Patents Assigned to Nippon Mektron, Limited
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Publication number: 20110251427Abstract: A polyfluoroalkane carboxylic acid represented by the following general formula: CnF2n+1(CH2CF2)m(CF2CF2)l?1CF2COOM (M: an alkali metal, a NH4 group or H; n: an integer of 1 to 6; m: an integer of 1 to 4; and l: 1 or 2) can be produced by hydrolysis reaction of polyfluoroalkane carboxylic acid fluoride represented by the following general formula: CnF2n+1(CH2CF2)m(CF2CF2)l?1CF2COF , where its carboxylic acid salt can be formed as an alkali metal salt, or a NH4 salt. The polyfluoroalkane carboxylic acid (or its salt) can act as a surfactant having distinguished monomer emulsificability and latex stability when used as an emulsifying agent or as a dispersing agent for polymerization reaction of fluorine-containing monomers, or as an effective surfactant capable of enhancing the micelles solubility of fluorine-containing monomers such as vinylidene fluoride, etc., when used as an emulsifying agent or a dispersing agent for homopolymerization or copolymerization reaction of vinylidene fluoride.Type: ApplicationFiled: July 17, 2007Publication date: October 13, 2011Applicant: Nippon Mektron, LimitedInventors: Daisuke Murai, Takashi Enokida, Seiichiro Murata
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Patent number: 7763321Abstract: A novel polyimide copolymer, which is a copolymer comprising two kinds of tetracarboxylic acid dianhydrides consisting of (A) isopropylidene-bis(4-phenyleneoxy-4-phthalic acid) dianhydride and (B) 3,3?,4,4?-biphenyltetracarboxylic acid dianhydride, and one kind of a diamine consisting of (C) 6-amino-2-(p-aminophenyl)benzimidazole, or two or three kinds of diamines consisting of component (C) and (D) at least one kind of diamines consisting of bis(4-amino-phenyl)ether (D1) and phenylenediamine (D2), and a metal laminate manufactured by laminating said polyimide copolymer to a metallic foil. The metal laminate comprising the novel polyimide copolymer as a layer on the metallic foil has a low curling susceptibility to cause curling, twisting, warping, etc.Type: GrantFiled: October 31, 2008Date of Patent: July 27, 2010Assignee: Nippon Mektron LimitedInventors: Min Zuo, Jenq-Tain Lin
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Publication number: 20090133907Abstract: A novel polyimide copolymer, which is a copolymer comprising two kinds of tetracarboxylic acid dianhydrides consisting of (A) isopropylidene-bis(4-phenyleneoxy-4-phthalic acid) dianhydride and (B) 3,3?,4,4?-biphenyltetracarboxylic acid dianhydride, and one kind of a diamine consisting of (C) 6-amino-2-(p-aminophenyl)benzimidazole, or two or three kinds of diamines consisting of component (C) and (D) at least one kind of diamines consisting of bis(4-amino-phenyl)ether (D1) and phenylenediamine (D2), and a metal laminate manufactured by laminating said polyimide copolymer to a metallic foil. The metal laminate comprising the novel polyimide copolymer as a layer on the metallic foil has a low curling susceptibility to cause curling, twisting, warping, etc.Type: ApplicationFiled: October 31, 2008Publication date: May 28, 2009Applicant: NIPPON MEKTRON LIMITEDInventors: Min Zuo, Jenq-Tain Lin
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Publication number: 20090136671Abstract: A novel polyimide copolymer, which is a copolymer comprising two kinds of tetracarboxylic acid dianhydrides consisting of (A) isopropylidene-bis(4-phenyleneoxy-4-phthalic acid) dianhydride and (B) 3,3?,4,4?-biphenyltetracarboxylic acid dianhydride, and one kind of a diamine consisting of (C) 6-amino-2-(p-aminophenyl)benzimidazole, or two or three kinds of diamines consisting of component (C) and (D) at least one kind of diamines consisting of bis(4-amino-phenyl)ether (D1) and phenylenediamine (D2), and a metal laminate manufactured by laminating said polyimide copolymer to a metallic foil. The metal laminate comprising the novel polyimide copolymer as a layer on the metallic foil has a low curling susceptibility to cause curling, twisting, warping, etc.Type: ApplicationFiled: October 31, 2008Publication date: May 28, 2009Applicant: NIPPON MEKTRON LIMITEDInventors: Min Zuo, Jenq-Tain Lin
