Abstract: In a physical vapor deposition method of thermochemical treatment of metals, the substance of a target which constitutes a first electrode of a treatment furnace is evaporated by ion bombardment optionally assisted by an electrical arc discharge. The particles evaporated in this manner are deposited onto a substrate at the potential of a second electrode which is different from that of the first electrode. The substrate is heated during this deposition to a treatment temperature exceeding 600.degree. C. and preferably between 800.degree. C. and 1 200.degree. C. The target and its ancillary members in the furnace are continuously cooled by a flow of cooling fluid so that when the treatment temperature is reached the material of the target remains solid and the evaporation occurring at the surface of the target is effected by sublimation. The result is to improve the regularity of the deposit, its adherence to the substrate and the treatment time.

Abstract: In a physical vapor deposition method of thermochemical treatment of metals, the substance of a target which constitutes a first electrode of a treatment furnace is evaporated by ion bombardment optionally assisted by an electrical arc discharge. The particles evaporated in this manner are deposited onto a substrate at the potential of a second electrode which is different from that of the first electrode. The substrate is heated during this deposition to a treatment temperature exceeding 600.degree. C. and preferably between 800.degree. C. and 1,200.degree. C. The target and its ancillary members in the furnace are continuously cooled by a flow of cooling fluid so that when the treatment temperature is reached the material of the target remains solid and the evaporation occurring at the surface of the target is effected by sublimation. The result is to improve the regularity of the deposit, its adherence to the substrate and the treatment time.

Abstract: A method is provided for manufacturing surgical implants at least partially coated with a layer of a metal compound, comprising the formation of an implant blank from a metal or composite substrate having at least one contact bearing surface, a first polishing of this contact bearing surface, cleaning of this contact bearing surface using physico-chemical means, decontamination and heating of this surface by high energy ion bombardment, in a reactor having a structure similar to that of an oven for thermo-chemical treatment by ionic bombardment, the formation of the deposit by creation of metal vapor inside the reactor and by introducing therein a reactive gas.