Patents Assigned to Hoechst Japan Limited
  • Patent number: 6559473
    Abstract: An organic light-emitting diode with high luminance and high efficiency comprising an anode, an organic pn-junction and a cathode layered sequentially in this order, wherein the organic pn-junction emits light by an electric current passing through the diode in an electric field applied between the anode and the cathode, characterized in that the organic pn-junction is composed of an organic p-type luminescent-semiconductor thin film and an organic n-type luminescent-semiconductor thin film, wherein one surface of the organic p-type luminescent-semiconductor thin film is in contact with the anode and another surface of the organic p-type luminescent-semiconductor thin film is in contact with the organic n-type luminescent-semiconductor thin film, and one surface of the organic n-type luminescent-semiconductor thin film is in contact with the cathode and another surface of the organic n-type luminescent-semiconductor thin film is in contact with the organic p-type luminescent-semiconductor thin film and wherei
    Type: Grant
    Filed: June 16, 1997
    Date of Patent: May 6, 2003
    Assignee: Hoechst Japan Limited
    Inventors: Nu Yu, Wen-Bing Kang, Akihiko Tokida
  • Patent number: 6110639
    Abstract: A radiation-sensitive composition comprising:an acid-generating compound capable of generating an acid upon exposure to radiation and represented by the formula (I): ##STR1## wherein X, Y and R.sup.1 to R.sup.5 have the following meanings: X and Y: independently a direct bond, C.sub.1 -C.sub.8 alkylene, C.sub.1 -C.sub.4 alkene, --O--R.sup.11 --O-- (wherein R.sup.11 is an alkylene group having 1 to 4 carbon atoms), --NH--, --O--, --S--, --SO.sub.2 --, --CO--, --COO-- or --CONR.sup.12 -- (wherein R.sup.12 is a hydrogen atom, C.sub.1 -C.sub.8 alkyl, alkylaryl, halogenated alkyl, halogenated aryl, a halogen atom, alkoxy, phenoxy, alkylsulfonyl-oxy, halogenated alkylsulfonyl-oxy, or substituted or unsubstituted arylsulfonyl-oxy);R.sup.1 to R.sup.4 : a hydrogen atom, C.sub.1 -C.sub.
    Type: Grant
    Filed: June 26, 1997
    Date of Patent: August 29, 2000
    Assignee: Hoechst Japan Limited
    Inventors: Seiya Masuda, Satoru Funato, Natsumi Kawasaki
  • Patent number: 6080720
    Abstract: This invention relates to a composition for metabolic bone diseaese and/or bone fractures which comprises a pharmaceutically acceptable carrier and human neurotrophin-3 (NT-3).This invention also relates to a method for the treatment and/or prevention of metabolic bone diseaese or bone fractures which comprises administering to a patient in need of said treatment and/or prevention a medicament containing an effective amount of human neurotrophin-3 (NT-3).
    Type: Grant
    Filed: July 21, 1995
    Date of Patent: June 27, 2000
    Assignee: Hoechst Japan Limited
    Inventors: Akira Kudo, Tohru Nakanishi, Masaharu Takigawa
  • Patent number: 6037521
    Abstract: The invention relates to an animal model of human Alzheimer's disease that is useful for determining the mechanism of the disease and for developing and testing potential therapeutic drugs. More particularly, the present invention relates to the creation of transgenic non-human mammalian animals having integrated into their genome an exogenous DNA construct that encodes a portion of a .beta.-amyloid precursor protein ("APP") and that is designed to overexpress in various types of animal tissues.
    Type: Grant
    Filed: November 14, 1994
    Date of Patent: March 14, 2000
    Assignee: Hoechst Japan Limited
    Inventors: Masahiro Sato, Takashi Kobayashi, Norihiro Tada, Mikio Shoji, Takeshi Kawarabayashi
  • Patent number: 5932688
    Abstract: An improved polybenzimidazole wherein the total concentration of metals other than alkali metal and alkaline earth metals is 10 ppm or less. The resulting polybenzimidazole is industrially useable in parts or components of apparatus for the manufacture of semiconductors and display devices.
