Abstract: It is an object to prevent adhesion of a processing liquid to a non-processing region of a substrate. In order to achieve the object, a substrate processing apparatus includes a substrate rotating mechanism, a discharging portion for discharging a processing liquid to a substrate, a moving portion for moving a discharging portion, and a controller. The discharging portion starts to discharge the processing liquid at a first position and is moved to a second position. The first position is a position of the discharging portion where a section of a passage of the discharging portion is projected onto a first region, and the second position is a position of the discharging portion where the section of the passage is projected onto a second region. The first region is a region on the peripheral edge side of the substrate from the second region.
Abstract: Provided is a substrate cleaning method for cleaning a substrate having an oxide film on the surface thereof. The method includes a partial etching step of etching the oxide film to a predetermined film thickness, and a physical cleaning step of executing physical cleaning on the surface of the substrate after the partial etching step. The oxide film may be a natural oxide film with particles at least partially taken into the film. In this case, the partial etching step may either expose the particles from the natural oxide film or increase the exposed portion from the natural oxide film. The physical cleaning may remove, by physical action, the particles exposed from the natural oxide film while leaving the natural oxide film on the surface of the substrate.
Abstract: A substrate on which a processing film made of a directed self-assembly material is formed is placed on a holding plate incorporating a preheating mechanism, and is preheated. A low oxygen atmosphere surrounds the substrate. A preheating temperature is a temperature at which the directed self-assembly material comprised of two types of polymers is phase-separated. By preheating the processing film, the two types of polymers are phase-separated to form a fine pattern. The processing film is irradiated with flashes of light from flash lamps while being preheated. This increases the fluidity of the polymers constituting the processing film to achieve the formation of a fine pattern while suppressing the occurrence of defects.
Abstract: On the basis of a first calibration point corresponding to a reflectance of a state where a target ink or the like is applied on a transparent ink and a second calibration point corresponding to a reflectance of a state where the target ink is applied on a black ink that is applied on a base material, a third calibration point corresponding to a reflectance of a state where the target ink is solidly applied on a background having an average reflectance is obtained. A reflectance as a prediction value of a color corresponding to the reflectance of the entire background is obtained on the basis of the third calibration point and a fourth calibration point corresponding to a reflectance of a state where the target ink is applied on the base material.
Abstract: A heating plate is stored in a chamber. With a solvent containing gas present in the chamber, a substrate on which a DSA film is formed is held at a position further upward than the heating plate. Thus, neutralization of an atmosphere is performed at a temperature at which microphase separation does not occur. Thereafter, with the solvent containing gas present in the chamber, the substrate is held on an upper surface of the heating plate. Thus, thermal processing is performed on the DSA film on the substrate.
August 4, 2017
Date of Patent:
November 10, 2020
SCREEN Holdings Co., Ltd.
Masahiko Harumoto, Masaya Asai, Yuji Tanaka, Koji Kaneyama
Abstract: A substrate treating device immerses substrates in a mixed-acid aqueous solution, and performs an etching treatment on the substrates. The substrate treating device includes: a treating tank that stores the mixed-acid aqueous solution; a treating-liquid exchange unit that performs a total liquid exchange of the mixed-acid aqueous solution based on a life time of the mixed-acid aqueous solution in the treating tank; a detecting unit that detects a pure-water concentration of the mixed-acid aqueous solution; a concentration control unit that controls, based on the pure-water concentration detected by the detecting unit, the pure-water concentration such that the pure-water concentration becomes a predetermined target concentration by supplying pure water to the mixed-acid aqueous solution in the treating tank; and a target-value change unit that changes a lower-side standard value (a target concentration).
Abstract: A development liquid is discharged from a development liquid nozzle having one discharge port extending continuously in one direction to the substrate. The development liquid nozzle is fixed such that the development liquid is supplied to a reference straight line on an upper surface of the substrate, and is fixed such that a liquid receiving region that receives the development liquid on the upper surface of the substrate extends in a direction inclined with respect to the reference straight line, the reference straight line passing through a rotational center of the substrate. The development liquid nozzle is moved in a direction of the reference straight line. The liquid receiving region has one end and another end. The other end is located farther away from the rotational center of the substrate than the one end, and is located farther downstream in the rotation direction of the substrate than the one end.
