Abstract: A monomer having formula (I): wherein in formula (I), groups and variables are the same as described in the specification.

Abstract: A polymer composite comprising quantum dots. The polymer composite comprises: (a) quantum dots; (b) a first polymer having a molecular weight from 1,000 to 100,000 and a solubility parameter from 12 to 17 (J/cm3)1/2; (c) a second polymer comprising polymerized units of a first compound comprising at least one readily polymerizable vinyl group and having a molecular weight from 72 to 500, wherein the second polymer has a solubility parameter from 16.5 to 20 (J/cm3)1/2; and (d) a third polymer comprising polymerized units of a second compound comprising at least two readily polymerizable vinyl groups and having a molecular weight from 72 to 2000; wherein the first polymer encapsulates the quantum dots; wherein a readily polymerizable vinyl group is part of a (meth)acrylate ester group or is attached directly to an aromatic ring.

Abstract: Certain cyclopentadienone monomers having polar moieties are useful in forming polyarylene resins having improved solubility in certain organic solvents and are useful in forming polyarylene resin layers in electronics applications.

Abstract: A method of providing spatial diversity for critical data delivery in a beamformed mmWave small cell is proposed. The proposed spatial diversity scheme offers duplicate or incremental data/signal transmission and reception by using multiple different beams for the same source and destination. The proposed spatial diversity scheme can be combined with other diversity schemes in time, frequency, and code, etc. for the same purpose. In addition, the proposed spatial diversity scheme combines the physical-layer resources associated with the beams with other resources of the same or different protocol layers. By spatial signaling repetition to avoid Radio Link Failure (RLF) and Handover Failure (HOF), mobility robustness can be enhanced. Mission-critical and/or time-critical data delivery can also be achieved without relying on retransmission.

Abstract: Cyanide-free acidic silver electroplating compositions include one or more acids or salts of tellurium and may be used to electroplate matte silver deposits on metals, such as nickel, copper or copper alloys. Matte silver metal may be electroplated at conventional plating rates or at high plating rates, such as in reel-to-reel and jet plating. The cyanide-free acidic silver electroplating compositions may be used to electroplate matte silver in the manufacture of electronic components such as electrical connectors, finishing layers for metallic substrates, optical devices and decorative applications.

Abstract: A polymer resin comprising: (a) quantum dots, (b) a compound of formula (I) (I) wherein R1 is hydrogen or methyl and R2 is a C6-C20 aliphatic polycyclic substituent, and (c) a block or graft copolymer having Mn from 50,000 to 400,000 and comprising from 10 to 100 wt % polymerized units of styrene and from 0 to 90 wt % of a non-styrene block; wherein the non-styrene block has a van Krevelen solubility parameter from 15.0 to 17.5 (J/cm3)1/2.

Abstract: Curable homopolymers formed from monomers having two 2-naphthol moieties are useful as underlayers in semiconductor manufacturing processes.

Abstract: A single phase liquid formulation useful for producing an organic charge transporting film; said formulation comprising: (a) a first polymer resin having Mw less than 5,000; (b) a second polymer resin having Mw at least 7,000; (c) a first solvent having a boiling point from 50 to 165° C.; and (d) a second solvent having a boiling point from 180 to 300° C.

Abstract: The present invention provides processes for preparing silanylamines, such as disilanylamines and polysilanylamines, and compositions comprising the silanylamines. In one embodiment, the present invention provides processes for preparing a silanylamine compound, the processes comprising reacting a starting compound of general formula RR1N—(SixH2x+1) with an amine compound of general formula R2R3NH to produce the silanylamine compound of general formula R2mR3n—N(SixH2+1)3-m-n.