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Patent number: 7459216Abstract: A novel polyimide copolymer, which is a copolymer comprising two kinds of tetracarboxylic acid dianhydrides consisting of (A) isopropylidene-bis(4-phenyleneoxy-4-phthalic acid) dianhydride and (B) 3,3?,4,4?-biphenyltetracarboxylic acid dianhydride, and one kind of a diamine consisting of (C) 6-amino-2-(p-aminophenyl)benzimidazole, or two or three kinds of diamines consisting of component (C) and (D) at least one kind of diamines consisting of bis(4-amino-phenyl)ether (D1) and phenylenediamine (D2), and a metal laminate manufactured by laminating said polyimide copolymer to a metallic foil. The metal laminate comprising the novel polyimide copolymer as a layer on the metallic foil has a low curling susceptibility to cause curling, twisting, warping, etc.Type: GrantFiled: March 31, 2004Date of Patent: December 2, 2008Assignee: Nippon Mektron LimitedInventors: Min Zuo, Jenq-Tain Lin
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Patent number: 6770733Abstract: A film-formable polyimide copolymer, which comprises two kinds of tetracarboxylic acid dianhydride consisting of (A) pyromellitic acid dianhydride and (B) 3,3′,4,4′-benzophenonetetracarboxylic acid dianhydride, and (C) 6-amino-2-(p-aminophenyl)benzimidazole has a heat-resistant dimensional stability without any deterioration of mechanical properties inherent in the polyimide resin when used as a film.Type: GrantFiled: January 3, 2003Date of Patent: August 3, 2004Assignee: Nippon Mektron, LimitedInventors: Min Zuo, Jenq-Tain Lin
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Patent number: 6489436Abstract: Novel polyimide copolymer, which is a copolymer of isopropylidene-bis-(4-phenyleneoxy-4-phthalic acid)dianhydride and 6-amino-2-(p-aminophenyl)benzimidazole or a copolymer of two kinds of tetracarboxylic acid dianhydrides consisting of isopropylidene-bis-(4-phenyleneoxy-4-phthalic acid)dianhydride and 3,3′,4,4′-benxophenonetetracarboxylic acid dianhydride and 6-amino-2-(p-aminophenyl)benzimidazole, can form a metal laminate by direct lamination with metallic foils. The metal laminate can fully satisfy the peel strength.Type: GrantFiled: November 29, 2001Date of Patent: December 3, 2002Assignee: Nippon Mektron, LimitedInventors: Jenq-Tain Lin, Hiroyuki Sekine, Alexandre L'vovich Rusanov, Lyubov Borisovna Elchina, Calina Valentinovna Kazakova, Yakov Semionovich Vygodskii
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Patent number: 6486290Abstract: Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and a carboxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a carboxyl group-containing diamine and an aromatic or alicyclic diamine with a dicarboxylic acid anhydride having a 2,5-dioxotetrahydrofuryl group as one acid anhydride group, thereby once forming a polyamic acid, and subjecting the polyamic acid to polyimidization reaction. The resulting polyimide itself is soluble in low boiling organic solvents for, general purpose use, typically methyl ethyl ketone. A photosensitive composition comprising the polyimide, a photo crosslinking agent and a photo acid-generating agent forms a negative type polyimide pattern upon development with an aqueous alkali solution.Type: GrantFiled: February 26, 1999Date of Patent: November 26, 2002Assignee: Nippon Mektron, LimitedInventors: Lin-chiu Chiang, Jenq-Tain Lin, Nobuyuki Sensui
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Patent number: 6407282Abstract: Monoester monoacid fluoride of dicarboxylic acid is produced by allowing dicaroxylic acid fluoride represented by the following general formula: FOCCF(CF3)OCF2(A)p(CF2)qCOF where A is a bifunctional perfluorinated group having 1 to 10 carbon atoms; p is 0 or 1; and q is 0 or an integer of 1-10, to react with an alcohol having at least 3 carbon atoms, thereby esterifying the terminal CF2COF group. Such selective monoesterification reaction is effective for separation and purification of a dicarboxylic acid difluoride isomer mixture comprising symmetrical dicarboxylic acid difluoride and asymmetrical dicarboxylic acid difluoride.Type: GrantFiled: October 30, 2000Date of Patent: June 18, 2002Assignee: Nippon Mektron, LimitedInventors: Hiroaki Murata, Sunao Ikeda, Satoru Saito