Abstract: A substrate treatment apparatus includes a brush moving mechanism which moves a shaft to which a cleaning brush is attached. The brush body includes a substrate contact portion of a pillar-shaped portion. The substrate treatment apparatus further includes a correcting member and a relatively-positioning mechanism. When the correcting member is placed in a target position, a contact portion of the correcting member overlaps an object portion which is a combination of a design contact portion and a belt-shaped annular portion in an outer surface of a design pillar-shaped portion of a design body of a design brush. The contact portion is formed to have an inverted shape of the object portion of the design brush, and a portion of the contact portion, which corresponds to the belt-shaped annular portion, is a center-axis facing surface which faces a center axis of the shaft.
Abstract: A substrate processing apparatus includes a substrate heating unit arranged to heat the underside of a substrate while supporting the substrate thereon and an attitude changing unit arranged to cause the substrate heating unit to undergo an attitude change between a horizontal attitude and a tilted attitude. In an organic solvent removing step to be performed following a substrate heating step of heating the substrate, the substrate heating unit undergoes an attitude change to the tilted attitude so that the upper surface of the substrate becomes tilted with respect to the horizontal surface.
Abstract: Disclosed is a substrate treating apparatus including a substrate holder, a rotating drive unit, a treatment liquid supplying unit, an exterior cup, and an interior cup. The interior cup is movable between a collection position where the interior cup collects the treatment liquid and a retracting position where the exterior cup collects the treatment liquid, and includes an interior cup main body with an annular contour, a liquid outlet in the interior cup main body for draining the treatment liquid in the interior cup main body, and an exhaust port in the interior cup main body for exhausting gas in the interior cup main body. The exterior cup includes an exterior cup main body with an annular contour, a liquid outlet in the exterior cup main body for draining the treatment liquid in the exterior cup main body, and an exhaust port in the exterior cup main body for exhausting gas in the exterior cup main body.
January 9, 2018
Date of Patent:
October 27, 2020
SCREEN HOLDINGS CO., LTD.
Masahito Kashiyama, Koji Nishiyama, Kota Kabune
Abstract: A chemical solution feeder feeds a chemical solution to a predetermined feed target, and includes: a feed flow path that is connected at its one end to a supply source of a chemical solution at room temperature and at its other end to a feed target, to guide the chemical solution to the feed target from the supply source; a first filter that removes particles in a chemical solution at room temperature injected from the supply source into the feed flow path; a heating unit that heats the chemical solution having passed through the first filter; and a second filter that removes particles in the chemical solution at high temperature heated by the heating unit, flowing through the feed flow path toward the feed target, wherein the first filter is a hydrophilic filter and the second filter is a hydrophobic filter.
Abstract: Processing liquid is stored by a supply tank. The dissolved oxygen concentration of the processing liquid is measured. The dissolved oxygen concentration of the processing liquid in the supply tank is adjusted by supplying concentration adjusting gas having a concentration of inert gas higher than that of air into the supply tank in accordance with the dissolved oxygen concentration of the processing liquid measured. The processing liquid in the supply tank is supplied to a substrate. The processing liquid that has been supplied to the substrate is collected to the supply tank. Unnecessary gas that is a gas other than the concentration adjusting gas and dissolved in the processing liquid during the processing of the substrate is decreased from the processing liquid before the processing liquid is collected to the supply tank.
Abstract: When a chamber of a heat treatment apparatus is opened for a purpose such as maintenance of the heat treatment apparatus, particles flow in large quantities into the chamber together with an outside atmosphere. After maintenance work is finished, an enclosed space is formed in the chamber and gas in the chamber is exhausted to place the interior of the chamber in a reduced-pressure atmosphere. While the interior of the chamber is in the reduced-pressure atmosphere, the interior of the chamber is irradiated with a flash of light emitted multiple times from a flash lamp to cause momentary gas expansion and subsequent gas shrinkage repeatedly, thereby causing particles adhering in the chamber to fly. The flying particles are discharged from the chamber to remove the particles.
Abstract: A technique for automatically and accurately determining life or death of cells in a sample prepared without any labeling, not relying on the subjectivity of a determiner, is intended. A fluorescent specimen in which respective fluorescence generation modes in response to excitation light are different from each other between a living cell and a dead cell is prepared, and fluorescence imaging of the fluorescent specimen is performed. Bright field imaging of the fluorescent specimen is performed, and respective positions of the living cell and the dead cell are specified from a fluorescent image. Image objects in a bright field image, which are located at positions corresponding to the specified positions of the living cell and the dead cell are extracted as a living cell object and a dead cell object, respectively, and a classifier is constructed through machine learning using supervisor data including respective feature vectors of the extracted objects.
