Abstract: A tunnel diode is disclosed having a highly P-doped layer of indium gallium arsenide formed on a highly N-doped layer of indium gallium arsenide which is supported on a semi-insulating substrate of indium phosphide. In an alternative embodiment, a tunnel diode is disclosed which has a highly P-doped layer of indium gallium arsenide formed on a highly N-doped layer of indium gallium arsenide which is supported on an N-doped substrate.
Type:
Grant
Filed:
November 4, 1991
Date of Patent:
July 6, 1993
Assignee:
Menlo Industries, Inc.
Inventors:
Chung-Yi Su, Sanehiko Kakihana, Domingo A. Figueredo
Abstract: A tunnel diode is disclosed having a highly P-doped layer of indium gallium arsenide formed on a highly N-doped layer of indium gallium arsenide which is supported on a semi-insulating substrate of indium phosphide. In an alternative embodiment, a tunnel diode is disclosed which has a highly P-doped layer of indium gallium arsenide formed on a highly N-doped layer of indium gallium arsenide which is supported on an N-doped substrate.
Type:
Grant
Filed:
November 9, 1990
Date of Patent:
March 3, 1992
Assignee:
Menlo Industries, Inc.
Inventors:
Chung-Yi Su, Sanehiko Kakihana, Domingo A. Figueredo
Abstract: Disclosed is a process for attaching a die to a package, which process utilizes a heat cycle in conjunction with a vacuum in the attachment process.
Abstract: Disclosed is a process for producing a field effect transistor to provide a uniformity of spacing between the gate and drain as well as the gate and source.