Abstract: A method of manufacturing a semitransparent display device includes the steps of forming a light shield film over a transparent display region on a transparent substrate, applying a photosensitive organic film over the transparent substrate coated with the light shield film, exposing and developing the photosensitive organic film to form a through hole extending through the photosensitive organic film in the transparent display region, removing the light shield film exposed through the through hole after forming the through hole, and forming a reflective film above the photosensitive organic film to form a reflective display region. Thereby, such a situation can be prevented that light reflected by a stage after passing through a TFT array substrate causes visible irregularities in thickness of an organic flattening film during exposure processing for forming the organic flattening film.
June 19, 2003
July 1, 2004
MITSUBISHI DENKI KABUSHIKI KAISHA; ADVANCED DISPLAY INC.