Abstract: An interference display unit with a first electrode, a second electrode and posts located between the two electrodes is provided. The characteristic of the interference display unit is that the second electrode's stress is released through a thermal process. The position of the second electrode is shifted and the distance between the first electrode and the second electrode is therefore defined. A method for fabricating the structure described as follow. A first electrode and a sacrificial layer are sequentially formed on a substrate and at least two openings are formed in the first electrode and the sacrificial layer. A supporter is formed in the opening and the supporter may have at least one arm on the top portion of the supporter. A second electrode is formed on the sacrificial layer and the supporter and a thermal process is performed. Finally, The sacrificial layer is removed.

Abstract: A structure of a micro electro mechanical system (MEMS) for a planar display apparatus is described. The MEMS structure used as a transmissible or reflective display device has a shielding electrode and a control electrode. The shielding electrode has a low stress electrode and a high stress electrode. The high stress electrode connected to the low stress electrode is a movable element. The control electrode is located below the high stress electrode. The control electrode attracts the high stress electrode when a voltage is applied to the control electrode. The high stress electrode deforms and the position of the low stress electrode is altered.

Abstract: A color changeable pixel comprises a first plate, a second plate and a third plate. The three plates are settled in parallel. The second plate is a deformable and reflective plate. An incident light from one side of the first plate is modulated and only specific frequency light reflects by the second plate. The frequency of the reflected light is related to the distance between the first plate and the second plate. The second plate shifts by the voltage added on the third plate to change the distance between the first plate and the second plate. Therefore, the frequency of the reflected light is altered.

Abstract: An optical interference reflective element has a light-incident electrode and a light-reflective electrode, and each or both of the two electrodes are made of a display part and a wiring part which are electrically connected to each other with a connection part. A plurality of the interference reflective elements are connected to form an electrode line by the wiring parts, and the electrode line is used in an optical interference reflective structure formed by the optical interference reflective elements that is operated in a passive matrix mode.

Abstract: An optical interference display unit, at least comprises a light-incidence electrode and a light-reflection electrode located on a transparent substrate. The light-incidence electrode at least comprises a transparent conductive layer and a dielectric layer. The light-reflection electrode at least comprises an absorption layer and a reflective layer.

Abstract: A protection layer covers the cavity-side surface of a bottom electrode of a interferometric modulation pixel. Consequently, the protective layer protects the surface of the bottom electrode while a sacrificial layer between the bottom electrode and the top electrode is being etched. Thus, the distance between the bottom electrode and the top electrode is maintained, thereby ensuring that only the light with desired wavelengths is reflected by the interferometric modulation pixel.

Abstract: An optical interference color display is provided. The optical interference color display comprises a color filtering substrate, a patterned support layer, a plurality of first electrodes, a plurality of optical films and a plurality of second electrodes. The patterned support layer and the first electrodes are positioned on the color filtering substrate with the patterned support layer between the first electrodes. The optical films are positioned on the first electrodes. The second electrodes is positioned over the first electrodes and supported through the patterned support layer such that an air gap with identical thickness is produce between every pair of second electrode and first electrode. Using the color filtering substrate to show color images, air gap between the first electrodes and the second electrodes are identical and hence simplifies the manufacturing process.

Abstract: A micro electro mechanical system display cell comprises a substrate, black matrix layer, a first electrode, a second electrode and supporters. The black matrix layer is located on the substrate and the first electrode is bridged between the black matrixes. The supporters are located on the black matrix layers and located between the two electrodes. The black matrix layers are used to prevent the light leakage between the second electrodes and between the first electrode and the second electrode.

Abstract: A structure of an interference display cell is provided. The cell comprises a first plate and a second plate, wherein a support is located between the first plate and the second plate. The second plate is a deformable and reflective plate. An incident light from one side of the first plate is modulated and only specific frequency light reflects by the second plate. The frequency of the reflected light is related to the distance between the first plate and the second plate. The support has at least one arm. The arm's stress makes the arm hiking upward or downward. The distance between the first plate and the second plate is also changed. Therefore, the frequency of the reflected light is altered.

Abstract: A structure of a structure release and a manufacturing method are provided. The structure and manufacturing method are adapted for an interference display cell. The structure of the interference display cell includes a first electrode, a second electrode and at least one supporter. The second electrode has at least one hole and is arranged about parallel with the first electrode. The supporter is located between the first electrode and the second electrode and a cavity is formed. In the release etch process of manufacturing the structure, an etchant can pass through the hole to etch a sacrificial layer between the first and the second electrodes to form the cavity; therefore, the time needed for the process becomes shorter.