October 26, 2016
Date of Patent:
October 13, 2020
SCREEN HOLDINGS CO., LTD., FRONTIER PHARMA INC.
Abstract: The present invention aims to obtain a tomographic image free from image noise due to reflection on a container wall surface and having a good image quality by a simple configuration. In a FD-OCT imaging apparatus which images an imaging object stored in a container having an optical transparent wall part tomographically, when the focal depth is set such that a distance D from a first surface Sa of the wall part on the side of the imaging object to a focal point FP of the objective optical system is smaller than a predetermined threshold value smaller than a thickness T of the wall part, the distance between a second surface Sb of the wall part on a side opposite to the imaging object out of the wall surfaces and a reference plane which is perpendicular to the optical path of the illumination light and to which an optical path length is equal is set a value equal to the thickness of the wall part.
Abstract: A nozzle operating situation checking method for inkjet printing apparatus which perform printing by dispensing ink droplets from a printing head having a plurality of nozzles arranged in a transverse direction of a printing medium. The method includes the following steps: a step of printing a testing chart; a step of reading the testing chart downstream of the printing head; a step of extracting grid boxes; a step of deriving a standard width from width sizes; a step of detecting a box having a width size equal to or larger than a corrected standard width by comparing the width sizes of the respective boxes with the corrected standard width; and a step of determining that a missing nozzle exists upon detection of the box having a width size equal to or larger than the corrected standard width.
Abstract: An image processing system includes an acquisition unit that acquires an original image capturing an original area, a recognition unit that recognizes one or more identifiers in the original image, an identification unit that identifies, based on the one or more identifiers recognized by the recognition unit, at least one of a first image portion capturing a first area in the original area or a second image portion capturing a second area that results from removing the first area from the original area, and a generation unit that generates a processed image including the first image portion in accordance with a result of identification from the identification unit. A certain image portion in the original image is automatically identified with the identifiers, and the processed image is generated in accordance with a result of the identification.
Abstract: A substrate processing method includes a processing liquid supplying step of supplying a processing liquid having a solute and a solvent to a front surface of a substrate, a processing film forming step of forming on the front surface of the substrate a processing film which holds a removal object present on the front surface of the substrate by solidifying or curing the processing liquid supplied to the front surface of the substrate, and a peeling step of peeling the processing film from the front surface of the substrate together with the removal object by supplying a peeling liquid to the front surface of the substrate, and the peeling step includes a penetrating hole forming step of forming a penetrating hole on the processing film by dissolving partially the processing film in the peeling liquid.
May 30, 2019
Date of Patent:
October 6, 2020
SCREEN Holdings Co., Ltd.
Yukifumi Yoshida, Manabu Okutani, Shuichi Yasuda, Yasunori Kanematsu, Dai Ueda, Song Zhang, Tatsuro Nagahara, Takafumi Kinuta
Abstract: In a substrate processing apparatus, a transport robot which transports a substrate between an indexer part and a substrate processing part is installed in a substrate transport part. The transport fan filter unit is provided in an upper part of the substrate transport part. An exhaust port is provided in the substrate transport part. The circulation piping allows the exhaust port of the substrate transport part and the transport fan filter unit to communicate with each other. The exhaust pipe is connected to the circulation piping. The inert gas supply part supplies an inert gas to the circulation piping. The circulation fan filter unit is disposed downstream of a connecting portion of the circulation piping with the exhaust pipe to be parallel to a flow path of the circulation piping.
Abstract: A substrate processing device is provided. A chamber has a side wall part and a top wall part and contains a substrate holding part. A first gas supply part is disposed in the top wall part and supplies a first gas toward a side on which the substrate holding part is positioned. A second gas supply part is contained in the chamber and supplies a second gas to an inside of the chamber. A control unit controls the first and second gas supply part. The second gas is a gas different from oxygen and an allotrope of oxygen. The second gas supply part has an air feeding port part which is positioned on an upward side of a holding position of a substrate by the substrate holding part in a vertical direction and is positioned on an outward side of the substrate holding part in a horizontal direction.