to an unacceptable degree, by compression during calendering. Accordingly, it is proposed to use, as an additive, porous carbon particles having a porosity in the range between 50% and 95% and having macropores which are fluidically connected to one another and which are delimited by carbon walls having an average wall thickness in the range of 5 to 500 nm.Type: GrantFiled: June 10, 2014Date of Patent: December 29, 2020Assignee: HERAEUS QUARZGLAS GMBH & CO. KGInventors: Christian Neumann, Jörg Becker, Sascha Pihan, Matthias Otter
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Patent number: 10851008Abstract: A method for producing a component with portions of a rare earth metal-doped quartz glass, an intermediate product containing voids and consisting of a SiO2 raw material doped with rare earth metal is introduced into a sinter mold the interior of which is bordered by a carbonaceous mold wall, and is melted therein into the component by gas pressure sintering at a maximum temperature above 1500° C. A shield is arranged between the mold wall and the intermediate product. In order to indicate a modified gas pressure sintering method that ensures the production of rare earth metal-doped quartz glass with reproducible properties, a bulk material of amorphous SiO2 particles with a layer thickness of at least 2 mm is used as the shield, the softening temperature thereof being at least 20° C.Type: GrantFiled: March 28, 2018Date of Patent: December 1, 2020Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Walter Lehmann, Mario Such, Thomas Kayser, Andreas Langner, Gerhard Schötz
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Patent number: 10852248Abstract: One aspect is an apparatus for analyzing particles a capillary as a measuring cell with a hollow channel for receiving or passing through a test sample containing the particles includes a light source for generating a light beam, an optical device for coupling the light beam into the hollow channel at an input point for the purpose of illuminating the test sample, and a detector for detecting scattered light exiting the hollow channel. In one aspects, the hollow channel has an internal diameter DH in the range of 10 ?m to 60 ?m, that the light beam has a radial light intensity distribution with a minimum beam diameter DL, wherein the following applies to the diameter ratio DL/DH: 0.05<DL/DH<2.00, and that the light beam has an angle of incidence of less than 2 degrees in relation to the hollow channel's longitudinal axis on entering the hollow channel.Type: GrantFiled: July 26, 2019Date of Patent: December 1, 2020Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Stefan Weidlich, Markus Schmidt
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Publication number: 20200361806Abstract: One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, making a glass melt out of silicon dioxide granulate in an oven and making a quartz glass body out of at least part of the glass melt. The oven has at least a first and a further chamber connected to one another via a passage. The temperature in the first chamber is lower than the temperature in the further chambers. On aspect relates to a quartz glass body which is obtainable by this process. One aspect relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.Type: ApplicationFiled: August 4, 2020Publication date: November 19, 2020Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Matthias OTTER, Walter LEHMANN, Michael HÜNERMANN, Nils Christian NIELSEN, Nigel Robert WHIPPEY, Boris GROMANN, Abdoul-Gafar KPEBANE, Matthias SÖHN
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Publication number: 20200363129Abstract: In a known method for treating pourable, inorganic grain, a heated rotary tube is used that rotates about an axis of rotation and surrounds a treatment chamber that is divided into a plurality of treatment zones by means of separating elements. The grain is supplied to the treatment chamber at a grain inlet side and is transported, in a grain transport direction, to a grain outlet side and is exposed to a treatment gas in the process. In order, proceeding herefrom, to allow for reliable and reproducible thermal treatment of pourable inorganic grain, in particular SiO2 grain in the rotary kiln, in a manner having low and effective consumption of treatment gas, it is proposed for spent treatment gas to be suctioned out of a reaction zone of the treatment chamber, by a gas manifold that rotates about the longitudinal axis thereof.Type: ApplicationFiled: May 12, 2020Publication date: November 19, 2020Applicant: Heraeus Quarzglas GmbH & Co. KGInventor: Matthias Söhn
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Patent number: 10807900Abstract: In one method for producing opaque quartz glass, a green body is produced from a slip containing fine, amorphous SiO2 particles and coarse SiO2 reinforcement bodies and the green body is sintered by way of a sintering treatment into a blank made from the opaque quartz glass. The reinforcement bodies with a specific density DK1 are here embedded in a SiO2 matrix with a specific glass density DM. Starting from this, in order to provide a blank of opaque quartz glass that is less susceptible to cracking and illustrates homogeneous transmission even in the case of small wall thicknesses, in one aspect sinterable reinforcement bodies are used, the specific density DK0 of which prior to the sintering treatment is lower than the specific glass density DM, and which due to the sintering treatment reach the specific density DK1 which differs from the specific glass density DM by less than 10%.Type: GrantFiled: December 20, 2017Date of Patent: October 20, 2020Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Christian Schenk, Gerrit Scheich, Nadine Tscholitsch