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Patent number: 6387292Abstract: An anti-soil finishing agent is produced by copolymerizing a fluoroalkyl group-containing monomer with a hydrophilic group-containing monomer in polypropylene glycol having an average molecular weight of not more than about 1,000 or a mixture thereof with a water-soluble organic solvent having a boiling point of not less than 150° C. or a flash point of more than 61° C. The anti-soil finishing agent has not only a high flash point, but also distinguished frozen stability and high temperature stability (storage stability at a temperature of about 40˜50° C. higher than room temperature).Type: GrantFiled: July 28, 2000Date of Patent: May 14, 2002Assignee: Nippon Mektron, LimitedInventor: Chiaki Saito
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Patent number: 6380318Abstract: A modified acrylic rubber having distinguished molding characteristics and O-ring compression set characteristic is produced by mixing an acrylic rubber having reactive functional groups such as active chlorine groups, carboxylic groups, epoxy groups, active ester groups, etc. with an unsaturated compound reactive with the reactive functional group with heating in the absence of a solvent.Type: GrantFiled: June 11, 1998Date of Patent: April 30, 2002Assignee: Nippon Mektron, LimitedInventors: Kuniyoshi Saito, Eiji Komiya, Jun Okabe
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Patent number: 6365324Abstract: Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and a carboxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a carboxyl group-containing diamine and an aromatic or alicyclic diamine with a 4,4′-(hexafluoroisopropylidene)diphthalic acid dianhydride, thereby once forming a polyamic acid, and subjecting the polyamic acid to polyimidization reaction. The resulting polyimide itself is soluble in low boiling organic solvents for general purpose use, typically methyl ethyl ketone. A photosensitive composition comprising the polyimide, a photo crosslinking agent and a photo acid-generating agent forms a negative type polyimide pattern upon development with an aqueous alkali solution.Type: GrantFiled: March 26, 1999Date of Patent: April 2, 2002Assignee: Nippon Mektron, LimitedInventors: Lin-chiu Chiang, Jenq-Tain Lin, Nobuyuki Sensui
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Patent number: 6329471Abstract: A carboxyl group-containing fluorine copolymer is produced safely at a low cost by treating a vinylidene fluoride copolymer with a base and a peroxide, preferably in the presence of a phase-transfer catalyst such as a quaternary ammonium salt or a quaternary phosphonium salt.Type: GrantFiled: March 19, 1999Date of Patent: December 11, 2001Assignee: Nippon Mektron LimitedInventors: Fumiyo Mizuide, Haruyoshi Tatsu, Sergey Vasilievich Sokolov, Michail Vasiliyevich Zhuravlev, Igor Vladimirovich Kokotin, Olga Viktorinovna Blagodatova
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Publication number: 20010005742Abstract: A butenedioic acid monoalkyl ester-copolymerized acrylic elastomer containing 0.1-30% by mole of unreacted butenedioic acid monoalkyl ester on the basis of carboxyl groups copolymerized in the acrylic elastomer or its cross-linkable composition. The cross-linkable composition can give cross-linking products having distinguished vulcanization characteristics and stably showing good compression set characteristics.Type: ApplicationFiled: December 19, 2000Publication date: June 28, 2001Applicant: Nippon Mektron, LimitedInventors: Iwao Moriyama, Jun Okabe
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Patent number: 6245484Abstract: Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and a carboxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a carboxyl group-containing diamine and an aromatic or alicyclic diamine with a dicarboxylic acid anhydride having a 2,5-dioxotetrahydrofuryl group as one acid anhydride group, thereby once forming a polyamic acid, and subjecting the polyamic acid to polyimidization reaction. The resulting polyimide itself is soluble in low boiling organic solvents for general purpose use, typically methyl ethyl ketone. A photosensitive composition comprising the polyimide, a photo crosslinking agent and a photo acid-generating agent forms a negative type polyimide pattern upon development with an aqueous alkali solution.Type: GrantFiled: February 1, 2000Date of Patent: June 12, 2001Assignee: Nippon Mektron LimitedInventors: Lin-chiu Chiang, Jenq-Tain Lin, Nobuyuki Sensui