Abstract: A curable composition comprising an epoxy-siloxane oligomer comprising as polymerized units one or more difunctional silane monomers of formula (1) and one or more trifunctional silane monomers of formula (2) in a mole ratio of 95:5 to 10:30 Si(R1)(R2)(Y1)2??(1) SiR3(Y2)3??(2) wherein R1, R2, and R3 are independently chosen from a C5-20-aliphatic group comprising an oxirane ring fused to an alicyclic ring, C1-20-alkyl, C6-30-aryl group, and a C5-20-aliphatic group having one or more heteroatoms; each Y1 and Y2 is independently chosen from halogen, C1-4-alkoxy, and —O—C1-4-acyl group; wherein at least one of R1, R2, and R3 is a C5-20-aliphatic group comprising an oxirane ring fused to an alicyclic ring; (b) organic particles having an average diameter of 50 to 250 nm; (c) a reactive carrier having one or more epoxy moieties or oxetane moieties; (d) a curing agent; and (e) one or more organic solvents, and methods of forming cured coatings using such compositions are described.

Abstract: Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.

Abstract: A photoacid generator compound having formula (I): wherein, in formula (I), groups and variables are the same as described in the specification.

Abstract: An ion exchange resin comprises a crosslinked resin and a salt covalently bonded to a carbon of the resin, wherein the salt comprises a first non-metallic cation and a first counteranion, wherein the first counteranion comprises a second non-metallic cation and a thiosulfate counteranion, and wherein the ion exchange resin is essentially free of metals. The ion exchange resin finds particular use in the removal of impurities from solutions that are useful in the manufacture of semiconductor devices.

Abstract: Compositions for forming thin, silicon-containing antireflective coatings and methods of using these compositions in the manufacture of electronic devices are provided. Silicon-containing antireflective coatings formed from the these compositions can be easily removed during processing without the need for a separate removal step.

Abstract: The present invention provides a quantum dot light emitting diode comprising i) an emitting layer of at least one semiconductor nanoparticle made from semiconductor materials selected from the group consisting of Group II-VI compounds, Group II-V compounds, Group III-VI compounds, Group III-V compounds, Group IV-VI compounds, Group I-III-VI compounds, Group II-IV-VI compounds, Group II-IV-V compounds, or any combination thereof; and ii) a polymer for hole injection or hole transport layer; and the polymer comprises, as polymerized units, at least one or more monomers having a first monomer structure comprising a) a polymerizable group, b) an electroactive group with formula NAr1Ar2Ar3 wherein Ar1, Ar2 and Ar3 independently are C6-C50 aromatic substituents, and (c) a linker group connecting the polymerizable group and the electroactive group.

Abstract: New photoacid generator compounds (“PAGs”) are provided that comprise a cholate moiety and photoresist compositions that comprise such PAG compounds.

Abstract: Acoustic wave sensors comprise: a piezoelectric layer, first and second electrodes arranged with the piezoelectric layer in a piezoelectric transducer circuit; and a polymeric sensing layer for adsorbing a gas-phase analyte, the adsorption of which analyte causes a change in resonant frequency of the piezoelectric transducer circuit, wherein the polymeric sensing layer comprises: (a) a polymer chosen from substituted or unsubstituted: polyarylenes comprising the reaction product of monomers comprising a first monomer comprising an aromatic acetylene group and a second monomer comprising a cyclopentadienone group; polyamides; polypyrazoles; or novolacs; or a cured product thereof; (b) a polymer chosen from substituted or unsubstituted: polyamic acids; or polyamic acid-polyimide copolymers; (c) a polymer formed from one or more monomers comprising a monomer comprising a polar group-substituted arylcyclobutene group, or a cured product thereof; or (d) a polymer comprising polymerized units of a monomer chosen fr

Abstract: Aromatic resin polymers and compositions containing them are useful as underlayers in semiconductor manufacturing processes.

Abstract: Organic coating compositions, particularly antireflective coating compositions for use with an overcoated photoresist, are provided that comprise that comprise a crosslinker component that comprises a structure of the following Formula (I):

Abstract: In a first aspect, methods are provided that comprise: (a) applying a curable composition on a substrate; (b) applying a hardmask composition above the curable composition; (c) applying a photoresist composition layer above the hard mask composition, wherein one or more of the compositions are removed in an ash-free process. In a second aspect, methods are provided that comprise (a) applying an organic composition on a substrate; (b) applying a photoresist composition layer above the organic composition, wherein the organic composition comprises a material that produce an alkaline-soluble group upon thermal and/or radiation treatment. Related compositions also are provided.