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Patent number: 10807901Abstract: One aspect relates to a method for producing an optical blank from synthetic quartz glass by vitrifying and shaping a porous, cylindrical SiO2 soot body having a longitudinal axis, in a heating zone including a melt mold with bottom plate. The SiO2 soot body vitrified in the heating zone at a vitrification temperature so as to form a full cylindrical, completely vitrified, transparent quartz glass body. Subsequently, the vitrified quartz glass body is shaped by softening in the melt mold at a softening temperature so as to form a viscous quartz glass mass which partly fills the volume of the melt mold, and cooling the quartz glass mass and removal from the melt mold so as to form the optical blank. During shaping in the melt mold, the full cylindrical quartz glass body is brought into contact by way of controlled supply with a centering means of the bottom plate.Type: GrantFiled: September 22, 2017Date of Patent: October 20, 2020Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Andreas Kaske, Klaus Becker, Stefan Ochs
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Patent number: 10785830Abstract: An infrared emitter is provided. The infrared emitter includes a substrate made of an electrically insulating material. The substrate includes a surface that contacts a printed conductor made of a resistor material that is electrically conducting and generates heat when current flows through it. The electrically insulating material includes an amorphous matrix component into which an additional component is embedded that absorbs in the spectral range of infrared radiation. At least a part of the surface is configured with a cover layer made of porous glass, whereby the printed conductor is embedded, at least in part, in the cover layer.Type: GrantFiled: November 11, 2016Date of Patent: September 22, 2020Assignees: Heraeus Noblelight GmbH, Heraeus Quarzglas GmbH & Co. KGInventors: Lotta Gaab, Nils Christian Nielsen, Gerrit Scheich, Jürgen Weber, Frank Wessely
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Publication number: 20200277217Abstract: In known methods for producing a glass component, a void-containing intermediate product containing doped or non-doped SiO2 is inserted into a sheath tube composed of glass, which has a longitudinal axis and an inner bore, and is thermally treated therein. In order to subject the intermediate product to a thermal and/or reactive treatment that is reproducible and uniform in its effect from this starting point, it is proposed in one embodiment that into the sheath tube's inner bore a first gas-permeable gas diffuser is inserted which is displaceable along the sheath tube's longitudinal axis and is pressed against the intermediate product during the thermal treatment.Type: ApplicationFiled: February 28, 2020Publication date: September 3, 2020Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Jacqueline Plass, Dörte Schönfeld, Clemens Schmitt, Alexander Laaz, Andreas Langner, Gerhard Schötz, Walter Lehmann, Michael Hünermann, Stefan Weidlich, Jürgen Schäfer
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Publication number: 20200270162Abstract: One aspect is a method for producing a hollow porous quartz glass base material, and a method for producing a synthetic quartz glass cylinder, wherein even when the hollow porous quartz glass base material (soot body) is produced in large weight and high bulk density, the ease of target extraction is maintained and target extraction is performed stably, and a large weight soot body can be produced.Type: ApplicationFiled: December 28, 2017Publication date: August 27, 2020Applicants: Shin-Etsu Quartz Products Co., Ltd., Heraeus Quarzglas GmbH & Co. KGInventors: Kotaro SUMI, Hikari KUWAHARA
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Patent number: 10732519Abstract: A substrate for an EUV mirror which contains a zero crossing temperature profile that departs from the statistical distribution is provided. A method for producing a substrate for an EUV mirror is also provided, in which the zero crossing temperature profile in the substrate is adapted to the operating temperature of the mirror. A lithography method using the substrate is also described.Type: GrantFiled: September 10, 2014Date of Patent: August 4, 2020Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Klaus Becker, Stephan Thomas
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Patent number: 10730780Abstract: One aspect relates to a process for the preparation of a quartz glass body, including providing a silicon dioxide granulate, wherein the silicon dioxide granulate was made from pyrogenic silicon dioxide powder and the silicon dioxide granulate has a BET surface area in a range from 20 to 40 m2/g, making a glass melt out of silicon dioxide granulate in an oven and making a quartz glass body out of at least part of the glass melt. The oven has at least a first and a further chamber connected to one another via a passage. The temperature in the first chamber is lower than the temperature in the further chambers. One aspect relates to a quartz glass body which is obtainable by this process. One aspect relates to a light guide, an illuminant and a formed body, which are each obtainable by further processing of the quartz glass body.Type: GrantFiled: December 16, 2016Date of Patent: August 4, 2020Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Matthias Otter, Walter Lehmann, Michael Hünermann, Nils Christian Nielsen, Nigel Robert Whippey, Boris Gromann, Abdoul-Gafar Kpebane, Matthias Söhn