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Patent number: 6232039Abstract: Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and a carboxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a carboxyl group-containing diamine and an aromatic or alicyclic diamine with a 4,4′-(hexafluoroisopropylidene)diphthalic acid dianhydride, thereby once forming a polyamic acid, and subjecting the polyamic acid to polyimidization reaction. The resulting polyimide itself is soluble in low boiling organic solvents for general purpose use, typically methyl ethyl ketone. A photosensitive composition comprising the polyimide, a photo crosslinking agent and a photo acid-generating agent forms a negative type polyimide pattern upon development with an aqueous alkali solution.Type: GrantFiled: January 28, 2000Date of Patent: May 15, 2001Assignee: Nippon Mektron LimitedInventors: Lin-chiu Chiang, Jenq-Tain Lin, Nobuyuki Sensui
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Patent number: 6174928Abstract: A fluorinated oligomer having COOH groups at both end and a &rgr;50° value of 1,000 to 10,000 is produced by swelling a fluorine rubber crosslinking product in an organic solvent, followed by decomposition in the presence of a base and a peroxide. The obtained fluorinated oligomer is soluble in solvent and thus easy to separate from fillers, etc., and can be effectively used as a chain-elongating agent for epoxy resin, isocyanate resin, oxazoline resin, etc.Type: GrantFiled: March 26, 1999Date of Patent: January 16, 2001Assignee: Nippon Mektron, LimitedInventors: Fumiyo Mizuide, Haruyoshi Tatsu, Sergey Vasilievich Sokolov, Michail Vasiliyevich Zhuravlev, Igor Vladimirovich Kokotin, Olga Viktorinovna Blagodatova
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Patent number: 6160051Abstract: A fluorine-containing copolymer having a solvent resistance and a cold resistance is produced by subjecting vinylidene fluoride and at least one of other fluorine-containing monomers to copolymerization reaction in the presence of a polyfluoropolyether having iodo groups at both terminals, represented by the following formula:I(R)pCF(CF.sub.3)O[CF.sub.2 CF(CF.sub.3)O]mRf[OCF(CF.sub.3)CF.sub.2 ]nOCF(CF.sub.3)(R)pIwherein Rf: perfluoroalkylene group of C.sub.2 -C.sub.6 ; R: alkylene group or polyfluoroalkylene group of C.sub.2 -C.sub.8 ; these alkylene groups may contain an ether bond or may be an alkyleneamide-containing or phenylene diamide-containing group; m+n: 20 or more; and p: 0 or 1. The copolymerization reaction is carried out preferably in the presence of a bromine-containing or iodine-containing monomer compound.Type: GrantFiled: May 20, 1999Date of Patent: December 12, 2000Assignee: Nippon Mektron, LimitedInventors: Haruyoshi Tatsu, Yasuyoshi Hisamatsu
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Patent number: 6156849Abstract: An acrylic elastomer composition, which comprises an acrylic elastomer obtained by copolymerization with 0.1 to 10% by weight of fumaric acid mono-lower alkyl ester on the basis of total monomer mixture, an aromatic diamine compound vulcanizing agent and a guanidine compound vulcanization promoter is distinguished in metal corrosion resistance, oil resistance, compression set characteristics, etc. and is effectively applicable as a vulcanization molding material for seal members or hose members to be used at contact sites with metal members, oil, etc.Type: GrantFiled: September 4, 1998Date of Patent: December 5, 2000Assignee: Nippon Mektron, LimitedInventors: Iwao Moriyama, Jun Okabe
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Patent number: 6153675Abstract: A water-dispersible, water- and oil-repellent agent, which comprises an aqueous emulsion comprising a copolymer of a fluoroalkyl group-containing monomer with vinylidene chloride or benzyl (meth)acrylate and a carboxyl group-containing, water-soluble polymer, dispersed in water by a nonionic surfactant, preferably the carboxyl group-containing, water-soluble polymer is used together with a sugar alcohol, contains no organic solvent and has a distinguished freeze-thaw stability.Type: GrantFiled: August 13, 1998Date of Patent: November 28, 2000Assignee: Nippon Mektron, LimitedInventors: Kazuhiro Yamamoto, Yuzuru Ishida