    Type: Grant
    Filed: January 14, 1997
    Date of Patent: August 3, 1999
    Assignee: Hoechst Japan Limited
    Inventor: Makoto Murata
  • Patent number: 5908828
    Abstract: The present invention provides synthetic peptide derivatives represented by the formulaP.sup.1 -R.sup.1 -P.sup.2wherein P.sup.1 is a peptide having an amino acid sequence in the SEQ ID NO.:1 of the Sequence Listing, or analogues thereof; P.sup.2 is a peptide having an amino acid sequence in the SEQ ID NO.:2 of the Sequence Listing, or analogues thereof; R.sup.1 denotes a linker with a property that does not interfere with the activity of the each peptide P.sup.1 and P.sup.2 to bind N-terminal end of the peptides P.sup.1 and P.sup.2.The present invention also provides a pharmaceutical composition for the treatment of bone related diseases comprising said peptide derivatives, or a therapeutically acceptable salt thereof, and a pharmaceutically acceptable carrier.The present invention also provides a method of treating bone related diseases in a mammal comprising administering thereto an effective amount of said peptide derivatives, or therapeutically acceptable salts thereof.
    Type: Grant
    Filed: June 30, 1995
    Date of Patent: June 1, 1999
    Assignee: Hoechst Japan Limited
    Inventors: Takashi Kurita, Tomoaki Matsumoto, Reiko Kikuno, Yoko Otawara-Hamamoto, Gerhard Breipohl
  • Patent number: 5902876
    Abstract: Improved process for producing a polybenzimidazole compound in solution by dissolving a fully dried polybenzimidazole of the following general formula (1) or (2) in N,N-dimethylacetamide of a sufficiently reduced water content at an elevated temperature of 260.degree. C. or higher in an inert gas atmosphere and a solution of the polybenzimidazole compound produced by the process. The solution remains useful for an extended time without using metal salts or any other stabilizers: ##STR1## where R.sup.1, R.sup.2 and R.sup.5 are tetra-, di- and trivalent aromatic groups, respectively; R.sup.3, R.sup.4 and R.sup.6 are each independently a hydrogen atom, an alkyl group or an aryl group; n is an integer of 2 or more.
    Type: Grant
    Filed: June 18, 1997
    Date of Patent: May 11, 1999
    Assignee: Hoechst Japan Limited
    Inventors: Makoto Murata, Toru Nakamura
  • Patent number: 5888964
    Abstract: A method for increasing the placental blood flow, which comprises administering a human-originated antithrombin-III. The human-originated antithrombin-III increases the placental blood flow in mammals and particularly improves intrauterine growth retardation caused by a decreased blood flow. The method is highly safe to the mother and fetus, since it uses human-originated AT-III as an active ingredient, thereby enabling effective and safe treatment of intrauterine growth retardation (IUGR) and the like.
    Type: Grant
    Filed: April 24, 1996
    Date of Patent: March 30, 1999
    Assignees: The Green Cross Corporation, Hoechst Japan Limited
    Inventors: Hiroshi Shinyama, Toshiaki Akira, Takeshi Uchida, Masahiro Watanabe
  • Patent number: 5882843
    Abstract: A photosensitive resin composition is disclosed.The photosensitive resin composition is characterized by containing (a) a reaction product of a polymer having a specific segment with (3,4-epoxycylohexyl)-methyl methacrylate, (b) a polymerization initiator allowing the initiation of the polymerization of said reaction product when irradiated with an actinic radiation, and (c) a solvent. Preferably, the composition further contains (d) a thermal crosslinker, a compound having a polymerizable unsaturated bond and/or a pigment in addition to the above ingredients.
    Type: Grant
    Filed: November 14, 1995
    Date of Patent: March 16, 1999
    Assignee: Hoechst Japan Limited
    Inventors: Takanori Kudo, Yuko Nozaki, Kazuya Nagao, Yuki Nanjo
  • Patent number: 5869638
    Abstract: A bone-related protein named OSF-4 which is obtained from bone tissue of a mammal including mouse or human, and a process for its production. This protein is a novel naturally occurring mammal protein of the cadherin family.OSF-4 acts as an adhesion molecule or a growth factor which takes part in the process of osteogenesis at the site of bone induction. OSF-4 can be used as an agent for treating bone metabolic diseases, and its high organ specificity for bones enables its use as a diagnostic reagent for bone metabolic diseases.