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Patent number: 10676388Abstract: One aspect relates to a light guide comprising a jacket and one or more cores, wherein the jacket surrounds the cores. Each core has a refractive index profile perpendicular to the maximum extension of the core, wherein at least one refractive index nK of each refractive index profile is greater than the refractive index nM1 of the jacket. The jacket is made of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminium content of less than 200 ppb. One aspect also relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminium content of less than 200 ppb, in each case based on the total weight of the silicon dioxide granulate I.Type: GrantFiled: December 16, 2016Date of Patent: June 9, 2020Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Michael Hünermann, Achim Hofmann, Heinz Fabian, Matthias Otter, Thomas Kayser
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Publication number: 20200131071Abstract: A method for homogenizing glass includes the method: providing a cylindrical blank composed of the glass having a cylindrical outer surface that extends along a longitudinal axis of the blank between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and displacing the shear zone along the longitudinal axis of the blank. To enable a radial mixing within the shear zone in addition to the tangential mixing with the lowest possible time and energy input, starting from this method, cylindrical sections of the blank are adjacent to the shear zone on both sides, the first cylindrical section having a first central axis and the second cylindrical section having a second central axis, the first central axis and the second central axis being temporarily non-coaxial with each other.Type: ApplicationFiled: October 24, 2019Publication date: April 30, 2020Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Stephan Thomas, Jan Vydra, Martin Trommer, Michael Huenermann, Andreas Langner, Walter Lehmann, Stefan Hengster, Klaus Becker
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Publication number: 20200131069Abstract: A known method for homogenizing glass includes the following steps: providing a cylindrical blank composed of the glass, having a cylindrical outer surface which extends between a first end face and a second end face, forming a shear zone in the blank by softening a longitudinal section of the blank and subjecting it to a thermal-mechanical intermixing treatment, and moving the shear zone along the longitudinal axis of the blank. To reduce the risk of cracks and fractures during homogenizing, it is proposed that a thermal radiation dissipator is used that at least partially surrounds the shear zone, the lateral dimension of which in the direction of the longitudinal axis of the blank is greater than the shear zone and smaller than the length of the blank, the thermal radiation dissipator being moved synchronously with the shear zone along the longitudinal axis of the blank.Type: ApplicationFiled: October 24, 2019Publication date: April 30, 2020Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Stephan Thomas, Jan Vydra, Martin Trommer, Michael Huenermann, Andreas Langner, Walter Lehmann, Stefan Hengster, Klaus Becker
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Publication number: 20200123039Abstract: One aspect relates to a process for the preparation of a quartz glass body including: i.) providing a silicon dioxide granulate, ii.) making a first glass melt out of the silicon dioxide granulate, iii.) making a glass product out of at least one part of the glass melt, iv.) reducing the size of the glass product to obtain a quartz glass grain, v.) making a further glass melt from the quartz glass grain and vi.) making a quartz glass body out of at least one part of the further glass melt. Furthermore, one aspect relates to a quartz glass body obtainable by this process. Furthermore, one aspect relates to a reactor, which is obtainable by further processing of the quartz glass body.Type: ApplicationFiled: June 13, 2018Publication date: April 23, 2020Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Boris Gromann, Marcus Constantin Goebel, Nils Christian Nielsen, Michael Huenermann, Kathrin Wissel-Stoll
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Patent number: 10618833Abstract: The invention relates to a process for the preparation of a quartz glass grain comprising the process steps i.) Providing a silicon dioxide granulate from a pyrogenically produced silicon dioxide powder, ii.) Making a glass melt out of silicon dioxide granulate, iii.) Making a quartz glass body out of at least part of the glass melt and iv.) Reducing the size of the quartz glass body to obtain the quartz glass grain. The invention further relates to a quartz glass grain which is obtainable by this process. The invention further relates to opaque quartz glass bodies, which are obtainable by further processing of the quartz glass grain.Type: GrantFiled: December 16, 2016Date of Patent: April 14, 2020Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Martin Arndt, Matthias Otter, Walter Lehmann, Michael Hünermann, Nils Christian Nielsen, Nigel Robert Whippey, Boris Gromann, Abdoul-Gafar Kpebane