Abstract: The present invention relates to a method of producing recombinant modified Staphylococcal toxin having improved stability, comprising the steps of preparing a modified toxin in which a specific amino acid sequence is substituted and a vector for expressing the modified toxin, and culturing E. coli transformed with the vector, and a use thereof for the vaccine.
Type:
Grant
Filed:
October 31, 2000
Date of Patent:
May 29, 2007
Assignee:
LG Chem-Investment Ltd.
Inventors:
Hong-Kyun Lee, Yong-Ho Park, Kyu-Boem Han, Byoung-Sun Chang, Yong-Jun Lee
Abstract: The present invention relates to low dielectric materials essential for a semiconductor having high density and high performance of the next generation, particularly to a process for preparing a porous interlayer insulating film having low dielectric constant containing pores with a size of a few nanometers or less.
The present invention provides a process for preparing a porous wiring interlayer insulating film having very low dielectric constant for a semiconductor device comprising the steps of a) preparing a mixed complex of pore-forming organic molecules and a matrix resin, b) coating the mixed complex on a substrate, and c) heating the mixed complex to remove the organic molecules therefrom, thereby forming pores inside the complex.
Abstract: The present invention provides to an isoxazoline derivative of formula (I), the pharmaceutically acceptable salts, esters and stereochemically isomeric forms thereof, and the use of the derivative in inhibiting the activity of caspases. The present invention also provides a pharmaceutical composition for preventing inflammation and apoptosis which comprise the isoxazoline derivative, pharmaceutically acceptable salts, esters and stereochemically isomeric forms thereof and the process for preparing the same. The derivative according to the present invention can be effectively used in treating diseases due to caspases, such as, for example the disease in which cells are abnormally died, dementia, cerebral stroke, AIDS, diabetes, gastric ulcer, hepatic injury by hepatitis, sepsis, organ transplantation rejection reaction and anti-inflammation.
Type:
Grant
Filed:
March 15, 2002
Date of Patent:
June 8, 2004
Assignee:
LG Chem Investment Ltd.
Inventors:
Eunice Eun-Kyeong Kim, Mi-Jeong Park, Tae-Hee Lee, Hye-Kyung Chang, Tae-Kyo Park, Chang-Yuil Kang, Young-Myeong Kim, Kwang-Yul Moon, Young-Leem Oh, Chang-Hee Min, Hyun-Ho Chung
Abstract: The present invention relates to low dielectric materials essential for a semiconductor having high density and high performance of the next generation, particularly to a process for preparing a porous interlayer insulating film having low dielectric constant containing pores with a size of a few nanometers or less.
The present invention provides a process for preparing a porous wiring interlayer insulating film having very low dielectric constant for a semiconductor device comprising the steps of a) preparing a mixed complex of pore-forming organic molecules and a matrix resin, b) coating the mixed complex on a substrate, and c) heating the mixed complex to remove the organic molecules therefrom, thereby forming pores inside the complex.
Abstract: The present invention relates to an improved somatotropin composition consisting of somatotropin having in vivo, at least one of lipid-soluble vitamins and at least one of pharmaceutically acceptable lubricants, which improves poor syringeability under cold temperature which has been a defect of the conventional somatotropin formulation using vitamins, and which shows at least the equivalent effect to that of the conventional formulation.
Abstract: The present invention relates to low dielectric materials essential for a semiconductor having high density and high performance of the next generation, particularly to a process for preparing a porous interlayer insulating film having low dielectric constant containing pores with a size of a few nanometers or less.
Type:
Application
Filed:
May 28, 2003
Publication date:
November 20, 2003
Applicant:
LG Chem Investment, Ltd., a Korea corporation
Abstract: A process for preparing a 1-substituted 5-hydroxymethylimidazole of the formula:
, wherein R represents alkyl, hydroxyalkyl, allyl, or substituted or unsubstituted arylmethyl or diarylmethyl,
comprising the step of reacting a 1-substituted 2-mercapto-5-hydroxymethylimidazole of the formula:
, wherein R is as defined above,
in the presence of a transition metal catalyst and an oxidizing agent in a solvent.
Type:
Grant
Filed:
March 5, 2002
Date of Patent:
October 7, 2003
Assignee:
LG Chem Investment Ltd.
Inventors:
Hyun-Ik Shin, Jay-Hyok Chang, Kyoo-Woong Lee, Hyun-Il Lee, Sung-Kee Kim, Do-Hyun Nam
Abstract: The present invention relates to a novel process for preparing pyrrole ester compounds, which are key intermediates in the preparation of farnesyl transferase inhibitors, an anti-cancer agent Horner-Emmons reaction of aldehyde compounds provides the corresponding &agr;,&bgr;-unsaturated esters, which without any separation and/or purification steps, are treated with toluenesutfonyl-methylisocyanate in the presence of base to give pyrrole esters in one-pot fashion.
Type:
Grant
Filed:
August 22, 2002
Date of Patent:
May 6, 2003
Assignee:
LG Chem Investment Ltd.
Inventors:
Hyun Ik Shin, Sung Tak Oh, Jay Hyok Chang, Kyoo Woong Lee