Abstract: A resist underlayer film-forming composition contains: (A) a compound having a partial structure represented by Formula (1). In Formula (1), R1 and R2 each denote a hydrogen atom, an alkyl group having 1-10 carbon atoms or an aryl group having 6-40 carbon atoms, X denotes an alkyl group having 1-10 carbon atoms, a hydroxyl group, an alkoxy group having 1-10 carbon atoms, an alkoxycarbonyl group having 1-10 carbon atoms, a halogen atom, a cyano group, a nitro group or a combination of these, Y denotes a direct bond, an ether bond, a thioether bond or an ester bond, n is an integer between 0 and 4, and * denotes a site of bonding to a residue of compound (A)); and a solvent.

Abstract: An aqueous sol used in CO2 foam flooding, one of EOR flooding methods for recovering crude oil by injection into the oil reservoir of an onshore or offshore oil field, the aqueous sol increasing foam stability even over a substantial period of time, at high temperatures and pressures, and in salt water, thus improving crude oil recovery rate. The aqueous sol for increasing stability of froth or emulsion in a mixture containing carbon dioxide, water, and oil in CO2 foam flooding of EOR, the sol including silica particles having an average particle diameter of 1 to 100 nm as measured by dynamic light scattering and having surfaces at least partially coated with a silane compound having a hydrolyzable group, the silica particles serving as a dispersoid and dispersed in an aqueous solvent having a pH of 1.0 to 6.0 serving as a dispersion medium.

Abstract: The present invention provides a culture method of cells and/or tissues including culturing cells and/or tissues in a suspended state by using a medium composition having an effect of preventing sedimentation of cells and/or tissues, which is afforded by substantially retaining the cells and/or tissues, without substantially increasing the viscosity of the solution, by nanofibers which have been added to the solution and uniformly dispersed in the liquid medium, and the like.

Abstract: An aqueous sol used in CO2 foam flooding, one of EOR flooding methods for recovering crude oil by injection into the oil reservoir of an onshore or offshore oil field, the aqueous sol increasing foam stability even over a substantial period of time, at high temperatures and pressures, and in salt water, thus improving crude oil recovery rate. The aqueous sol for increasing stability of froth or emulsion in a mixture containing carbon dioxide, water, and oil in CO2 foam flooding of EOR, the sol including silica particles having an average particle diameter of 1 to 100 nm as measured by dynamic light scattering and having surfaces at least partially coated with a silane compound having a hydrolyzable group, the silica particles serving as a dispersoid and dispersed in an aqueous solvent having a pH of 1.0 to 6.0 serving as a dispersion medium.

Abstract: A coating composition can form a cured film which has excellent transparency, hardness, abrasion resistance, adhesion, and weather resistance. The stability of the composition itself is excellent. An optical member has a cured film formed from the coating composition.

Abstract: A method for manufacturing a wafer having a functional film, with an outer peripheral part of a top face of the wafer annularly exposed, the method including: spin-coating a high-viscosity coating material that contains a functional film constituent over the top face of the wafer to form a coating film; subsequently, supplying a cleaning liquid to the outer peripheral part of the top face of the wafer and kept rotated to remove the coating film on the outer peripheral part of the top face of the wafer; subsequently, heating the coating film on the wafer to form a fluidity suppressed film; subsequently, supplying a cleaning liquid to the outer peripheral part of the top face of the wafer having the fluidity suppressed film and kept rotated to remove the fluidity suppressed film on the top face of the wafer; and subsequently, heating the fluidity suppressed film on the wafer.

Abstract: An object of the present invention is to provide an external pharmaceutical composition that imparts light stability to a ?-blocker (particularly propranolol hydrochloride) and is excellent in the balance between transdermal absorbability and skin retention, and the present invention provides a complex composed of a water-soluble ?-blocker and lecithin, a method for producing the complex, an external pharmaceutical composition containing the complex, and the like. The complex or a dispersion in oil containing the complex is applied to an existing pharmaceutical external preparation formulation (for example, W/O type cream), and a complex containing a ?-blocker is allowed to be present in the O phase, thereby avoiding contact with water or dissolved oxygen and reducing the risk of photolysis.

Abstract: A method for producing a silica sol containing a small amount of metal impurities and wherein colloidal silica having an elongated particle shape is dispersed in a solvent, by addition of a compound as an anion source and ammonia as an alkali source and heating of the resultant mixture at a predetermined temperature, includes the following steps: (a) preparing a raw material liquid by adding at least one compound as an anion source selected from the group of inorganic acids, organic acids, and ammonium salts of these acids, and ammonia to a silica sol as a raw material having SiO2 of 1% by mass to 30% by mass and a pH of 2 to 5 so the mass ratio of the compound to SiO2 is 0.5% to 1.9%; and (b) heating the raw material liquid prepared in step (a) at 80° C. to 200° C. for 0.5 hours to 20 hours.

Abstract: An isoxazoline-substituted benzamide compound, and the salt thereof. For example, a compound having the following formula: and pesticides characterized by containing the compound as an active ingredient.

Abstract: A composition for forming a resist underlayer film includes: a solvent; and a polymer containing a unit structure (A) represented by formula (1). The composition is reduced in the amount of sublimated substances that contaminate a device, is improved in the in-plane uniform coatability of a film to be coated thereon, exhibits satisfactory resistance to a chemical solution used in a resist under layer film, and can exhibit other satisfactory properties.