Abstract: A structure of a thin film transistor (TFT) liquid crystal display (LCD) device including plural conductive beads and a manufacturing method thereof are provided. The manufacturing method includes the steps of (a) providing an insulated substrate, (b) forming a TFT structure and a transparent electrode structure on the insulated substrate wherein the transparent electrode structure is connected to a source/drain region of the TFT structure, and (c) forming a thin film structure including plural conductive beads on the transparent electrode structure.

Abstract: A structure of a structure release and a manufacturing method are provided. The structure and manufacturing method are adapted for an interference display cell. The structure of the interference display cell includes a first electrode, a second electrode and at least one supporter. The second electrode has at least one hole and is arranged about parallel with the first electrode. The supporter is located between the first electrode and the second electrode and a cavity is formed. In the release etch process of manufacturing the structure, an etchant can pass through the hole to etch a sacrificial layer between the first and the second electrodes to form the cavity; therefore, the time needed for the process becomes shorter.

Abstract: A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm's stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.

Abstract: A scan driving circuit and driving method for active matrix liquid crystal display is disclosed. The scan driving circuit comprises a switching circuit including a plurality of low-temperature poly-silicon MOS devices of same conductivity type formed on the liquid crystal display panel and a plurality of control signal input ports connected to the switching circuit, in which the number of the control signal input ports is less than that of the scan lines of the liquid crystal display panel, and the switching circuit is coupled between the scan lines and the control signal input ports. The driving method comprises providing a plurality of control signals consisted of sequential or back-and-forth pulses coupled to the control signal input ports from outside of the panel for operation of the switching circuit to drive the scan lines.

Abstract: An optical interference display plate at least comprises a light-incidence electrode and a light-reflection electrode. The light-incidence electrode at least comprises an absorption layer and a dielectric layer. A material of the absorption layer does not comprises metallic material.

Abstract: An optical-interference type reflective panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple supporting layers are firstly formed. Then, a plurality of first conductive optical film stacks, spacing layers and multiple second conductive optical film stacks are sequentially formed on the substrate. Finally, once the spacing layers are removed, optical-interference regulators are formed. Since said supporting layers forming step is prior to the first conductive optical film stacks, a precise back-side exposing step is not necessary so that the making procedure of the panel is simplified.

Abstract: An optical-interference type display panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple first conductive optical film stacks, supporting layers and multiple second conductive optical film stacks are formed. The substrate further has a plurality of connecting pads consisting of a transparent conductive film of the first conductive optical film stacks. Since the transparent conductive film is made of indium tin oxide, these connecting pads have the excellent anti-oxidation ability at their surface.

Abstract: Disclosed is a metal contact structure and method for a thin film transistor array in liquid crystal display in order to prevent source/drain electrode metal layer from plasma damage and oxide insulator formation thereon during contact hole process, such that low contact resistance is obtained between the source/drain electrode metal layer and top-ITO conductive layer, wherein a thin film transistor structure is formed on a substrate and a metal oxide conductive film is covered on the source/drain electrode metal layer of the thin film transistor structure before an insulative passivation layer is deposited over the thin film transistor structure.

Abstract: A manufacturing method for optical interference type panel is provided. A patterned supporting layer is formed on a transparent substrate, and then a first electrode layer and an optical film are formed sequentially on the supporting layer and the transparent substrate. A sacrificial material layer is formed on the optical layer, and then, a backside exposure process is performed by using the supporting layer as a mask to pattern the sacrificial material layer. A portion of the patterned sacrificial material layer is removed to expose the optical film above the supporting layer to form a sacrificial layer, and then a second electrode layer is formed on the sacrificial layer between the adjacent supporting layers and portion of the optical film. Afterwards, the sacrificial layer is removed.

Abstract: There is provided a reflection type/transflection type thin film transistor liquid crystal display, including an insulating substrate, a thin film transistor formed on the insulating substrate, a transparent electrode made of indium-tin-oxide formed on the thin film transistor and electrically contacted with a source region and a drain region of the thin film transistor, and a curved conducting structure with an inclination of 3 to 20 degrees formed on the transparent electrode.