    Type: Grant
    Filed: October 25, 1996
    Date of Patent: February 9, 1999
    Assignee: Hoechst Japan Limited
    Inventors: Sunao Takeshita, Makoto Okazaki, Shinji Kawai, Atsushi Tsujimura, Egon Amann
  • Patent number: 5853471
    Abstract: Disclosed herein is a composition for anti-reflection coating which comprises a perfluoroalkyl sulfonic acid, an organic amine, a polyvinyl pyrrolidone, a water-soluble alkylsiloxane polymer, and water. The composition is able to be an anti-reflection coating film which has a low refractive index, reduces the degree of forming insoluble layer, and does not generate fine particles and minute crystalline matters in its surface layer.
    Type: Grant
    Filed: April 9, 1997
    Date of Patent: December 29, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Takeo Yoshida, Hatsuyuki Tanaka
  • Patent number: 5849993
    Abstract: Transgenic mice carrying a recombinant DNA construct comprising the gene encoding diphtheria toxin A chain operably linked to a osteocalcin promoter. The transgenic mice can be used as a model for metabolic bone diseases since they have decreased bone mass associated with a marked reduction in the number of osteoblasts.
    Type: Grant
    Filed: April 25, 1995
    Date of Patent: December 15, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Norihiro Tada, Masahiro Sato, Takashi Kobayashi, Toru Ikeda, Katsuiku Hirokawa
  • Patent number: 5846690
    Abstract: A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.
    Type: Grant
    Filed: March 14, 1996
    Date of Patent: December 8, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Munirathna Padmanaban, Yoshiaki Kinoshita, Hiroshi Okazaki, Seiya Masuda, Natsumi Kawasaki, Satoru Funato, Georg Pawlowski
  • Patent number: 5843319
    Abstract: A process for producing a solution of a basic or non-basic sulfonium compound (A) of formulae II-V: ##STR1## wherein R.sup.5, R.sup.6 and R.sup.7 each independently represent a C.sub.1 -C.sub.18 alkyl, aryl or heteroaryl group or an aryl group mono-, di- or tri-substituted with an alkyl, an alkylaryl, an aryl, a halogen, an alkoxy, a phenoxy, a thiophenol, a phenylsulfonyl or a phenylsulphenyl;Y represents (CH.sub.2).sub.n (wherein n is 0 or 1), O or S;R.sup.8 and R.sup.9 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen;R.sup.10 and R.sup.11 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen;n is 5 or 6; andX.sub.2.sup.- represents a basic anion having a pK.sub.B value of -3 to +5; comprising the steps of:(a) dissolving a sulfonium salt (B) in a metal-ion free polar or non-polar solvent to form a solution, said sulfonium salt (B) being selected from said formulae II-V, wherein R.sup.5 to R.sup.11, Y and n of said sulfonium salt (B) have the sane meaning as above and X.sub.2.sup.
    Type: Grant
    Filed: July 29, 1997
    Date of Patent: December 1, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Klaus Juergen Przybilla, Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Natsumi Suehiro, Munirathna Padmanaban, Hiroshi Okazaki, Hajime Endo, Ralph Dammel, Georg Pawlowski
  • Patent number: 5773191
    Abstract: A radiation-sensitive composition is disclosed which includes:(a) a copolymer represented by the general formula: ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, Ar is a substituted or unsubstituted phenylene group or a substituted or unsubstituted cyclohexylene group, X is a divalent group represented by --SO.sub.2 -- or --CO--, m and n are individually an integer not less than 1;(b) a dissolution inhibitor composed of a compound represented by the general formula: ##STR2## wherein R.sup.3 is an alkyl group or a substituted or unsubstituted aryl group, R.sup.4 is an alkylene group, a cycloalkylene group, an alkenylene group or an alkynylene group, R.sup.