Abstract: A step substrate coating composition for efficiently forming a coating that is capable of filling and flattening a pattern. A step substrate coating composition comprising a compound (A) of a main agent, a crosslinking agent, and a solvent, the compound (A) including a partial structure expressed by formula (A-1) (where the broken line represents bonding with an aromatic ring, the aromatic ring forming a polymer skeleton or a monomer, and n represents an integer of 1-4).

Abstract: The laminate of the invention has a semiconductor substrate, a support substrate, a release layer disposed so as to come into contact with the semiconductor substrate, and an adhesive layer disposed between the support substrate and the release layer, characterized in that the release layer is a film formed from a releasing agent composition containing a polyorganosiloxane component essentially containing polydimethylsiloxane; the polyorganosiloxane component has a viscosity of 5.50 × 103 Pa·s to 0.75 × 103 Pa·s, as measured at 25° C.; and the film has a thickness of 0.01 µm to 4.90 µm.

Abstract: A composition for forming a resist underlayer film and a method for producing a resist pattern, the method using the composition for forming a resist underlayer film; and a method for producing a semiconductor device. A resist underlayer film-forming composition which contains an organic solvent and a polymer that has an end blocked with a compound (A), wherein: the polymer is derived from compound (B) that is represented by formula (11). (In formula (11), Y1 represents a single bond, an oxygen atom, a sulfur atom, an alkylene group having from 1 to 10 carbon atoms, the alkylene group being optionally substituted by a halogen atom or an aryl group having from 6 to 40 carbon atoms, or a sulfonyl group; each of T1 and T2 represents an alkyl group having from 1 to 10 carbon atoms; and each of n1 and n2 independently represents an integer from 0 to 4.

Abstract: For example, a triazine ring-containing polymer containing a repeating unit structure represented by formula (25) below, wherein Ra represents R102 or R103, R102 represents a fluorine atom or a fluoroalkyl group having 1 to 10 carbon atoms, and R103 represents a crosslinking group.

Abstract: A resist underlayer film-forming composition exhibiting high etching resistance, high heat resistance, and excellent coatability; a resist underlayer film obtained using the resist underlayer film-forming composition and a method for producing the same; a method for forming a resist pattern; and a method for producing a semiconductor device. A resist underlayer film-forming composition including a polymer and a compound represented by Formula (1) as a solvent. In Formula (1), R1, R2, and R3 in Formula (1) each independently represent a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, which may be interrupted by an oxygen atom, a sulfur atom, or an amide bond, and R1, R2, and R3 may be the same or different and may bond to each other to form a ring structure.

Abstract: An additive capable of suppressing generation of free water from a cement slurry even under a high temperature environment of 150° C. or more and a silica-based additive that suppresses, in a cement slurry for cementing in oil fields and gas oil fields, free water under high temperature and high pressure environments of 100° C. or more, the silica-based additive containing an aqueous silica sol containing nanosilica particles with a true density of 2.15 g/cm3 or more and less than 2.30 g/cm3, and a cement slurry for cementing that contains the silica-based additive.

Abstract: A lithographic process for the production of a semiconductor device has recently caused a problem in terms of generation of a sublime component (sublimate) derived from a low-molecular-weight compound (e.g., polymer resin, crosslinking agent, or crosslinking catalyst) during baking upon formation of a resist underlayer film from a resist underlayer film-forming composition. The resist underlayer film-forming composition of the present invention uses an organic acid having a fluoroalkyl group or an organic acid salt having a fluoroalkyl group, as a crosslinking catalyst, and thus the resist underlayer film-forming composition containing the crosslinking catalyst can effectively prevent generation of a sublimate derived from a low-molecular-weight component contained in the resist underlayer film during formation of the film.

Abstract: A protective film formation composition contains a polymer having a unit structure represented by formula (1-1), a compound or a polymer having phenolic hydroxy group other than catechol, (C) a thermal acid generator, and (D) a solvent. (Ar represents a benzene, naphthalene, or an anthracene ring; R1 represents a hydroxy, mercapto,amino, halogeno, or an alkyl group that has 1-10 carbon atoms and that may be substituted or interrupted by a hetero atom and may be substituted by a hydroxy group; n1 represents an integer of 0-3; L1 represents a single bond or an alkylene group having 1-10 carbon atoms; E represents an epoxy group; when n2=1, T1 represents a single bond or an alkylene group having 1-10 carbon atoms and may be interrupted by an ether bond, an ester bond, or an amide bond; and when n2=2, T1 represents a nitrogen atom or an amide bond.

Abstract: The present invention is directed to new crystalline forms of Pitavastatin hemicalcium salt, referred to hereinafter as polymorphic Forms A, B, C, D, E and F, as well as the amorphous form. Furthermore, the present invention is directed to processes for the preparation of these crystalline forms and the amorphous form and pharmaceutical compositions comprising these crystalline forms or the amorphous forms.

Abstract: A method for producing a drug substance of crystalline pitavastatin calcium excellent in stability, is presented. In the production of a compound (pitavastatin calcium) represented by the formula (1): The water content is adjusted to a level of from 5 to 15%, and the crystal form is controlled to be crystal form A, thereby to obtain a drug substance excellent in stability.