    Type: Grant
    Filed: July 24, 1996
    Date of Patent: June 30, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Munirathna Padmanaban, Yoshiaki Kinoshita, Satoru Funato, Natsumi Kawasaki, Hiroshi Okazaki, Georg Pawlowski
  • Patent number: 5770142
    Abstract: Provided is a process for manufacturing sintered polybenzimidazole (PBI) articles at high yields, said articles having neither voids nor porous, low-strength parts resulting from oxidative deterioration. To produce said sintered PBI articles from a particulate PBI resin, said PBI resin is compacted in a closed mold, the mold is heated up to a predetermined temperature of from 350.degree. to 600.degree. C. without applying any external pressure thereto, then, after having heated up to said predetermined temperature, the mold is pressed to have a predetermined external pressure of from 140 to 1400 kg/cm2 at said predetermined temperature whereby the resin is sintered for from 60 to 350 minutes under that conditions, and finally the sintered PBI article is cooled and taken out of the mold.
    Type: Grant
    Filed: June 13, 1997
    Date of Patent: June 23, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Yoshisato Sasaki, Minoru Kurisaki
  • Patent number: 5767146
    Abstract: An anti-osteopathic composition comprising as an active ingredient a compound represented by the following formula (I), (II) or (Ill): ##STR1## which is useful for therapeutic and prophylactic treatment of osteopathia such as osteoporosis and bone fracture.
    Type: Grant
    Filed: September 22, 1997
    Date of Patent: June 16, 1998
    Assignees: Hoechst Japan Limited, Koichi Shudo
    Inventors: Koichi Shudo, Tatsuo Sugioka, Mizuho Inazu, Hideyuki Tanaka, Tsutomu Inoue, Kazuyuki Kitamura
  • Patent number: 5756664
    Abstract: The present invention provides the sequence of the novel bone-related protein OSF-2 which can be obtained from mammalian bone tissues. The invention further provides a method of production of OSF-2 by recombinant techniques.
    Type: Grant
    Filed: April 21, 1995
    Date of Patent: May 26, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Egon Amann, Yoko Otawara-Hamamoto, Reiko Kikuno, Sunao Takeshita, Kenichi Tezuka
  • Patent number: 5738972
    Abstract: A chemically amplified resist material comprising: a) a homopolymer or a copolymer of hydroxystyrene or hydroxystyrene partly protected by a group sensitive to an acid such as a tetrahydropyranyl or t-butoxycarbonyl group, b) a dissolution inhibitor such as poly(N,O-acetal) or phenol or bisphenol protected by a group cleavable with an acid, c) a photosensitive compound capable of generating an acid upon exposure, d) a base capable of degrading upon radiation to regulate the line width in a period between the exposure step and the processing steps after exposure, e) a low-molecular weight phenolic or polyphenolic compound having a structure represented by the following general formula or a mixture of the phenolic or polyphenolic compounds: ##STR1## where n is an integer of 1 to 5, m is an integer of 0 to 4, n+m.ltoreq.5, and p is an integer of 1 to 10, each R is a C.sub.1 -C.sub.12 alkyl group or an unsubstituted or substituted cycloalkyl group or a C.sub.1 -C.sub.
    Type: Grant
    Filed: May 28, 1997
    Date of Patent: April 14, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Munirathna Padmanaban, Natsumi Suehiro, Yoshiaki Kinoshita, Satoru Funato, Seiya Masuda, Hiroshi Okazaki, Georg Pawlowski
  • Patent number: 5726148
    Abstract: A method of treating metabolic bone diseases comprising using a pharmaceutical composition which comprises as an active ingredient IL-1 receptor, a soluble fragment consisting of an extracellular domain of IL-1R or a fragment thereof derived from mammals. The composition has a bone resorption inhibiting activity and is useful for the therapy and prophylaxis of metabolic bone diseases.
    Type: Grant
    Filed: June 7, 1995
    Date of Patent: March 10, 1998
    Assignee: Hoechst Japan Limited
    Inventors: Masakazu Katoh, Kazuyuki Kitamura